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WO2010029997A1 - Cadre pelliculaire, pellicule et procédé d'utilisation de cadre pelliculaire - Google Patents

Cadre pelliculaire, pellicule et procédé d'utilisation de cadre pelliculaire Download PDF

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Publication number
WO2010029997A1
WO2010029997A1 PCT/JP2009/065919 JP2009065919W WO2010029997A1 WO 2010029997 A1 WO2010029997 A1 WO 2010029997A1 JP 2009065919 W JP2009065919 W JP 2009065919W WO 2010029997 A1 WO2010029997 A1 WO 2010029997A1
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WO
WIPO (PCT)
Prior art keywords
pellicle
pellicle frame
frame
film
long side
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2009/065919
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English (en)
Japanese (ja)
Inventor
慎太郎 北島
芳真 栗山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Original Assignee
Asahi Kasei E Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei E Materials Corp filed Critical Asahi Kasei E Materials Corp
Priority to JP2010528762A priority Critical patent/JP4886070B2/ja
Priority to KR1020137010747A priority patent/KR101390007B1/ko
Priority to CN200980133492.9A priority patent/CN102132210B/zh
Priority to KR1020117004478A priority patent/KR101287700B1/ko
Publication of WO2010029997A1 publication Critical patent/WO2010029997A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
    • H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment

Definitions

  • the present invention prevents foreign matter from adhering to a photomask or a reticle used in a lithography process when manufacturing a thin film transistor (TFT), a color filter (CF), or the like constituting an LSI or a liquid crystal display (LCD).
  • Frame which is a constituent member of a pellicle used in a pellicle, in particular, a pellicle frame that is a constituent member of a super-large pellicle having a long side length exceeding 1400 mm, a pellicle using the pellicle frame, and use of the pellicle frame Regarding the method.
  • the present invention relates to a frame and a pellicle that are constituent members of the pellicle.
  • the pellicle will be described. 2. Description of the Related Art
  • a pellicle is a transparent polymer film (hereinafter referred to as nitrocellulose, cellulose derivative, or fluoropolymer) having a thickness of 10 ⁇ m or less on the upper surface of a frame having a shape matching the shape of a photomask or reticle, for example.
  • the pellicle film is spread and adhered, and an adhesive material is applied to the lower surface of the frame body, and a protective film is adhered to the adhesive material with a predetermined adhesive force.
  • the pressure-sensitive adhesive is for fixing the pellicle to a photomask or reticle, and the protective film is used to maintain the adhesive strength of the pressure-sensitive adhesive until the pressure-sensitive adhesive is used for that purpose. It protects the adhesive surface.
  • a pellicle is generally supplied from the manufacturer that manufactures the pellicle to the manufacturer that manufactures the photomask or reticle, where the pellicle is attached to the photomask or reticle, and then the semiconductor manufacturer, the panel manufacturer, etc. Supplied to manufacturers who perform lithography.
  • a large color TFT LCD Thin Film Transistor Liquid Crystal Display
  • a pellicle frame applicable to a large photomask or reticle used in a photolithography process such as a large TFTLCD (Thin Film Transistor Liquid Crystal Display)
  • TFTLCD Thin Film Transistor Liquid Crystal Display
  • a rectangular shape having a long side and a short side is generally used.
  • the side of the frame is distorted inward due to the tension of the pellicle film, and the effective exposure area of the photomask or reticle may be reduced due to this distortion.
  • the phenomenon becomes more prominent as the stretched area of the pellicle film increases (the pecryl film increases).
  • Such a phenomenon has been solved by increasing the rigidity of the pellicle frame while maintaining the area inside the pellicle frame (hereinafter referred to as an effective area) as much as possible (see, for example, Patent Document 1). ).
  • the frame of the pellicle should follow the bending of the mask or the like on the long side. Is required.
  • the present invention is intended to solve a new problem caused by the enlargement of the pellicle, and the first invention is that the pellicle frame is distorted when the pellicle film is stretched and bonded. Furthermore, the problem to be solved is that the pellicle frame itself follows the bending due to its own weight even after the pellicle is attached to the mask. Furthermore, the ultra-large pellicle is also required to have a characteristic that the frame body is not distorted during handling until the pellicle film is spread and bonded to the pellicle frame body and then attached to the mask.
  • the pellicle frame is not distorted when the pellicle film is stretched and bonded, and handling is performed until the pellicle frame is bonded to the mask after the pellicle film is stretched and bonded to the pellicle frame.
  • the frame body is not distorted, and the pellicle frame body itself follows the bending due to its own weight even after the pellicle is stuck to the mask.
  • the present inventors have intensively studied and found that the above-mentioned problems can be solved by specifying the distortion ⁇ and followability ⁇ of the frame of the super-large pellicle.
  • the present invention has been completed.
