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WO2015026071A1 - Electrode à activation par pression et écran tactile la possédant - Google Patents

Electrode à activation par pression et écran tactile la possédant Download PDF

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Publication number
WO2015026071A1
WO2015026071A1 PCT/KR2014/006905 KR2014006905W WO2015026071A1 WO 2015026071 A1 WO2015026071 A1 WO 2015026071A1 KR 2014006905 W KR2014006905 W KR 2014006905W WO 2015026071 A1 WO2015026071 A1 WO 2015026071A1
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WO
WIPO (PCT)
Prior art keywords
pattern
electrode
sensing
metal
sensing pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2014/006905
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English (en)
Korean (ko)
Inventor
하경수
박동필
김상수
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongwoo Fine Chem Co Ltd
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Publication of WO2015026071A1 publication Critical patent/WO2015026071A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • the present invention relates to a touch sensing electrode and a touch screen panel having the same, and more particularly, to a touch sensing electrode having excellent electrical conductivity and a touch screen panel having the same.
  • the touch screen panel is a screen panel equipped with a special input device to receive the position when touched by hand.
  • the touch screen panel receives input data directly from the screen so that when a person's hand or an object touches a character or a specific location displayed on the screen without using a keyboard, the touch screen panel can identify the location and perform specific processing by the stored software. It is made possible by being laminated
  • a transparent touch sensing electrode In order to recognize the touched portion without degrading the visibility of the image displayed on the screen, the use of a transparent touch sensing electrode is essential, and typically, a sensing pattern formed in a predetermined pattern is used.
  • GFF glass-ITO film-ITO film
  • G1F glass-ITO film
  • G2 glass-only
  • a structure shown in FIG. 1 may be cited as a conventional transparent sensing electrode structure.
  • the transparent sensing electrode may be formed of the first sensing pattern 10 and the second sensing pattern 20.
  • the first sensing pattern 10 and the second sensing pattern 20 are disposed in different directions to provide information about the X and Y coordinates of the touched point. Specifically, when a human hand or an object contacts the transparent substrate, the capacitance according to the contact position toward the driving circuit side via the first sensing pattern 10, the second sensing pattern 20, and the metal wiring which is the position detecting line. The change is conveyed. Then, the contact position is grasped by the change of the capacitance converted into an electrical signal by the X and Y input processing circuit (not shown) or the like.
  • first sensing pattern 10 and the second sensing pattern 20 are formed on the same substrate, and each pattern must be electrically connected to sense a touched point.
  • first sensing patterns 10 are connected to each other, but the second sensing patterns 20 are separated from each other in an island form, a separate connection is required to electrically connect the second sensing patterns 20.
  • An electrode (bridge electrode) 50 is required.
  • the bridge electrode 50 should not be electrically connected to the first sensing pattern 10, the bridge electrode 50 should be formed on a different layer from the first sensing pattern 10. To show this structure, an enlarged view of a portion where the bridge electrode 50 is formed in the A-A 'cross section of FIG. 1 is shown in FIG.
  • sensing patterns 10 and 20 are formed on a substrate 100, and an insulating layer 30 and a bridge electrode 50 are formed thereon.
  • the first sensing pattern 10 and the second sensing pattern 20 are spaced apart from each other, and are separated from the bridge electrode 50 by the insulating layer 30 formed thereon.
  • the first sensing pattern 10 is electrically insulated from the bridge electrode 50, and as described above, since the second sensing pattern 20 needs to be electrically connected, the bridge electrode 50 is used. Is electrically connected.
  • a contact hole 40 may be formed on the insulating layer 30. There is a need.
  • the bridge electrode 50 is typically formed of a metal in order to increase the electrical conductivity, there is a problem that the pattern is visible due to the difference in reflectance with the sensing pattern.
  • the bridge electrode 50 is formed of a metal with a very narrow width
  • the visibility can be improved and the process can be simplified by forming with the metal wiring, but to form a narrow width
  • the electrical resistance is increased and the electrical conductivity is lowered, resulting in a slower detection speed. there is a problem.
  • Japanese Patent Application Laid-Open No. 2008-98169 proposes a transparent conductive film in which an undercoat layer composed of two layers having different refractive indices is formed between a transparent substrate and a transparent conductive layer.
