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WO2015030404A1 - Électrode de détection tactile et écran tactile comprenant ladite électrode - Google Patents

Électrode de détection tactile et écran tactile comprenant ladite électrode Download PDF

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Publication number
WO2015030404A1
WO2015030404A1 PCT/KR2014/007629 KR2014007629W WO2015030404A1 WO 2015030404 A1 WO2015030404 A1 WO 2015030404A1 KR 2014007629 W KR2014007629 W KR 2014007629W WO 2015030404 A1 WO2015030404 A1 WO 2015030404A1
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WO
WIPO (PCT)
Prior art keywords
pattern
metal
sensing
sensing electrode
touch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2014/007629
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English (en)
Korean (ko)
Inventor
하경수
김상수
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongwoo Fine Chem Co Ltd
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Dongwoo Fine Chem Co Ltd
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Filing date
Publication date
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Publication of WO2015030404A1 publication Critical patent/WO2015030404A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material

Definitions

  • the present invention relates to a touch sensing electrode and a touch screen panel having the same, and more particularly, to a touch sensing electrode having excellent electrical conductivity and visibility and a touch screen panel having the same.
  • the touch screen panel is a screen panel equipped with a special input device to receive the position when touched by hand.
  • the touch screen panel receives input data directly from the screen so that when a person's hand or an object touches a character or a specific location displayed on the screen without using a keyboard, the touch screen panel can identify the location and perform specific processing by the stored software. It is made possible by being laminated
  • a transparent touch sensing electrode In order to recognize the touched portion without degrading the visibility of the image displayed on the screen, the use of a transparent touch sensing electrode is essential, and typically, a sensing pattern formed in a predetermined pattern is used.
  • GFF glass-ITO film-ITO film
  • G1F glass-ITO film
  • G2 glass-only
  • a structure shown in FIG. 1 may be cited as a conventional transparent sensing electrode structure.
  • the transparent sensing electrode may be formed of the first sensing pattern 10 and the second sensing pattern 20.
  • the first sensing pattern 10 and the second sensing pattern 20 are disposed in different directions to provide information about the X and Y coordinates of the touched point. Specifically, when a human hand or an object contacts the transparent substrate, the capacitance according to the contact position toward the driving circuit side via the first sensing pattern 10, the second sensing pattern 20, and the metal wiring which is the position detecting line. The change is conveyed. Then, the contact position is grasped by the change of the capacitance converted into an electrical signal by the X and Y input processing circuit (not shown) or the like.
  • first sensing pattern 10 and the second sensing pattern 20 are formed on the same substrate, and each pattern must be electrically connected to sense a touched point.
  • first sensing patterns 10 are connected to each other, but the second sensing patterns 20 are separated from each other in an island form, a separate connection is required to electrically connect the second sensing patterns 20.
  • An electrode (bridge electrode) 50 is required.
  • the bridge electrode 50 should not be electrically connected to the first sensing pattern 10, the bridge electrode 50 should be formed on a different layer from the first sensing pattern 10. To show this structure, an enlarged view of a portion where the bridge electrode 50 is formed in the A-A 'cross section of FIG. 1 is shown in FIG.
  • sensing patterns 10 and 20 are formed on a substrate 100, and an insulating layer 30 and a bridge electrode 50 are formed thereon.
  • the first sensing pattern 10 and the second sensing pattern 20 are spaced apart from each other, and are separated from the bridge electrode 50 by the insulating layer 30 formed thereon.
  • the first sensing pattern 10 is electrically insulated from the bridge electrode 50, and as described above, since the second sensing pattern 20 needs to be electrically connected, the bridge electrode 50 is used. Is electrically connected.
  • a contact hole 40 may be formed on the insulating layer 30. There is a need.
  • the bridge electrode 50 is typically formed of a metal in order to increase the electrical conductivity, there is a problem that the pattern is visible due to the difference in reflectance with the sensing pattern.
  • the bridge electrode 50 is formed of a metal with a very narrow width
  • the visibility can be improved and the process can be simplified by forming with the metal wiring, but to form a narrow width
  • the electrical resistance is increased and the electrical conductivity is lowered, resulting in a slower detection speed. there is a problem.
  • Japanese Patent Application Laid-Open No. 2008-98169 proposes a transparent conductive film in which an undercoat layer composed of two layers having different refractive indices is formed between a transparent substrate and a transparent conductive layer.
  • Patent Document 1 Japanese Laid-Open Patent No. 2008-98169
  • An object of the present invention is to provide a touch sensing electrode having a high electrical conductivity and a touch screen panel having the same.
  • Another object of the present invention is to provide a touch sensing electrode having low visibility according to a difference in reflectance for each position, and a touch screen panel having the same.
