[go: up one dir, main page]

WO2012136387A3 - Metallpartikelhaltiges und ätzendes druckbares medium insbesondere zur kontaktbildung mit silizium beim herstellen einer solarzelle - Google Patents

Metallpartikelhaltiges und ätzendes druckbares medium insbesondere zur kontaktbildung mit silizium beim herstellen einer solarzelle Download PDF

Info

Publication number
WO2012136387A3
WO2012136387A3 PCT/EP2012/001608 EP2012001608W WO2012136387A3 WO 2012136387 A3 WO2012136387 A3 WO 2012136387A3 EP 2012001608 W EP2012001608 W EP 2012001608W WO 2012136387 A3 WO2012136387 A3 WO 2012136387A3
Authority
WO
WIPO (PCT)
Prior art keywords
printable medium
passivation layer
medium
production
solar cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2012/001608
Other languages
English (en)
French (fr)
Other versions
WO2012136387A2 (de
WO2012136387A4 (de
Inventor
Giso Hahn
Bernd Raabe
Stefan Braun
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universitaet Konstanz
Original Assignee
Universitaet Konstanz
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universitaet Konstanz filed Critical Universitaet Konstanz
Priority to JP2014503034A priority Critical patent/JP2014522545A/ja
Priority to CN201280017487.3A priority patent/CN103493146A/zh
Priority to KR1020137027432A priority patent/KR20140038954A/ko
Priority to US14/110,065 priority patent/US20140021472A1/en
Publication of WO2012136387A2 publication Critical patent/WO2012136387A2/de
Publication of WO2012136387A3 publication Critical patent/WO2012136387A3/de
Publication of WO2012136387A4 publication Critical patent/WO2012136387A4/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/85Packages
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/03Printing inks characterised by features other than the chemical nature of the binder
    • C09D11/033Printing inks characterised by features other than the chemical nature of the binder characterised by the solvent
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/03Printing inks characterised by features other than the chemical nature of the binder
    • C09D11/037Printing inks characterised by features other than the chemical nature of the binder characterised by the pigment
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/52Electrically conductive inks
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00Etching, surface-brightening or pickling compositions
    • C09K13/02Etching, surface-brightening or pickling compositions containing an alkali metal hydroxide
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00Etching, surface-brightening or pickling compositions
    • C09K13/04Etching, surface-brightening or pickling compositions containing an inorganic acid
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • H10F77/206Electrodes for devices having potential barriers
    • H10F77/211Electrodes for devices having potential barriers for photovoltaic cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/014Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group IV materials
    • H10H20/0145Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group IV materials comprising polycrystalline, amorphous or porous Group IV materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Weting (AREA)
  • Conductive Materials (AREA)
  • Microelectronics & Electronic Packaging (AREA)

Abstract

Es wird ein druckbares Medium vorgeschlagen, wie es zum Beispiel bei der Herstellung von Metallkontakten (11) für Siliziumsolarzellen, die an einer Oberfläche (7) eines Siliziumsubstrats (1) mit einer Passivierungsschicht (9) bedeckt sind, verwendet werden kann. Es wird auch ein entsprechendes Herstellungsverfahren und eine entsprechend hergestellte Solarzelle beschrieben. Das druckbare Medium enthält zumindest ein die Passivierungsschicht (9) ätzendes Medium und Metallpartikel wie z.B. Nickelpartikel (15). Durch lokales Aufbringen des druckbaren Mediums auf die Passivierungsschicht und anschließendes Erhitzen kann mit Hilfe des ätzenden Mediums die Passivierungsschicht (9) lokal geöffnet werden. Dadurch können die Nickelpartikel (15) einen mechanischen und elektrischen Kontakt mit der Substratoberfläche (7), vorzugsweise unter Bildung einer Nickelsilizidschicht (19), eingehen. Das druckbare Medium bzw. das damit ermöglichte Herstellungsverfahren sind aufgrund der Verwendung von beispielsweise Nickelpartikeln kostengünstig und erlauben sowohl einen guten elektrischen Kontakt als auch die Vermeidung von unerwünschten Hochtemperaturschritten.
PCT/EP2012/001608 2011-04-07 2012-04-05 Metallpartikelhaltiges und ätzendes druckbares medium insbesondere zur kontaktbildung mit silizium beim herstellen einer solarzelle Ceased WO2012136387A2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2014503034A JP2014522545A (ja) 2011-04-07 2012-04-05 印刷可能な媒体で金属粒子を含みかつエッチングをもたらし、より具体的には太陽電池の生産中にシリコンと接点を作り出す、印刷可能な媒体
CN201280017487.3A CN103493146A (zh) 2011-04-07 2012-04-05 特别用于在太阳能电池生产期间与硅进行接触的包含金属颗粒并且能够蚀刻的可印刷的介质
KR1020137027432A KR20140038954A (ko) 2011-04-07 2012-04-05 금속입자를 포함하고 식각에 영향을 미치며, 특히 태양전지를 생산하는 동안 실리콘과 콘택을 만드는 인쇄매체
US14/110,065 US20140021472A1 (en) 2011-04-07 2012-04-05 Printable medium that contains metal particles and effects etching, more particularly for making contact with silicon during the production of a solar cell