  • Patent Document 1 Japanese Patent Application Laid-Open No. 2008-98169
  • An object of the present invention is to provide a touch sensing electrode and a touch screen panel having the same, which shows high electrical conductivity but does not degrade visibility.
  • Another object of the present invention is to provide a touch sensing electrode having a narrow bezel and a touch screen panel having the same.
  • a bridge electrode electrically connecting the spaced unit pattern of the second sensing pattern to an upper portion of the first sensing pattern;
  • An insulating layer interposed between the first sensing pattern and the bridge electrode at an intersection point of the first sensing pattern and the bridge electrode;
  • a metal plating layer formed on an upper surface of the bridge electrode.
  • the metal wiring connecting the first sensing pattern and the second sensing pattern with a driving circuit further comprises a metal plating layer on the upper surface, the touch sensing electrode.
  • first sensing pattern and the second sensing pattern includes a metal mesh on the upper or lower, touch sensing electrode.
  • the metal mesh formed on the first sensing pattern and the second sensing pattern further comprises a metal plating layer on the upper surface, the touch sensing electrode.
  • the touch sensing electrode 7. In the above 1, wherein the thickness of the metal plating layer is 500 to 1,000nm, the touch sensing electrode.
  • the touch sensing electrode formed on one surface of the cover window substrate or the display panel of the touch screen panel.
  • a first sensing pattern formed in a first direction and a second sensing pattern formed in a second direction are formed on a substrate, and an insulating layer is formed on the first sensing pattern at a point where the first sensing pattern and the bridge electrode intersect. Forming a; Forming a bridge electrode on the insulating layer to electrically connect the second sensing pattern; And forming a metal plating layer on the bridge electrode.
  • the forming of the bridge electrode includes: forming a bridge electrode forming metal layer on the substrate formed up to the insulating layer; Forming a photoresist pattern on the upper surface of the metal layer for forming bridge electrodes to expose only a portion where a metal plating layer is to be formed; Forming a metal plating layer on the exposed portion; And removing the metal layer for forming bridge electrodes on which the photoresist pattern and the metal plating layer are not formed.
  • the metal plating layer is also formed on the metal mesh pattern That is, the manufacturing method of the touch sensing electrode.
  • the bridge electrode forming metal layer is formed to a metal wiring portion
  • the photoresist pattern further includes an exposed portion to include the metal wiring portion
  • the metal plating layer is also formed on the upper metal wiring That is, the manufacturing method of the touch sensing electrode.
  • the touch screen panel including the touch sensing electrode of any one of the above 1 to 8.
  • Display device including the touch screen panel of 13 above.
  • the touch sensing electrode of the present invention has a metal plating layer on top of the bridge electrode to increase the electrical conductivity of the bridge electrode, thereby exhibiting an excellent sensing speed.
  • the touch sensing electrode of the present invention may maintain the visibility of the bridge electrode similar to the conventional or even lower when the metal plating layer is used as a material having a low reflectance.
  • the touch sensing electrode of the present invention may include a metal plating layer on the metal wiring connecting the sensing pattern to the circuit, thereby maintaining a high electric conductivity even when the metal wiring is narrowed, thereby implementing a narrow bezel display device.
  • the touch sensing electrode of the present invention includes a metal mesh in the sensing pattern, thereby improving the electrical conductivity of the sensing pattern to further improve the sensing speed.
  • 1 is a schematic plan view of a conventional touch sensing electrode.
  • FIG. 2 is a schematic vertical cross-sectional view of a conventional touch sensing electrode.
  • FIG. 3 is a schematic vertical cross-sectional view according to an embodiment of the touch sensing electrode according to the present invention.
  • FIG. 4 is a view schematically showing a touch sensing electrode manufacturing method according to the present invention.
  • the present invention includes a first sensing pattern formed in a first direction and a second sensing pattern formed in a second direction; A bridge electrode electrically connecting the spaced unit pattern of the second sensing pattern to an upper portion of the first sensing pattern; An insulating layer interposed between the first sensing pattern and the bridge electrode at an intersection point of the first sensing pattern and the bridge electrode; And a metal plating layer formed on an upper surface of the bridge electrode, and relates to a touch sensing electrode having excellent electrical conductivity and a touch screen panel having the same.