  • Another object of the present invention is to provide a touch sensing electrode having a narrow bezel and a touch screen panel having the same.
  • Touch sensing electrode having a metal plating layer on top.
  • the sensing pattern other than the metal mesh structure is a transparent electrode pattern formed of a metal oxide, touch sensing electrode.
  • the thickness of the metal plating layer is 500 to 1,000nm, touch sensing electrode.
  • the touch sensing electrode according to 1 above formed on one surface of a cover window substrate or a display panel of the touch screen panel.
  • At least one of the sensing patterns are formed by forming a metal plating pattern on the upper surface of the metal mesh pattern after forming a metal mesh pattern, manufacturing method of the touch sensing electrode.
  • the sensing pattern other than the metal mesh pattern is formed of a metal oxide
  • the touch screen panel including the touch sensing electrode of any one of the above 1 to 7.
  • a display device comprising the above touch screen panel.
  • the touch sensing electrode of the present invention has a metal plating layer on top of the metal mesh electrode to increase the electrical conductivity of the metal mesh electrode, thereby exhibiting an excellent sensing speed.
  • the touch sensing electrode of the present invention may lower the visibility of the metal mesh electrode when the metal plating layer is used as a material having a low reflectance.
  • the touch sensing electrode of the present invention may include a metal plating layer on the metal wiring connecting the sensing pattern to the circuit, thereby maintaining a high electric conductivity even when the metal wiring is narrowed, thereby implementing a narrow bezel display device.
  • the touch sensing electrode of the present invention is disposed on different planes (upper and lower surface of the insulating layer) where the first sensing pattern and the second sensing pattern are different, so that there is no need for contact holes, and thus, the manufacturing process is simpler. .
  • 1 is a schematic plan view of a conventional touch sensing electrode.
  • FIG. 2 is a schematic vertical cross-sectional view of a conventional touch sensing electrode.
  • FIG 3 is a schematic plan view according to an embodiment of a touch sensing electrode according to the present invention.
  • FIG. 4 is a schematic vertical cross-sectional view of a portion of the touch sensing electrode of the present invention shown in FIG.
  • FIG. 5 is a schematic vertical cross-sectional view according to another embodiment of the touch sensing electrode according to the present invention.
  • FIG. 6 is a schematic vertical cross-sectional view of a portion of the touch sensing electrode of the present invention shown in FIG.
  • FIG. 7 is a view schematically showing an embodiment of a method of manufacturing a touch sensing electrode according to the present invention.
  • the present invention includes a first sensing pattern formed on a lower surface of an insulating layer and a second sensing pattern formed on an upper surface of an insulating layer, wherein at least one of the first sensing pattern and the second sensing pattern includes a metal mesh pattern.
  • the present invention relates to a touch sensing electrode having an electrical conductivity and a touch screen panel having the same by providing a metal plating layer thereon.
  • FIG 3 and 4 schematically show an embodiment of the touch sensing electrode of the present invention.
  • the touch sensing electrode of the present invention has a structure in which a first sensing pattern 10 is formed on a lower surface of the insulating layer 30 and a second sensing pattern 20 is formed on an upper surface of the touch sensing electrode, and the first sensing pattern 10 and the second sensing are detected. At least one of the patterns 20 is formed of a metal mesh pattern and has a metal plating layer 200 on an upper surface thereof. 3 illustrates a structure in which both the first sensing pattern and the second sensing pattern are formed of a metal mesh.
  • the first sensing pattern 10 and the second sensing pattern 20 are disposed in different directions to provide information about the X and Y coordinates of the touched point. Specifically, when a human hand or an object comes into contact with the transparent substrate, the capacitance of the capacitance according to the contact position is moved to the driving circuit via the first sensing pattern 10, the second sensing pattern 20, and the metal wiring 70. Change is communicated. Then, the contact position is grasped by the change of the capacitance converted into an electrical signal by the X and Y input processing circuit (not shown) or the like.
  • the first sensing pattern 10 and the second sensing pattern 20 are formed on the substrate 100, and each pattern must be electrically connected to detect a touched point.
  • the sensing patterns are formed on the same plane as illustrated in FIGS. 1 and 2, the first sensing pattern 10 is connected to each other, but the second sensing pattern 20 has an island pattern.
  • the structure is separated from each other, and thus, a separate bridge electrode 50 is required to electrically connect the second sensing pattern 20.
  • the touch sensing electrode of the present invention since the first sensing pattern 10 and the second sensing pattern 20 are formed on different planes of the insulating layer 30, there is no need for a conventional bridge electrode or contact hole forming process. . Therefore, the problem of the contact resistance and the process of generating the contact hole by the bridge electrode does not occur.
  • ITO indium tin oxide
  • metal has excellent electrical conductivity but high reflectance, which causes a problem of poor visibility when applied to a touch screen.