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011016335A DE102011016335B4 (de) 2011-04-07 2011-04-07 Nickelhaltige und ätzende druckbare Paste sowie Verfahren zur Bildung von elektrischen Kontakten beim Herstellen einer Solarzelle
DE102011016335.2 2011-04-07

Publications (3)

Publication Number Publication Date
WO2012136387A2 WO2012136387A2 (de) 2012-10-11
WO2012136387A3 true WO2012136387A3 (de) 2012-11-29
WO2012136387A4 WO2012136387A4 (de) 2013-02-21

Family

ID=46025597

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2012/001608 Ceased WO2012136387A2 (de) 2011-04-07 2012-04-05 Metallpartikelhaltiges und ätzendes druckbares medium insbesondere zur kontaktbildung mit silizium beim herstellen einer solarzelle

Country Status (6)

Country Link
US (1) US20140021472A1 (de)
JP (1) JP2014522545A (de)
KR (1) KR20140038954A (de)
CN (1) CN103493146A (de)
DE (1) DE102011016335B4 (de)
WO (1) WO2012136387A2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012213077A1 (de) * 2012-07-25 2014-01-30 Robert Bosch Gmbh Verfahren zum Kontaktieren eines Halbleitermaterials mit einer Kontaktlage
KR101614186B1 (ko) * 2013-05-20 2016-04-20 엘지전자 주식회사 태양전지 및 이의 제조 방법
CN104241402A (zh) * 2013-06-20 2014-12-24 晶科能源有限公司 太阳能电池减反射膜及其制备方法
JP6425927B2 (ja) * 2014-07-03 2018-11-21 国立研究開発法人産業技術総合研究所 シリコン窒化膜用エッチング剤、エッチング方法
DE102014221584B4 (de) * 2014-10-23 2018-10-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Elektrochemisches Sintern von Metallpartikelschichten
WO2016144359A1 (en) 2015-03-12 2016-09-15 Hewlett-Packard Development Company, L.P. Printhead structure
CN106373792B (zh) * 2016-08-30 2021-06-08 南通万德科技有限公司 一种高分子材料和金属的复合材料及其制备工艺
KR102600380B1 (ko) * 2018-12-05 2023-11-09 상라오 징코 솔라 테크놀러지 디벨롭먼트 컴퍼니, 리미티드 태양 전지 및 이의 제조 방법, 그리고 태양 전지 패널
KR102212224B1 (ko) * 2019-09-11 2021-02-04 울산과학기술원 다공성 강유전체 박막을 포함하는 광전소자 및 이의 제조방법
CN119630123A (zh) * 2024-11-22 2025-03-14 隆基绿能科技股份有限公司 太阳能电池片、太阳能电池片的制备方法及光伏组件

