WO2016064187A1 - Multi-layer structured lithium metal electrode and method for manufacturing same - Google Patents
Multi-layer structured lithium metal electrode and method for manufacturing same Download PDFInfo
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- WO2016064187A1 WO2016064187A1 PCT/KR2015/011145 KR2015011145W WO2016064187A1 WO 2016064187 A1 WO2016064187 A1 WO 2016064187A1 KR 2015011145 W KR2015011145 W KR 2015011145W WO 2016064187 A1 WO2016064187 A1 WO 2016064187A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
- H01M4/134—Electrodes based on metals, Si or alloys
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/052—Li-accumulators
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/13—Electrodes for accumulators with non-aqueous electrolyte, e.g. for lithium-accumulators; Processes of manufacture thereof
- H01M4/139—Processes of manufacture
- H01M4/1395—Processes of manufacture of electrodes based on metals, Si or alloys
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/36—Selection of substances as active materials, active masses, active liquids
- H01M4/48—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/62—Selection of inactive substances as ingredients for active masses, e.g. binders, fillers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Definitions
- the present invention relates to a lithium metal electrode having a multi-layer structure and a method of manufacturing the same, and more particularly, to form a buffer layer of lithium nitride (Li 3 N) on a lithium metal plate, and to form a protective layer of LiBON on the buffer layer.
- the present invention relates to a method for producing a lithium metal electrode having a multilayer structure, wherein a lithium nitride buffer layer and a LiBON protective layer are successively formed on a lithium metal electrode having a multilayer structure and a lithium metal plate by reactive sputtering.
- Lithium metal secondary batteries Lithium Metal Battery, LMB
- Lithium metal secondary batteries use lithium as a negative electrode.
- Lithium has a low density and low standard reduction potential of -3.04 V, which is light and has the advantage of producing high energy in secondary battery manufacturing.
- Korean Unexamined Patent Publication No. 2013-0043117 discloses a lithium secondary battery using lithium metal oxides such as LiNiCoMnO 2 , LiNiO 2 , LiCoO 2 , LiMn 2 O 4 , LiFePO 4 , and the like.
- lithium oxide is used as a negative electrode in a secondary battery because lithium metal is highly reactive. Lithium metal reacts with moisture in the air to produce by-products such as LiOH, Li 2 O, Li 2 CO 3, and the like.
- a resistive material is produced, which significantly degrades the performance of the manufactured battery, and may cause an internal short circuit.
- since lithium is a very weak metal, handling is difficult and it is difficult to utilize it as an electrode.
- lithium metal electrodes that can solve the reactivity problem of lithium while improving energy efficiency using lithium metal and can simplify the process more.
- Patent Document 1 Korean Patent Publication No. 2013-0043117 (Published: 2013.04.29)
- An object of the present invention is to form a protective layer that can ensure the safety by preventing the violent reaction of moisture and lithium metal in the air during cell fabrication, the oxide is formed by the side reaction of oxygen and lithium in the process of forming the protective layer It is to provide a multi-layered lithium metal electrode having a buffer layer for preventing the ion conductivity is reduced.
- An object of the present invention is to provide a method for producing an electrode having excellent processability by sequentially and successively forming a buffer layer and a protective layer on a lithium metal plate in the same chamber by a reactive sputtering method.
- an aspect of the present invention is a lithium metal electrode of a multi-layer structure includes a protective layer consisting of a lithium nitride layer formed on the lithium metal plate and LiBON having a composition of the following formula (1):
- the buffer layer may be formed on one side or both sides of the lithium metal plate, and may be preferably formed on the side facing the electrolyte.
- LiBON having a composition of Formula 1 is Li 3 . 09 BO 2 . 53 N 0 .52, Li 0.90 BO 0.66 N 0.98, Li 3.51, or 3.03 N 0.52 BO, and the like, but not limited to these.
- the thickness of the lithium metal plate may be 30 to 500 ⁇ m.
- the thickness of the buffer layer lithium nitride layer may be 0.01 to 5 ⁇ m.
- the thickness of the protective layer LiBON layer may be 0.1 to 10 ⁇ m.
- the method of manufacturing the lithium nitride buffer layer or LiBON protective layer is not particularly limited, and for example, a method selected from electron beam deposition, organometallic chemical vapor deposition, reactive sputtering, high frequency sputtering, and magnetron sputtering It can be formed as.
- Another aspect of the present invention provides a method of manufacturing a lithium metal electrode of a multilayer structure by a reactive sputtering method comprising the following steps.
- lithium nitride (Li 3 N) thin film on one or both surfaces of the lithium metal plate by reactive sputtering
- LiBON thin film having a composition of Chemical Formula 1 by reactive sputtering in a continuous manner to the lithium nitride thin film.
- Another aspect of the present invention is a lithium secondary battery including a negative electrode, a positive electrode, and an electrolyte interposed between the positive electrode and the negative electrode, a lithium secondary using a lithium electrode of a multi-layer structure according to the aspect of the present invention as the negative electrode Provide a battery.
- the lithium metal electrode of the multi-layered structure of the present invention can form a protective layer to protect the lithium metal from moisture or reactivity in the battery environment and prevent dendrite formation.
- the oxide layer is formed on the lithium metal plate during the formation of the protective layer by the formation of the buffer layer to prevent the problem that the ion conductivity may be reduced.
- FIG. 1 is a schematic diagram of a lithium metal electrode of a multilayer structure according to an embodiment of the present invention.
- FIG. 2 is a flowchart of a method of manufacturing a lithium metal electrode of a multilayer structure according to an embodiment of the present invention.
- FIG. 1 is a view showing a lithium metal electrode of a multilayer structure according to an embodiment of the present invention.
- a buffer layer 1210 and a protective layer 1220 are formed on a lithium metal plate 1100.
- the buffer layer 1210 and the protective layer 1220 are formed on only one surface of the lithium metal plate 1100 in this drawing, both surfaces of the lithium metal plate 1100 may be formed.
- lithium metal when used as a battery negative electrode, the following problems exist.
- the dendrite thus formed may grow and cause an internal short circuit directly between the positive electrode and the void of the separator, thereby causing the battery to explode.
- the buffer layer 1210 and the protective layer 1220 by forming the buffer layer 1210 and the protective layer 1220, it is possible to prevent the formation of the passivation layer and the formation of dendrites and to reinforce the mechanical strength.
- the buffer layer 1210 blocks handling of the lithium metal in a battery manufacturing environment, thereby making it easier to handle and lowering ion conductivity.
- the lithium metal plate 1100 uses a plate metal.
- the lithium metal plate may be adjusted in width depending on the shape of the electrode to facilitate the manufacture of the electrode.
- the thickness of the lithium metal plate may be 30 to 500 ⁇ m.
- the buffer layer 1210 may be formed of lithium nitride (Li 3 N), and may be formed on both the top and bottom surfaces of the lithium metal plate 1100 or on only one surface of the lithium metal plate 1100 that faces the electrolyte layer.
- lithium metal is oxidized in the process of forming the protective layer 1220 to expose to moisture in the air, thereby forming Li 2 O, thereby lowering the ionic conductivity.