  • the present invention forms a sensing pattern with a metal but has a mesh structure pattern, thereby simultaneously achieving excellent electrical conductivity and visibility.
  • the metal forming the metal mesh pattern is not particularly limited as long as it is a metal having electrical conductivity, and examples thereof include silver (Ag), gold (Au), aluminum (Al), and molybdenum (Mo). have.
  • a material that can be formed together with the metal wiring 70 can be used, for example, molybdenum.
  • the specific form of the mesh structure is not particularly limited.
  • a rectangular rectangular mesh structure, a rhombus mesh structure, a hexagonal mesh structure, etc. may be mentioned, but it is not limited to this.
  • the thickness (height) of the bridge electrode 50 is not particularly limited, and may be, for example, 20 to 300 nm. If the thickness of the bridge electrode 30 is less than 20 nm, the electrical resistance may increase, and thus the touch sensitivity may be lowered.
  • the width of the metal mesh pattern is not particularly limited, and may be, for example, 2 to 30 ⁇ m, preferably 2 to 20 ⁇ m, but is not limited thereto. When the width of the metal mesh pattern is 2 to 30 mu m, the visibility of the pattern may be reduced and appropriate electrical resistance may be obtained.
  • the metal mesh pattern is not formed in a wide width. Since the electrical resistance is inversely proportional to the cross-sectional area of the charge travel path, the narrow width of the metal mesh pattern causes the cross-sectional area of the charge travel path to be small, which in turn limits the electrical conductivity. In order to solve this problem, simply forming the metal mesh pattern to have a high height, the accuracy of the pattern is lowered and the problem that the substrate 100 is bent occurs.
  • the present invention solves the above-described problem by providing a separate metal plating layer 200 on the sensing patterns 10 and 20 formed of the metal mesh pattern.
  • the metal plating layer 200 is formed on the sensing patterns 10 and 20 to widen the cross-sectional area of the movement path of the charge, thereby greatly improving the electrical conductivity of the sensing patterns 10 and 20.
  • the metal plating layer 200 is electrically conductive and may be used without particular limitation as long as it is a material capable of plating on the metal mesh pattern. For example, silver (Ag), gold (Au), copper (Cu), and the like, but are not limited thereto.
  • the metal plating layer 200 is formed on the metal mesh pattern, it is preferable to use a material having low reflectance in view of visibility. In that aspect, it is preferable to use copper (Cu).
  • the thickness of the metal plating layer 200 is not particularly limited, but is preferably 500 to 1,000 nm in terms of improving the electrical conductivity but not affecting the overall structure of the touch sensing electrode.
  • the other when only one of the first sensing pattern 10 and the second sensing pattern 20 is formed of a metal mesh pattern, the other may be formed of a conventional touch sensing pattern.
  • 5 and 6 illustrate a schematic structure of a touch sensing electrode in which the second sensing pattern 20 is formed in a metal mesh pattern.
  • the sensing pattern other than the metal mesh may be used without limitation in the material used in the art, and in order not to impair visibility of the image displayed on the screen, it is preferable to use a transparent material or formed in a fine pattern.
  • a transparent material or formed in a fine pattern include metal oxides such as indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), and cadmium tin oxide (CTO). These may be used alone or in combination of two or more, preferably indium tin oxide (ITO) may be used.
  • the insulating layer 30 functions to electrically insulate the first sensing pattern 10 and the second sensing pattern 20.
  • the insulating layer 30 may be formed using any material and method used in the art without particular limitation.
  • the metal line 70 transmits a change in capacitance sensed in the sensing patterns 10 and 20 to the driving circuit side.
  • the metal wire 70 may be formed of the same material as the metal mesh pattern, and therefore, the metal wire 70 may be formed at the same time when the metal mesh pattern is formed.
  • the metal wire 70 is disposed on the bezel portion of the display device.
  • the metal wire 70 is preferably formed with the minimum width possible.
  • the metal wiring 70 of the present invention may further include a metal plating layer 200 thereon.
  • the metal plating layer 200 on the upper portion of the metal wiring may be formed of the same material as the metal plating layer 200 formed on the bridge electrode 50, and may be formed at the same time.
  • the touch sensing electrode of the present invention is formed on the substrate 100.
  • the substrate 100 may be a material commonly used in the art without limitation, for example, glass, polyethersulphone (PES), polyacrylate (PAR, polyacrylate), polyether imide (PEI, polyetherimide, polyethylene naphthalate (PEN, polyethyelenen napthalate), polyethylene terephthalate (PET, polyethyelene terepthalate), polyphenylene sulfide (PPS), polyallylate, polyimide, polycarbonate ( PC, polycarbonate), cellulose tri acetate (TAC), cellulose acetate propionate (CAP), and the like.
  • PES polyethersulphone
  • PAR polyacrylate
  • PEI polyether imide
  • PEN polyethylene naphthalate
  • PET polyethyelene terepthalate
  • PPS polyphenylene sulfide
  • PC polycarbonate
  • TAC cellulose tri acetate
  • CAP cellulose acetate propionate
  • the substrate 100 may be one surface of a cover window substrate or a display panel forming an outermost surface of the touch screen panel.
  • the touch sensing electrode of the present invention may further include a transparent dielectric layer between the substrate 100 and the sensing pattern as necessary.
