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WO2012030139A3 - Appareil de traitement thermique sous vide - Google Patents

Appareil de traitement thermique sous vide Download PDF

Info

Publication number
WO2012030139A3
WO2012030139A3 PCT/KR2011/006406 KR2011006406W WO2012030139A3 WO 2012030139 A3 WO2012030139 A3 WO 2012030139A3 KR 2011006406 W KR2011006406 W KR 2011006406W WO 2012030139 A3 WO2012030139 A3 WO 2012030139A3
Authority
WO
WIPO (PCT)
Prior art keywords
muffle
heat treatment
treatment apparatus
vacuum heat
disposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2011/006406
Other languages
English (en)
Other versions
WO2012030139A2 (fr
Inventor
Jung Eun Han
Byung Sook Kim
Kyoung Hoon Chai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Innotek Co Ltd
Original Assignee
LG Innotek Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Innotek Co Ltd filed Critical LG Innotek Co Ltd
Publication of WO2012030139A2 publication Critical patent/WO2012030139A2/fr
Publication of WO2012030139A3 publication Critical patent/WO2012030139A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/74—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
    • C21D1/773—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material under reduced pressure or vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/04—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated adapted for treating the charge in vacuum or special atmosphere
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories or equipment specially adapted for furnaces of these types
    • F27B5/14—Arrangements of heating devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories or equipment specially adapted for furnaces of these types
    • F27B5/16—Arrangements of air or gas supply devices
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories or equipment specially adapted for furnaces of these types
    • F27B5/16—Arrangements of air or gas supply devices
    • F27B2005/161—Gas inflow or outflow
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06—Details, accessories or equipment specially adapted for furnaces of these types
    • F27B5/10—Muffles

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)
  • Furnace Details (AREA)
  • Silicon Compounds (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

L'invention concerne un appareil de traitement thermique sous vide. L'appareil de traitement thermique sous vide comprend une chambre, un élément d'isolation disposé à l'intérieur de la chambre, un moufle disposé à l'intérieur de l'élément d'isolation, un élément chauffant disposé entre l'élément d'isolation et le moufle, et un récipient de réaction disposé à l'intérieur du moufle. Le moufle comprend un premier moufle et un second moufle disposé à l'intérieur du premier moufle et espacé du premier moufle.
PCT/KR2011/006406 2010-09-01 2011-08-30 Appareil de traitement thermique sous vide Ceased WO2012030139A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020100085428A KR101210064B1 (ko) 2010-09-01 2010-09-01 진공 열처리 장치
KR10-2010-0085428 2010-09-01

Publications (2)

Publication Number Publication Date
WO2012030139A2 WO2012030139A2 (fr) 2012-03-08
WO2012030139A3 true WO2012030139A3 (fr) 2012-05-18

Family

ID=45773377

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/006406 Ceased WO2012030139A2 (fr) 2010-09-01 2011-08-30 Appareil de traitement thermique sous vide

Country Status (2)

Country Link
KR (1) KR101210064B1 (fr)
WO (1) WO2012030139A2 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102440172B1 (ko) * 2020-09-25 2022-09-05 비나텍주식회사 반응기 및 그것을 구비한 가압 활성화 장비
KR102530008B1 (ko) * 2022-09-22 2023-05-08 대보하이테크 주식회사 흑연 고순화 처리장치 및 그의 동작방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05163038A (ja) * 1991-12-16 1993-06-29 Sumitomo Electric Ind Ltd 光ファイバ用多孔質母材の加熱透明化方法
JP2002154898A (ja) * 2000-11-10 2002-05-28 Denso Corp 炭化珪素単結晶の製造方法及び製造装置
JP2003192357A (ja) * 2001-12-25 2003-07-09 Shin Etsu Chem Co Ltd 多孔質ガラス母材の熱処理方法及び装置
JP2007045669A (ja) * 2005-08-10 2007-02-22 Ricoh Co Ltd 結晶成長装置および製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05163038A (ja) * 1991-12-16 1993-06-29 Sumitomo Electric Ind Ltd 光ファイバ用多孔質母材の加熱透明化方法
JP2002154898A (ja) * 2000-11-10 2002-05-28 Denso Corp 炭化珪素単結晶の製造方法及び製造装置
JP2003192357A (ja) * 2001-12-25 2003-07-09 Shin Etsu Chem Co Ltd 多孔質ガラス母材の熱処理方法及び装置
JP2007045669A (ja) * 2005-08-10 2007-02-22 Ricoh Co Ltd 結晶成長装置および製造方法

Also Published As

Publication number Publication date
KR20120022173A (ko) 2012-03-12
WO2012030139A2 (fr) 2012-03-08
KR101210064B1 (ko) 2012-12-07

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