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WO2016101360A1 - Plaque de masque, procédé d'alignement optique et dispositif d'affichage à cristaux liquides - Google Patents

Plaque de masque, procédé d'alignement optique et dispositif d'affichage à cristaux liquides Download PDF

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Publication number
WO2016101360A1
WO2016101360A1 PCT/CN2015/070607 CN2015070607W WO2016101360A1 WO 2016101360 A1 WO2016101360 A1 WO 2016101360A1 CN 2015070607 W CN2015070607 W CN 2015070607W WO 2016101360 A1 WO2016101360 A1 WO 2016101360A1
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WO
WIPO (PCT)
Prior art keywords
region
pixel
mask
panel
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2015/070607
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English (en)
Chinese (zh)
Inventor
孙杰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
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Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US14/436,450 priority Critical patent/US9678390B2/en
Publication of WO2016101360A1 publication Critical patent/WO2016101360A1/fr
Priority to US15/588,979 priority patent/US10048579B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G02F1/134345—Subdivided pixels, e.g. for grey scale or redundancy

Definitions

  • the present invention relates to the field of liquid crystal technology, and in particular, to a mask, a light alignment method for aligning a liquid crystal display device using the mask, and a liquid crystal display device.
  • the most widely used alignment technique in the manufacture of liquid crystal displays is the rubbing alignment method.
  • the brush alignment method can provide strong alignment ability of liquid crystal molecules, but in the process of brushing, due to the contact friction of the flannel, static electricity and particle pollution are generated, and these pollutions often directly cause liquid crystal components. Damage.
  • the utility model has the advantages that the surface of the glass substrate can be prevented from being contaminated, the alignment of the small area can be performed, and the illuminating through the reticle can be used for pattern alignment, and the parameters of the liquid crystal unit, such as the pretilt angle, can be controlled by using the angle of the incident light and the length of the irradiation time. Surface orientation strength, etc.
  • a plurality of regions of the same alignment direction are formed in a plurality of regions in one pixel by the photo-alignment method, thereby improving the side visibility of the liquid crystal display.
  • a plurality of photomasks are required, and the incident light in different directions is used for multiple irradiation alignment, the manufacturing process is cumbersome, and the manufacturing cost is high.
  • Embodiments of the present invention provide a mask and a photoalignment method for aligning a liquid crystal display device using the mask.
  • a method of optical alignment comprising the following steps,
  • the upper alignment film of the upper panel and the lower alignment film of the lower panel are exposed by ultraviolet rays emitted from the mask in a second incident direction.
  • a high gray scale sub-pixel of the lower panel into a first high gray scale sub-pixel region and a second high gray scale sub-pixel region adjacent to each other along a long side of the pixel; and lower gray scale of the lower panel
  • the sub-pixel is divided into a first low gray-scale sub-pixel region and a second low gray-scale sub-pixel region that are adjacent and arranged along a long side of the pixel;
  • a high gray scale sub-pixel of the upper panel into a first high gray scale sub-pixel region and a second high gray scale sub-pixel region adjacent to each other along a short side of the pixel; and lower gray scale of the upper panel
  • the sub-pixel is divided into a first low gray-scale sub-pixel region and a second low gray-scale sub-pixel region that are adjacent and arranged along a short side of the pixel;
  • the upper panel and the lower panel are disposed perpendicular to each other.
  • the method further includes the following steps:
  • the first light-transmissive region of the mask is opened and corresponding to the first high-gray sub-pixel region of the lower panel; the first baffle of the mask blocks the second transparent region of the first opening;
  • the third transparent region of the mask is opened and corresponding to the first low gray sub-pixel region of the lower panel; the second baffle of the mask blocks the fourth transparent region of the second opening;
  • the fifth light-transmissive region of the reticle is opened and corresponding to the first high-gray sub-pixel region of the upper panel; the third baffle of the reticle blocks the sixth transparent region of the third opening;
  • the seventh light-transmitting region of the mask is opened and corresponding to the first low-gray sub-pixel region of the upper panel; and the fourth baffle of the mask blocks the eighth light-transmitting region of the fourth opening.
  • the ultraviolet rays pass through the first light transmission region of the mask plate in the first incident direction, and the third The light transmitting region is incident on the lower panel; the ultraviolet light is incident on the upper panel through the fifth light transmitting region and the seventh light transmitting region of the mask in the first incident direction.
