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WO2011059280A3 - Nonaqueous resist stripper composition - Google Patents

Nonaqueous resist stripper composition Download PDF

Info

Publication number
WO2011059280A3
WO2011059280A3 PCT/KR2010/008043 KR2010008043W WO2011059280A3 WO 2011059280 A3 WO2011059280 A3 WO 2011059280A3 KR 2010008043 W KR2010008043 W KR 2010008043W WO 2011059280 A3 WO2011059280 A3 WO 2011059280A3
Authority
WO
WIPO (PCT)
Prior art keywords
weight
stripper composition
resist stripper
nonaqueous
flat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2010/008043
Other languages
French (fr)
Korean (ko)
Other versions
WO2011059280A2 (en
Inventor
박면규
김정현
이승용
김병묵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dongwoo Fine Chem Co Ltd
Original Assignee
Dongwoo Fine Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongwoo Fine Chem Co Ltd filed Critical Dongwoo Fine Chem Co Ltd
Priority to JP2012538766A priority Critical patent/JP2013511063A/en
Priority to CN2010800366465A priority patent/CN102667628A/en
Publication of WO2011059280A2 publication Critical patent/WO2011059280A2/en
Publication of WO2011059280A3 publication Critical patent/WO2011059280A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

The present invention relates to a nonaqueous resist stripper composition comprising: (a) 5-30% by weight of a basic compound; (b) 20-80% by weight of an amide compound; (c) 10-70% by weight of a polar solvent; and (d) 0.0-10% by weight of an alkanolamine salt. The present invention provides a new resist stripper composition which can effectively remove, in a short time and without corrosion, the etching residue and resist transformed during a process of manufacturing a thin-film transistor used in a flat-panel display to realize the high resolution of the flat-panel display.
PCT/KR2010/008043 2009-11-16 2010-11-15 Nonaqueous resist stripper composition Ceased WO2011059280A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012538766A JP2013511063A (en) 2009-11-16 2010-11-15 Non-aqueous resist stripping composition
CN2010800366465A CN102667628A (en) 2009-11-16 2010-11-15 Nonaqueous resist stripper composition

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2009-0110133 2009-11-16
KR1020090110133A KR20110053557A (en) 2009-11-16 2009-11-16 Resist stripper composition

Publications (2)

Publication Number Publication Date
WO2011059280A2 WO2011059280A2 (en) 2011-05-19
WO2011059280A3 true WO2011059280A3 (en) 2011-10-20

Family

ID=43992253

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/008043 Ceased WO2011059280A2 (en) 2009-11-16 2010-11-15 Nonaqueous resist stripper composition

Country Status (5)

Country Link
JP (1) JP2013511063A (en)
KR (1) KR20110053557A (en)
CN (1) CN102667628A (en)
TW (1) TW201132616A (en)
WO (1) WO2011059280A2 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101879576B1 (en) * 2011-06-29 2018-07-18 동우 화인켐 주식회사 Cleaning solution composition for offset-printing cliche and cleaning method using the same
KR101978521B1 (en) * 2012-10-05 2019-05-15 동우 화인켐 주식회사 A photoresist stripper composition restraining galvanic corrosion
KR102032321B1 (en) * 2012-11-13 2019-10-15 동우 화인켐 주식회사 A resist stripper composition for preventing unevenness
KR101988668B1 (en) * 2013-03-15 2019-06-12 동우 화인켐 주식회사 Cleaning composition for removing color resist and organic insulating layer
TWI518467B (en) * 2013-11-15 2016-01-21 達興材料股份有限公司 Photoresist stripper composition, electronic device and method of fabricating the same
KR102529951B1 (en) * 2015-12-14 2023-05-08 삼성디스플레이 주식회사 Composition for photoresist stripper and method of manufacturing thin film transistor array using the composition
KR102028120B1 (en) * 2016-03-07 2019-10-02 동우 화인켐 주식회사 Resist stripper composition
KR102422264B1 (en) * 2016-03-11 2022-07-18 주식회사 이엔에프테크놀로지 Thinner composition
KR102527635B1 (en) * 2016-03-14 2023-05-02 주식회사 이엔에프테크놀로지 Thinner composition
BR112019004949A2 (en) * 2016-09-28 2019-06-25 Dow Global Technologies Llc solvents for use in the electronics industry
CN108424818A (en) * 2017-02-14 2018-08-21 东友精细化工有限公司 Cleaning masks liquid composition
KR102002276B1 (en) * 2019-05-03 2019-07-19 동우 화인켐 주식회사 A photoresist stripper composition restraining galvanic corrosion
TWI809992B (en) * 2021-07-27 2023-07-21 元瀚材料股份有限公司 Photoresist removing composition and method for using the same
WO2025086185A1 (en) * 2023-10-26 2025-05-01 Dow Global Technologies Llc Solvent mixture

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002351093A (en) * 2001-05-22 2002-12-04 Nagase Chemtex Corp Composition for stripping resist
JP2004287288A (en) * 2003-03-24 2004-10-14 Nagase Chemtex Corp Resist stripping composition and method for stripping resist
JP2005070230A (en) * 2003-08-21 2005-03-17 Nagase Chemtex Corp Resist stripping composition and resist stripping method
KR20060123714A (en) * 2003-08-28 2006-12-04 소니 가부시끼 가이샤 Photoresist stripper composition of a substrate containing silver and / or a silver alloy, a method of manufacturing a pattern using the same, and a display device including the same
KR20080066322A (en) * 2007-01-12 2008-07-16 동우 화인켐 주식회사 Resist stripper composition and method of peeling resist using same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3929518B2 (en) * 1995-11-30 2007-06-13 東京応化工業株式会社 Stripping composition for resist
CN100364061C (en) * 2003-06-04 2008-01-23 花王株式会社 Stripping agent composition and stripping cleaning method using the stripping agent composition
CN101017333A (en) * 2006-02-06 2007-08-15 东进世美肯株式会社 Positive photosensitive resist release agent compositions
KR101403515B1 (en) * 2006-06-22 2014-06-09 주식회사 동진쎄미켐 Composition for removing photoresist

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002351093A (en) * 2001-05-22 2002-12-04 Nagase Chemtex Corp Composition for stripping resist
JP2004287288A (en) * 2003-03-24 2004-10-14 Nagase Chemtex Corp Resist stripping composition and method for stripping resist
JP2005070230A (en) * 2003-08-21 2005-03-17 Nagase Chemtex Corp Resist stripping composition and resist stripping method
KR20060123714A (en) * 2003-08-28 2006-12-04 소니 가부시끼 가이샤 Photoresist stripper composition of a substrate containing silver and / or a silver alloy, a method of manufacturing a pattern using the same, and a display device including the same
KR20080066322A (en) * 2007-01-12 2008-07-16 동우 화인켐 주식회사 Resist stripper composition and method of peeling resist using same

Also Published As

Publication number Publication date
KR20110053557A (en) 2011-05-24
TW201132616A (en) 2011-10-01
WO2011059280A2 (en) 2011-05-19
CN102667628A (en) 2012-09-12
JP2013511063A (en) 2013-03-28

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