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0452118A1 (de) * 1990-04-12 1991-10-16 Matsushita Electric Industrial Co., Ltd. Leitende Tintenzusammensetzung und Verfahren zum Herstellen eines dickschichtigen Musters
EP1847575A1 (de) * 2004-12-27 2007-10-24 Mitsui Mining & Smelting Co., Ltd. Leitfähige farbe
WO2009111393A2 (en) * 2008-03-05 2009-09-11 Applied Nanotech Holdings, Inc. Additives and modifiers for solvent- and water-based metallic conductive inks
US20090252924A1 (en) * 2005-11-04 2009-10-08 Mitsui Mining & Smelting Co., Ltd. Nickel ink and conductor film formed of nickel ink
WO2009150116A1 (de) * 2008-06-09 2009-12-17 Basf Se Dispersion zum aufbringen einer metallschicht
WO2010049223A2 (de) * 2008-10-31 2010-05-06 Bosch Solar Energy Ag Verfahren, vorrichtung und drucksubstanz zur herstellung einer metallischen kontaktstruktur
WO2010056826A1 (en) * 2008-11-14 2010-05-20 Applied Nanotech Holdings, Inc. Inks and pastes for solar cell fabrication

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4183136A (en) * 1977-08-03 1980-01-15 Johnson Controls, Inc. Temperature sensing resistance device
US4968354A (en) * 1987-11-09 1990-11-06 Fuji Electric Co., Ltd. Thin film solar cell array
JP3254044B2 (ja) * 1993-06-16 2002-02-04 ナミックス株式会社 太陽電池用電極
WO1995005008A2 (de) * 1993-07-29 1995-02-16 Gerhard Willeke Flaches bauelement mit einem gitternetz von durchgangslöchern
JPH08279649A (ja) * 1995-04-05 1996-10-22 Mitsubishi Electric Corp 半導体レーザの製造方法,及び半導体レーザ
JP3889271B2 (ja) * 2000-12-15 2007-03-07 株式会社東芝 半導体装置の製造方法
DE10150040A1 (de) * 2001-10-10 2003-04-17 Merck Patent Gmbh Kombinierte Ätz- und Dotiermedien
EP1378948A1 (de) * 2002-07-01 2004-01-07 Interuniversitair Microelektronica Centrum Vzw Ätzpaste für Halbleiter und deren Verwendung zum lokalisierten Ätzen von Halbleitersubstraten
JP4549655B2 (ja) * 2003-11-18 2010-09-22 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング 機能性塗料
JP4761714B2 (ja) * 2004-01-29 2011-08-31 京セラ株式会社 太陽電池およびこれを用いた太陽電池モジュール
JP3853793B2 (ja) * 2004-02-27 2006-12-06 京セラケミカル株式会社 太陽電池用導電性ペースト、太陽電池及び太陽電池の製造方法
DE102005007743A1 (de) * 2005-01-11 2006-07-20 Merck Patent Gmbh Druckfähiges Medium zur Ätzung von Siliziumdioxid- und Siliziumnitridschichten
CN101098833A (zh) * 2005-01-11 2008-01-02 默克专利股份有限公司 用于二氧化硅和氮化硅层的蚀刻的可印刷介质
DE102005033724A1 (de) * 2005-07-15 2007-01-18 Merck Patent Gmbh Druckfähige Ätzmedien für Siliziumdioxid-und Siliziumnitridschichten
DE102006030822A1 (de) * 2006-06-30 2008-01-03 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Herstellen einer metallischen Kontaktstruktur einer Solarzelle
WO2009067483A1 (en) * 2007-11-19 2009-05-28 Applied Materials, Inc. Solar cell contact formation process using a patterned etchant material
US8101231B2 (en) * 2007-12-07 2012-01-24 Cabot Corporation Processes for forming photovoltaic conductive features from multiple inks
US7820540B2 (en) * 2007-12-21 2010-10-26 Palo Alto Research Center Incorporated Metallization contact structures and methods for forming multiple-layer electrode structures for silicon solar cells
DE102008037613A1 (de) * 2008-11-28 2010-06-02 Schott Solar Ag Verfahren zur Herstellung eines Metallkontakts
CN101562217A (zh) * 2009-05-22 2009-10-21 中国科学院电工研究所 一种太阳电池前电极制备方法
JP2011060752A (ja) * 2009-08-12 2011-03-24 Nippon Kineki Kk 導電性ペースト組成物
US20120142140A1 (en) * 2010-12-02 2012-06-07 Applied Nanotech Holdings, Inc. Nanoparticle inks for solar cells