- forming the lithium nitride thin film is to prevent oxidation of the electrode rather than to improve battery performance.
- the thickness of the lithium nitride layer is sufficient to be applied only enough to prevent the surface of the lithium electrode from being exposed to moisture or air to be oxidized, and if too thick, it causes an unnecessary increase in thickness of the electrode. May be ⁇ m.
- the protective layer 1220 may be deposited on the surface of the buffer layer 1210 to prevent the lithium metal plate 1100 from being directly exposed to the electrolyte, thereby preventing the reaction between lithium and the electrolyte.
- the protective layer 1220 of the present invention is made of LiBON and has conductivity, it is possible to smoothly transfer ions to the electrode, thereby increasing battery life and enhancing battery performance.
- the LiBON may have a composition of Formula 1 below.
- the LiBON is especially Li 3 . 09 BO 2 . 53 have the following composition when N 0 .52 ionic conductivity up to 2.3 ⁇ 10 -6 S / cm, has been reported to exhibit excellent charge-discharge performance compared to conventional LiPON bar.
- the thickness of the protective layer 1220 is too thin, the protective effect on the environment of the moisture or the battery may not be sufficiently exhibited. On the contrary, if the thickness is too thick, relative capacity loss may occur due to unnecessary thickness increase. It may be formed to a thickness of ⁇ m.
- the method of forming the lithium nitride thin film of the buffer layer 1210 and the LiBON thin film of the protective layer 1220 is not particularly limited.
- electron beam deposition, organometallic chemical vapor deposition, reactive sputtering, high frequency sputtering, and magnetron sputtering Various vapor deposition methods may be used, but the present invention is not limited thereto.
- Each of the illustrated deposition methods is a well-known method, and thus a detailed description thereof is omitted herein.
- the lithium metal electrode 1000 of the multilayer structure according to the present invention may have various widths and lengths depending on the shape of the battery. If necessary, the lithium metal electrode 1000 manufactured in various widths may be wound and cut if necessary.
- FIG. 2 is a flow chart of a method for manufacturing a lithium electrode of a multi-layer structure according to an embodiment of the present invention.
- a lithium metal electrode is provided in a vacuum chamber (S1).
- the next step (S2) is a step of forming a lithium nitride (Li 3 N) thin film on one or both sides of the lithium metal plate by nitrogen (N 2 ) gas reactive sputtering method.
- the next step (S3) is a step of forming a LiBON thin film having the composition of Chemical Formula 1 by reactive sputtering method while leaving the lithium metal plate on which the lithium nitride thin film is formed in the reaction chamber.
- reactive sputtering is a method of forming a thin film using DC power.
- a lithium metal is mounted as a target and an argon gas is injected to generate a plasma, and nitrogen may be added as a reactive gas.
- a lithium metal plate coated with a lithium nitride thin film is targeted in the same vacuum chamber, and boron gas, oxygen gas, and nitrogen gas are added as a reactive gas.
- Each gas line can be equipped with a Mass Flow Controller (MFC) to control the gas. Only by controlling the amount of the reaction gas precisely, the stoichiometric ratio of the thin film can be matched.
- MFC Mass Flow Controller
- One embodiment of the present invention includes a negative electrode, a positive electrode, and an electrolyte interposed between the positive electrode and the negative electrode, the negative electrode provides a lithium secondary battery which is a lithium electrode of the multi-layer structure described above. Since the secondary battery of the present invention manufactures a negative electrode using lithium metal instead of lithium ions, a battery having a higher capacity and a higher energy density than a conventional secondary battery can be manufactured. In addition, by forming a buffer layer on the lithium metal plate before the cathode is manufactured, a protective layer can be formed on the lithium metal plate while preventing lithium from reacting with moisture in the air.
- a lithium metal plate (thickness: 20 ⁇ m) was exposed to 0.1 Pa of nitrogen (N 2 ) gas for 5 minutes in a vacuum chamber to form a lithium nitride (Li 3 N) thin film (thickness: 0.02 ⁇ m) by the reactive sputtering method. continuously while still placed a lithium metal plate to form a thin film of lithium in the reaction chamber by reactive sputtering a target of Li 2 BO 3 method (reactive sputtering) as Li 3. 09 BO 2 . 53 N 0 LiBON thin film having a composition of 0.52 (thickness: 0.2 ⁇ m) was formed. The lithium metal plate on which the coating layer thus prepared was formed was used as a negative electrode.
- a symmetric cell of the prepared negative electrode was prepared.
- a symmetric cell was prepared in the same manner as in Example 1 except that the thickness of the lithium nitride (Li 3 N) thin film was formed to 0.02 ⁇ m in Example 1.
- a symmetric cell was prepared in the same manner as in Example 1 except that the thickness of the lithium nitride (Li 3 N) thin film was formed in 0.01 ⁇ m.
- a symmetric cell was prepared in the same manner as in Example 1 except that the thickness of the LiBON thin film was formed to 0.01 ⁇ m in Example 1.
- a symmetric cell was prepared in the same manner as in Example 1 except that the thickness of the LiBON thin film was set to 5 ⁇ m in Example 1.
- the LiBON thin film in Example 1 was Li 0 . 9 BO 0 . 66 N 0 to 0.98, and the composition of the embodiment in the same manner as in Example 1, but formed to have a symmetrical cell was prepared.
- the LiBON thin film in Example 1 was Li 3 . 51 BO 3 . 03 N 0 to 0.52, and the composition of the embodiment in the same manner as in Example 1, but formed to have a symmetrical cell was prepared.
- a symmetric cell was prepared in the same manner as in Example 1 except that the lithium nitride (Li 3 N) thin film and the LiBON thin film were not formed in Example 1.
- a symmetric cell was prepared in the same manner as in Example 1 except that the LiBON thin film was not formed in Example 1.
- a symmetric cell was prepared in the same manner as in Example 1 except that the lithium nitride (Li 3 N) thin film was not formed in Example 1.
- a lithium metal plate (thickness: 20 ⁇ m) was exposed to 0.1 Pa of nitrogen (N 2 ) gas for 5 minutes in a vacuum chamber to form a lithium nitride (Li 3 N) thin film (thickness: 0.02 ⁇ m) by the reactive sputtering method. continuously while still placed a lithium metal plate to form a thin film of lithium in the reaction chamber by reactive sputtering a target of Li 3 PO 4 method (reactive sputtering) by LiPON LiPON thin film having a composition of 1, 0.33: (thickness 0.2 ⁇ m) was formed.
- the lithium metal plate on which the coating layer thus prepared was formed was used as a negative electrode.
- a symmetric cell of the prepared negative electrode was prepared.
- a symmetric cell was prepared in the same manner as in Comparative Example 4 except that the thickness of the LiPON thin film in Comparative Example 4 was 0.1 ⁇ m.
- a symmetric cell was prepared in the same manner as in Comparative Example 4 except that the thickness of the LiPON thin film was formed at 2 ⁇ m in Comparative Example 4.