  • the transparent dielectric layer improves the optical uniformity of the touch screen panel by reducing the difference in optical characteristics due to positional structural differences according to the sensing pattern structure.
  • the transparent dielectric layer may be formed by mixing niobium oxide, silicon oxide, cerium oxide, indium oxide, or the like, alone or in combination of two or more thereof.
  • the formation method may be a vacuum deposition method, a sputtering method, an ion plating method, and the like, and may be easily manufactured in the form of a thin film through the above method.
  • the transparent dielectric layer may be formed of a plurality of layers.
  • each layer may be formed of different materials, and may have different refractive indices and thicknesses.
  • the touch sensing electrode of the present invention forms a sensing pattern formed in different directions on the lower and upper portions of the insulating layer, and at least one of the sensing patterns forms a metal mesh pattern and then a metal plating layer on an upper surface of the metal mesh pattern. It is prepared by forming a.
  • FIG. 7 schematically illustrates an example in which the first sensing pattern 10 and the second sensing pattern 20 are all formed of a metal mesh pattern as an embodiment of a method of manufacturing a touch sensing electrode.
  • description will be made based on this, but the present invention is not limited thereto.
  • the first sensing pattern 10 is formed on the substrate 100 using a metal mesh pattern.
  • the first sensing pattern is formed in the first direction, in which case the metal lines 70 may be formed together.
  • the metal mesh pattern may be applied without limitation by methods known in the art, and may be formed by various thin film deposition techniques such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). For example, it may be formed by reactive sputtering, which is an example of physical vapor deposition. Or by using a photolithography method.
  • PVD physical vapor deposition
  • CVD chemical vapor deposition
  • the metal plating layer 200 is formed on the upper surface thereof.
  • the metal plating layer 200 may be formed by a conventional metal plating method. Although there is no particular limitation on the plating method, an electroplating method is preferable in view of precision to be formed only on the first sensing pattern 10.
  • the substrate is immersed in an electrolyte solution in which metal ions of the anode are present.
  • the metal plating layer 200 is formed on the upper surface of the first sensing pattern 10. If the metal wiring 70 is connected, the metal plating layer 200 is formed on the metal wiring 70.
  • the insulating layer 30 is formed.
  • the insulating layer 30 may be formed by using a method used in the art without particular limitation, and for example, the first sensing pattern including the photocurable or thermosetting insulating layer forming composition and the metal plating layer 200.
  • the substrate 10 may be formed by coating and curing the formed substrate 100.
  • a metal plating layer 200 is formed on the second sensing pattern 20 and the upper surface thereof in the same manner as the first sensing pattern 10 to form the touch sensing electrode of the present invention. It can manufacture.
  • the other sensing pattern may be manufactured by a conventional method using a metal oxide material.
  • a metal oxide material For example, it may be formed by various thin film deposition techniques such as physical vapor deposition (PVD) and chemical vapor deposition (CVD).
  • PVD physical vapor deposition
  • CVD chemical vapor deposition
  • it may be formed by reactive sputtering, which is one example of a physical vapor deposition method, but is not limited thereto. Another example is photolithography.
  • the touch sensing electrode of the present invention can form a touch screen panel through additional processes known in the art.
  • a display device used may include a liquid crystal display, an OLED, a flexible display, but is not limited thereto.
  • a metal mesh pattern and a metal wire having a thickness of 20 nm and a width of 5 ⁇ m and a metal wire were formed of molybdenum on a glass substrate (refractive index: 1.51) to electrically connect the metal mesh pattern and the metal wire.
  • a power supply is connected to the metal wiring, and the other side of the power supply is connected to a copper electrode, and then the substrate and the copper electrode are immersed in a copper electrolyte solution and electroplated to perform the metal mesh pattern and the metal wiring.
  • a copper plating layer was formed on the surface (first sensing pattern).
  • the metal mesh pattern and the metal plating layer are formed in the same manner except that the metal mesh pattern is formed in a different direction from the metal mesh pattern manufactured above (second sensing). Pattern) and a touch sensing electrode.
  • the refractive index and the extinction coefficient are described based on the light of 550nm wavelength.
  • a touch sensing electrode was manufactured in the same manner as in Example 1, except that the sensing pattern (first sensing pattern) under the insulating layer was formed of indium tin oxide (ITO) ( refractive index: 1.8).
  • ITO indium tin oxide
  • a touch sensing electrode was manufactured in the same manner as in Example 1, except that the copper plating layer was not formed and molybdenum was formed to have a thickness of 300 nm.
  • a touch sensing electrode was manufactured in the same manner as in Example 2, except that the copper plating layer was not formed and molybdenum was formed to have a thickness of 300 nm.
  • Reflectance means the average of reflectance in 400 nm-700 nm.
  • first sensing pattern 20 second sensing pattern
  • bridge electrode 200 metal plating layer

