WO2012030139A3 - Vacuum heat treatment apparatus - Google Patents
Vacuum heat treatment apparatus Download PDFInfo
- Publication number
- WO2012030139A3 WO2012030139A3 PCT/KR2011/006406 KR2011006406W WO2012030139A3 WO 2012030139 A3 WO2012030139 A3 WO 2012030139A3 KR 2011006406 W KR2011006406 W KR 2011006406W WO 2012030139 A3 WO2012030139 A3 WO 2012030139A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- muffle
- heat treatment
- treatment apparatus
- vacuum heat
- disposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D1/00—General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
- C21D1/74—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
- C21D1/773—Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material under reduced pressure or vacuum
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
- F27B5/04—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated adapted for treating the charge in vacuum or special atmosphere
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
- F27B5/06—Details, accessories or equipment specially adapted for furnaces of these types
- F27B5/14—Arrangements of heating devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
- F27B5/06—Details, accessories or equipment specially adapted for furnaces of these types
- F27B5/16—Arrangements of air or gas supply devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
- F27B5/06—Details, accessories or equipment specially adapted for furnaces of these types
- F27B5/16—Arrangements of air or gas supply devices
- F27B2005/161—Gas inflow or outflow
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B5/00—Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
- F27B5/06—Details, accessories or equipment specially adapted for furnaces of these types
- F27B5/10—Muffles
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thermal Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Muffle Furnaces And Rotary Kilns (AREA)
- Furnace Details (AREA)
- Silicon Compounds (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Provided is a vacuum heat treatment apparatus. The vacuum heat treatment apparatus includes a chamber, an insulation member disposed within the chamber, a muffle disposed within the insulation member, a heating member disposed between the insulation member and the muffle, and a reaction container disposed within the muffle. The muffle includes a first muffle and a second muffle disposed inside the first muffle and spaced from the first muffle.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020100085428A KR101210064B1 (en) | 2010-09-01 | 2010-09-01 | Vacuum heat treatment apparatus |
| KR10-2010-0085428 | 2010-09-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2012030139A2 WO2012030139A2 (en) | 2012-03-08 |
| WO2012030139A3 true WO2012030139A3 (en) | 2012-05-18 |
Family
ID=45773377
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/KR2011/006406 Ceased WO2012030139A2 (en) | 2010-09-01 | 2011-08-30 | Vacuum heat treatment apparatus |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR101210064B1 (en) |
| WO (1) | WO2012030139A2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102440172B1 (en) * | 2020-09-25 | 2022-09-05 | 비나텍주식회사 | Reactor and carbon support treating equipment having the same |
| KR102530008B1 (en) * | 2022-09-22 | 2023-05-08 | 대보하이테크 주식회사 | Apparatus for Purifying Graphite and Method for Operating thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05163038A (en) * | 1991-12-16 | 1993-06-29 | Sumitomo Electric Ind Ltd | Method for heating and clarifying porous preform for optical fiber |
| JP2002154898A (en) * | 2000-11-10 | 2002-05-28 | Denso Corp | Method and apparatus for producing silicon carbide single crystal |
| JP2003192357A (en) * | 2001-12-25 | 2003-07-09 | Shin Etsu Chem Co Ltd | Heat treatment method and apparatus for porous glass base material |
| JP2007045669A (en) * | 2005-08-10 | 2007-02-22 | Ricoh Co Ltd | Crystal growth apparatus and manufacturing method |
-
2010
- 2010-09-01 KR KR1020100085428A patent/KR101210064B1/en not_active Expired - Fee Related
-
2011
- 2011-08-30 WO PCT/KR2011/006406 patent/WO2012030139A2/en not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05163038A (en) * | 1991-12-16 | 1993-06-29 | Sumitomo Electric Ind Ltd | Method for heating and clarifying porous preform for optical fiber |
| JP2002154898A (en) * | 2000-11-10 | 2002-05-28 | Denso Corp | Method and apparatus for producing silicon carbide single crystal |
| JP2003192357A (en) * | 2001-12-25 | 2003-07-09 | Shin Etsu Chem Co Ltd | Heat treatment method and apparatus for porous glass base material |
| JP2007045669A (en) * | 2005-08-10 | 2007-02-22 | Ricoh Co Ltd | Crystal growth apparatus and manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20120022173A (en) | 2012-03-12 |
| WO2012030139A2 (en) | 2012-03-08 |
| KR101210064B1 (en) | 2012-12-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 11822114 Country of ref document: EP Kind code of ref document: A2 |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| 122 | Ep: pct application non-entry in european phase |
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