- the symmetric cells prepared in Examples and Comparative Examples were charged and discharged at 83% DOD (depth of discharge) and 1C charge and discharge conditions. After the charging and discharging, it was visually observed whether the Li metal was oxidized and whether the LiBON thin film or the LiPON thin film was cracked, and the cycle efficiency (%) was measured. The results are shown in Table 1 below.
- the optimum thickness of the lithium nitride (Li 3 N) thin film in Examples 1 to 3 is 0.02 ⁇ m.
- LiBON thin film coating may cause oxidation of Li.
- the thickness is larger, the Li efficiency decreases due to the low ion conductivity of the lithium nitride (Li 3 N) thin film. .
- the optimum thickness of the LiBON thin film is 0.2 ⁇ m.
- the thickness is smaller than this, lithium is exposed to the electrolyte due to the breakdown of the LiBON thin film during charge and discharge, and when the thickness is larger, the efficiency decreases due to the resistance.
- the LiBON thin film is not formed to prevent lithium dendrite formation
- the lithium nitride (Li 3 N) thin film is not formed so that the battery is not driven by the formation of LiO 2 during coating of the LiBON thin film. It can be seen that.
- lithium metal electrode 1100 lithium metal plate
- buffer layer 1220 protective layer
- the present invention relates to a lithium metal electrode having a multi-layer structure and a method of manufacturing the same, the multi-layer structure of forming a buffer layer of lithium nitride (Li 3 N) on a lithium metal plate, and a protective layer of LiBON on the buffer layer
- the present invention relates to a method for producing a lithium metal electrode having a multi-layer structure in which a lithium nitride buffer layer and a LiBON protective layer are successively formed on a lithium metal plate by a lithium metal electrode and a reactive sputtering method.
- the lithium metal electrode may be used as a negative electrode of a lithium secondary battery.
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Abstract
Description
본 발명은 다층구조의 리튬금속 전극 및 이의 제조방법에 관한 것으로, 보다 구체적으로는 리튬 금속판 상에 질화리튬(Li3N)으로 이루어진 버퍼층을 형성하고, 상기 버퍼층 상에 LiBON으로 이루어진 보호층을 형성한 다층구조의 리튬금속 전극과 리튬 금속판에 반응성 스퍼터링법으로 연속하여 질화리튬 버퍼층과 LiBON 보호층을 형성하는 다층구조의 리튬금속 전극의 제조방법에 관한 것이다. The present invention relates to a lithium metal electrode having a multi-layer structure and a method of manufacturing the same, and more particularly, to form a buffer layer of lithium nitride (Li 3 N) on a lithium metal plate, and to form a protective layer of LiBON on the buffer layer. The present invention relates to a method for producing a lithium metal electrode having a multilayer structure, wherein a lithium nitride buffer layer and a LiBON protective layer are successively formed on a lithium metal electrode having a multilayer structure and a lithium metal plate by reactive sputtering.
이동 전화기부터 시작하여, 무선 가전 기기, 전기 자동차에 이르기까지 전지를 필요로 하는 다양한 기기들이 개발되고 있다. 이러한 기기들의 개발에 따라 이차 전지에 대한 수요 역시 증가하고 있다. 특히, 전자 제품의 소형화 경향과 더불어 이차 전지도 경량화 및 소형화되고 있는 추세이다.Starting with mobile phones, a variety of devices requiring batteries are being developed, ranging from wireless home appliances to electric vehicles. With the development of these devices, the demand for secondary batteries is also increasing. In particular, in addition to miniaturization of electronic products, secondary batteries are also becoming lighter and smaller.
이러한 추세에 부합하여, 최근 리튬 금속 이차 전지(Lithium Metal Battery, LMB)가 각광을 받고 있다. 리튬 금속 이차 전지는 음극으로서 리튬을 사용하고 있다. 리튬은 밀도가 낮고 표준 환원 전위가 -3.04 V로 낮기 때문에 가벼우면서도 이차 전지 제조시 고에너지를 낼 수 있다는 장점이 있다. In response to this trend, lithium metal secondary batteries (Lithium Metal Battery, LMB) has been in the spotlight. Lithium metal secondary batteries use lithium as a negative electrode. Lithium has a low density and low standard reduction potential of -3.04 V, which is light and has the advantage of producing high energy in secondary battery manufacturing.
한국 공개특허 제2013-0043117호에는 LiNiCoMnO2, LiNiO2, LiCoO2, LiMn2O4, LiFePO4 등의 리튬 금속 산화물을 이용한 리튬 이차 전지에 대하여 개시되어 있다. 일반적으로 이차전지에서 음극으로서 리튬 산화물을 이용하는데, 이는 리튬 금속의 반응성이 매우 크기 때문이다. 리튬 금속은 공기 중의 수분과 반응하여 LiOH, Li2O, Li2CO3 등의 부산물을 만든다. 또한, 전극으로 사용된 리튬 금속이 전해액에 노출되는 경우 저항 물질이 생성되며, 이는 제조된 전지의 성능을 현저하게 떨어뜨리게 되며, 내부 단락까지 초래할 수 있다. 또한, 리튬은 강도가 매우 약한 금속이기 때문에 핸들링이 어렵고 전극으로 활용하기가 어려운 문제가 있다.Korean Unexamined Patent Publication No. 2013-0043117 discloses a lithium secondary battery using lithium metal oxides such as LiNiCoMnO 2 , LiNiO 2 , LiCoO 2 , LiMn 2 O 4 , LiFePO 4 , and the like. Generally, lithium oxide is used as a negative electrode in a secondary battery because lithium metal is highly reactive. Lithium metal reacts with moisture in the air to produce by-products such as LiOH, Li 2 O, Li 2 CO 3, and the like. In addition, when a lithium metal used as an electrode is exposed to an electrolyte, a resistive material is produced, which significantly degrades the performance of the manufactured battery, and may cause an internal short circuit. In addition, since lithium is a very weak metal, handling is difficult and it is difficult to utilize it as an electrode.
이에, 리튬 금속을 사용하여 에너지 효율을 높이면서도 리튬의 반응성 문제를 해결할 수 있고 공정을 보다 더 간단하게 할 수 있는 리튬 금속 전극의 개발이 요구된다. Accordingly, the development of lithium metal electrodes that can solve the reactivity problem of lithium while improving energy efficiency using lithium metal and can simplify the process more.
[선행기술문헌][Preceding technical literature]
[특허문헌][Patent Documents]
특허문헌 1: 한국 공개특허 제2013-0043117호(공개일: 2013.04.29) Patent Document 1: Korean Patent Publication No. 2013-0043117 (Published: 2013.04.29)
본 발명의 목적은 셀(cell) 제작시 대기 중 수분과 리튬 금속의 격렬한 반응을 막아 안전성을 확보할 수 있는 보호층이 형성되고, 보호층의 형성 과정에서 산소와 리튬의 부반응으로 산화물이 형성되어 이온전도도가 감소하는 것을 방지하기 위한 버퍼층이 형성된 다층구조의 리튬 금속 전극을 제공하는 것이다. An object of the present invention is to form a protective layer that can ensure the safety by preventing the violent reaction of moisture and lithium metal in the air during cell fabrication, the oxide is formed by the side reaction of oxygen and lithium in the process of forming the protective layer It is to provide a multi-layered lithium metal electrode having a buffer layer for preventing the ion conductivity is reduced.
