WO2012014949A1 - Electric contact material - Google Patents
Electric contact material Download PDFInfo
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- WO2012014949A1 WO2012014949A1 PCT/JP2011/067155 JP2011067155W WO2012014949A1 WO 2012014949 A1 WO2012014949 A1 WO 2012014949A1 JP 2011067155 W JP2011067155 W JP 2011067155W WO 2012014949 A1 WO2012014949 A1 WO 2012014949A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/02—Contacts characterised by the material thereof
- H01H1/04—Co-operating contacts of different material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
- B22F7/02—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite layers
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/10—Alloys containing non-metals
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
- C22C29/02—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides
- C22C29/06—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides based on carbides, but not containing other metal compounds
- C22C29/08—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides based on carbides or carbonitrides based on carbides, but not containing other metal compounds based on tungsten carbide
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/06—Alloys based on silver
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/02—Contacts characterised by the material thereof
- H01H1/021—Composite material
- H01H1/023—Composite material having a noble metal as the basic material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H1/00—Contacts
- H01H1/02—Contacts characterised by the material thereof
- H01H1/021—Composite material
- H01H1/023—Composite material having a noble metal as the basic material
- H01H1/0237—Composite material having a noble metal as the basic material and containing oxides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
- H01H11/00—Apparatus or processes specially adapted for the manufacture of electric switches
- H01H11/04—Apparatus or processes specially adapted for the manufacture of electric switches of switch contacts
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C2204/00—End product comprising different layers, coatings or parts of cermet
Definitions
- the present invention relates to an electrical contact material used for an electromagnetic switch such as a magnet switch, a breaker, or a relay.
- JP 2002-363665 A Japanese Patent Laid-Open No. 5-86426
- the silver-oxide-based electrical contact material repeats electrical switching, and oxide is deposited on the contact surface layer, which increases the contact resistance on the contact surface. There is a problem of causing a temperature rise.
- An object of the present invention is to solve such a problem.
- the present invention provides a contact surface of a silver-oxide based electrical contact material with at least one of 1 to 99 mass% Ag-W, 1 to 99 mass% Ag-WC, WC or W having a thickness of 0.1 ⁇ m to 1000 ⁇ m.
- FIG. 18 shows a structure photograph of a contact obtained by coating W on a contact material of 91.7Ag-5.5SnO 2 -2.5In 2 O 3 -0.3NiO.
- At least one coating of Pt, Au, Ag, Ni and Cu is applied between the electrical contact material and the coating layer of 1 to 99 mass% Ag-W, 1 to 99 mass% Ag-WC, WC or W.
- the coating layer of 1 to 99 mass% Ag-W, 1 to 99 mass% Ag-WC, WC or W.
- the coating method includes plasma spraying, gas spraying, high-speed flame spraying, and other spraying, intermittent discharge in the air and liquid as shown in FIGS.
- vapor deposition methods such as PVD and CVD.
- the reason why the thickness of one layer of the coating layer is in the range of 0.1 ⁇ m to 1000 ⁇ m is that when the thickness of one layer is less than 0.1 ⁇ m, there is no coating effect. In addition, if the thickness of one layer exceeds 1000 ⁇ m, it is difficult to perform coating from the viewpoint of technology and production cost. In addition, in 1 to 99 mass% Ag-W and 1 to 99 mass% Ag-WC, if the Ag component is less than 1 mass% and exceeds 99 mass%, the meaning of the Ag alloy is lost.
- the resistance value of the contact can be lowered, the welding resistance and the wear resistance can be improved, and the life can be extended. It becomes.
- the resistance value of the contact can be further lowered, preventing abnormal temperature rise, Even when used as an electrical contact material for high loads due to significantly improved welding resistance and wear resistance, it is possible to extend the service life.
- the contact material was coated with 1 mass% Ag-W by air discharge (see FIG. 1) to form a layer thickness of 800 ⁇ m.
- the air discharge conditions were as follows: 1 mass% Ag-W for the anode and 91.7 mass% Ag-5.5 mass% Sn-2.5 mass% In-0.3 mass% Ni for the cathode were connected to the atmosphere.
- the coating layer 4 was applied as shown in FIG. 3 by oscillating at a current of 1 to 3 A, voltage of 60 V, discharge distance of 1 mm, and 300 to 400 Hz.
- 1 is an electrode and 2 is a contact.
- the contact 2 is placed in a general electrolyte 3 such as a tricalcium phosphate solution or a 5% citric acid aqueous solution. Discharge is performed with the electrode 1.
- a general electrolyte 3 such as a tricalcium phosphate solution or a 5% citric acid aqueous solution. Discharge is performed with the electrode 1.