  • the second transparent region of the mask is opened and corresponding to the second high gray sub-pixel region of the lower panel; the first baffle of the mask blocks the first transparent region of the first opening;
  • the fourth transparent region of the mask is opened and corresponding to the second low gray sub-pixel region of the lower panel; the second barrier of the mask blocks the third transparent region of the second opening;
  • the sixth light-transmitting region of the mask is opened and corresponding to the second high-gray sub-pixel region of the upper panel; the third baffle of the mask blocks the fifth light-transmitting region of the third opening;
  • An eighth light-transmissive region of the mask is opened and corresponding to a second low-gray sub-pixel region of the upper panel; and a fourth barrier of the mask blocks a seventh transparent region of the fourth opening.
  • the ultraviolet rays pass through the second light transmission region of the mask plate in the first incident direction, and the fourth The light transmitting region is incident on the lower panel; the ultraviolet light is incident on the upper panel through the sixth light transmitting region and the eighth light transmitting region of the mask in the first incident direction.
  • a mask board includes a light shielding plate body, a first opening, a second opening, a third opening and a fourth opening formed in the light shielding plate body, wherein the first opening of the mask plate includes an adjacent first light transmitting region And the second transparent region, the second opening of the mask includes an adjacent third transparent region and a fourth transparent region, and the third opening of the mask includes an adjacent fifth transparent region and the a sixth transparent region, the fourth opening of the mask includes an adjacent seventh transparent region and an eighth transparent region, and the mask is further provided with a first baffle, a second baffle, and a third block a first baffle for shielding the first light transmissive area or the second light transmissive area, wherein the second baffle is for shielding the third light transmissive area or the fourth translucent area In the light region, the third baffle is used to block the fifth light-transmitting region or the sixth light-transmitting region, and the fourth baffle is used to block the seventh light-transmitting region or the eighth light-transmitting region.
  • a liquid crystal display device includes a lower layer panel, an upper layer panel, and a liquid crystal layer disposed between the upper layer panel and the lower layer panel;
  • the upper layer panel includes an upper layer substrate and an upper alignment film disposed on the upper layer substrate;
  • the panel includes a lower substrate and a lower alignment film disposed on the lower substrate, the liquid crystal layer includes a plurality of liquid crystal molecules, and any pixel of the liquid crystal display device includes a high gray scale sub-pixel located at an upper end and a lower portion at a lower end a gray-scale sub-pixel, the high gray-scale sub-pixel and the low gray-scale sub-pixel are each divided into four domains, in which liquid crystal molecules of the liquid crystal layer Being oriented in different directions.
  • the angle between the liquid crystal molecules and the long side or the short side of the panel is less than 45 degrees.
  • the high gray scale sub-pixel of the lower panel is divided into a first high gray scale sub-pixel region and a second high gray scale sub-pixel region which are adjacent and arranged along a long side of the pixel.
  • the low grayscale sub-pixels of the lower panel are divided into first low grayscale sub-pixel regions and second low grayscale sub-pixel regions adjacent to each other along the long side of the pixel.
  • the high grayscale sub-pixels of the upper panel are divided into first high grayscale sub-pixel regions and second high grayscale sub-pixel regions adjacent to each other along the short side of the pixel.
  • the low grayscale sub-pixels of the upper panel are divided into first low grayscale sub-pixel regions and second low grayscale sub-pixel regions adjacent to each other along the short side of the pixel.
  • the mask plate of the present invention and the photo-alignment method using the same enable the mask to be reusable by providing the movable first baffle, the second baffle, the third baffle and the fourth baffle, thereby reducing
  • the number of mask plates in the process of optical alignment of the alignment film reduces the cost.
  • the lower layer panel and the upper panel are disposed, and the alignment film of the lower panel and the upper panel is simultaneously exposed by using the mask, and only one mask is used for the exposure to complete the alignment film process in the entire liquid crystal display device, thereby effectively reducing the exposure.
  • FIG. 1 is a schematic structural view of a liquid crystal display device according to the present invention.
  • FIG. 2 is a schematic structural view of a lower panel of the liquid crystal display device of FIG. 1;
  • FIG. 3 is a schematic structural view of an upper panel of the liquid crystal display device of FIG. 1;
  • FIG. 4 is a schematic structural view of a visor body of a reticle provided by a preferred embodiment of the present invention.
  • FIG. 5 and FIG. 6 are schematic diagrams showing the arrangement of an upper panel, a lower panel, and a mask provided by a preferred embodiment of the present invention
  • FIG. 7 is a flow chart of a method for optical alignment provided by a preferred embodiment of the present invention.
  • FIG. 8 to FIG. 13 are schematic cross-sectional views of respective bayonet of the mask when aligned by a mask according to a preferred embodiment of the present invention.
