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WO2012099350A3 - 상온진공과립분사 공정을 위한 취성재료 과립 및 이를 이용한 코팅층의 형성방법 - Google Patents

상온진공과립분사 공정을 위한 취성재료 과립 및 이를 이용한 코팅층의 형성방법 Download PDF

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Publication number
WO2012099350A3
WO2012099350A3 PCT/KR2012/000086 KR2012000086W WO2012099350A3 WO 2012099350 A3 WO2012099350 A3 WO 2012099350A3 KR 2012000086 W KR2012000086 W KR 2012000086W WO 2012099350 A3 WO2012099350 A3 WO 2012099350A3
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WIPO (PCT)
Prior art keywords
coating film
granules
forming
room temperature
brittle material
Prior art date
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Ceased
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PCT/KR2012/000086
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English (en)
French (fr)
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WO2012099350A4 (ko
WO2012099350A2 (ko
Inventor
박동수
김종우
류정호
윤운하
최종진
한병동
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Korea Institute of Machinery and Materials KIMM
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Korea Institute of Machinery and Materials KIMM
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Priority claimed from KR1020110130294A external-priority patent/KR101380836B1/ko
Application filed by Korea Institute of Machinery and Materials KIMM filed Critical Korea Institute of Machinery and Materials KIMM
Priority to CN201280013407.7A priority Critical patent/CN103501888B/zh
Priority to JP2013550391A priority patent/JP6101634B2/ja
Priority to US13/980,313 priority patent/US20130295272A1/en
Publication of WO2012099350A2 publication Critical patent/WO2012099350A2/ko
Publication of WO2012099350A3 publication Critical patent/WO2012099350A3/ko
Publication of WO2012099350A4 publication Critical patent/WO2012099350A4/ko
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • C—CHEMISTRY; METALLURGY
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    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C—CHEMISTRY; METALLURGY
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    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
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    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
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    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/447—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on phosphates, e.g. hydroxyapatite
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    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
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    • C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
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  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
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  • Inorganic Chemistry (AREA)
  • Medicinal Preparation (AREA)
  • Compositions Of Oxide Ceramics (AREA)

Abstract

본 발명은 상온진공과립분사 공정을 위한 취성재료 과립 및 이를 이용한 코 팅층의 형성방법에 관한 것으로, 더욱 상세하게는 0.1 내지 6 ㎛ 크기의 미립자 분말이 과립화되어 상온진공과립분사 공정을 통해 코팅층을 형성할 수 있는 것을 특징으로 하는 취성재료 과립 및 이를 이용한 코팅층의 형성방법을 제공한다. 본 발명에 따른 취성재료 과립은 상온진공과립분사 공정을 통해 과립을 공급하며 연속 적으로 코팅공정을 수행할 수 있고, 노즐을 통해 분사되는 과립의 질량이 상대적으 로 큼에 따라 높은 운동에너지를 나타내어 낮은 가스 유량에서도 코팅층을 제조할 수 있으며, 성막 속도를 증가시킬 수 있어 세라믹 코팅층 제조에 유용하게 사용할 수 있다. 또한, 본 발명에 따른 코팅층 형성방법을 통해 10% 이하의 기공율을 나타 내며, 균열이나 거대 기공 또는 층상구조와 같은 불균일성이 없는 균일한 미세구조 를 가진 코팅층을 제조할 수 있다.
PCT/KR2012/000086 2011-01-18 2012-01-04 상온진공과립분사 공정을 위한 취성재료 과립 및 이를 이용한 코팅층의 형성방법 Ceased WO2012099350A2 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN201280013407.7A CN103501888B (zh) 2011-01-18 2012-01-04 室温真空颗粒喷射的脆性材料颗粒及其形成涂膜的方法
JP2013550391A JP6101634B2 (ja) 2011-01-18 2012-01-04 常温真空顆粒噴射工程のための脆性材料顆粒を用いたコーティング層の形成方法
US13/980,313 US20130295272A1 (en) 2011-01-18 2012-01-04 Granules of a Brittle Material for Room Temperature Granule Spray in Vacuum, and Method for Forming a Coating Film Using Same

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20110005094 2011-01-18
KR10-2011-0005094 2011-01-18
KR1020110130294A KR101380836B1 (ko) 2011-01-18 2011-12-07 상온진공과립분사 공정을 위한 취성재료 과립 및 이를 이용한 코팅층의 형성방법
KR10-2011-0130294 2011-12-07

Publications (3)

Publication Number Publication Date
WO2012099350A2 WO2012099350A2 (ko) 2012-07-26
WO2012099350A3 true WO2012099350A3 (ko) 2012-12-06
WO2012099350A4 WO2012099350A4 (ko) 2013-01-24

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PCT/KR2012/000086 Ceased WO2012099350A2 (ko) 2011-01-18 2012-01-04 상온진공과립분사 공정을 위한 취성재료 과립 및 이를 이용한 코팅층의 형성방법

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Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119943946B (zh) * 2025-03-06 2025-11-28 华鼎国联四川电池材料有限公司 一种改性的磷酸锰铁锂正极材料及其制备方法和锂离子电池

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060110352A (ko) * 2004-01-22 2006-10-24 쇼와 덴코 가부시키가이샤 금속산화물 분산액, 금속산화물 전극막, 및 색소 증감 태양전지
KR20070008727A (ko) * 1999-10-12 2007-01-17 도토기키 가부시키가이샤 복합 구조물
KR20080071193A (ko) * 2005-11-23 2008-08-01 아이언우드 파마슈티컬스, 인코포레이티드 위장 장애의 치료 방법 및 치료 조성물
JP2009242942A (ja) * 2008-03-10 2009-10-22 Toto Ltd 複合構造物形成方法、調製粒子、および複合構造物形成システム

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070008727A (ko) * 1999-10-12 2007-01-17 도토기키 가부시키가이샤 복합 구조물
KR20060110352A (ko) * 2004-01-22 2006-10-24 쇼와 덴코 가부시키가이샤 금속산화물 분산액, 금속산화물 전극막, 및 색소 증감 태양전지
KR20080071193A (ko) * 2005-11-23 2008-08-01 아이언우드 파마슈티컬스, 인코포레이티드 위장 장애의 치료 방법 및 치료 조성물
JP2009242942A (ja) * 2008-03-10 2009-10-22 Toto Ltd 複合構造物形成方法、調製粒子、および複合構造物形成システム

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WO2012099350A2 (ko) 2012-07-26

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