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WO2012030139A3 - Vacuum heat treatment apparatus - Google Patents

Vacuum heat treatment apparatus Download PDF

Info

Publication number
WO2012030139A3
WO2012030139A3 PCT/KR2011/006406 KR2011006406W WO2012030139A3 WO 2012030139 A3 WO2012030139 A3 WO 2012030139A3 KR 2011006406 W KR2011006406 W KR 2011006406W WO 2012030139 A3 WO2012030139 A3 WO 2012030139A3
Authority
WO
WIPO (PCT)
Prior art keywords
muffle
heat treatment
treatment apparatus
vacuum heat
disposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2011/006406
Other languages
French (fr)
Other versions
WO2012030139A2 (en
Inventor
Jung Eun Han
Byung Sook Kim
Kyoung Hoon Chai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Innotek Co Ltd
Original Assignee
LG Innotek Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Innotek Co Ltd filed Critical LG Innotek Co Ltd
Publication of WO2012030139A2 publication Critical patent/WO2012030139A2/en
Publication of WO2012030139A3 publication Critical patent/WO2012030139A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D1/00General methods or devices for heat treatment, e.g. annealing, hardening, quenching or tempering
    • C21D1/74Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material
    • C21D1/773Methods of treatment in inert gas, controlled atmosphere, vacuum or pulverulent material under reduced pressure or vacuum
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/04Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated adapted for treating the charge in vacuum or special atmosphere
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06Details, accessories or equipment specially adapted for furnaces of these types
    • F27B5/14Arrangements of heating devices
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06Details, accessories or equipment specially adapted for furnaces of these types
    • F27B5/16Arrangements of air or gas supply devices
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06Details, accessories or equipment specially adapted for furnaces of these types
    • F27B5/16Arrangements of air or gas supply devices
    • F27B2005/161Gas inflow or outflow
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B5/00Muffle furnaces; Retort furnaces; Other furnaces in which the charge is held completely isolated
    • F27B5/06Details, accessories or equipment specially adapted for furnaces of these types
    • F27B5/10Muffles

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)
  • Furnace Details (AREA)
  • Silicon Compounds (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

Provided is a vacuum heat treatment apparatus. The vacuum heat treatment apparatus includes a chamber, an insulation member disposed within the chamber, a muffle disposed within the insulation member, a heating member disposed between the insulation member and the muffle, and a reaction container disposed within the muffle. The muffle includes a first muffle and a second muffle disposed inside the first muffle and spaced from the first muffle.
PCT/KR2011/006406 2010-09-01 2011-08-30 Vacuum heat treatment apparatus Ceased WO2012030139A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020100085428A KR101210064B1 (en) 2010-09-01 2010-09-01 Vacuum heat treatment apparatus
KR10-2010-0085428 2010-09-01

Publications (2)

Publication Number Publication Date
WO2012030139A2 WO2012030139A2 (en) 2012-03-08
WO2012030139A3 true WO2012030139A3 (en) 2012-05-18

Family

ID=45773377

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/006406 Ceased WO2012030139A2 (en) 2010-09-01 2011-08-30 Vacuum heat treatment apparatus

Country Status (2)

Country Link
KR (1) KR101210064B1 (en)
WO (1) WO2012030139A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102440172B1 (en) * 2020-09-25 2022-09-05 비나텍주식회사 Reactor and carbon support treating equipment having the same
KR102530008B1 (en) * 2022-09-22 2023-05-08 대보하이테크 주식회사 Apparatus for Purifying Graphite and Method for Operating thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05163038A (en) * 1991-12-16 1993-06-29 Sumitomo Electric Ind Ltd Method for heating and clarifying porous preform for optical fiber
JP2002154898A (en) * 2000-11-10 2002-05-28 Denso Corp Method and apparatus for producing silicon carbide single crystal
JP2003192357A (en) * 2001-12-25 2003-07-09 Shin Etsu Chem Co Ltd Heat treatment method and apparatus for porous glass base material
JP2007045669A (en) * 2005-08-10 2007-02-22 Ricoh Co Ltd Crystal growth apparatus and manufacturing method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05163038A (en) * 1991-12-16 1993-06-29 Sumitomo Electric Ind Ltd Method for heating and clarifying porous preform for optical fiber
JP2002154898A (en) * 2000-11-10 2002-05-28 Denso Corp Method and apparatus for producing silicon carbide single crystal
JP2003192357A (en) * 2001-12-25 2003-07-09 Shin Etsu Chem Co Ltd Heat treatment method and apparatus for porous glass base material
JP2007045669A (en) * 2005-08-10 2007-02-22 Ricoh Co Ltd Crystal growth apparatus and manufacturing method

Also Published As

Publication number Publication date
KR20120022173A (en) 2012-03-12
WO2012030139A2 (en) 2012-03-08
KR101210064B1 (en) 2012-12-07

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