  • the present inventors have found that the above problem can be solved by widening the width Wb of the short side 1b of the pellicle frame body at a specific ratio with respect to the width Wa of the long side 1a. It came to complete. That is, the present invention is as follows.
  • a rectangular pellicle frame wherein the pellicle frame has a distortion ⁇ of 0.06% or less, and the following ⁇ of each side of the pellicle frame represented by the following general formula (1) is 3 mm.
  • the followability ⁇ of the long side of the pellicle frame is 32 mm or less
  • the length of the long side of the frame is 1400 mm or more and 2100 mm or less
  • the area inside the pellicle frame is 15000 cm 2 or more.
  • ⁇ (1 / pellicle deflection) ⁇ thickness ⁇ width (1)
  • the surface of the pellicle frame is subjected to sealing treatment of the opening of micro holes formed by alumite treatment, blackening treatment and alumite treatment, and there is substantially no micro crack (1) to ( 4)
  • (6) A pellicle obtained by spreading a pellicle film on the pellicle frame according to any one of (1) to (5).
  • the pellicle frame of the pellicle according to (6) is attached to a mask by gripping at least one part of each of the short sides of the pair of short sides facing each other.
  • the frame body of the present invention Since the pellicle frame body of the present invention has appropriate rigidity and flexibility, the frame body is not distorted when the pellicle film is spread and bonded to the pellicle frame body, and the effective exposure expressed by the area inside the pellicle It does not reduce the area. In addition, since the pellicle can follow the bending of the mask even after the pellicle is attached to the mask, an air path does not occur on the bonding surface between the mask and the pellicle. Further, in the second invention, the frame body is not distorted during handling until the pellicle film is spread and bonded to the pellicle frame body and then adhered to the mask.
  • the pellicle frame of the present invention has a remarkable effect in the case of an ultra-large pellicle. Specifically, the pellicle frame has a remarkable effect in the case of an ultra-large pellicle having an effective area of 15000 cm 2 or more.
  • FIG. 1 is a perspective view showing a configuration of a pellicle frame body and a pellicle using the same according to the present invention. It is sectional drawing of the surface perpendicular
  • FIG. 2 is a cross-sectional view of a surface perpendicular to the longitudinal direction of the short side of the pellicle frame of FIG. 1. It is explanatory drawing which shows the initial length of the measurement side of a pellicle frame. It is explanatory drawing which shows the state in which the pellicle frame was supported and bent. It is explanatory drawing which shows the length after the support of the measurement side of a pellicle frame. It is explanatory drawing which shows the state by which the pellicle frame was supported by the stand.
  • the shape of the pellicle frame of the present invention is a rectangle similar to the mask shape.
  • the long side of the pellicle frame refers to the longest side of the frame, and the short side of the pellicle frame refers to the shortest side of the frame. More specifically, in the case of a rectangle, the longer side of the two orthogonal sides is the longer side and the shorter side is the shorter side, and in the case of a square, all four sides have the same length. In the case of a square, any side may be defined as a long side and a short side.
  • the distortion ⁇ is represented by the following general formula (2). This distortion ⁇ is measured as follows. Hereinafter, the measuring method of distortion property (alpha) is demonstrated using FIG. 4A, FIG. 4B, FIG. 4C, and FIG.
  • the length of one side (length in the initial state) L1 (shown in FIG. 4A) of the pellicle frame body 1 for which the distortion ⁇ is to be measured is measured.
  • the lower surfaces (the upper surfaces are not touched) of the two opposite sides that do not measure the distortion ⁇ in the pellicle frame body 1 are supported by the base 20.
  • the entire side where the distortion ⁇ is not measured is supported from below and is supported up to 15 mm from the end of the pellicle frame 1.
  • the entire long side is supported by the base 20 from below so that the long side is not bent.
  • the entire short side is supported by the base 20 from below. Hold in this state for 10 minutes (shown in FIG. 4B), then stop the support, leave the pellicle frame straight on a flat table, and measure the length of one side to be measured after 10 minutes (after support)
  • the length (after applying force due to its own weight)) L2 (shown in FIG. 4C) is measured again, and the elongation ratio of the length L2 after support to the length L2 in the initial state is calculated from the following equation to obtain distortion.
  • ⁇ be.
  • the measurement temperature is 23.8 ° C. and the relative humidity is 74% RH.
  • the distortion value ⁇ of the pellicle frame is defined as the value having the largest distortion factor ⁇ .
  • the lower limit of distortion property ⁇ of the pellicle frame may be 0% or more, but the upper limit is 0.06% or less, preferably 0.02% or less, and most preferably 0.01% or less.
  • the followability ⁇ indicating the followability to the mask of the pellicle frame is represented by the following general formula (1), and the lower limit of ⁇ on each side of the pellicle frame is 3 mm or more, more preferably 4 mm or more, The upper limit of the followability of the long side of the pellicle frame is 32 mm or less, preferably 25 mm or less.