- the contact material was coated with 1 mass% Ag-WC by air discharge (see FIG. 1) to form a layer thickness of 100 ⁇ m.
- the air discharge conditions are as follows: 1 mass% Ag-WC is connected to the anode, and 91.7 mass% Ag-5.5 mass% Sn-2.5 mass% In-0.3 mass% Ni contact material is connected to the cathode. Then, a partial coating layer 4 was applied as shown in FIG. 4 by oscillating at a current of 1 to 3 A, a voltage of 60 V, a discharge distance of 1 mm, and a discharge of 300 to 400 Hz, and intermittently discharging.
- the surface of the contact material was blasted and then coated by plasma jet spraying.
- the plasma jet spraying conditions are as follows: Ag powder having a particle size of 5 to 125 ⁇ m and W powder are mixed in a plasma jet atmosphere so as to have a ratio of 50: 1.
- a jet current of 500 to 800 A, a spraying distance of 100 mm, plasma Argon is used as the gas (flow rate 30 l / min), and the spray gun is reciprocated at 300 mm / sec to coat the coating layer 4 with a thickness of 0.1 ⁇ m and a coating layer 4 composition of 50 mass% Ag-W. Layered.
- the coating layer 4 was applied by plasma spraying similar to Example 3 with a coating layer 4 thickness of 20 ⁇ m and a coating layer 4 composition of 50 mass% Ag-WC.
- the coating layer 4 was applied by plasma spraying in the same manner as in Example 3 with the thickness of the coating layer 4 being 500 ⁇ m and the composition of the coating layer 4 being 99 mass% Ag—W.
- the coating layer 4 was applied by plasma spraying in the same manner as in Example 3 above, with the coating layer 4 having a thickness of 1000 ⁇ m and the composition of the coating layer 4 being 99 mass% Ag-WC.
- the coating layer 4 was applied by plasma spraying similar to Example 3 with the coating layer 4 having a thickness of 300 ⁇ m and the composition of the coating layer 4 being W.
- the coating layer 4 was applied by plasma spraying similar to Example 3 above with the coating layer 4 having a thickness of 600 ⁇ m and the composition of the coating layer 4 being WC.
- the thickness of one coating layer is set to 50 ⁇ m by plasma spraying similar to that in Example 3, and the composition of the coating layer is alternately 1 mass% Ag-W and 1 mass% Ag-WC from the bottom as shown in FIG. Eight coating layers 4 were applied.
- the thickness of one coating layer is 50 ⁇ m by plasma spraying similar to Example 3, and the composition of the coating layer is alternately 50 mass% Ag-W and 50 mass% Ag-WC from the bottom as shown in FIG. Six coating layers 4 were applied.
- the thickness of one coating layer is 50 ⁇ m by plasma spraying similar to Example 3, and the composition of the coating layer is alternately 99 mass% Ag-W and 99 mass% Ag-WC from the bottom as shown in FIG. Four coating layers 4 were applied.
- the thickness of one layer of the coating layer was set to 50 ⁇ m by plasma spraying similar to Example 3 described above, and the two coating layers 4 were applied as W and WC from the bottom as shown in FIG.
- Plasma jet spraying was performed under the same conditions as in Example 3 above. Ag powder and W powder having a particle size of 5 to 125 ⁇ m were mixed in the plasma jet atmosphere so that the ratio was 99: 1, and the amount of W powder was gradually increased. Then, the composition is changed step by step, the thickness of one coating layer is 100 ⁇ m, and the composition of the coating layer is 99 mass% Ag-W, 75 mass Ag-W, 50 mass% Ag ⁇ from the bottom as shown in FIG. The coating layer 4 was applied as W, 25 mass% Ag-W, and 1 mass% Ag-W.
- the thickness of one coating layer was 100 ⁇ m, and the composition of the coating layer was 99 mass% Ag-WC, 75 mass% Ag-WC, 50 mass% Ag— from the bottom as shown in FIG.
- the coating layer 4 was applied as WC, 25 mass% Ag-WC, and 1 mass% Ag-WC.
- Plasma jet spraying was performed under the same conditions as in Example 3 above.
- the thickness of one coating layer was 50 ⁇ m, and the composition of the coating layer was 1 mass% Ag—W and Au from the bottom as shown in FIG.
- the five coating layers 4 were applied alternately.
- the thickness of one coating layer is 40 ⁇ m, and the composition of the coating layer is 7 coating layers alternately as 1 mass% Ag—W, Au, and Pt from the bottom as shown in FIG. 4 was applied.
- the thickness of one coating layer is 50 ⁇ m, and the composition of the coating layer is 50 mass% Ag—W and Au from the bottom as shown in FIG. gave.