  • a preferred embodiment of the present invention provides a mask and a photoalignment method for aligning a liquid crystal display device using the mask.
  • the liquid crystal display device includes a lower layer panel 100, an upper layer panel 200, and a liquid crystal layer (not shown) disposed between the upper layer panel 200 and the lower layer panel 100.
  • the upper layer panel 200 includes an upper layer substrate and a setting.
  • the lower panel 100 includes a lower substrate and a lower alignment film (not shown) disposed on the lower substrate.
  • the liquid crystal layer includes a plurality of liquid crystal molecules 310. The mask can be used to expose the alignment film of the upper panel and the lower panel.
  • a pixel 10 of the liquid crystal display device includes a high gray scale sub-pixel H at an upper end and a low gray scale sub-pixel L at a lower end, the high gray The order sub-pixel H and the low gray scale sub-pixel L are disposed along the long side of the pixel.
  • the high gray scale sub-pixel H and the low gray scale sub-pixel L are each divided into four domains, having a structure of 2x2. In four adjacent domains, the liquid crystal molecules of the liquid crystal layer are aligned in different directions; in each domain, the angle between the liquid crystal molecules 310 and one side (long side or short side) of the panel is less than 45°.
  • the high gray scale sub-pixel H and the low gray scale sub-pixel L of the lower panel 100 are divided into left and right portions.
  • the high gray scale sub-pixel H of the lower panel 100 is divided into a first high gray scale sub-pixel region h 1 and a second high gray matrix sub-pixel region h 2 adjacent to each other along the long side of the pixel 10
  • the low gray scale sub-pixel L of the lower panel 100 is divided into a first low gray scale sub-pixel region 11 and a second low gray scale sub-pixel region l 2 which are adjacent and arranged along the long side of the pixel 10.
  • the liquid crystal display device optically aligns the high-gray sub-pixel H and the low-gray sub-pixel L of the lower panel 100 through the lower alignment film of the lower panel 100.
  • the high gray scale sub-pixel H and the low gray scale sub-pixel L of the upper panel 200 are formed into left and right portions.
  • the high gray scale sub-pixel H of the upper panel 200 is divided into a first high gray scale sub-pixel region h 3 and a second high gray matrix sub-pixel region h 4 adjacent to each other along the short side of the pixel 10
  • the low gray scale sub-pixel L of the upper panel 200 is divided into a first low gray scale sub-pixel region 13 and a second low gray scale sub-pixel region 14 which are adjacent and arranged along the short side of the pixel 10.
  • the liquid crystal display device optically aligns the high-gray sub-pixel H and the low-gray sub-pixel L of the upper panel 200 through the upper alignment film of the upper panel 200.
  • the lower layer panel 100 or the upper layer panel 200 is blocked by the mask 40, and the lower layer alignment film of the lower layer panel 100 or the upper layer alignment film of the upper layer panel 200 is exposed, such that the lower layer alignment film of the lower layer panel 100 and the upper layer panel 200
  • the upper alignment film has an alignment force as shown in FIG.
  • the lower panel 100 or the upper panel 200 is shielded by the mask 40, and optical alignment is performed.
  • the present invention provides a mask 40 required for a photo-alignment method, including a visor body 400, a first opening 401, a second opening 402, and a third opening 403 formed in the visor body 400.
  • the first opening 401 of the mask 40 includes an adjacent first light transmissive region 4011 and a second light transmissive region 4012.
  • the second opening 402 of the mask 40 includes adjacent third light transmissive regions 4021 and fourth light transmissive regions 4022.
  • the third opening 403 of the mask 40 includes adjacent fifth light transmissive regions 4031 and sixth light transmissive regions 4032.
  • the fourth opening 404 of the mask 40 includes adjacent seventh light transmissive regions 4041 and eighth light transmissive regions 4042.
  • the mask 40 is further provided with a first baffle 41 , and the first baffle 41 is movable in the first opening 401 to block the first light transmission. Region 4011 or second light transmissive region 4012.
  • the reticle 40 is further provided with a second baffle 42 movable in the second opening 402 to block the third transparent region 4021 or the fourth transparent region 4022.
  • the reticle 40 is further provided with a third baffle 43 , and the third baffle 43 is movable in the third opening 403 to block the fifth transparent region 4031 or the sixth transparent region 4032.
  • the reticle 40 is further provided with a fourth baffle 44, and the fourth baffle 44 is movable in the fourth opening 404 to block the seventh transparent region 4041 or the eighth transparent region 4042.