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0452118A1 (de) * 1990-04-12 1991-10-16 Matsushita Electric Industrial Co., Ltd. Leitende Tintenzusammensetzung und Verfahren zum Herstellen eines dickschichtigen Musters
EP1847575A1 (de) * 2004-12-27 2007-10-24 Mitsui Mining & Smelting Co., Ltd. Leitfähige farbe
US20090252924A1 (en) * 2005-11-04 2009-10-08 Mitsui Mining & Smelting Co., Ltd. Nickel ink and conductor film formed of nickel ink
WO2009111393A2 (en) * 2008-03-05 2009-09-11 Applied Nanotech Holdings, Inc. Additives and modifiers for solvent- and water-based metallic conductive inks
WO2009150116A1 (de) * 2008-06-09 2009-12-17 Basf Se Dispersion zum aufbringen einer metallschicht
WO2010049223A2 (de) * 2008-10-31 2010-05-06 Bosch Solar Energy Ag Verfahren, vorrichtung und drucksubstanz zur herstellung einer metallischen kontaktstruktur
WO2010056826A1 (en) * 2008-11-14 2010-05-20 Applied Nanotech Holdings, Inc. Inks and pastes for solar cell fabrication

Also Published As

Publication number Publication date
US20140021472A1 (en) 2014-01-23
WO2012136387A2 (de) 2012-10-11
WO2012136387A4 (de) 2013-02-21
JP2014522545A (ja) 2014-09-04
CN103493146A (zh) 2014-01-01
KR20140038954A (ko) 2014-03-31
DE102011016335A1 (de) 2012-10-11
DE102011016335B4 (de) 2013-10-02

Similar Documents

Publication Publication Date Title
WO2012136387A3 (de) Metallpartikelhaltiges und ätzendes druckbares medium insbesondere zur kontaktbildung mit silizium beim herstellen einer solarzelle
WO2013090562A3 (en) Photovoltaic cell and method of forming the same
MY162679A (en) Thin silicon solar cell and method of manufacture
WO2010099863A3 (de) Beidseitig kontaktierte solarzellen sowie verfahren zu deren herstellung
WO2011157422A3 (de) Verfahren zur herstellung einer photovoltaischen solarzelle
WO2010071341A3 (en) Solar cell and method of manufacturing the same
WO2009011185A1 (ja) 太陽電池の製造方法
WO2010087712A3 (en) Back contacting and interconnection of two solar cells
WO2010090489A2 (ko) 절연된 도전성 패턴의 제조 방법 및 적층체
WO2007059578A8 (en) High efficiency solar cell fabrication
WO2011102677A3 (ko) 나노구조 무기-유기 이종 접합 태양전지의 제조방법
WO2011046388A3 (ko) 태양광 발전장치 및 이의 제조방법
WO2010081505A3 (de) Solarzelle und verfahren zur herstellung einer solarzelle aus einem siliziumsubstrat
WO2011097056A3 (en) Solar cells and methods of fabrication thereof
WO2013090545A8 (en) Photovoltaic cell and method of forming the same
WO2011091959A8 (de) Verfahren zur lokalen hochdotierung und kontaktierung einer halbleiterstruktur, welche eine solarzelle oder eine vorstufe einer solarzelle ist
WO2014044482A3 (en) Method for fabricating silicon photovoltaic cells
WO2010089364A3 (de) Verfahren zur herstellung eines dünnschicht-photovoltaik-systems und dünnschicht-photovoltaik-system
EP1772907A3 (de) Germanium-Solarzelle und Verfahren zu ihrer Herstellung
WO2010022849A8 (de) Randentschichtung von dünnschicht-solar-modulen mittels ätzen
WO2012054426A3 (en) Method of reducing laser-induced damage in forming laser-processed contacts
WO2011067338A3 (de) Solarzelle, solarmodul und herstellungsverfahren für eine solarzelle bzw. für ein solarmodul
WO2010085439A3 (en) Self-aligned selective emitter formed by counterdoping
WO2011002212A3 (ko) 태양광 발전장치 및 이의 제조방법
WO2011131388A3 (de) Verfahren zur herstellung einer solarzelle sowie nach diesem verfahren hergestellte solarzelle

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 12718070

Country of ref document: EP

Kind code of ref document: A2

ENP Entry into the national phase

Ref document number: 2014503034

Country of ref document: JP

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 14110065

Country of ref document: US

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 20137027432

Country of ref document: KR

Kind code of ref document: A

122 Ep: pct application non-entry in european phase

Ref document number: 12718070

Country of ref document: EP

Kind code of ref document: A2