- the thickness of one coating layer is 40 ⁇ m, and the composition of the coating layer is seven coating layers alternately as 50 mass% Ag—W, Au and Pt from the bottom as shown in FIG. 4 was applied.
- the thickness of one coating layer is 20 ⁇ m, and the composition of the coating layer is 99 mass% Ag—W and Au from the bottom as shown in FIG. gave.
- the thickness of one coating layer is 20 ⁇ m, and the composition of the coating layer is 10 coating layers alternately as 99 mass% Ag-WC, Au and Pt from the bottom as shown in FIG. 4 was applied.
- the thickness of one coating layer was 10 ⁇ m, and the composition of the coating layer was composed of 9 layers of 99 mass% Ag—WC and Ni, Ag and Cu alternately from the bottom as shown in FIG. Coating layer 4 was applied.
- the contact test was conducted for each of the above examples and comparative examples.
- the contact test was performed by measuring contact resistance, welding test (for 60A rating), and measuring consumption by a commercially available contactor (AC200V, 20A) to evaluate electrical characteristics.
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Abstract
Description
本発明は、マグネットスイッチ、ブレーカ、リレー等の電磁開閉器に使用される電気接点材料に関する。 The present invention relates to an electrical contact material used for an electromagnetic switch such as a magnet switch, a breaker, or a relay.
従来の銀-酸化物系の電気接点材料は、耐溶着性、耐消耗性、温度特性の向上のために内部酸化条件の変更や第3元素、第4元素の添加によりその都度性能的な課題を克服してきた。例えば、Ag中にSn、In、Sb、Bi等を添加して内部酸化処理を行った材料がある(例えば、特許文献1参照)。 Conventional silver-oxide-based electrical contact materials are subject to performance problems by changing internal oxidation conditions and adding third and fourth elements to improve welding resistance, wear resistance, and temperature characteristics. Has been overcome. For example, there is a material in which Sn, In, Sb, Bi, or the like is added to Ag and subjected to internal oxidation treatment (see, for example, Patent Document 1).
また、mass(質量)%でSn:4~11%、In:1~5%、Te:0.05~3%、Cd:0.05~3%を含有し、さらに必要に応じてFe、Ni、Coのうちの1種以上:0.01~1%含有し、残りがAgと不可避不純物からなる組織を有するAg合金を内部酸化処理したものが提案されている(例えば、特許文献2参照)。 Further, it contains Sn: 4 to 11%, In: 1 to 5%, Te: 0.05 to 3%, Cd: 0.05 to 3% in mass (mass)%, and if necessary, Fe, One or more of Ni and Co: 0.01 to 1%, and an Ag alloy having a structure composed of Ag and inevitable impurities with the remainder being subjected to internal oxidation treatment has been proposed (see, for example, Patent Document 2) ).
しかしながら、上述した従来の技術においては、銀-酸化物系の電気接点材料は電気的開閉を繰り返すことにより、接点表層に酸化物が堆積し、それが要因となって接点表面における接触抵抗を引き上げ、温度上昇を引き起こすという問題がある。 However, in the conventional technology described above, the silver-oxide-based electrical contact material repeats electrical switching, and oxide is deposited on the contact surface layer, which increases the contact resistance on the contact surface. There is a problem of causing a temperature rise.
この温度上昇の問題を解決するためには、添加する酸化物量を減少させる方法があるが、添加する酸化物の量を減少させると、耐溶着性、耐消耗性を引き下げることになるという問題がある。 In order to solve this temperature increase problem, there is a method of reducing the amount of oxide to be added. However, if the amount of oxide to be added is reduced, there is a problem that welding resistance and wear resistance are lowered. is there.
安定した接触抵抗を得て、しかも優れた温度特性の実現と耐溶着性、耐消耗性の向上をはかるということは相反することとなり、接点材料の選択に当たってしばしば問題となっている。
本発明は、このような問題を解決することを課題とする。
Obtaining stable contact resistance and achieving excellent temperature characteristics and improving welding resistance and wear resistance are contradictory, and are often a problem in selecting contact materials.
An object of the present invention is to solve such a problem.
そこで本発明は、銀-酸化物系の電気接点材料の接点面に、1~99mass%Ag-W、1~99mass%Ag-WC、WCもしくはWの1種以上を厚みが0.1μm~1000μmのコーティングを施すことにより、接点の抵抗値を下げて異常な温度上昇をなくし、しかも耐溶着性、耐消耗性の大幅な向上をはかり、高負荷用の電気接点材料に使用した場合においても長寿命の接点とすることができた。 Accordingly, the present invention provides a contact surface of a silver-oxide based electrical contact material with at least one of 1 to 99 mass% Ag-W, 1 to 99 mass% Ag-WC, WC or W having a thickness of 0.1 μm to 1000 μm. By applying this coating, the resistance value of the contacts is lowered to eliminate abnormal temperature rises, and the welding resistance and wear resistance are greatly improved, and even when used as an electrical contact material for high loads. It was able to be a contact point of life.