  • the first baffle 41, the second baffle 42, and the third baffle 43 are movable in the first opening 401, the second opening 402, the third opening 403, and the fourth opening 404, thereby blocking or opening the first transparent area 4011 and the second transparent area 4012 as needed.
  • the third light transmissive region 4021, the fourth light transmissive region 4022, the fifth light transmissive region 4031, the sixth light transmissive region 4032, the seventh light transmissive region 4041, and the eighth light transmissive region 4042 Therefore, when the lower alignment film or the upper alignment film is subjected to exposure alignment, the ultraviolet light emitted from the exposure lamp 60 is transmitted through the corresponding light transmission region to perform a desired exposure alignment operation.
  • the present invention also provides a photo-alignment method, comprising the following steps:
  • step S101 the upper panel 200 and the lower panel 100 are provided.
  • Step S1011 dividing the high gray scale sub-pixel H of the lower layer panel 100 into the first high gray scale sub-pixel region h 1 and the second high gray scale sub-pixel region h 2 adjacent to each other along the long side of the pixel 10
  • the low gray scale sub-pixel L of the lower panel 100 is divided into first low gray sub-pixel regions l 1 and second low gray sub-pixel regions l 2 adjacent to each other along the long side of the pixel 10;
  • Step S1012 the upper panel the high gray sub-pixel is divided into H 200 pixels 10 adjacent to and along the short side arranged sub-pixel region of the first high gradation h 3 and the second high-gray subpixel region h 4
  • the low gray sub-pixel L of the upper panel 200 is divided into a first low gray sub-pixel region l 3 and a second low gray sub-pixel region l 4 adjacent to each other along the short side of the pixel 10;
  • step S1013 the upper panel 200 and the lower panel 100 are vertically disposed to each other.
  • Step S102 providing a mask 40 to block the upper panel 200 and the lower panel 100, and to provide a light transmissive area of the mask 40.
  • This step further includes the following steps:
  • Step S1021 as shown in FIG. 8, the first mask 40 is light-transmissive region template 4011 and the corresponding opening of the lower panel first high gray sub-pixel region 100 is disposed h 1; 40 of the first template mask The baffle 41 blocks the second transparent region 4012 of the first opening 401;
  • Step S1022 as shown in FIG. 9, the third mask 40 and light-transmissive region corresponding to the lower opening 4021 of the first panel region of low gray level sub-pixel set 100 l 1; and the second template mask 40
  • the baffle 42 blocks the fourth transparent region 4022 of the second opening 401;
  • Step S1023, shown in Figure 10 the mask 40 is turned on and the fifth light transmitting region 4031 corresponding to the first sub-pixel high gradation region of the upper panel 200 disposed h 3; the third mask of the template 40 The baffle 43 blocks the sixth transparent region 4032 of the third opening 401;
  • Step S1024 shown in Figure 10, the mask 40 is opened and the seventh light-transmissive region 4041 corresponding to the top panel of the first low gray level sub-pixel region 200 disposed l 3; said fourth mask template 40
  • the baffle 44 blocks the eighth light transmissive area 4042 of the fourth opening 401.
  • step S102 when the mask 40 is provided to perform the mask, the upper panel 200 and the lower panel 100 are moved relative to the mask 40. Thereby, the mask 40 is disposed at an appropriate position between the upper panel 200, the lower panel 100, and the exposure lamp 60. It can be understood that the upper panel 200 and the lower panel 100 can be moved toward the mask 40 when the mask is performed.
  • the upper panel 200 and the lower panel 100 may also be fixed, and the mask 40 may be moved toward the upper panel 200 and the lower panel 100.
  • step S103 the upper alignment film of the upper panel 200 and the lower alignment film of the lower panel 100 are exposed by ultraviolet rays in the first incident direction by the mask 40.
  • the exposure lamp 60 emits ultraviolet rays in a first incident direction, and is incident on the lower layer panel 100 through the first light transmitting region 4011 and the third light transmitting region 4021 of the mask 40; and the exposure lamp 60 is first.
  • the incident direction emits ultraviolet rays, and is incident on the upper panel 200 through the fifth light-transmitting region 4031 and the seventh light-transmitting region 4041 of the mask 40, thereby causing the first high-gray sub-pixel region h 1 of the upper panel 200 a low gray level sub-pixel region. 1 l and the lower region of the first panel of high gray scale subpixel 100 h 3, a first low gray level sub-pixel region having a first l 3 with the ultraviolet ray incidence direction of the film uniform Orientation.
  • step S104 the light transmissive area of the mask 40 is adjusted.