  • FIG 3 schematically illustrates an embodiment of the touch sensing electrode of the present invention.
  • the touch sensing electrode of the present invention includes an insulating layer 30 interposed between the first sensing pattern 10 and the bridge electrode 50 at the intersection of the first sensing pattern 10 and the bridge electrode 50.
  • the bridge electrode 50 has a metal plating layer 200 thereon.
  • the bridge electrode 50 electrically connects the second sensing patterns 20 formed by separating the unit patterns, but the bridge electrodes 50 are not formed to have a wide width due to the visibility of the patterns. Since the electrical resistance is inversely proportional to the cross-sectional area of the charge travel path, the narrow width of the bridge electrode 50 causes the cross-sectional area of the charge travel path to be small, which in turn limits the electrical conductivity. In order to solve this problem, simply forming the bridge electrode 50 to have a high height, the accuracy of the pattern is reduced and the problem that the substrate 100 is bent.
  • the present invention solves the above-described problem by providing a separate metal plating layer 200 on the bridge electrode 50.
  • the metal plating layer 200 is formed on the bridge electrode 50 to broadly improve the electrical conductivity of the bridge electrode 50 by widening the cross-sectional area of the movement path of the charge.
  • the metal plating layer 200 is electrically conductive and may be used without particular limitation as long as it is a material capable of plating on the bridge electrode 50.
  • silver (Ag), gold (Au), copper (Cu), and the like are examples of silver (Ag), gold (Au), copper (Cu), and the like, but are not limited thereto.
  • the metal plating layer 200 is formed on the bridge electrode 50, it is preferable to use a material having low reflectance in view of visibility. In that aspect, it is preferable to use copper (Cu).
  • the thickness of the metal plating layer 200 is not particularly limited, but is preferably 500 to 1,000 nm in terms of improving the electrical conductivity but not affecting the overall structure of the touch sensing electrode.
  • the bridge electrode 50 electrically connects the spaced unit pattern of the second sensing pattern 20 to the upper portion of the first sensing pattern 10.
  • the bridge electrode 50 according to the present invention may be formed of a metal material, and preferably, the bridge electrode 50 may be formed of the same material as the metal wire 70. In such a case, the bridge electrodes 50 may be formed together at the time of forming the metal wiring 70, thereby simplifying the process.
  • the metal is not particularly limited as long as it is excellent in electrical conductivity and low in resistance, and examples thereof include molybdenum, silver, aluminum, and the like, and molybdenum may be preferably used.
  • the thickness (height) of the bridge electrode 50 is not particularly limited, and may be, for example, 10 to 300 nm. When the thickness of the bridge electrode 30 is less than 10 nm, the electrical resistance may increase, and thus the touch sensitivity may be lowered.
  • the width of the bridge electrode 50 is not particularly limited, for example, may be 2 to 30 ⁇ m, preferably 2 to 20 ⁇ m, but is not limited thereto. When the width of the bridge electrode 50 is 2 to 30 ⁇ m, the visibility of the pattern may be reduced and an appropriate electrical resistance may be obtained.
  • the insulating layer 30 functions to electrically insulate the first sensing pattern 10 from the bridge electrode 50.
  • the conventional insulating layer is formed entirely on top of the sensing pattern, but the insulating layer 30 according to the present invention has a first sensing pattern 10 and a bridge electrode as shown in FIG. 3. It is interposed between the first sensing pattern and the bridge electrode at the intersection of 50.
  • the insulating layer 30 since the insulating layer 30 according to the present invention only needs to insulate the first sensing pattern 10 and the bridge electrode 50, the insulating layer 30 does not need to be formed entirely on the substrate 100, and also requires a process of forming the contact hole 40. none.
  • the insulating layer 30 may be formed using any material and method used in the art without particular limitation.
  • the first sensing pattern 10 and the second sensing pattern 20 are disposed in different directions to provide information about the X and Y coordinates of the touched point. Specifically, when a human hand or an object comes into contact with the transparent substrate, the capacitance of the capacitance according to the contact position is moved to the driving circuit via the first sensing pattern 10, the second sensing pattern 20, and the metal wiring 70. Change is communicated. Then, the contact position is grasped by the change of the capacitance converted into an electrical signal by the X and Y input processing circuit (not shown) or the like.