例として、図18に、91.7Ag-5.5SnO2-2.5In2O3-0.3NiOの接点材料にWをコーティングした接点の組織写真を示す。 As an example, FIG. 18 shows a structure photograph of a contact obtained by coating W on a contact material of 91.7Ag-5.5SnO 2 -2.5In 2 O 3 -0.3NiO.
さらに、電気接点材料と1~99mass%Ag-W、1~99mass%Ag-WC、WCもしくはWのコーティング層の間に、Pt、Au、Ag、Ni、Cuの少なくとも1種のコーティングを施すことにより、接点の抵抗値を下げることができ、異常な温度上昇を防ぐ効果があり、しかも耐溶着性、耐消耗性の大幅な向上をはかり、高負荷用の電気接点材料に使用した場合においても長寿命の接点とすることができる。 Further, at least one coating of Pt, Au, Ag, Ni and Cu is applied between the electrical contact material and the coating layer of 1 to 99 mass% Ag-W, 1 to 99 mass% Ag-WC, WC or W. Can reduce the resistance value of the contacts, prevent abnormal temperature rise, and greatly improve welding resistance and wear resistance, even when used for high load electrical contact materials It can be a long-life contact.
なお、コーティング方法は、プラズマ溶射、ガス溶射、高速フレーム溶射等の溶射でのコーティング、図1および図2に示すような気中や液中での断続的な放電、パルス等の放電によるコーティングおよびPVD、CVDなどの蒸着法等による。 The coating method includes plasma spraying, gas spraying, high-speed flame spraying, and other spraying, intermittent discharge in the air and liquid as shown in FIGS. By vapor deposition methods such as PVD and CVD.
上記において、コーティング層の1層の厚みを0.1μm~1000μmの範囲にした理由は、1層の厚みが0.1μm未満ではコーティングの効果がないためである。また、1層の厚みが1000μmを超えると技術および生産コストの面からコーティングを行うことが難しいためである。
また、1~99mass%Ag-W、1~99mass%Ag-WCにおいて、Ag成分が1mass%未満および99mass%を超えるとAg合金の意味がなくなる。
In the above, the reason why the thickness of one layer of the coating layer is in the range of 0.1 μm to 1000 μm is that when the thickness of one layer is less than 0.1 μm, there is no coating effect. In addition, if the thickness of one layer exceeds 1000 μm, it is difficult to perform coating from the viewpoint of technology and production cost.
In addition, in 1 to 99 mass% Ag-W and 1 to 99 mass% Ag-WC, if the Ag component is less than 1 mass% and exceeds 99 mass%, the meaning of the Ag alloy is lost.
このようにした本発明は、銀-酸化物系の電気接点材料に上記構成のコーティングを行うことにより、接点の抵抗値を下げ、耐溶着性、耐消耗性が向上して長寿命化が可能となる。 In the present invention as described above, by coating the silver-oxide based electrical contact material with the above configuration, the resistance value of the contact can be lowered, the welding resistance and the wear resistance can be improved, and the life can be extended. It becomes.
また、電気接点材料とコーティング層の間に、Pt、Au、Ag、Ni、Cuの少なくとも1種のコーティングを施すことにより、さらに接点の抵抗値を下げることができ、異常な温度上昇を防ぎ、耐溶着性、耐消耗性が大幅に向上して高負荷用の電気接点材料に使用した場合においても長寿命化が可能となる。 In addition, by applying at least one coating of Pt, Au, Ag, Ni, Cu between the electrical contact material and the coating layer, the resistance value of the contact can be further lowered, preventing abnormal temperature rise, Even when used as an electrical contact material for high loads due to significantly improved welding resistance and wear resistance, it is possible to extend the service life.
以下、図面を参照して本発明による実施例を説明する。
まず、板厚1.2mmで3.5mm角の寸法で酸素分圧0.5MPa、内部酸化温度700°Cで48時間内部酸化させた91.7mass%Ag-5.5mass%Sn-2.5mass%In-0.3mass%Niからなる接点材料を作製する。
Embodiments according to the present invention will be described below with reference to the drawings.
