[go: up one dir, main page]

WO2013010864A3 - Vorrichtung und verfahren zum bestimmen des dampfdrucks eines in einem trägergasstrom verdampften ausgangsstoffes - Google Patents

Vorrichtung und verfahren zum bestimmen des dampfdrucks eines in einem trägergasstrom verdampften ausgangsstoffes Download PDF

Info

Publication number
WO2013010864A3
WO2013010864A3 PCT/EP2012/063539 EP2012063539W WO2013010864A3 WO 2013010864 A3 WO2013010864 A3 WO 2013010864A3 EP 2012063539 W EP2012063539 W EP 2012063539W WO 2013010864 A3 WO2013010864 A3 WO 2013010864A3
Authority
WO
WIPO (PCT)
Prior art keywords
gas stream
carrier gas
starting substance
determining
vapour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2012/063539
Other languages
English (en)
French (fr)
Other versions
WO2013010864A2 (de
Inventor
Michael Long
Markus Gersdorff
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aixtron SE
Original Assignee
Aixtron SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aixtron SE filed Critical Aixtron SE
Publication of WO2013010864A2 publication Critical patent/WO2013010864A2/de
Publication of WO2013010864A3 publication Critical patent/WO2013010864A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
    • G01F1/684—Structural arrangements; Mounting of elements, e.g. in relation to fluid flow
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/68—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using thermal effects
    • G01F1/696—Circuits therefor, e.g. constant-current flow meters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Fluid Mechanics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Dispersion Chemistry (AREA)
  • Investigating Or Analyzing Materials Using Thermal Means (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)

Abstract

Die Erfindung betrifft ein Verfahren zum Erzeugen eines in einem Trägergas transportierten Dampfs eines festen oder flüssigen Ausgangsstoffs umfassend die Schritte: Beheizen eines eine Eintrittsöffnung (7) und eine Austrittsöffnung (9) aufweisenden Verdampfer (8); Einspeisen eines ein Trägergas aufweisenden Eingangsgasstroms durch die Eintrittsöffnung (7) in den Verdampfer (8); Verdampfen des festen oder flüssigen Ausgangsstoffs innerhalb des Verdampfers (8); Transportieren des so erzeugten Dampfes zusammen mit dem Trägergas als Ausgangsgasstrom durch die Austrittsöffnung (9); Ermitteln eines dem Massenfluss des Trägergases im Eingangsgasstrom zugeordneten ersten Wert mittels eines ersten Sensors (2); Ermitteln eines sowohl vom Massenfluss beziehungsweise Partialdruck des Trägergases als auch vom Massenfluss beziehungsweise Partialdruck des Dampfes im Ausgangsgasstrom beeinflussten zweiten Wert mit einem zweiten Sensor (10); Berechnen eines dem Partialdruck des im Ausgangsgasstrom transportierten Dampfes entsprechenden Wert durch In-Beziehung-Setzen der mittels der beiden Sensoren (2, 10) ermittelten Werte. Die Erfindung betrifft darüber hinaus eine Vorrichtung zum Verdampfen eines flüssigen oder festen Ausgangsstoffs in einem beheizbaren Verdampfer.
PCT/EP2012/063539 2011-07-19 2012-07-11 Vorrichtung und verfahren zum bestimmen des dampfdrucks eines in einem trägergasstrom verdampften ausgangsstoffes Ceased WO2013010864A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011051931A DE102011051931A1 (de) 2011-07-19 2011-07-19 Vorrichtung und Verfahren zum Bestimmen des Dampfdrucks eines in einem Trägergasstrom verdampften Ausgangsstoffes
DE102011051931.9 2011-07-19

Publications (2)

Publication Number Publication Date
WO2013010864A2 WO2013010864A2 (de) 2013-01-24
WO2013010864A3 true WO2013010864A3 (de) 2013-11-07

Family

ID=46513756

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2012/063539 Ceased WO2013010864A2 (de) 2011-07-19 2012-07-11 Vorrichtung und verfahren zum bestimmen des dampfdrucks eines in einem trägergasstrom verdampften ausgangsstoffes

Country Status (3)