  • the first sensing pattern 10 and the second sensing pattern 20 are formed on the substrate 100, and each pattern must be electrically connected to detect a touched point.
  • the first sensing pattern 10 is connected to each other but the second sensing pattern 20 has a structure in which the unit patterns are separated in an island form, in order to electrically connect the second sensing pattern 20.
  • a separate bridge electrode 50 is needed.
  • the thickness of the sensing pattern is not particularly limited, and may be, for example, 20 to 200 nm. If the thickness of the sensing pattern is less than 20 nm, the electrical resistance may be increased, and thus the touch sensitivity may be lowered. If the thickness of the sensing pattern is greater than 200 nm, the reflectance may be increased, thereby causing a problem of visibility.
  • a material used in the art may be used without limitation, and in order not to impair visibility of an image displayed on a screen, a transparent material is used. Or is formed in a fine pattern.
  • Specific examples include indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc oxide (IZTO), cadmium tin oxide (CTO), and PEDOT (poly (3,4-ethylenedioxythiophene) ), Carbon nanotubes (CNT), metal wires, and the like. These may be used alone or in combination of two or more, preferably indium tin oxide (ITO) may be used.
  • the metal used for a metal wire is not specifically limited, For example, silver (Ag), gold, aluminum, copper, iron, nickel, titanium, telenium, chromium, etc. are mentioned. These can be used individually or in mixture of 2 or more types.
  • the touch sensing electrode of the present invention may further include a metal mesh 80 above or below the first sensing pattern 10 and the second sensing pattern 20, as necessary.
  • a metal mesh 80 above or below the first sensing pattern 10 and the second sensing pattern 20, as necessary.
  • an appropriate shape may be provided above or below a unit pattern of a rhombus shape (see FIG. 1) of the first sensing pattern 10 and the second sensing pattern 20 to improve the electrical conductivity of the sensing pattern, thereby improving the sensing speed. Can be raised.
  • the additionally provided metal mesh 80 does not need to be electrically connected between the unit patterns, and may be formed in a grid shape or the like within each unit pattern region.
  • the metal mesh 80 may further include a metal conductive layer 200 thereon.
  • the metal mesh 80 is preferably provided on the sensing patterns 10 and 20.
  • the metal mesh 80 may include a metal conductive layer 200, whereby electrical conductivity may be significantly increased.
  • the metal line 70 transmits a change in capacitance sensed in the sensing patterns 10 and 20 to the driving circuit side.
  • the metal wire 70 may be formed of the same material as the bridge electrode 50, and therefore, the metal wire 70 may be formed at the same time when the bridge electrode 50 is formed.
  • the metal wire 70 is disposed on the bezel portion of the display device.
  • the metal wire 70 is preferably formed with the minimum width possible.
  • the metal wiring 70 of the present invention may further include a metal plating layer 200 thereon.
  • the metal plating layer 200 on the upper portion of the metal wiring may be formed of the same material as the metal plating layer 200 formed on the bridge electrode 50, and may be formed at the same time.
  • the touch sensing electrode of the present invention is formed on the substrate 100.
  • the substrate 100 may be a material commonly used in the art without limitation, for example, glass, polyethersulphone (PES), polyacrylate (PAR, polyacrylate), polyether imide (PEI, polyetherimide, polyethylene naphthalate (PEN, polyethyelenen napthalate), polyethylene terephthalate (PET, polyethyelene terepthalate), polyphenylene sulfide (PPS), polyallylate, polyimide, polycarbonate ( PC, polycarbonate), cellulose tri acetate (TAC), cellulose acetate propionate (CAP), and the like.
  • PES polyethersulphone
  • PAR polyacrylate
  • PEI polyether imide
  • PEN polyethylene naphthalate
  • PET polyethyelene terepthalate
  • PPS polyphenylene sulfide
  • PC polycarbonate
  • TAC cellulose tri acetate
  • CAP cellulose acetate propionate
  • the substrate 100 may be one surface of a cover window substrate or a display panel forming an outermost surface of the touch screen panel.