First, 91.7 mass% Ag-5.5 mass% Sn-2.5 mass was internally oxidized for 48 hours at a plate thickness of 1.2 mm, a 3.5 mm square oxygen partial pressure of 0.5 MPa, and an internal oxidation temperature of 700 ° C. A contact material made of% In-0.3 mass% Ni is prepared.
上記接点材料に、1mass%Ag-Wのコーティングを気中放電(図1参照)によって行い、800μmの層厚に形成した。 The contact material was coated with 1 mass% Ag-W by air discharge (see FIG. 1) to form a layer thickness of 800 μm.
気中放電の条件は、陽極に1mass%Ag-W、陰極に91.7mass%Ag-5.5mass%Sn-2.5mass%In-0.3mass%Niからなる接点材料を接続し、大気中にて電流1~3A、電圧60V、放電距離1mm、300~400Hzで振動させ、断続的に放電させることによって図3に示す如くコーティング層4を施した。
なお、図1において、1は電極、2は接点である。
The air discharge conditions were as follows: 1 mass% Ag-W for the anode and 91.7 mass% Ag-5.5 mass% Sn-2.5 mass% In-0.3 mass% Ni for the cathode were connected to the atmosphere. The
In FIG. 1, 1 is an electrode and 2 is a contact.
また、上記では気中放電で行ったが、液中放電でもよく、図2に示す如く、リン酸三カルシウム溶液や5%クエン酸水溶液等の一般的な電解液3中に接点2を入れ、電極1との間で放電を行う。
Moreover, although it carried out by the air discharge in the above, it may be a liquid discharge. As shown in FIG. 2, the
上記接点材料に、1mass%Ag-WCのコーティングを気中放電(図1参照)によって行い、100μmの層厚に形成した。 The contact material was coated with 1 mass% Ag-WC by air discharge (see FIG. 1) to form a layer thickness of 100 μm.
気中放電の条件は、陽極に1mass%Ag-WC、陰極に91.7mass%Ag-5.5mass%Sn-2.5mass%In-0.3mass%Niの接点材料を接続し、大気中にて電流1~3A、電圧60V、放電距離1mm、300~400Hzで振動させ、断続的に放電させることによって図4に示す如く部分的コーティング層4を施した。
The air discharge conditions are as follows: 1 mass% Ag-WC is connected to the anode, and 91.7 mass% Ag-5.5 mass% Sn-2.5 mass% In-0.3 mass% Ni contact material is connected to the cathode. Then, a
上記接点材料表面にブラスト処理を行った後、プラズマジェット溶射によってコーティングを行った。 The surface of the contact material was blasted and then coated by plasma jet spraying.
上記プラズマジェット溶射の条件は、プラズマジェット雰囲気中に粒度5~125μmのAg粉末とW粉末を50:1になるように混入し、大気中にて、ジェット電流500~800A、溶射距離100mm、プラズマガスにはアルゴンを使用(流量30l/min)し、溶射ガンを300mm/secにて往復移動させてコーティング層4の厚さを0.1μm、コーティング層4の組成を50mass%Ag-Wとしてコーティング層を施した。
The plasma jet spraying conditions are as follows: Ag powder having a particle size of 5 to 125 μm and W powder are mixed in a plasma jet atmosphere so as to have a ratio of 50: 1. In the atmosphere, a jet current of 500 to 800 A, a spraying distance of 100 mm, plasma Argon is used as the gas (flow rate 30 l / min), and the spray gun is reciprocated at 300 mm / sec to coat the
上記実施例3と同様のプラズマ溶射によってコーティング層4の厚さ20μm、コーティング層4の組成を50mass%Ag-WCとしてコーティング層4を施した。
The
上記実施例3と同様のプラズマ溶射によってコーティング層4の厚さ500μm、コーティング層4の組成を99mass%Ag-Wとしてコーティング層4を施した。
The
上記実施例3と同様のプラズマ溶射によってコーティング層4の厚さ1000μm、コーティング層4の組成を99mass%Ag-WCとしてコーティング層4を施した。
The
上記実施例3と同様のプラズマ溶射によってコーティング層4の厚さ300μm、コーティング層4の組成をWとしてコーティング層4を施した。
The
上記実施例3と同様のプラズマ溶射によってコーティング層4の厚さ600μm、コーティング層4の組成をWCとしてコーティング層4を施した。
The
上記実施例3と同様のプラズマ溶射によってコーティング層の1層の厚さを50μmとし、コーティング層の組成を、図5に示す如く、下から1mass%Ag-Wと1mass%Ag-WCとして交互に8層のコーティング層4を施した。
The thickness of one coating layer is set to 50 μm by plasma spraying similar to that in Example 3, and the composition of the coating layer is alternately 1 mass% Ag-W and 1 mass% Ag-WC from the bottom as shown in FIG. Eight