본 발명의 목적은 반응성 스퍼터링법으로 동일한 챔버 내에서 리튬 금속판에 버퍼층과 보호층을 순차적이고 연속적으로 형성함으로써 공정성이 우수한 전극의 제조방법을 제공하는 것이다.An object of the present invention is to provide a method for producing an electrode having excellent processability by sequentially and successively forming a buffer layer and a protective layer on a lithium metal plate in the same chamber by a reactive sputtering method.
위와 같은 목적을 달성하기 위하여, 본 발명의 일 측면은 다층구조의 리튬금속 전극은 리튬 금속판 상에 형성된 질화리튬으로 된 버퍼층과 하기 화학식 1의 조성을 갖는 LiBON으로 이루어진 보호층을 포함한다: In order to achieve the above object, an aspect of the present invention is a lithium metal electrode of a multi-layer structure includes a protective layer consisting of a lithium nitride layer formed on the lithium metal plate and LiBON having a composition of the following formula (1):
LixBOyNz 식(1)LixBOyNz formula (1)
(상기 x는 0.9 내지 3.51, y는 0.6 내지 3.2, z는 0.5 내지 1.0임.)(The x is 0.9 to 3.51, y is 0.6 to 3.2, z is 0.5 to 1.0.)
본 발명의 일 예에 따른 다층구조의 리튬금속 전극에서 상기 버퍼층은 리튬 금속판의 일면 또는 양면에 형성될 수 있으며, 바람직하게는 전해질과 대면하는 면에 형성될 수 있다. In the lithium metal electrode of a multilayer structure according to an embodiment of the present invention, the buffer layer may be formed on one side or both sides of the lithium metal plate, and may be preferably formed on the side facing the electrolyte.
본 발명의 일 예에서, 상기 화학식 1의 조성을 갖는 LiBON은 Li3 . 09BO2 . 53N0 .52, Li0.90BO0.66N0.98, 또는 Li3.51BO3.03N0.52 등을 들 수 있으나 이에 한정되지 않는다. In one embodiment of the present invention, LiBON having a composition of Formula 1 is Li 3 . 09 BO 2 . 53 N 0 .52, Li 0.90 BO 0.66 N 0.98, Li 3.51, or 3.03 N 0.52 BO, and the like, but not limited to these.
본 발명의 일 예에서, 상기 리튬 금속판의 두께는 30 내지 500㎛일 수 있다. In one embodiment of the present invention, the thickness of the lithium metal plate may be 30 to 500㎛.
본 발명의 일 예에서, 상기 버퍼층인 질화리튬층의 두께는 0.01 내지 5㎛일 수 있다. In one embodiment of the present invention, the thickness of the buffer layer lithium nitride layer may be 0.01 to 5㎛.
본 발명의 일 예에서, 상기 보호층인 LiBON층의 두께는 0.1 내지 10㎛일 수 있다. In one example of the present invention, the thickness of the protective layer LiBON layer may be 0.1 to 10㎛.
본 발명의 일 예에서, 상기 질화리튬 버퍼층 또는 LiBON 보호층의 제조방법은 특별히 제한되지 않으며, 예를 들어 전자빔 증착법, 유기금속 화학 기상 증착법, 반응성 스퍼터링, 고주파 스퍼터링법, 및 마그네트론 스퍼터링법 중 선택된 방법으로 형성될 수 있다. In one embodiment of the present invention, the method of manufacturing the lithium nitride buffer layer or LiBON protective layer is not particularly limited, and for example, a method selected from electron beam deposition, organometallic chemical vapor deposition, reactive sputtering, high frequency sputtering, and magnetron sputtering It can be formed as.
본 발명의 또 다른 측면은 하기 단계들을 포함하는 반응성 스퍼터링법에 의한 다층구조의 리튬금속 전극의 제조방법을 제공한다. Another aspect of the present invention provides a method of manufacturing a lithium metal electrode of a multilayer structure by a reactive sputtering method comprising the following steps.
진공챔버 내에 리튬 금속판을 제공하는 단계;Providing a lithium metal plate in a vacuum chamber;
상기 리튬 금속판의 일면 또는 양면에 반응성 스퍼터링법으로 질화리튬(Li3N) 박막을 형성하는 단계; 및 Forming a lithium nitride (Li 3 N) thin film on one or both surfaces of the lithium metal plate by reactive sputtering; And
상기 질화리튬 박막에 연속하여 반응성 스퍼터링법으로 하기 화학식 1의 조성을 갖는 LiBON 박막을 형성하는 단계. Forming a LiBON thin film having a composition of Chemical Formula 1 by reactive sputtering in a continuous manner to the lithium nitride thin film.
본 발명의 또 다른 측면은 음극, 양극, 및 상기 양극과 음극 사이에 개재되는 전해질을 포함하는 리튬 이차전지에 있어서, 상기 음극으로서 상기 본 발명의 일 측면에 따른 다층구조의 리튬전극을 이용하는 리튬 이차전지를 제공한다. Another aspect of the present invention is a lithium secondary battery including a negative electrode, a positive electrode, and an electrolyte interposed between the positive electrode and the negative electrode, a lithium secondary using a lithium electrode of a multi-layer structure according to the aspect of the present invention as the negative electrode Provide a battery.
본 발명의 다층구조의 리튬금속 전극은 보호층의 형성으로 리튬금속의 수분이나 전지내 환경에서의 반응성을 보호하고 덴드라이트 형성을 방지할 수 있다. 또한, 버퍼층의 형성으로 보호층의 형성과정에서 리튬금속판 상에 산화물층이 형성되어 이온전도도가 저하될 수 있는 문제를 방지한다. The lithium metal electrode of the multi-layered structure of the present invention can form a protective layer to protect the lithium metal from moisture or reactivity in the battery environment and prevent dendrite formation. In addition, the oxide layer is formed on the lithium metal plate during the formation of the protective layer by the formation of the buffer layer to prevent the problem that the ion conductivity may be reduced.
도 1은 본 발명의 일 실시예에 따른 다층구조의 리튬금속 전극의 모식도이다. 1 is a schematic diagram of a lithium metal electrode of a multilayer structure according to an embodiment of the present invention.
도 2는 본 발명의 일 실시예에 따른 다층구조의 리튬금속 전극의 제조방법의 순서도이다. 2 is a flowchart of a method of manufacturing a lithium metal electrode of a multilayer structure according to an embodiment of the present invention.
