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WO2012070833A3 - 광경화형 수지 조성물 및 이를 이용한 자기복제성 복제몰드의 제작방법 - Google Patents

광경화형 수지 조성물 및 이를 이용한 자기복제성 복제몰드의 제작방법 Download PDF

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Publication number
WO2012070833A3
WO2012070833A3 PCT/KR2011/008908 KR2011008908W WO2012070833A3 WO 2012070833 A3 WO2012070833 A3 WO 2012070833A3 KR 2011008908 W KR2011008908 W KR 2011008908W WO 2012070833 A3 WO2012070833 A3 WO 2012070833A3
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WO
WIPO (PCT)
Prior art keywords
mold
replicatable
self
producing
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2011/008908
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English (en)
French (fr)
Other versions
WO2012070833A2 (ko
Inventor
정봉현
이봉국
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Korea Research Institute of Bioscience and Biotechnology KRIBB
Original Assignee
Korea Research Institute of Bioscience and Biotechnology KRIBB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Korea Research Institute of Bioscience and Biotechnology KRIBB filed Critical Korea Research Institute of Bioscience and Biotechnology KRIBB
Publication of WO2012070833A2 publication Critical patent/WO2012070833A2/ko
Publication of WO2012070833A3 publication Critical patent/WO2012070833A3/ko
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

본 발명은 광경화형 수지 조성물 및 이를 이용한 자기복제성 복제몰드의 제작방법에 관한 것으로, 보다 상세하게는, 화학적, 열적 및 기계적인 스트레스에 대하여 높은 내구성을 가지는 동시에 고밀도와 고종횡비를 가지는 자기복제성 복제몰드 제작용 광경화형 수지 조성물 및 이를 이용한 자기복제성 복제몰드의 제작방법에 관한 것이다. 본 발명에 따른 자기복제성 복제몰드의 제작방법은 자외선 조사를 통한 간단한 공정으로 단 시간내에 고밀도 및 고종횡비를 가지는 자기복제성 복제몰드를 제작할 수 있다. 또한, 본 발명에 따른 자기복제성 복제몰드는 화학적, 열적 및 기계적인 스트레스에 대해 높은 내구성을 가지는 동시에, 추가적인 이형제 처리 없이 저 점도성과 고 광투과성을 가질 뿐만 아니라, 유기용매에 대해서도 저팽윤, 저수축, 고가스투과성 및 고 영율 특성을 가져 임프린팅, 몰딩, 전자 인쇄 기술 등과 같은 고성능 몰드-기반 리소그래피에 유용하게 사용될 수 있다.
PCT/KR2011/008908 2010-11-23 2011-11-22 광경화형 수지 조성물 및 이를 이용한 자기복제성 복제몰드의 제작방법 Ceased WO2012070833A2 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020100116864A KR20120055242A (ko) 2010-11-23 2010-11-23 광경화형 수지 조성물 및 이를 이용한 자기복제성 복제몰드의 제작방법
KR10-2010-0116864 2010-11-23

Publications (2)

Publication Number Publication Date
WO2012070833A2 WO2012070833A2 (ko) 2012-05-31
WO2012070833A3 true WO2012070833A3 (ko) 2012-09-07

Family

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Application Number Title Priority Date Filing Date
PCT/KR2011/008908 Ceased WO2012070833A2 (ko) 2010-11-23 2011-11-22 광경화형 수지 조성물 및 이를 이용한 자기복제성 복제몰드의 제작방법

Country Status (2)

Country Link
KR (1) KR20120055242A (ko)
WO (1) WO2012070833A2 (ko)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102119596B1 (ko) * 2013-10-18 2020-06-08 엘지이노텍 주식회사 수지 조성물 및 이를 포함하는 전도성 패턴 형성용 몰드
KR101844973B1 (ko) * 2016-12-22 2018-04-03 (주)이노보 Uv 금형의 편집 방법
KR102039459B1 (ko) 2017-05-23 2019-11-01 애경화학 주식회사 고강도 및 고내열성 3d프린팅용 광경화수지 잉크 조성물
KR102048770B1 (ko) 2018-02-27 2019-11-26 애경화학 주식회사 디싸이클로펜타디엔 에폭시 아크릴레이트를 포함하는 내열성과 기계적 물성이 우수한 3d프린팅용 광경화 수지 잉크조성물
KR102105493B1 (ko) 2018-12-27 2020-04-28 애경화학 주식회사 내열성 및 인쇄특성이 우수한 3d프린트용 아이소소바이드 우레탄아크릴레이트 광경화 수지 및 이를 포함하는 3d프린트용 광경화 수지 조성물
KR102145415B1 (ko) 2019-01-30 2020-08-18 애경화학 주식회사 불포화폴리에스테르 수지를 포함하는 현상성과 수축률이 우수한 3d프린팅용 광경화수지 조성물
US11718580B2 (en) 2019-05-08 2023-08-08 Meta Platforms Technologies, Llc Fluorene derivatized monomers and polymers for volume Bragg gratings
US12386253B2 (en) * 2019-09-25 2025-08-12 Basf Coatings Gmbh Method for transferring an embossed structure to the surface of a coating, and composite employable as embossing mold
US11780819B2 (en) 2019-11-27 2023-10-10 Meta Platforms Technologies, Llc Aromatic substituted alkane-core monomers and polymers thereof for volume Bragg gratings
US11879024B1 (en) * 2020-07-14 2024-01-23 Meta Platforms Technologies, Llc Soft mold formulations for surface relief grating fabrication with imprinting lithography
KR102510805B1 (ko) 2020-12-29 2023-03-17 애경케미칼주식회사 바이오매스 유래 1,5-펜타메틸렌디이소시아네이트-이소시아누레이트-아크릴레이트화합물을 포함하는 3d 광경화수지 조성물
KR102470021B1 (ko) 2020-12-29 2022-11-23 애경케미칼주식회사 수용화도가 우수하여 미반응물의 제거가 용이한 아미노 술폰산 변성 1,6-헥사메틸렌디이소시아네이트-이소시아누레이트-아크릴레이트화합물을 포함하는 3d 광경화수지 조성물
KR102569223B1 (ko) 2021-06-02 2023-08-22 애경케미칼주식회사 1,6-헥사메틸렌디이소시아네이트와 2,4-톨루엔디이소시아네이트의 이소시아누레이트형 삼량체 구조를 가지는 우레탄아크릴레이트 화합물 및 이를 이용한 고강도 및 고내열성 3d 광경화 조성물
KR102669493B1 (ko) * 2021-12-29 2024-05-27 경북대학교 산학협력단 포아송 효과를 이용한 3d 미세구조 복제방법

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KR20120055242A (ko) 2012-05-31
WO2012070833A2 (ko) 2012-05-31

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