上記実施例3と同様のプラズマ溶射によってコーティング層の1層の厚さを50μmとし、コーティング層の組成を、図6に示す如く、下から50mass%Ag-Wと50mass%Ag-WCとして交互に6層のコーティング層4を施した。
The thickness of one coating layer is 50 μm by plasma spraying similar to Example 3, and the composition of the coating layer is alternately 50 mass% Ag-W and 50 mass% Ag-WC from the bottom as shown in FIG. Six
上記実施例3と同様のプラズマ溶射によってコーティング層の1層の厚さを50μmとし、コーティング層の組成を、図7に示す如く、下から99mass%Ag-Wと99mass%Ag-WCとして交互に4層のコーティング層4を施した。
The thickness of one coating layer is 50 μm by plasma spraying similar to Example 3, and the composition of the coating layer is alternately 99 mass% Ag-W and 99 mass% Ag-WC from the bottom as shown in FIG. Four
上記実施例3と同様のプラズマ溶射によってコーティング層の1層の厚さを50μmとし、コーティング層の組成を、図8に示す如く、下からWとWCとして2層のコーティング層4を施した。
The thickness of one layer of the coating layer was set to 50 μm by plasma spraying similar to Example 3 described above, and the two
板厚1.2mmで3.5mm角の寸法で酸素分圧0.5MPa、内部酸化温度700°Cで48時間内部酸化させた91.7mass%Ag-5.5mass%Sn-2.5mass%In-0.3mass%Niからなる接点材料の表面にブラスト処理を行った後、プラズマジェット溶射によってコーティング層を施した。 91.7 mass% Ag-5.5mass% Sn-2.5mass% In, which was internally oxidized for 48 hours at a plate thickness of 1.2mm, dimensions of 3.5mm square, oxygen partial pressure of 0.5MPa, and internal oxidation temperature of 700 ° C. After blasting the surface of the contact material made of -0.3 mass% Ni, a coating layer was applied by plasma jet spraying.
プラズマジェット溶射の条件は、上記実施例3と同様の条件で行い、プラズマジェット雰囲気中に粒度5~125μmのAg粉末とW粉末を99:1になるように混入し、徐々にW粉末を増量して段階的に組成を変化させ、コーティング層の1層の厚さを100μmとし、コーティング層の組成を、図9に示す如く、下から99mass%Ag-W、75massAg-W、50mass%Ag-W、25mass%Ag-W、1mass%Ag-Wとしてコーティング層4を施した。
Plasma jet spraying was performed under the same conditions as in Example 3 above. Ag powder and W powder having a particle size of 5 to 125 μm were mixed in the plasma jet atmosphere so that the ratio was 99: 1, and the amount of W powder was gradually increased. Then, the composition is changed step by step, the thickness of one coating layer is 100 μm, and the composition of the coating layer is 99 mass% Ag-W, 75 mass Ag-W, 50 mass% Ag− from the bottom as shown in FIG. The
実施例13と同様にして、コーティング層の1層の厚さを100μmとし、コーティング層の組成を、図10に示す如く、下から99mass%Ag-WC、75mass%Ag-WC、50mass%Ag-WC、25mass%Ag-WC、1mass%Ag-WCとしてコーティング層4を施した。
In the same manner as in Example 13, the thickness of one coating layer was 100 μm, and the composition of the coating layer was 99 mass% Ag-WC, 75 mass% Ag-WC, 50 mass% Ag— from the bottom as shown in FIG. The
板厚1.2mmで3.5mm角の寸法で酸素分圧0.5MPa、内部酸化温度700°Cで48時間内部酸化させた91.7mass%Ag-5.5mass%Sn-2.5mass%In-0.3mass%Niからなる接点材料の表面にブラスト処理を行った後、プラズマジェット溶射によってコーティング層を施した。 91.7 mass% Ag-5.5mass% Sn-2.5mass% In, which was internally oxidized for 48 hours at a plate thickness of 1.2mm, dimensions of 3.5mm square, oxygen partial pressure of 0.5MPa, and internal oxidation temperature of 700 ° C. After blasting the surface of the contact material made of -0.3 mass% Ni, a coating layer was applied by plasma jet spraying.