이하, 첨부된 도면을 참조하여 본 발명의 바람직한 실시예들을 상세히 설명한다. 이 때, 첨부된 도면에서 동일한 구성 요소는 가능한 동일한 부호로 나타내고 있음에 유의한다. 또한, 본 발명의 요지를 흐리게 할 수 있는 공지 기능 및 구성에 대한 상세한 설명은 생략할 것이다. 마찬가지 이유로 첨부 도면에 있어서 일부 구성요소는 과장되거나 생략되거나 개략적으로 도시되었다. Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. At this time, it is noted that the same components in the accompanying drawings are represented by the same reference numerals as possible. In addition, detailed descriptions of well-known functions and configurations that may blur the gist of the present invention will be omitted. For the same reason, in the accompanying drawings, some components are exaggerated, omitted or schematically illustrated.
도 1은 본 발명의 일 실시예에 따른 다층구조의 리튬금속 전극을 나타내는 도면이다. 1 is a view showing a lithium metal electrode of a multilayer structure according to an embodiment of the present invention.
도 1을 참조하면, 본 발명의 리튬금속 전극(1000)은 리튬 금속판(1100) 상에 버퍼층(1210)과 보호층(1220)이 형성되어 있다. 본 도면에서는 리튬 금속판(1100)의 일 면에만 버퍼층(1210)과 보호층(1220)이 형성되어 있지만, 양면에 모두 형성될 수도 있다. Referring to FIG. 1, in the
일반적으로 리튬 금속을 전지 음극으로 이용하는 경우 다음과 같은 문제가 존재한다. 첫째, 리튬은 알칼리금속으로서 물과 폭발적으로 반응하므로 일반적인 환경에서 제조 및 이용이 어렵다. 둘째, 리튬을 음극으로 사용할 경우 전해질이나 물, 전지 내의 불순물, 리튬염 등과 반응하여 부동태층(passivation layer)을 만들게 되고, 이 층은 국부적인 전류밀도 차이를 초래하여 수지상의 리튬 덴드라이트를 형성시킨다. 또한, 이렇게 형성된 덴드라이트는 성장하여 세퍼레이터의 공극 사이를 넘어 양극과 직접적인 내부단락을 일으킬 수 있으므로 전지가 폭발하는 현상을 초래하게 된다. 셋째, 리튬은 부드러운 금속이며 기계적 강도가 약해서 추가적인 표면 처리 없이 사용하기엔 취급성이 매우 떨어진다.In general, when lithium metal is used as a battery negative electrode, the following problems exist. First, lithium is an alkali metal and explosively reacts with water, making it difficult to manufacture and use in a general environment. Second, when lithium is used as a negative electrode, it forms a passivation layer by reacting with electrolyte, water, impurities in the battery, lithium salt, etc., and this layer causes a local current density difference to form dendritic lithium dendrite. . In addition, the dendrite thus formed may grow and cause an internal short circuit directly between the positive electrode and the void of the separator, thereby causing the battery to explode. Third, lithium is a soft metal and its mechanical strength is poor, making it very intractable for use without additional surface treatment.
이에, 본 발명에서는 버퍼층(1210)과 보호층(1220)을 형성함으로써 부동태층의 형성과 덴드라이트 형성을 방지할 수 있으며 기계적 강도를 보강한다. 또한, 버퍼층(1210)은 전지제조 환경에서 리튬금속의 반응성을 차단함으로써 핸들링이 용이하고 이온전도도 저하가 방지된다. Thus, in the present invention, by forming the
리튬 금속판(1100)은 판형의 금속을 이용한다. 리튬 금속판은 전극 제조에 용이하도록 전극 형태에 따라 폭이 조절될 수 있다. 리튬 금속판의 두께는 30 내지 500㎛일 수 있다. The
버퍼층(1210)은 질화리튬(Li3N)으로 이루어지며, 리튬 금속판(1100)의 상면과 하면에 모두 형성될 수도 있고, 전해질층과 대면하는 일 면에만 형성될 수도 있다. 버퍼층(1210)이 형성되지 않은 경우 보호층(1220)의 형성과정에서 리튬 금속이 공기 중의 수분에 노출되는 등의 이유로 산화되어 Li2O가 형성되어 이온전도도가 저하될 수 있다. 이에, 본 발명에서는 질화리튬 박막을 형성하는 것은 전지성능을 높이기 위해서라기 보다는 전극의 산화를 방지하기 위한 것이다. 따라서, 상기 질화리튬층의 두께는 리튬전극의 표면이 수분이나 공기에 노출되어 산화되는 것을 방지할 수 있을 정도로만 도포되면 충분하며, 지나치게 두꺼우면 불필요한 전극의 두께 증가를 유발하므로 바람직하게는 0.01 내지 5㎛일 수 있다. The
보호층(1220)은 버퍼층(1210) 표면에 증착되어 리튬 금속판(1100)이 전해액에 직접 노출되는 것을 방지하여 리튬과 전해질의 반응을 막을 수 있다. 또한, 본 발명의 보호층(1220)은 LiBON으로 이루어져 있는바 도전성을 가지므로, 전극에 이온을 원활하게 전달할 수 있어서 전지 수명이 길어지고 전지 성능이 증강된다. The
상기 LiBON은 하기 화학식 1의 조성을 가질 수 있다. The LiBON may have a composition of Formula 1 below.
LixBOyNz 식(1)LixBOyNz formula (1)
(상기 x는 0.9 내지 3.51, y는 0.6 내지 3.2, z는 0.5 내지 1.0임.)(The x is 0.9 to 3.51, y is 0.6 to 3.2, z is 0.5 to 1.0.)
상기 LiBON이 특히 Li3 . 09BO2 . 53N0 .52 조성을 가질 때 이온전도도가 최대 2.3×10-6 S/cm로, 기존의 LiPON보다 우수한 충방전 성능을 보이는 것으로 보고된 바 있다. The LiBON is especially Li 3 . 09 BO 2 . 53 have the following composition when N 0 .52 ionic conductivity up to 2.3 × 10 -6 S / cm, has been reported to exhibit excellent charge-discharge performance compared to conventional LiPON bar.
보호층(1220)의 두께가 너무 얇으면 수분이나 전지내 환경에의 보호효과를 충분히 발휘할 수 없고, 반대로 두께가 너무 두꺼우면 불필요한 두께 증가로 상대적 용량손실이 발생할 수 있으므로, 바람직하게는 0.1 내지 10㎛의 두께로 형성될 수 있다. If the thickness of the
상기 버퍼층(1210)의 질화리튬 박막과 보호층(1220)의 LiBON 박막의 형성방법은 특별히 제한되지 않으며, 예를 들어 전자빔 증착법, 유기금속 화학 기상 증착법, 반응성 스퍼터링, 고주파 스퍼터링법, 및 마그네트론 스퍼터링법 등 다양한 증착법이 이용가능하고, 이에 한정되지 않는다. 예시된 각각의 증착법은 공지의 방법이므로 이에 대한 구체적인 설명은 본 명세서에서 생략한다. The method of forming the lithium nitride thin film of the
본 발명에 따른 다층구조의 리튬금속 전극(1000)은 전지로 가공되는 형태에 따라 다양한 폭과 길이를 가질 수 있다. 필요에 따라 다양한 폭으로 제조된 리튬금속 전극(1000)을 권취하여 필요시 절단하여 사용할 수도 있다. The
도 2에는 본 발명의 일 실시예에 따라 다층구조의 리튬전극을 제조하기 위한 방법의 순서도가 도시되어 있다. 2 is a flow chart of a method for manufacturing a lithium electrode of a multi-layer structure according to an embodiment of the present invention.