Country Link
DE (1) DE102011051931A1 (de)
TW (1) TW201307606A (de)
WO (1) WO2013010864A2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6142629B2 (ja) * 2013-03-29 2017-06-07 東京エレクトロン株式会社 原料ガス供給装置、成膜装置及び原料ガス供給方法
DE102013106863A1 (de) 2013-07-01 2015-01-08 Aixtron Se Vorrichtung zum Bestimmen des Massenflusses eines in einem Trägergas transportierten Dampfs
CN103528630B (zh) * 2013-10-16 2016-06-08 国家电网公司 高压旁路蒸汽泄漏量及减温水流量的计算方法
DE102014101792A1 (de) * 2014-02-13 2015-08-13 Aixtron Se Vorrichtung zum Bestimmen des Massenflusses eines Gases beziehungsweise Gasgemisches mit ineinandergeschachtelten rohrförmigen Filamentanordnungen
DE102014101971A1 (de) 2014-02-17 2015-08-20 Aixtron Se Magnetisches Verfahren zur Bestimmung einer Dampfkonzentration sowie Vorrichtung zur Durchführung des Verfahrens
DE102014102484A1 (de) 2014-02-26 2015-08-27 Aixtron Se Verwendung eines QCM-Sensors zur Bestimmung der Dampfkonzentration beim OVPD-Verfahren beziehungsweise in einem OVPD-Beschichtungssystem
DE102015104240A1 (de) * 2015-03-20 2016-09-22 Aixtron Se Durch Aufheizen zu reinigender QCM-Sensor und dessen Verwendung in einem OVPD-Beschichtungssystem
DE102015105404A1 (de) 2015-04-09 2016-10-27 Aixtron Se Vorrichtung und Verfahren zum Bestimmen der Konzentration oder des Partialdrucks eines Dampfes mit magnetischen Eigenschaften
US9960009B2 (en) * 2015-07-17 2018-05-01 Lam Research Corporation Methods and systems for determining a fault in a gas heater channel
DE102017123233A1 (de) 2017-10-06 2019-04-11 Aixtron Se Vorrichtung und Verfahren zur Erzeugung eines in einem Trägergas transportierten Dampfes
DE102017126126A1 (de) * 2017-11-08 2019-05-09 Aixtron Se Verfahren und Vorrichtung zum Erzeugen eines Dampfes durch die Verwendung von in einem Regelmodus gewonnenen Steuerdaten
US10914717B2 (en) * 2018-05-09 2021-02-09 Mks Instruments, Inc. Method and apparatus for partial pressure detection
DE102020103822A1 (de) 2020-02-13 2021-08-19 Apeva Se Vorrichtung zum Verdampfen eines organischen Pulvers
DE102020116271A1 (de) 2020-06-19 2021-12-23 Apeva Se Vorrichtung und Verfahren zum Verdampfen eines organischen Pulvers

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3650151A (en) * 1970-11-18 1972-03-21 Tylan Corp Fluid flow measuring system
US4341107A (en) * 1980-10-14 1982-07-27 Tylan Corporation Calibratable system for measuring fluid flow
US4363238A (en) * 1979-08-16 1982-12-14 Franz Willam Device for measuring the breath of patients
EP0370311A2 (de) * 1988-11-23 1990-05-30 Applied Materials, Inc. Anlage zum chemischen Bedampfen aus der Gasphase und Bauteil zur Versorgung mit Reaktionsmitteln
US4996876A (en) * 1988-12-16 1991-03-05 Leybold Aktiengesellschaft Microrheoscopic detector for gas flows
US5000039A (en) * 1989-11-21 1991-03-19 Siemens-Bendix Automotive Electronics L.P. Mass air flow integrator
US5820678A (en) * 1997-05-30 1998-10-13 The Regents Of The University Of California Solid source MOCVD system
US20050147749A1 (en) * 2004-01-05 2005-07-07 Msp Corporation High-performance vaporizer for liquid-precursor and multi-liquid-precursor vaporization in semiconductor thin film deposition
US20060115589A1 (en) * 2004-11-29 2006-06-01 Tokyo Electron Limited Method and system for measuring a flow rate in a solid precursor delivery system
US7238389B2 (en) * 2004-03-22 2007-07-03 Eastman Kodak Company Vaporizing fluidized organic materials
DE102006026576A1 (de) * 2006-06-06 2008-01-10 Aixtron Ag Vorrichtung und Verfahren zum Aufdampfen eines pulverförmigen organischen Ausgangsstoffs
US7322248B1 (en) * 2006-08-29 2008-01-29 Eastman Kodak Company Pressure gauge for organic materials
EP2034047A1 (de) * 2006-06-27 2009-03-11 Fujikin Incorporated Verdampfungs-/zuführungsvorrichtung von material und automatischer druckregler zur verwendung darin

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3680377A (en) 1970-08-17 1972-08-01 Hewlett Packard Co Fluid flow meter
US4885211A (en) 1987-02-11 1989-12-05 Eastman Kodak Company Electroluminescent device with improved cathode
US4769292A (en) 1987-03-02 1988-09-06 Eastman Kodak Company Electroluminescent device with modified thin film luminescent zone
US4961348A (en) * 1988-12-16 1990-10-09 Ulrich Bonne Flowmeter fluid composition correction
GB8903744D0 (en) * 1989-02-18 1989-04-05 Endress & Hauser Ltd Flowmeter
JPH0795527B2 (ja) * 1991-02-05 1995-10-11 株式会社リンテック 液体原料用気化供給器
US5288325A (en) * 1991-03-29 1994-02-22 Nec Corporation Chemical vapor deposition apparatus
US7501152B2 (en) 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone
US7000463B1 (en) 2004-11-12 2006-02-21 Mks Instruments, Inc. Reynolds number correction function for mass flow rate sensor
US8027574B2 (en) 2007-08-06 2011-09-27 Global Oled Technology Llc Vaporization of thermally sensitive materials
DE102007062977B4 (de) * 2007-12-21 2018-07-19 Schott Ag Verfahren zur Herstellung von Prozessgasen für die Dampfphasenabscheidung

