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WO2012087044A3 - Vacuum thermal treating apparatus - Google Patents

Vacuum thermal treating apparatus Download PDF

Info

Publication number
WO2012087044A3
WO2012087044A3 PCT/KR2011/009977 KR2011009977W WO2012087044A3 WO 2012087044 A3 WO2012087044 A3 WO 2012087044A3 KR 2011009977 W KR2011009977 W KR 2011009977W WO 2012087044 A3 WO2012087044 A3 WO 2012087044A3
Authority
WO
WIPO (PCT)
Prior art keywords
treating apparatus
vacuum thermal
thermal treating
reaction vessels
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2011/009977
Other languages
French (fr)
Other versions
WO2012087044A2 (en
Inventor
Jung Eun Han
Byung Sook Kim
Kyoung Hoon Chai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Innotek Co Ltd
Original Assignee
LG Innotek Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Innotek Co Ltd filed Critical LG Innotek Co Ltd
Publication of WO2012087044A2 publication Critical patent/WO2012087044A2/en
Publication of WO2012087044A3 publication Critical patent/WO2012087044A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/03—Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/02—Feed or outlet devices therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
    • B01J4/005—Feed or outlet devices as such, e.g. feeding tubes provided with baffles
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/90—Carbides
    • C01B32/914—Carbides of single elements
    • C01B32/956—Silicon carbide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00132—Controlling the temperature using electric heating or cooling elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/0015—Controlling the temperature by thermal insulation means
    • B01J2219/00155—Controlling the temperature by thermal insulation means using insulating materials or refractories

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Muffle Furnaces And Rotary Kilns (AREA)
  • Furnace Details (AREA)

Abstract

A vacuum thermal treating apparatus includes a chamber; reaction vessels positioned in the chamber; a heating member positioned between the chamber the reaction vessels and heating the reaction vessels; and an exhaust pipe discharging the inside of the reaction vessels and including a plurality of the exhaust member formed separately.
PCT/KR2011/009977 2010-12-24 2011-12-22 Vacuum thermal treating apparatus Ceased WO2012087044A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020100134527A KR101877494B1 (en) 2010-12-24 2010-12-24 Vacuum heat treatment apparatus
KR10-2010-0134527 2010-12-24

Publications (2)

Publication Number Publication Date
WO2012087044A2 WO2012087044A2 (en) 2012-06-28
WO2012087044A3 true WO2012087044A3 (en) 2012-10-04

Family

ID=46314645

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/009977 Ceased WO2012087044A2 (en) 2010-12-24 2011-12-22 Vacuum thermal treating apparatus

Country Status (2)

Country Link
KR (1) KR101877494B1 (en)
WO (1) WO2012087044A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3029428B1 (en) * 2014-12-04 2016-12-30 Univ Nantes DEVICE FOR THE SYNTHESIS AND STUDY OF COMPOUNDS UNDER TEMPERATURES AND CONTROLLED PRESSURES
JP7381001B2 (en) * 2019-03-22 2023-11-15 三菱重工業株式会社 Hydrothermal treatment equipment

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4832781A (en) * 1988-01-07 1989-05-23 Varian Associates, Inc. Methods and apparatus for thermal transfer with a semiconductor wafer in vacuum
US5131842A (en) * 1988-12-27 1992-07-21 Kabushiki Kaisha Toshiba Corrosion resistant thermal treating apparatus
JP2005533378A (en) * 2002-07-15 2005-11-04 アヴィザ テクノロジー インコーポレイテッド Heat treatment apparatus and configurable vertical chamber
US6991684B2 (en) * 2000-09-29 2006-01-31 Tokyo Electron Limited Heat-treating apparatus and heat-treating method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002367914A (en) * 2001-06-11 2002-12-20 Tokyo Electron Ltd Heat treatment equipment
KR100864758B1 (en) * 2002-06-19 2008-10-22 오리온오엘이디 주식회사 Full color organic electroluminescent device
JP2005185883A (en) * 2003-12-24 2005-07-14 Kri Inc Purification apparatus
KR100754902B1 (en) * 2005-12-09 2007-09-04 (주) 디오브이 Purification Method of Organic Electroluminescent Material

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4832781A (en) * 1988-01-07 1989-05-23 Varian Associates, Inc. Methods and apparatus for thermal transfer with a semiconductor wafer in vacuum
US5131842A (en) * 1988-12-27 1992-07-21 Kabushiki Kaisha Toshiba Corrosion resistant thermal treating apparatus
US6991684B2 (en) * 2000-09-29 2006-01-31 Tokyo Electron Limited Heat-treating apparatus and heat-treating method
JP2005533378A (en) * 2002-07-15 2005-11-04 アヴィザ テクノロジー インコーポレイテッド Heat treatment apparatus and configurable vertical chamber

Also Published As

Publication number Publication date
KR20120072668A (en) 2012-07-04
KR101877494B1 (en) 2018-07-13
WO2012087044A2 (en) 2012-06-28

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