도 2를 참조하면, 먼저 리튬금속 전극을 진공챔버 내에 제공한다(S1). Referring to FIG. 2, first, a lithium metal electrode is provided in a vacuum chamber (S1).
다음 단계(S2)는 리튬 금속판의 일면 또는 양면에 질소(N2) 가스 반응성 스퍼터링법으로 질화리튬(Li3N) 박막을 형성하는 단계이다. The next step (S2) is a step of forming a lithium nitride (Li 3 N) thin film on one or both sides of the lithium metal plate by nitrogen (N 2 ) gas reactive sputtering method.
다음 단계(S3)는 상기 질화리튬 박막을 형성한 리튬 금속판을 반응챔버 내에 그대로 둔 채로 연속하여 반응성 스퍼터링법으로 상기 화학식 1의 조성을 갖는 LiBON 박막을 형성하는 단계이다. The next step (S3) is a step of forming a LiBON thin film having the composition of Chemical Formula 1 by reactive sputtering method while leaving the lithium metal plate on which the lithium nitride thin film is formed in the reaction chamber.
여기서, 반응성 스퍼터링법은 DC 전력을 이용하여 박막을 형성하는 방법으로서, 질화리튬 박막을 형성하기 위해서는 타겟으로 리튬 금속을 장착하고 아르곤 가스를 주입하면 플라즈마가 발생하고, 반응성 가스로서 질소를 넣어주면 된다. 또한, LiBON 박막을 형성하기 위해서는 동일한 진공챔버 내에서 질화리튬 박막이 도포된 리튬 금속판을 타겟으로 하고, 붕소 가스, 산소 가스, 및 질소 가스를 반응성 가스로서 넣어준다. 각각의 가스 라인에는 MFC(Mass Flow Controller)를 장착하여 가스를 제어할 수 있다. 이와 같은 반응 가스의 양을 정밀히 제어해야만 박막의 화학양론비를 맞출 수 있다. Here, reactive sputtering is a method of forming a thin film using DC power. To form a lithium nitride thin film, a lithium metal is mounted as a target and an argon gas is injected to generate a plasma, and nitrogen may be added as a reactive gas. . In addition, in order to form a LiBON thin film, a lithium metal plate coated with a lithium nitride thin film is targeted in the same vacuum chamber, and boron gas, oxygen gas, and nitrogen gas are added as a reactive gas. Each gas line can be equipped with a Mass Flow Controller (MFC) to control the gas. Only by controlling the amount of the reaction gas precisely, the stoichiometric ratio of the thin film can be matched.
본 발명의 일 실시예는 음극, 양극, 및 상기 양극과 음극 사이에 개재되는 전해질을 포함하고, 상기 음극은 앞서 상술한 다층구조의 리튬전극인 리튬 이차전지를 제공한다. 본 발명의 이차전지는 리튬 이온이 아닌 리튬 금속을 이용하여 음극을 제조하기 때문에, 기존의 이차 전지보다 보다 고용량, 고에너지 밀도의 전지를 제조할 수 있다. 또한, 음극으로 제조되기 전 리튬 금속판에 버퍼층을 형성함으로써 리튬이 공기 중의 수분과 반응하는 것을 방지할 수 있으면서도 동시에 리튬 금속판에 보호층을 형성할 수 있다. One embodiment of the present invention includes a negative electrode, a positive electrode, and an electrolyte interposed between the positive electrode and the negative electrode, the negative electrode provides a lithium secondary battery which is a lithium electrode of the multi-layer structure described above. Since the secondary battery of the present invention manufactures a negative electrode using lithium metal instead of lithium ions, a battery having a higher capacity and a higher energy density than a conventional secondary battery can be manufactured. In addition, by forming a buffer layer on the lithium metal plate before the cathode is manufactured, a protective layer can be formed on the lithium metal plate while preventing lithium from reacting with moisture in the air.
이하, 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 용이하게 실시할 수 있도록 본 발명의 실시예에 대하여 상세히 설명한다. 그러나 본 발명은 여러 가지 상이한 형태로 구현될 수 있으며 여기에서 설명하는 실시예에 한정되지 않는다.Hereinafter, embodiments of the present invention will be described in detail so that those skilled in the art can easily practice the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.
(( 실시예Example 1) One)
리튬 금속판(두께: 20㎛)을 진공 챔버 내에서 질소(N2) 가스 0.1Pa, 5분 노출시켜 반응성 스퍼터링법으로 질화리튬(Li3N) 박막(두께: 0.02㎛)을 형성하고, 상기 질화리튬 박막을 형성한 리튬 금속판을 반응챔버 내에 그대로 둔 채로 연속하여 Li2BO3를 타겟으로 반응성 스퍼터링법(reactive sputtering)으로 Li3 . 09BO2 . 53N0 .52의 조성을 갖는 LiBON 박막(두께: 0.2㎛)을 형성하였다. 이렇게 제조된 코팅층이 형성된 리튬 금속판을 음극으로 사용하였다.A lithium metal plate (thickness: 20 μm) was exposed to 0.1 Pa of nitrogen (N 2 ) gas for 5 minutes in a vacuum chamber to form a lithium nitride (Li 3 N) thin film (thickness: 0.02 μm) by the reactive sputtering method. continuously while still placed a lithium metal plate to form a thin film of lithium in the reaction chamber by reactive sputtering a target of Li 2 BO 3 method (reactive sputtering) as Li 3. 09 BO 2 . 53 N 0 LiBON thin film having a composition of 0.52 (thickness: 0.2㎛) was formed. The lithium metal plate on which the coating layer thus prepared was formed was used as a negative electrode.
전해액은 에틸렌카보네이트/디메틸카보네이트(EC/EMC의 혼합 부피비=1/1)로 이루어진 유기용매에 1M 농도의 리튬헥사플루오로포스페이트(LiPF6)를 용해시켜 제조하였다.The electrolyte was prepared by dissolving lithium hexafluorophosphate (LiPF 6 ) at a concentration of 1 M in an organic solvent consisting of ethylene carbonate / dimethyl carbonate (mixing volume ratio of EC / EMC = 1/1).
상기 제조된 음극의 대칭셀(symmetric cell)을 제조하였다.A symmetric cell of the prepared negative electrode was prepared.
상기 실시예 1에서 제조된 LiBON 박막의 표면을 주사전자현미경(SEM) 사진으로 관찰하였고, 그 결과는 본 발명의 원출원인 한국 특허 출원 제10-2015-0145771 호(출원일: 2015년 10월 20일)의 도 3에 나타내었다.The surface of the LiBON thin film prepared in Example 1 was observed with a scanning electron microscope (SEM) photograph, and the result is Korean Patent Application No. 10-2015-0145771 (Application date: October 20, 2015) 3 is shown in FIG.