プラズマジェット溶射の条件は、上記実施例3と同様の条件で行い、コーティング層の1層の厚さを50μm、コーティング層の組成を、図11に示す如く、下から1mass%Ag-WとAuを交互に5層のコーティング層4を施した。
Plasma jet spraying was performed under the same conditions as in Example 3 above. The thickness of one coating layer was 50 μm, and the composition of the coating layer was 1 mass% Ag—W and Au from the bottom as shown in FIG. The five
上記実施例15と同様にしてコーティング層の1層の厚さを40μm、コーティング層の組成を、図12に示す如く、下から1mass%Ag-WとAuおよびPtとして交互に7層のコーティング層4を施した。 In the same manner as in Example 15, the thickness of one coating layer is 40 μm, and the composition of the coating layer is 7 coating layers alternately as 1 mass% Ag—W, Au, and Pt from the bottom as shown in FIG. 4 was applied.
上記実施例15と同様にしてコーティング層の1層の厚さを50μm、コーティング層の組成を、図13に示す如く、下から50mass%Ag-WとAuとして交互に5層のコーティング層4を施した。 In the same manner as in Example 15, the thickness of one coating layer is 50 μm, and the composition of the coating layer is 50 mass% Ag—W and Au from the bottom as shown in FIG. gave.
上記実施例15と同様にしてコーティング層の1層の厚さを40μm、コーティング層の組成を、図14に示す如く、下から50mass%Ag-WとAuおよびPtとして交互に7層のコーティング層4を施した。 In the same manner as in Example 15 above, the thickness of one coating layer is 40 μm, and the composition of the coating layer is seven coating layers alternately as 50 mass% Ag—W, Au and Pt from the bottom as shown in FIG. 4 was applied.
上記実施例15と同様にしてコーティング層の1層の厚さを20μm、コーティング層の組成を、図15に示す如く、下から99mass%Ag-WとAuとして交互に9層のコーティング層4を施した。 In the same manner as in Example 15, the thickness of one coating layer is 20 μm, and the composition of the coating layer is 99 mass% Ag—W and Au from the bottom as shown in FIG. gave.
上記実施例15と同様にしてコーティング層の1層の厚さを20μm、コーティング層の組成を、図16に示す如く、下から99mass%Ag-WCとAuおよびPtとして交互に10層のコーティング層4を施した。 In the same manner as in Example 15, the thickness of one coating layer is 20 μm, and the composition of the coating layer is 10 coating layers alternately as 99 mass% Ag-WC, Au and Pt from the bottom as shown in FIG. 4 was applied.
上記実施例15と同様にしてコーティング層の1層の厚さを10μm、コーティング層の組成を、図17に示す如く、下から99mass%Ag-WCとNi、AgおよびCuとして交互に9層のコーティング層4を施した。
In the same manner as in Example 15, the thickness of one coating layer was 10 μm, and the composition of the coating layer was composed of 9 layers of 99 mass% Ag—WC and Ni, Ag and Cu alternately from the bottom as shown in FIG.
板厚1.2mmで3.5mm角の寸法で酸素分圧0.5MPa、内部酸化温度700°Cで48時間内部酸化させた91.7mass%Ag-5.5mass%Sn-2.5mass%In-0.3mass%Niからなる接点を作製した。 91.7 mass% Ag-5.5mass% Sn-2.5mass% In, which was internally oxidized for 48 hours at a plate thickness of 1.2mm, dimensions of 3.5mm square, oxygen partial pressure of 0.5MPa, and internal oxidation temperature of 700 ° C. A contact made of −0.3 mass% Ni was produced.
板厚1.2mmで3.5mm角の寸法で、酸素分圧0.5MPa、内部酸化温度700°Cで48時間内部酸化させた92.3mass%Ag-5mass%Sn-2.5mass%In-0.2mass%Niからなる接点を作製した。 92.3 mass% Ag-5 mass% Sn-2.5mass% In-, which was 1.2 mm thick and 3.5 mm square with an oxygen partial pressure of 0.5 MPa and an internal oxidation temperature of 700 ° C. for 48 hours. A contact made of 0.2 mass% Ni was produced.
板厚1.2mmで3.5mm角の寸法で酸素分圧0.5MPa、内部酸化温度700°Cで48時間内部酸化させた91.9mass%Ag-7mass%Sn-1mass%In-0.1mass%Niからなる接点を作製した。 91.9 mass% Ag-7 mass% Sn-1 mass% In-0.1 mass which was internally oxidized for 48 hours at a thickness of 1.2 mm, dimensions of 3.5 mm square, oxygen partial pressure of 0.5 MPa, and an internal oxidation temperature of 700 ° C. A contact made of% Ni was prepared.
上記各実施例および比較例について接点試験を行った。接点試験は、接触抵抗の測定と溶着試験(60A定格用)ならびに市販接触器による消耗量の測定(AC200V 20A)を行い、電気特性を評価した。 The contact test was conducted for each of the above examples and comparative examples. The contact test was performed by measuring contact resistance, welding test (for 60A rating), and measuring consumption by a commercially available contactor (AC200V, 20A) to evaluate electrical characteristics.
