[go: up one dir, main page]

WO2011014027A3 - Cleaning fluid composition and a cleaning method for a panel using the same - Google Patents

Cleaning fluid composition and a cleaning method for a panel using the same Download PDF

Info

Publication number
WO2011014027A3
WO2011014027A3 PCT/KR2010/005002 KR2010005002W WO2011014027A3 WO 2011014027 A3 WO2011014027 A3 WO 2011014027A3 KR 2010005002 W KR2010005002 W KR 2010005002W WO 2011014027 A3 WO2011014027 A3 WO 2011014027A3
Authority
WO
WIPO (PCT)
Prior art keywords
fluid composition
cleaning
panel
same
cleaning fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2010/005002
Other languages
French (fr)
Korean (ko)
Other versions
WO2011014027A2 (en
Inventor
홍형표
홍헌표
김태희
박면규
윤효중
김병묵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongwoo Fine Chem Co Ltd
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020090069506A external-priority patent/KR20110011996A/en
Priority claimed from KR1020090069505A external-priority patent/KR20110011995A/en
Priority claimed from KR1020090073683A external-priority patent/KR20110016136A/en
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Priority to JP2012522766A priority Critical patent/JP5890306B2/en
Priority to CN201080038438.9A priority patent/CN102639686B/en
Publication of WO2011014027A2 publication Critical patent/WO2011014027A2/en
Publication of WO2011014027A3 publication Critical patent/WO2011014027A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/28—Heterocyclic compounds containing nitrogen in the ring
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Detergent Compositions (AREA)
  • Liquid Crystal (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

The present invention relates to a cleaning fluid composition for flat-panel display devices, comprising: (a) between 0.05 and 5 wt.% of an amine compound; (b) from 0.01 to 10 wt.% of an additive comprising one or two or more components selected from the group consisting of azole-based compounds, alkanol amine salts and reducing agents; and (c) a balance of water.
PCT/KR2010/005002 2009-07-29 2010-07-29 Cleaning fluid composition and a cleaning method for a panel using the same Ceased WO2011014027A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012522766A JP5890306B2 (en) 2009-07-29 2010-07-29 Cleaning liquid composition and panel cleaning method using the same
CN201080038438.9A CN102639686B (en) 2009-07-29 2010-07-29 Cleaning fluid composition and a cleaning method for a panel using the same

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
KR10-2009-0069505 2009-07-29
KR1020090069506A KR20110011996A (en) 2009-07-29 2009-07-29 Cleaning liquid composition and cleaning method using the same
KR10-2009-0069506 2009-07-29
KR1020090069505A KR20110011995A (en) 2009-07-29 2009-07-29 Cleaning liquid composition and cleaning method using the same
KR10-2009-0073683 2009-08-11
KR1020090073683A KR20110016136A (en) 2009-08-11 2009-08-11 Cleaning liquid composition and cleaning method using the same

Publications (2)

Publication Number Publication Date
WO2011014027A2 WO2011014027A2 (en) 2011-02-03
WO2011014027A3 true WO2011014027A3 (en) 2011-06-16

Family

ID=43529887

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/005002 Ceased WO2011014027A2 (en) 2009-07-29 2010-07-29 Cleaning fluid composition and a cleaning method for a panel using the same

Country Status (4)

Country Link
JP (1) JP5890306B2 (en)
CN (1) CN102639686B (en)
TW (1) TWI481706B (en)
WO (1) WO2011014027A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI491729B (en) * 2011-08-31 2015-07-11 Dongwoo Fine Chem Co Ltd Cleaning composition
CA2941253A1 (en) * 2014-03-27 2015-10-01 Frank Hulskotter Cleaning compositions containing a polyetheramine
CN109074002A (en) * 2016-03-30 2018-12-21 日产化学株式会社 The coating aqueous solution of resist pattern and the pattern forming method for having used the aqueous solution
CN110198932B (en) * 2017-01-26 2023-04-07 东曹株式会社 Alkanolamine, friction reducer, and lubricating oil composition
WO2024250132A1 (en) 2023-06-05 2024-12-12 Dow Global Technologies Llc Cleaning compositions with n-substituted piperazines

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000232063A (en) * 1998-12-09 2000-08-22 Kishimoto Sangyo Co Ltd Resist residual removal agent
JP2005154558A (en) * 2003-11-25 2005-06-16 Kishimoto Sangyo Co Ltd Detergent
KR100599849B1 (en) * 2003-01-07 2006-07-13 토소가부시키가이샤 Cleaning material and method for cleaning using it