(( 실시예Example 2) 2)
상기 실시예 1에서 상기 질화리튬(Li3N) 박막의 두께를 0.02㎛로 형성한 것을 제외하고는 실시예 1과 동일하게 실시하여 대칭셀을 제조하였다.A symmetric cell was prepared in the same manner as in Example 1 except that the thickness of the lithium nitride (Li 3 N) thin film was formed to 0.02 μm in Example 1.
(( 실시예Example 3) 3)
상기 실시예 1에서 상기 질화리튬(Li3N) 박막의 두께를 0.01㎛로 형성한 것을 제외하고는 실시예 1과 동일하게 실시하여 대칭셀을 제조하였다.A symmetric cell was prepared in the same manner as in Example 1 except that the thickness of the lithium nitride (Li 3 N) thin film was formed in 0.01 μm.
(( 실시예Example 4) 4)
상기 실시예 1에서 상기 LiBON 박막의 두께를 0.01㎛로 형성한 것을 제외하고는 실시예 1과 동일하게 실시하여 대칭셀을 제조하였다.A symmetric cell was prepared in the same manner as in Example 1 except that the thickness of the LiBON thin film was formed to 0.01 μm in Example 1.
(( 실시예Example 5) 5)
상기 실시예 1에서 상기 LiBON 박막의 두께를 5㎛로 형성한 것을 제외하고는 실시예 1과 동일하게 실시하여 대칭셀을 제조하였다.A symmetric cell was prepared in the same manner as in Example 1 except that the thickness of the LiBON thin film was set to 5 μm in Example 1.
(( 실시예Example 6) 6)
상기 실시예 1에서 상기 LiBON 박막을 Li0 . 9BO0 . 66N0 .98의 조성을 갖도록 형성한 것을 제외하고는 실시예 1과 동일하게 실시하여 대칭셀을 제조하였다.The LiBON thin film in Example 1 was Li 0 . 9 BO 0 . 66 N 0 to 0.98, and the composition of the embodiment in the same manner as in Example 1, but formed to have a symmetrical cell was prepared.
(( 실시예Example 7) 7)
상기 실시예 1에서 상기 LiBON 박막을 Li3 . 51BO3 . 03N0 .52의 조성을 갖도록 형성한 것을 제외하고는 실시예 1과 동일하게 실시하여 대칭셀을 제조하였다.The LiBON thin film in Example 1 was Li 3 . 51 BO 3 . 03 N 0 to 0.52, and the composition of the embodiment in the same manner as in Example 1, but formed to have a symmetrical cell was prepared.
(( 비교예Comparative example 1) One)
상기 실시예 1에서 상기 질화리튬(Li3N) 박막 및 상기 LiBON 박막을 형성하지 않은 것을 제외하고는 실시예 1과 동일하게 실시하여 대칭셀을 제조하였다.A symmetric cell was prepared in the same manner as in Example 1 except that the lithium nitride (Li 3 N) thin film and the LiBON thin film were not formed in Example 1.
(( 비교예Comparative example 2) 2)
상기 실시예 1에서 상기 LiBON 박막을 형성하지 않은 것을 제외하고는 실시예 1과 동일하게 실시하여 대칭셀을 제조하였다.A symmetric cell was prepared in the same manner as in Example 1 except that the LiBON thin film was not formed in Example 1.
(( 비교예Comparative example 3) 3)
상기 실시예 1에서 상기 질화리튬(Li3N) 박막을 형성하지 않은 것을 제외하고는 실시예 1과 동일하게 실시하여 대칭셀을 제조하였다.A symmetric cell was prepared in the same manner as in Example 1 except that the lithium nitride (Li 3 N) thin film was not formed in Example 1.
(( 비교예Comparative example 4) 4)
리튬 금속판(두께: 20㎛)을 진공 챔버 내에서 질소(N2) 가스 0.1Pa, 5분 노출시켜 반응성 스퍼터링법으로 질화리튬(Li3N) 박막(두께: 0.02㎛)을 형성하고, 상기 질화리튬 박막을 형성한 리튬 금속판을 반응챔버 내에 그대로 둔 채로 연속하여 Li3PO4를 타겟으로 반응성 스퍼터링법(reactive sputtering)으로 LiPON1 .33의 조성을 갖는 LiPON 박막(두께: 0.2㎛)을 형성하였다. 이렇게 제조된 코팅층이 형성된 리튬 금속판을 음극으로 사용하였다.A lithium metal plate (thickness: 20 μm) was exposed to 0.1 Pa of nitrogen (N 2 ) gas for 5 minutes in a vacuum chamber to form a lithium nitride (Li 3 N) thin film (thickness: 0.02 μm) by the reactive sputtering method. continuously while still placed a lithium metal plate to form a thin film of lithium in the reaction chamber by reactive sputtering a target of Li 3 PO 4 method (reactive sputtering) by LiPON LiPON thin film having a composition of 1, 0.33: (thickness 0.2㎛) was formed. The lithium metal plate on which the coating layer thus prepared was formed was used as a negative electrode.
전해액은 에틸렌카보네이트/디메틸카보네이트(EC/EMC의 혼합 부피비=1/1)로 이루어진 유기용매에 1M 농도의 리튬헥사플루오로포스페이트(LiPF6)를 용해시켜 제조하였다.The electrolyte was prepared by dissolving lithium hexafluorophosphate (LiPF 6 ) at a concentration of 1 M in an organic solvent consisting of ethylene carbonate / dimethyl carbonate (mixing volume ratio of EC / EMC = 1/1).
상기 제조된 음극의 대칭셀(symmetric cell)을 제조하였다.A symmetric cell of the prepared negative electrode was prepared.
상기 실시예 4에서 제조된 LiPON 박막의 표면을 주사전자현미경(SEM) 사진으로 관찰하였고, 그 결과는 본 발명의 원출원인 한국 특허 출원 제10-2015-0145771 호(출원일: 2015년 10월 20일)의 도 4에 나타내었다.The surface of the LiPON thin film prepared in Example 4 was observed with a scanning electron microscope (SEM) photograph, and the result is Korean Patent Application No. 10-2015-0145771 (Application Date: October 20, 2015) 4 is shown in FIG.
(( 비교예Comparative example 5) 5)
상기 비교예 4에서 상기 LiPON 박막의 두께를 0.1㎛로 형성한 것을 제외하고는 비교예 4와 동일하게 실시하여 대칭셀을 제조하였다.A symmetric cell was prepared in the same manner as in Comparative Example 4 except that the thickness of the LiPON thin film in Comparative Example 4 was 0.1 μm.
(( 비교예Comparative example 6) 6)
상기 비교예 4에서 상기 LiPON 박막의 두께를 2㎛로 형성한 것을 제외하고는 비교예 4와 동일하게 실시하여 대칭셀을 제조하였다.A symmetric cell was prepared in the same manner as in Comparative Example 4 except that the thickness of the LiPON thin film was formed at 2 μm in Comparative Example 4.