  • the touch sensing electrode of the present invention may further include a transparent dielectric layer between the substrate 100 and the sensing pattern as necessary.
  • the transparent dielectric layer improves the optical uniformity of the touch screen panel by reducing the difference in optical characteristics due to positional structural differences according to the sensing pattern structure.
  • the transparent dielectric layer may be formed by mixing niobium oxide, silicon oxide, cerium oxide, indium oxide, or the like, alone or in combination of two or more thereof.
  • the formation method may be a vacuum deposition method, a sputtering method, an ion plating method, and the like, and may be easily manufactured in the form of a thin film through the above method.
  • the transparent dielectric layer may be formed of a plurality of layers.
  • each layer may be formed of different materials, and may have different refractive indices and thicknesses.
  • a first sensing pattern formed in a first direction and a second sensing pattern formed in a second direction are formed on a substrate, and an insulating layer is formed on the first sensing pattern at a point where the first sensing pattern and the bridge electrode intersect.
  • the sensing patterns 10 and 20 may be formed by various thin film deposition techniques such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). For example, it may be formed by reactive sputtering, which is an example of physical vapor deposition.
  • PVD physical vapor deposition
  • CVD chemical vapor deposition
  • the sensing pattern may be formed by a printing process.
  • various printing methods such as gravure off set, reverse off set, inkjet printing, screen printing, and gravure printing may be used.
  • the sensing pattern when the sensing pattern is formed by a printing process, the sensing pattern may be formed of a printable paste material.
  • it may be formed of carbon nanotubes (CNTs), conductive polymers, and silver nano wire inks.
  • the sensing pattern may be formed by photolithography in addition to the above method.
  • the insulating layer 30 is formed on the first sensing pattern 10 at the point where the first sensing pattern 10 and the bridge electrode 50 to be formed later intersect. .
  • the insulating layer 30 may be formed using any material and method used in the art without particular limitation.
  • a bridge electrode 50 is formed on the insulating layer 30 to electrically connect the second sensing pattern 20.
  • a metal layer for forming bridge electrodes is formed on the substrate formed up to the insulating layer 30.
  • the metal layer may be formed on the entire upper surface of the substrate.
  • the metal layer for forming the bridge electrode is formed of a metal to be used as the bridge electrode, and the forming method is not particularly limited.
  • various thin films such as physical vapor deposition (PVD) and chemical vapor deposition (CVD) are used. It may be formed by a deposition technique. For example, it may be formed by reactive sputtering, which is one example of a physical vapor deposition method, but is not limited thereto.
  • a method of coating a coating solution containing metal particles may be applied.
  • a photoresist pattern is formed on the top surface of the bridge electrode forming metal layer to expose only a portion where the metal plating layer is to be formed.
  • the portion exposed by the photoresist pattern may be the bridge electrode 50.
  • a portion of the metal mesh 80, a portion of the metal wiring 70, and the like may also be exposed. In this case, the metal mesh 80 and the metal wiring 70 are formed simultaneously with the bridge electrode 50.
  • the metal mesh 80 is formed below the sensing patterns 10 and 20, the metal mesh 80 is first formed on the substrate 100 and then the sensing patterns 10 and 20 are formed thereon. do.
  • the photoresist pattern may be formed to cover the metal mesh 80 so as not to include the metal plating layer 200.
  • a metal plating layer is formed on the exposed portion.
  • the metal plating layer 200 may be formed by a conventional metal plating method. Although there is no particular limitation on the plating method, an electroplating method is preferable in view of precision to be formed only on the bridge electrode 50.
  • the bridge electrode forming metal layer is used as the cathode electrode and the metal to form the plating layer is used as the anode electrode, the substrate is immersed in an electrolyte solution in which the metal ions of the anode electrode are present, and then a power source is connected. When flowing, the metal plating layer 200 is formed on a portion exposed by the photoresist pattern.
  • the touch sensing electrode of the present invention can be obtained. Removing the metal layer for forming the bridge electrode in the portion where the metal plating layer is not formed may be easily performed by using an etchant capable of etching the bridge electrode forming metal layer without etching the metal plating layer.
  • the touch sensing electrode of the present invention can form a touch screen panel through additional processes known in the art.
