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WO2011014027A3 - Composition de nettoyage fluide et procédé de nettoyage pour panneau à l'aide de cette composition - Google Patents

Composition de nettoyage fluide et procédé de nettoyage pour panneau à l'aide de cette composition Download PDF

Info

Publication number
WO2011014027A3
WO2011014027A3 PCT/KR2010/005002 KR2010005002W WO2011014027A3 WO 2011014027 A3 WO2011014027 A3 WO 2011014027A3 KR 2010005002 W KR2010005002 W KR 2010005002W WO 2011014027 A3 WO2011014027 A3 WO 2011014027A3
Authority
WO
WIPO (PCT)
Prior art keywords
fluid composition
cleaning
panel
same
cleaning fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2010/005002
Other languages
English (en)
Korean (ko)
Other versions
WO2011014027A2 (fr
Inventor
홍형표
홍헌표
김태희
박면규
윤효중
김병묵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongwoo Fine Chem Co Ltd
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020090069506A external-priority patent/KR20110011996A/ko
Priority claimed from KR1020090069505A external-priority patent/KR20110011995A/ko
Priority claimed from KR1020090073683A external-priority patent/KR20110016136A/ko
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Priority to JP2012522766A priority Critical patent/JP5890306B2/ja
Priority to CN201080038438.9A priority patent/CN102639686B/zh
Publication of WO2011014027A2 publication Critical patent/WO2011014027A2/fr
Publication of WO2011014027A3 publication Critical patent/WO2011014027A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/28—Heterocyclic compounds containing nitrogen in the ring
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Detergent Compositions (AREA)
  • Liquid Crystal (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

La présente invention concerne une composition du nettoyage fluide pour des dispositifs d'affichage à panneaux plats, cette composition comprenant : (a) entre 0,05 et 5 % en poids d'un composé amine; (b) de 0,01 à 10 % en poids d'un additif comprenant au moins un ou deux composants sélectionnés dans le groupe comprenant des composés à base d'azole, des sels d'alcanolamine et des agents de réduction; et (c) le reste étant de l'eau.
PCT/KR2010/005002 2009-07-29 2010-07-29 Composition de nettoyage fluide et procédé de nettoyage pour panneau à l'aide de cette composition Ceased WO2011014027A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012522766A JP5890306B2 (ja) 2009-07-29 2010-07-29 洗浄液組成物及びこれを用いたパネルの洗浄方法
CN201080038438.9A CN102639686B (zh) 2009-07-29 2010-07-29 清洁组成物及使用该组成物清洁面板的方法

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
KR10-2009-0069505 2009-07-29
KR1020090069506A KR20110011996A (ko) 2009-07-29 2009-07-29 세정액 조성물 및 이를 이용한 세정방법
KR10-2009-0069506 2009-07-29
KR1020090069505A KR20110011995A (ko) 2009-07-29 2009-07-29 세정액 조성물 및 이를 이용한 세정방법
KR10-2009-0073683 2009-08-11
KR1020090073683A KR20110016136A (ko) 2009-08-11 2009-08-11 세정액 조성물 및 이를 이용한 세정방법

Publications (2)

Publication Number Publication Date
WO2011014027A2 WO2011014027A2 (fr) 2011-02-03
WO2011014027A3 true WO2011014027A3 (fr) 2011-06-16

Family

ID=43529887

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/005002 Ceased WO2011014027A2 (fr) 2009-07-29 2010-07-29 Composition de nettoyage fluide et procédé de nettoyage pour panneau à l'aide de cette composition

Country Status (4)

Country Link
JP (1) JP5890306B2 (fr)
CN (1) CN102639686B (fr)
TW (1) TWI481706B (fr)
WO (1) WO2011014027A2 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI491729B (zh) * 2011-08-31 2015-07-11 Dongwoo Fine Chem Co Ltd 清洗組成物
CA2941253A1 (fr) * 2014-03-27 2015-10-01 Frank Hulskotter Compositions de nettoyage contenant une polyetheramine
CN109074002A (zh) * 2016-03-30 2018-12-21 日产化学株式会社 抗蚀剂图案被覆用水溶液以及使用了该水溶液的图案形成方法
CN110198932B (zh) * 2017-01-26 2023-04-07 东曹株式会社 烷醇胺、减摩剂、以及润滑油组合物
WO2024250132A1 (fr) 2023-06-05 2024-12-12 Dow Global Technologies Llc Compositions de nettoyage à pipérazines n-substituées

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000232063A (ja) * 1998-12-09 2000-08-22 Kishimoto Sangyo Co Ltd レジスト残渣除去剤
JP2005154558A (ja) * 2003-11-25 2005-06-16 Kishimoto Sangyo Co Ltd 洗浄剤
KR100599849B1 (ko) * 2003-01-07 2006-07-13 토소가부시키가이샤 세정액 및 그것을 이용한 세정방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4304909B2 (ja) * 2002-04-03 2009-07-29 東ソー株式会社 洗浄剤及びそれを用いた洗浄方法
US6951710B2 (en) * 2003-05-23 2005-10-04 Air Products And Chemicals, Inc. Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof
JP2005336342A (ja) * 2004-05-27 2005-12-08 Tosoh Corp 洗浄用組成物
US7888302B2 (en) * 2005-02-03 2011-02-15 Air Products And Chemicals, Inc. Aqueous based residue removers comprising fluoride
KR101251594B1 (ko) * 2006-03-23 2013-04-08 주식회사 동진쎄미켐 레지스트 스트리퍼 제거용 케미칼 린스 조성물
JP4692497B2 (ja) * 2007-02-28 2011-06-01 ナガセケムテックス株式会社 フォトレジスト剥離剤組成物
JP4716225B2 (ja) * 2007-05-15 2011-07-06 ナガセケムテックス株式会社 フォトレジスト剥離剤組成物
JP2009021377A (ja) * 2007-07-11 2009-01-29 Yushiro Chem Ind Co Ltd 電子材料用洗浄剤組成物及び電子材料の洗浄方法
TW200925800A (en) * 2007-12-06 2009-06-16 Mallinckrodt Baker Inc Fluoride-free photoresist stripper or residue removing cleaning compositions containing conjugate oligomeric or polymeric material of alpha-hydroxycarbonyl compound/amine or ammonia reaction
WO2009078123A1 (fr) * 2007-12-17 2009-06-25 Sanyo Chemical Industries, Ltd. Agent de nettoyage et procédé de nettoyage pour matériau électronique

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000232063A (ja) * 1998-12-09 2000-08-22 Kishimoto Sangyo Co Ltd レジスト残渣除去剤
KR100599849B1 (ko) * 2003-01-07 2006-07-13 토소가부시키가이샤 세정액 및 그것을 이용한 세정방법
JP2005154558A (ja) * 2003-11-25 2005-06-16 Kishimoto Sangyo Co Ltd 洗浄剤

Also Published As

Publication number Publication date
CN102639686A (zh) 2012-08-15
TWI481706B (zh) 2015-04-21
WO2011014027A2 (fr) 2011-02-03
CN102639686B (zh) 2014-09-03
JP2013500601A (ja) 2013-01-07
JP5890306B2 (ja) 2016-03-22
TW201109435A (en) 2011-03-16

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