[[ 실험예Experimental Example : 제조된 Manufactured 대칭셀의Symmetrical 성능 측정] Performance measurement]
상기 실시예 및 비교예에서 제조된 대칭셀을 DOD(depth of discharge) 83%, 1C 충방전 조건으로 충방전시켰다. 상기 충방전 후, Li 금속의 산화 여부와 LiBON 박막 또는 LiPON 박막의 크랙(crack) 여부를 육안으로 관찰하였고, 사이클 효율(%)을 측정하였고, 그 결과를 하기 표 1에 나타내었다.The symmetric cells prepared in Examples and Comparative Examples were charged and discharged at 83% DOD (depth of discharge) and 1C charge and discharge conditions. After the charging and discharging, it was visually observed whether the Li metal was oxidized and whether the LiBON thin film or the LiPON thin film was cracked, and the cycle efficiency (%) was measured. The results are shown in Table 1 below.
1) Li 금속의 산화 기준1) Oxidation standard of Li metal
- X: 산화되지 않음X: not oxidized
- △: 부분적 산화Δ: partial oxidation
- O: 전부 산화-O: all oxidation
2) 크랙(crack) 여부2) Crack
- X: 크랙 없음-X: no crack
- △: 간헐적 크랙△: intermittent crack
- O: 전면적 크랙-O: full crack
상기 표 1을 참고하면, 실시예 1 내지 3에서 질화리튬(Li3N) 박막의 최적 두께는 0.02㎛인 것을 알 수 있다. 이 보다 두께가 더 작을때는 LiBON 박막 코팅시 Li의 산화가 발생할 수 있으며, 두께가 더 클때는 질화리튬(Li3N) 박막의 낮은 이온전도도로 인한 저항에 의하여 Li 효율 감소가 일어나는 것을 확인할 수 있다.Referring to Table 1, it can be seen that the optimum thickness of the lithium nitride (Li 3 N) thin film in Examples 1 to 3 is 0.02㎛. When the thickness is smaller than this, LiBON thin film coating may cause oxidation of Li. When the thickness is larger, the Li efficiency decreases due to the low ion conductivity of the lithium nitride (Li 3 N) thin film. .
또한, 실시예 1, 4 및 5에서 LiBON 박막의 최적 두께는 0.2㎛인 것을 알 수 있다. 두께가 이 보다 작을때는 충방전 중 상기 LiBON 박막의 파괴로 전해액에 리튬이 노출되어 효율이 저하되며, 두께가 더 클때는 저항에 의하여 효율 감소가 일어나는 것을 확인할 수 있다.In addition, it can be seen that in Example 1, 4 and 5, the optimum thickness of the LiBON thin film is 0.2 μm. When the thickness is smaller than this, lithium is exposed to the electrolyte due to the breakdown of the LiBON thin film during charge and discharge, and when the thickness is larger, the efficiency decreases due to the resistance.
또한, 실시예 1, 6 및 7에서 LiBON의 원소 조성에 따라 약간씩은 다르지만 대체로 90%에 가까운 효율을 나타냄을 알 수 있다.In addition, in Examples 1, 6 and 7, it can be seen that the efficiency is almost 90%, although slightly different depending on the elemental composition of LiBON.
한편, 비교예 2에서는 LiBON 박막이 형성되지 않아 리튬 덴드라이트 형성을 막지 못하며, 비교예 3에서는 질화리튬(Li3N) 박막이 형성되지 않아 LiBON 박막 코팅 중에 LiO2의 형성에 의하여 전지가 구동되지 않음을 알 수 있다.Meanwhile, in Comparative Example 2, the LiBON thin film is not formed to prevent lithium dendrite formation, and in Comparative Example 3, the lithium nitride (Li 3 N) thin film is not formed so that the battery is not driven by the formation of LiO 2 during coating of the LiBON thin film. It can be seen that.
비교예 4 내지 6에서는 LiBON 박막 대신 LiPON 박막을 형성하였으나, LiPON 박막 표면에 크랙이 발생하여 효율이 감소함을 알 수 있다.In Comparative Examples 4 to 6, the LiPON thin film was formed instead of the LiBON thin film, but it can be seen that cracks occur on the surface of the LiPON thin film, thereby decreasing efficiency.
한편, 본 명세서와 도면에 개시된 본 발명의 실시예들은 본 발명이 기술 내용을 쉽게 설명하고 본 발명의 이해를 돕기 위해 특정 예를 제시한 것일 뿐이며, 본 발명의 범위를 한정하고자 하는 것은 아니다. 여기에 개시된 실시예들 이외에도 본 발명의 기술적 사상에 바탕을 둔 다른 변형예들이 실시 가능하다는 것은 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자에게 자명한 것이다.On the other hand, the embodiments of the present invention disclosed in the specification and drawings are merely presented specific examples to easily explain the technical contents and help the understanding of the present invention, and are not intended to limit the scope of the present invention. It will be apparent to those skilled in the art that other modifications based on the technical idea of the present invention can be carried out in addition to the embodiments disclosed herein.
[부호의 설명][Description of the code]
1000 : 리튬금속 전극 1100 : 리튬 금속판1000: lithium metal electrode 1100: lithium metal plate
1210: 버퍼층 1220: 보호층1210: buffer layer 1220: protective layer
본 발명은 다층구조의 리튬금속 전극 및 이의 제조방법에 관한 것으로, 리튬 금속판 상에 질화리튬(Li3N)으로 이루어진 버퍼층을 형성하고, 상기 버퍼층 상에 LiBON으로 이루어진 보호층을 형성한 다층구조의 리튬금속 전극과 반응성 스퍼터링법으로 연속하여 리튬금속판에 질화리튬 버퍼층과 LiBON 보호층을 연속하여 형성하는 다층구조의 리튬금속 전극의 제조방법에 관한 것이다. 상기 리튬금속 전극은 리튬 이차전지의 음극으로 사용될 수 있다.The present invention relates to a lithium metal electrode having a multi-layer structure and a method of manufacturing the same, the multi-layer structure of forming a buffer layer of lithium nitride (Li 3 N) on a lithium metal plate, and a protective layer of LiBON on the buffer layer The present invention relates to a method for producing a lithium metal electrode having a multi-layer structure in which a lithium nitride buffer layer and a LiBON protective layer are successively formed on a lithium metal plate by a lithium metal electrode and a reactive sputtering method. The lithium metal electrode may be used as a negative electrode of a lithium secondary battery.
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| JP2017501356A JP6357728B2 (en) | 2014-10-23 | 2015-10-21 | Multi-layer lithium metal electrode and method of manufacturing the same |
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| KR20140083024A (en) * | 2011-10-13 | 2014-07-03 | 시온 파워 코퍼레이션 | Electrode structure and method for making the same |
| KR20130106965A (en) * | 2012-03-21 | 2013-10-01 | 지에스칼텍스 주식회사 | Flexible thin film battery through thermal annealing at high temperature and method of manufacturing the same |
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| CN112436140A (en) * | 2019-08-26 | 2021-03-02 | 青岛九环新越新能源科技股份有限公司 | Composite material for inhibiting dendritic crystal growth |
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