  • a display device used may include a liquid crystal display, an OLED, a flexible display, but is not limited thereto.
  • First and second sensing patterns having a thickness of 20 nm were formed of indium tin oxide (ITO) (refractive index: 1.8) on a glass substrate (refractive index: 1.51).
  • ITO indium tin oxide
  • an insulating layer was formed on the first sensing pattern of the portion where the bridge pattern was to be formed, and then a molybdenum metal layer having a thickness of 10 nm was formed on the upper surface of the substrate on which the insulating layer was formed by sputtering.
  • a power source is connected to the molybdenum metal layer, and the other side of the power source is connected to a copper electrode, and then the substrate and copper The electrode was immersed in a copper electrolyte solution and electroplated to form a copper plating layer on the exposed molybdenum metal layer.
  • the photoresist pattern was removed, and the molybdenum metal layer on which the copper plating layer was not formed was removed to manufacture a touch sensing electrode.
  • the refractive index is described based on light of 550 nm wavelength.
  • a touch sensing electrode was manufactured in the same manner as in Example 1, except that the metal mesh and the metal plating layer were further formed on the first sensing pattern and the second sensing pattern.
  • a touch sensing electrode was manufactured in the same manner as in Example 1, except that a metal mesh was further formed below the first sensing pattern and the second sensing pattern.
  • a touch sensing electrode was manufactured in the same manner as in Example 1, except that the copper plating layer was not formed and molybdenum was formed to have a thickness of 300 nm.
  • Reflectance means the average of reflectance in 400 nm-700 nm.
  • the electrical resistance is significantly smaller than that of the comparative example and the difference between the reflectivity and the comparative example without forming the metal plating layer.
  • first sensing pattern 20 second sensing pattern
  • bridge electrode 200 metal plating layer

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

L'invention concerne une électrode à activation par pression qui présente une bonne conductivité électrique et un écran tactile la possédant. L'électrode à activation par pression comprend : une électrode en pont électriquement connectée sous la forme d'un treillis métallique à un circuit métallique sur un substrat et ayant une couche de placage métallique sur une partie supérieure de celui-ci ; une couche isolante formée sur le substrat et l'électrode en pont ; et un premier tracé de détection formé sur la couche isolante dans une première direction et un second tracé de détection dont les tracés individuels espacés sont électriquement connectés à l'électrode en pont et qui est formé dans une seconde direction.
PCT/KR2014/006905 2013-08-20 2014-07-29 Electrode à activation par pression et écran tactile la possédant Ceased WO2015026071A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2013-0098261 2013-08-20
KR20130098261A KR101389876B1 (ko) 2013-08-20 2013-08-20 터치 감지 전극 및 이를 구비하는 터치 스크린 패널

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WO2015026071A1 true WO2015026071A1 (fr) 2015-02-26

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PCT/KR2014/006905 Ceased WO2015026071A1 (fr) 2013-08-20 2014-07-29 Electrode à activation par pression et écran tactile la possédant

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KR (1) KR101389876B1 (fr)
TW (1) TW201508587A (fr)
WO (1) WO2015026071A1 (fr)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105426018A (zh) * 2015-11-23 2016-03-23 友达光电股份有限公司 触控面板
WO2016159509A1 (fr) * 2015-03-30 2016-10-06 동우화인켐 주식회사 Capteur tactile
CN107045399A (zh) * 2016-02-06 2017-08-15 宸鸿科技(厦门)有限公司 触控面板及其制作方法
WO2018044000A1 (fr) * 2016-08-31 2018-03-08 전자부품연구원 Module de capteur tactile capacitif pouvant détecter la pression
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CN107045399A (zh) * 2016-02-06 2017-08-15 宸鸿科技(厦门)有限公司 触控面板及其制作方法
CN107045399B (zh) * 2016-02-06 2023-08-08 宸鸿科技(厦门)有限公司 触控面板及其制作方法
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CN114168016A (zh) * 2021-12-10 2022-03-11 深圳市华星光电半导体显示技术有限公司 触控显示面板及显示装置
CN114168016B (zh) * 2021-12-10 2023-11-28 深圳市华星光电半导体显示技术有限公司 触控显示面板及显示装置

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