  • This step further includes the following steps:
  • Step S1041 as shown in FIG. 11, the second light-transmitting region 4012 of the mask 40 is opened and corresponding to the second high-gray sub-pixel region h 2 of the lower panel 100; the first of the mask 40 The baffle 41 blocks the first transparent region 4011 of the first opening 401;
  • Step S1042 shown in Figure 12, the mask 40 is turned on and a fourth transmissive region 4022 corresponding to the lower panel of the second low gray level sub-pixel region 100 is disposed l 2; the second template mask 40 The baffle 42 blocks the third transparent region 4021 of the second opening 401;
  • the baffle 43 blocks the fifth transparent region 4031 of the third opening 401;
  • Step S1044 the eighth transparent region 4042 of the mask 40 is opened and corresponding to the second low gray sub-pixel region 14 of the upper panel 200; the fourth shutter 44 of the mask 40 blocks the The seventh light transmitting region 4041 of the fourth opening 401.
  • step S105 the upper alignment film of the upper layer panel 200 and the lower alignment film of the lower layer panel 100 are exposed by ultraviolet rays in the second incident direction by the mask 40.
  • the exposure lamp 60 emits ultraviolet rays in the second incident direction, and is incident on the lower layer panel 100 through the second light transmitting region 4012 and the fourth light transmitting region 4022 of the mask 40, and the exposure lamp 60 is second.
  • the incident direction emits ultraviolet rays through the sixth light-transmitting region 4032 of the mask 40, and the eighth light-transmitting region 4042 is incident on the upper panel 200, so that the second high-gray sub-pixel region h 2 and the second low of the upper panel 200
  • the alignment film of the gray-scale sub-pixel region 12 and the second high-gray sub-pixel region h 4 and the second low-gray sub-pixel region 14 of the lower panel 100 has an alignment force consistent with the second incident direction of the ultraviolet light. .
  • step S105 the alignment is the same as the photo-alignment method in step S103, except for the position where the baffle is disposed and the incident direction of the ultraviolet ray.
  • the upper alignment film of the double-layered upper layer panel 200 and the respective regions of the lower alignment film of the lower layer panel 100 have different alignment forces, that is, a plurality of domains having different alignment directions are formed on one pixel 10.
  • the mask 40 of the present invention and the photo-alignment method using the mask 40 are provided with the movable first shutter 41, the second shutter 42, the third shutter 43, and the fourth shutter 44, so that the mask 40 is provided. It can be reused, thereby reducing the number of lands of the reticle 40 in the process of optical alignment of the alignment film, and reducing the cost.
  • the lower panel 100 and the upper panel 200 are disposed, and the alignment film of the lower panel 100 and the upper panel 200 is simultaneously exposed by the mask 40, and only one exposure of the mask 40 is performed to complete the alignment in the entire liquid crystal display device.
  • the film process effectively reduces the number of exposures and simplifies the manufacturing process.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Liquid Crystal (AREA)
  • Geometry (AREA)

Abstract

La présente invention concerne un procédé d'alignement optique, comprenant les étapes consistant à obtenir un panneau de couche supérieure et d'un panneau de couche inférieure; à obtenir une plaque de masque pour protéger le panneau de couche supérieure et le panneau de couche inférieure et à obtenir une zone émettrice de lumière de la plaque de masque; à utiliser la plaque de masque pour émettre un rayon ultraviolet à partir d'une première direction d'incidence pour faire apparaître un film d'alignement de couche supérieure du panneau de couche supérieure et un film d'alignement de couche inférieure du panneau de couche inférieure; à ajuster la zone émettrice de lumière de la plaque de masque; et à utiliser la plaque de masque pour émettre le rayon ultraviolet à partir d'une seconde direction d'incidence pour faire apparaître le film d'alignement de couche supérieure du panneau de couche supérieure et le film d'alignement de couche inférieure du panneau de couche inférieure. Le fait de rendre visible les films d'alignement en deux endroits pour une seule plaque de masque permet d'achever la procédure de fabrication pour le film d'alignement dans l'ensemble du dispositif d'affichage à cristaux liquides, ce qui permet de réduire efficacement le nombre de fois où l'on doit rendre ce film visible et de simplifier le processus de fabrication.
PCT/CN2015/070607 2014-12-26 2015-01-13 Plaque de masque, procédé d'alignement optique et dispositif d'affichage à cristaux liquides Ceased WO2016101360A1 (fr)

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US20170242334A1 (en) 2017-08-24
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CN104570489B (zh) 2018-07-03
US9885921B2 (en) 2018-02-06
US20160202559A1 (en) 2016-07-14
CN104570489A (zh) 2015-04-29

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