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

L'invention concerne une électrode de détection tactile et un écran tactile comprenant ladite électrode. En particulier, l'invention concerne une électrode de détection tactile qui possède une excellente conductivité électrique, et un écran tactile comprenant ladite électrode, l'électrode de détection tactile comprenant : un premier motif de détection formé sur la surface inférieure d'une couche d'isolation ; et un second motif de détection formé sur la surface supérieure de la couche d'isolation, le premier motif de détection et/ou le second motif de détection comprenant un motif de maille métallique, une couche de plaquage métallique étant placée sur la partie supérieure du premier et/ou du second motif de détection.
PCT/KR2014/007629 2013-08-30 2014-08-18 Électrode de détection tactile et écran tactile comprenant ladite électrode Ceased WO2015030404A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2013-0103605 2013-08-30
KR1020130103605A KR101401052B1 (ko) 2013-08-30 2013-08-30 터치 감지 전극 및 이를 구비하는 터치 스크린 패널

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KR (1) KR101401052B1 (fr)
TW (1) TWI628563B (fr)
WO (1) WO2015030404A1 (fr)

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US11531438B2 (en) 2020-05-29 2022-12-20 Apple Inc. Differential drive and sense for touch sensor panel
US11789561B2 (en) 2021-09-24 2023-10-17 Apple Inc. Architecture for differential drive and sense touch technology
US12197679B2 (en) 2022-05-06 2025-01-14 Apple Inc. Touch screen shield layer with ring and tapping points
US12260045B2 (en) 2021-09-24 2025-03-25 Apple Inc. Architecture for differential drive and sense for touch sensor panel

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