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4304909B2 (en) * 2002-04-03 2009-07-29 東ソー株式会社 Cleaning agent and cleaning method using the same
US6951710B2 (en) * 2003-05-23 2005-10-04 Air Products And Chemicals, Inc. Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof
JP2005336342A (en) * 2004-05-27 2005-12-08 Tosoh Corp Cleaning composition
US7888302B2 (en) * 2005-02-03 2011-02-15 Air Products And Chemicals, Inc. Aqueous based residue removers comprising fluoride
KR101251594B1 (en) * 2006-03-23 2013-04-08 주식회사 동진쎄미켐 Chemical rinse composition for removing resist stripper
JP4692497B2 (en) * 2007-02-28 2011-06-01 ナガセケムテックス株式会社 Photoresist stripper composition
JP4716225B2 (en) * 2007-05-15 2011-07-06 ナガセケムテックス株式会社 Photoresist stripper composition
JP2009021377A (en) * 2007-07-11 2009-01-29 Yushiro Chem Ind Co Ltd Cleaning composition for electronic material and cleaning method for electronic material
TW200925800A (en) * 2007-12-06 2009-06-16 Mallinckrodt Baker Inc Fluoride-free photoresist stripper or residue removing cleaning compositions containing conjugate oligomeric or polymeric material of alpha-hydroxycarbonyl compound/amine or ammonia reaction
WO2009078123A1 (en) * 2007-12-17 2009-06-25 Sanyo Chemical Industries, Ltd. Cleaning agent and cleaning method for electronic material

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000232063A (en) * 1998-12-09 2000-08-22 Kishimoto Sangyo Co Ltd Resist residual removal agent
KR100599849B1 (en) * 2003-01-07 2006-07-13 토소가부시키가이샤 Cleaning material and method for cleaning using it
JP2005154558A (en) * 2003-11-25 2005-06-16 Kishimoto Sangyo Co Ltd Detergent

Also Published As

Publication number Publication date
CN102639686A (en) 2012-08-15
TWI481706B (en) 2015-04-21
WO2011014027A2 (en) 2011-02-03
CN102639686B (en) 2014-09-03
JP2013500601A (en) 2013-01-07
JP5890306B2 (en) 2016-03-22
TW201109435A (en) 2011-03-16

Similar Documents

Publication Publication Date Title
WO2009125222A3 (en) Antimicrobial system
IN2012DN05233A (en)
PH12013500365A1 (en) Anti-infective agents and uses thereof
WO2007077560A3 (en) Cryoprotective compositions and methods of using same
WO2011084553A3 (en) Compositions and uses of cis-1,1,1,4,4,4-hexafluoro-2-butene
WO2010053573A3 (en) Screen for inhibitors of filovirus and uses therefor
WO2009094407A3 (en) Fungicidal amides
MY161562A (en) Rinse liquid for lithography and pattern formation method using the same
WO2008112939A3 (en) Composition and method for making oligo-benzamide compounds
UA101912C2 (en) Fungicidal composition
ZA200903305B (en) Concentrated Surfactant Compositions
MX2009003834A (en) Pyrrolydine derivatives as iap inhibitors.
WO2008027264A3 (en) Disinfectant systems and methods
WO2007107966A3 (en) Hydrogenated castor oil based compositions as a replacement for petrolatum
WO2012082580A3 (en) Fungicidal azocyclic amides
WO2010139656A3 (en) Synergistic fungicidal mixtures
WO2009060026A3 (en) Herbicidal composition comprising an aminophosphate or aminophosphonate salt and a viscosity reducing agent
MY161098A (en) Liquid detergent composition
WO2010033543A3 (en) Substituted benzamides as cannabinoid receptor ligands
WO2012021164A3 (en) Agricultural pesticide compositions
WO2011014027A3 (en) Cleaning fluid composition and a cleaning method for a panel using the same
WO2011103610A3 (en) Plant protection agent
WO2009055629A3 (en) Cyclohexeneamide derivatives and their use as trpv1 antagonist
MX346980B (en) New hexahydrocyclopentapyrrolone, hexahydropyrrolopyrrolone, octahydropyrrolopyridinone and octahydropyridinone compounds.
WO2007122792A3 (en) Biofilm formation inhibitor composition

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 201080038438.9

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10804740

Country of ref document: EP

Kind code of ref document: A2

NENP Non-entry into the national phase

Ref country code: DE

WWE Wipo information: entry into national phase

Ref document number: 2012522766

Country of ref document: JP

122 Ep: pct application non-entry in european phase

Ref document number: 10804740

Country of ref document: EP

Kind code of ref document: A2