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WO2013120839A3 - Device for the magnetic-field-compensated positioning of a component - Google Patents

Device for the magnetic-field-compensated positioning of a component Download PDF

Info

Publication number
WO2013120839A3
WO2013120839A3 PCT/EP2013/052763 EP2013052763W WO2013120839A3 WO 2013120839 A3 WO2013120839 A3 WO 2013120839A3 EP 2013052763 W EP2013052763 W EP 2013052763W WO 2013120839 A3 WO2013120839 A3 WO 2013120839A3
Authority
WO
WIPO (PCT)
Prior art keywords
component
field
magnetic
compensated positioning
compensated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2013/052763
Other languages
French (fr)
Other versions
WO2013120839A2 (en
Inventor
Michael Stolz
Peter Gerber
Stefan Hembacher
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of WO2013120839A2 publication Critical patent/WO2013120839A2/en
Publication of WO2013120839A3 publication Critical patent/WO2013120839A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G02B7/1827—Motorised alignment
    • G02B7/1828—Motorised alignment using magnetic means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Measuring Magnetic Variables (AREA)

Abstract

A device (26) for the magnetic-field-compensated positioning of a component (25, 30) comprises a holding unit (27) for mounting the component (25, 30) and means (33) for at least partly compensating for an external magnetic field in the region of the holding unit (27).
PCT/EP2013/052763 2012-02-14 2013-02-12 Device for the magnetic-field-compensated positioning of a component Ceased WO2013120839A2 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201261598423P 2012-02-14 2012-02-14
DE201210202167 DE102012202167A1 (en) 2012-02-14 2012-02-14 Device for magnetic-field-compensated positioning of a component
US61/598423 2012-02-14
DE102012202167.1 2012-02-14

Publications (2)

Publication Number Publication Date
WO2013120839A2 WO2013120839A2 (en) 2013-08-22
WO2013120839A3 true WO2013120839A3 (en) 2013-12-27

Family

ID=48868362

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2013/052763 Ceased WO2013120839A2 (en) 2012-02-14 2013-02-12 Device for the magnetic-field-compensated positioning of a component

Country Status (2)

Country Link
DE (1) DE102012202167A1 (en)
WO (1) WO2013120839A2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013215203A1 (en) * 2013-08-02 2014-08-28 Carl Zeiss Smt Gmbh Holder for mirror assembly of projection exposure system, has base body including magnet, which is arranged such that magnetic field is created in region of support surface
DE102014216631A1 (en) 2014-08-21 2016-02-25 Carl Zeiss Smt Gmbh Microlithographic projection exposure apparatus, mirror module therefor, and method for operating the mirror module
DE102015204995A1 (en) 2015-03-19 2015-06-03 Carl Zeiss Smt Gmbh Apparatus and method for processing ceramic components, in particular mirror surface carriers
DE102015208515A1 (en) 2015-05-07 2015-07-09 Carl Zeiss Smt Gmbh Method and device for the revision of mirror surface carriers, as well as correspondingly processed mirror surface support itself
DE102015211474A1 (en) * 2015-06-22 2016-07-07 Carl Zeiss Smt Gmbh ACTUATOR DEVICE FOR A LITHOGRAPHIC SYSTEM AND LITHOGRAPHIC SYSTEM
DE102016226079A1 (en) 2016-12-22 2018-06-28 Carl Zeiss Smt Gmbh Method for positioning a component of an optical system
DE102017200793A1 (en) 2017-01-19 2018-01-11 Carl Zeiss Smt Gmbh Mirror system and projection exposure system
DE102019218305B4 (en) 2019-11-26 2022-02-24 Carl Zeiss Smt Gmbh Method for compensating for excitations when storing a component of a projection exposure system
DE102021208879A1 (en) * 2021-08-13 2023-02-16 Carl Zeiss Smt Gmbh OPTICAL ELEMENT, PROJECTION OPTICS AND PROJECTION EXPOSURE SYSTEM
DE102022209902A1 (en) * 2022-09-20 2024-03-21 Carl Zeiss Smt Gmbh BIPOD, OPTICAL SYSTEM AND PROJECTION EXPOSURE SYSTEM
DE102024205635A1 (en) * 2024-06-19 2025-05-15 Carl Zeiss Smt Gmbh OPTICAL SYSTEM AND LITHOGRAPHY SYSTEM WITH AN OPTICAL SYSTEM

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020153495A1 (en) * 2001-04-21 2002-10-24 Nikon Corporation. Magnetically shielded enclosures for housing charged-particle-beam systems
US20110181851A1 (en) * 2008-09-19 2011-07-28 Carl Zeiss Smt Gmbh Temperature-control device for an optical assembly

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6859515B2 (en) 1998-05-05 2005-02-22 Carl-Zeiss-Stiftung Trading Illumination system, particularly for EUV lithography
JP5041810B2 (en) * 2003-09-12 2012-10-03 カール・ツァイス・エスエムティー・ゲーエムベーハー Optical element operation device
DE102006036064A1 (en) 2006-08-02 2008-02-07 Carl Zeiss Smt Ag Illumination system for a projection exposure apparatus with wavelengths ≦ 193 nm
EP2397905A1 (en) * 2010-06-15 2011-12-21 Applied Materials, Inc. Magnetic holding device and method for holding a substrate
DE102011006100A1 (en) * 2011-03-25 2012-09-27 Carl Zeiss Smt Gmbh Mirror array

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020153495A1 (en) * 2001-04-21 2002-10-24 Nikon Corporation. Magnetically shielded enclosures for housing charged-particle-beam systems
US20110181851A1 (en) * 2008-09-19 2011-07-28 Carl Zeiss Smt Gmbh Temperature-control device for an optical assembly

Also Published As

Publication number Publication date
DE102012202167A1 (en) 2013-08-14
WO2013120839A2 (en) 2013-08-22

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