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3650151A (en) * 1970-11-18 1972-03-21 Tylan Corp Fluid flow measuring system
US4363238A (en) * 1979-08-16 1982-12-14 Franz Willam Device for measuring the breath of patients
US4341107A (en) * 1980-10-14 1982-07-27 Tylan Corporation Calibratable system for measuring fluid flow
EP0370311A2 (de) * 1988-11-23 1990-05-30 Applied Materials, Inc. Anlage zum chemischen Bedampfen aus der Gasphase und Bauteil zur Versorgung mit Reaktionsmitteln
US4996876A (en) * 1988-12-16 1991-03-05 Leybold Aktiengesellschaft Microrheoscopic detector for gas flows
US5000039A (en) * 1989-11-21 1991-03-19 Siemens-Bendix Automotive Electronics L.P. Mass air flow integrator
US5820678A (en) * 1997-05-30 1998-10-13 The Regents Of The University Of California Solid source MOCVD system
US20050147749A1 (en) * 2004-01-05 2005-07-07 Msp Corporation High-performance vaporizer for liquid-precursor and multi-liquid-precursor vaporization in semiconductor thin film deposition
US7238389B2 (en) * 2004-03-22 2007-07-03 Eastman Kodak Company Vaporizing fluidized organic materials
US20060115589A1 (en) * 2004-11-29 2006-06-01 Tokyo Electron Limited Method and system for measuring a flow rate in a solid precursor delivery system
DE102006026576A1 (de) * 2006-06-06 2008-01-10 Aixtron Ag Vorrichtung und Verfahren zum Aufdampfen eines pulverförmigen organischen Ausgangsstoffs
EP2034047A1 (de) * 2006-06-27 2009-03-11 Fujikin Incorporated Verdampfungs-/zuführungsvorrichtung von material und automatischer druckregler zur verwendung darin
US7322248B1 (en) * 2006-08-29 2008-01-29 Eastman Kodak Company Pressure gauge for organic materials

Also Published As

Publication number Publication date
TW201307606A (zh) 2013-02-16
DE102011051931A1 (de) 2013-01-24
WO2013010864A2 (de) 2013-01-24

Similar Documents

Publication Publication Date Title
WO2013010864A3 (de) Vorrichtung und verfahren zum bestimmen des dampfdrucks eines in einem trägergasstrom verdampften ausgangsstoffes
CA2750041A1 (en) Hydrogen peroxide vaporizer
WO2008123309A1 (ja) ガス供給方法及びガス供給装置
WO2013022669A3 (en) Systems and methods for processing vapor
WO2013058980A3 (en) Integrated multi-headed atomizer and vaporization system and method
GB2558805A8 (en) Vaporization device systems and methods
PH12012500659A1 (en) Aerosol generator including multi-component wick
WO2011047219A3 (en) Method and apparatus for counting particles in a gas
WO2010083513A3 (en) Continuous droplet generator devices and methods
WO2008045841A3 (en) High saturation ratio water condensation device and method
WO2012023015A3 (en) Gas supply system and correction method
MY170670A (en) Liquid delivery tank with expansion chamber
WO2007062001A3 (en) Use of spectroscopic techniques to monitor and control reactant gas input into a pre-pump reactive gas injection system
WO2008073823A3 (en) System and method for forming and curing a composite structure
WO2007008509A3 (en) Methods for verifying gas flow rates from a gas supply system into a plasma processing chamber
WO2013049660A3 (en) Humidification device, elements, and methodology
CA2732653C (en) System for incondensable component separation in a liquefied natural gas facility
WO2010138950A3 (en) Hydrogen chlorine level detector
WO2014194982A9 (de) Drucksensor, messvorrichtung, reaktionsträger und messverfahren
ATE526431T1 (de) Vakuumbeschichtungsverfahren und anordnung zur durchführung des verfahrens
WO2011154879A3 (en) Trichlorosilane vaporization system
JP2010085222A5 (de)
WO2011031672A3 (en) Parallel system for epitaxial chemical vapor deposition
PL2057381T3 (pl) Sposób cyklicznego beztłokowego sprężania fazy gazowej gazów skraplanych w niskich temperaturach
WO2007099530A3 (en) Integrated cooling system

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 12735283

Country of ref document: EP

Kind code of ref document: A2

122 Ep: pct application non-entry in european phase

Ref document number: 12735283

Country of ref document: EP

Kind code of ref document: A2