[規則26に基づく補充 08.09.2011]
1 電極
2 接点
3 電解液
4 コーティング層
1
Claims (4)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020137003235A KR20130136963A (en) | 2010-07-28 | 2011-07-27 | Electric contact material |
| CN201180036903XA CN103109338A (en) | 2010-07-28 | 2011-07-27 | Electric contact material |
| JP2012526536A JP5684809B2 (en) | 2010-07-28 | 2011-07-27 | Electrical contact material |
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| Application Number | Priority Date | Filing Date | Title |
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| JP2010-169587 | 2010-07-28 | ||
| JP2010169587 | 2010-07-28 |
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| WO2012014949A1 true WO2012014949A1 (en) | 2012-02-02 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2011/067155 Ceased WO2012014949A1 (en) | 2010-07-28 | 2011-07-27 | Electric contact material |
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| Country | Link |
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| JP (1) | JP5684809B2 (en) |
| KR (1) | KR20130136963A (en) |
| CN (1) | CN103109338A (en) |
| TW (1) | TW201229254A (en) |
| WO (1) | WO2012014949A1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014191005A1 (en) | 2013-05-31 | 2014-12-04 | Danmarks Tekniske Universitet | A wavelength tunable photon source with sealed inner volume |
| CN104882314A (en) * | 2014-02-28 | 2015-09-02 | 西门子公司 | Method for preparing Ag-Ni yl contact materials |
| US20160301188A1 (en) * | 2013-10-29 | 2016-10-13 | Hewlett Packard Enterprise Development Lp | High contrast grating optoelectronics |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102224011B1 (en) * | 2017-01-23 | 2021-03-05 | 현대자동차 주식회사 | Electrical contact material |
| KR20190070735A (en) * | 2017-12-13 | 2019-06-21 | 엘티메탈 주식회사 | Manufacturing method for electric contact material having brazing layer by thermal spray and electric contact material integrated with brazing layer prepared thereby |
| KR102013824B1 (en) * | 2018-03-13 | 2019-08-23 | 재단법인 포항산업과학연구원 | Electrical contact and manufacturing method of the same |
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|---|---|---|---|---|
| JPS56107836U (en) * | 1980-01-16 | 1981-08-21 | ||
| JPS5810319A (en) * | 1981-07-13 | 1983-01-20 | 株式会社東芝 | Composite sintered contact |
| JPH0487224A (en) * | 1990-07-27 | 1992-03-19 | Mitsubishi Electric Corp | Circuit breaker |
| JPH1068005A (en) * | 1997-05-01 | 1998-03-10 | Tokuriki Honten Co Ltd | Ag-oxide bar stock and its production |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5128153B2 (en) * | 2006-03-17 | 2013-01-23 | 古河電気工業株式会社 | Electrical contact material and manufacturing method thereof |
-
2011
- 2011-07-26 TW TW100126295A patent/TW201229254A/en unknown
- 2011-07-27 KR KR1020137003235A patent/KR20130136963A/en not_active Withdrawn
- 2011-07-27 WO PCT/JP2011/067155 patent/WO2012014949A1/en not_active Ceased
- 2011-07-27 CN CN201180036903XA patent/CN103109338A/en active Pending
- 2011-07-27 JP JP2012526536A patent/JP5684809B2/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56107836U (en) * | 1980-01-16 | 1981-08-21 | ||
| JPS5810319A (en) * | 1981-07-13 | 1983-01-20 | 株式会社東芝 | Composite sintered contact |
| JPH0487224A (en) * | 1990-07-27 | 1992-03-19 | Mitsubishi Electric Corp | Circuit breaker |
| JPH1068005A (en) * | 1997-05-01 | 1998-03-10 | Tokuriki Honten Co Ltd | Ag-oxide bar stock and its production |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014191005A1 (en) | 2013-05-31 | 2014-12-04 | Danmarks Tekniske Universitet | A wavelength tunable photon source with sealed inner volume |
| US20160301188A1 (en) * | 2013-10-29 | 2016-10-13 | Hewlett Packard Enterprise Development Lp | High contrast grating optoelectronics |
| CN104882314A (en) * | 2014-02-28 | 2015-09-02 | 西门子公司 | Method for preparing Ag-Ni yl contact materials |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20130136963A (en) | 2013-12-13 |
| CN103109338A (en) | 2013-05-15 |
| TW201229254A (en) | 2012-07-16 |
| JPWO2012014949A1 (en) | 2013-09-12 |
| JP5684809B2 (en) | 2015-03-18 |
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