  • the followability of the short side of the pellicle frame is preferably 100 mm or less, more preferably 80 mm or less, and particularly preferably 50 mm or less.
  • ⁇ (1 / pellicle deflection) ⁇ thickness ⁇ width (1)
  • the method for measuring the follow-up ⁇ is as follows. First, as shown in FIG. 5, the lower surfaces of the two opposite sides that do not measure the followability ⁇ in the pellicle frame 1 are supported by the base 20. At this time, the entire side where the follow-up ⁇ is not measured is supported from below and is supported up to 15 mm from the end of the pellicle frame 1. For example, when measuring the short side of the pellicle frame 1, the entire long side is supported by the base 20 from below so that the long side is not bent. When measuring the long side of the pellicle frame 1, the entire short side is supported by the base 20 from below. In this state, after holding for 10 minutes, as shown in FIG.
  • the amount of change from the initial position of the most bent portion of the side to be measured is measured, and the amount of change is determined as the amount of bending of the pellicle.
  • ⁇ T the reciprocal of the amount of deflection ⁇ T is multiplied by the thickness and width of the side to be measured to obtain the followability ⁇ .
  • the following ⁇ is measured for all sides of the pellicle frame 1. When the width of the side is different between the upper surface and the bottom surface, the followability ⁇ is measured with the surface having the wider side being down. The measurement of the followability ⁇ is performed simultaneously with the measurement of the distortion property ⁇ .
  • This followability ⁇ is an index representing flexibility indicating how much the deflection of the pellicle frame can follow the deflection of the mask. Therefore, it can be said that the smaller the numerical value, the higher the followability, but if the followability is too high, wrinkles will occur when the pellicle film is extended or handled, so it is necessary to be within the above range.
  • the lower limit of the thickness of the pellicle frame is preferably 4.0 mm or more, more preferably the lower limit is 5.0 mm or more, and particularly preferably 6.0 mm or more.
  • the upper limit is preferably 10 mm or less, more preferably 8 mm or less, still more preferably 7 mm or less, and particularly preferably 6.5 mm or less.
  • the width of the pellicle frame is preferably 13 mm or more, more preferably 14 mm or more, and further preferably 16 mm or more.
  • One upper limit is preferably 30 mm or less, more preferably 25 mm or less, and still more preferably 19 mm or less.
  • the width may be the same as the width of either the long side or the short side, or may be an independent width.
  • the width of the side of the pellicle frame refers to the maximum width of each side such as the widths Wa and Wb as shown in FIGS.
  • the cross-sectional shape of each side of the pellicle frame body is not particularly limited, such as a rectangular shape, an H shape, or a T shape, but the rectangular shape is most preferable.
  • the cross section may be a hollow structure.
  • the pellicle frame of the present invention has a remarkable effect as it becomes very large. Specifically, the length of the long side of the pellicle frame is 1400 mm or more, particularly 1700 mm or more and 2100 mm or less. Is 16000 cm 2 or more, 24000 cm 2 or more, particularly 25000 cm 2 or more. Although the pellicle frame of the present invention has a significant effect when it is large, it is sufficient that the upper limit of the effective area is 35000 cm 2 because of the size required for masks used in the manufacture of TFTLCDs. is there.
  • the gripping method grips two sides on the short side.
  • the width Wb of the short side of the pellicle frame is Wb / Wa of 1.05 or more with respect to the width Wa of the long side, it is always rigid when handled by the gripping method of gripping the two short sides. Gripping from a high side is possible, and wrinkling during handling can be suppressed.
  • the width Wb of the short side 1b of the pellicle frame 1 is preferably 1.05 or more, more preferably 1 as the ratio (Wb / Wa) of the width Wb of the short side 1b to the width Wa of the long side 1a.
  • the upper limit is preferably 1.50 or less, more preferably 1.25 or less, and particularly preferably 1.2 or less.
  • Materials constituting the pellicle frame of the present invention include, for example, carbon steel for machine structures (SC series, etc.), tool steel (carbon tool steel SK series, high speed tool steel SKH series, alloy tool steel SKS series, SKD series, SKT series, etc.), martensitic stainless steel series (SUS403, SUS410, SUS410S, SUS420J1, SUS420J2, SUS429J1, SUS440A, SUS304, etc.), aluminum, aluminum alloys (5000 series, 6000 series, 7000 series, etc.), ceramics ( SiC, AlN, Al2O3, etc.), ceramic and metal composite materials (Al-SiC, Al-AlN, Al-Al2O3, etc.), among which aluminum and its alloys can be mentioned.
  • SC series carbon steel for machine structures
  • tool steel carbon tool steel SK series, high speed tool steel SKH series, alloy tool steel SKS series, SKD series, SKT series, etc.
  • martensitic stainless steel series SUS40
  • each said steel material can be fixed with a magnet since it is a magnetic material, especially in the case of the frame of a large pellicle, processing work improves and it is preferably used.
  • the surface of the pellicle frame can be subjected to blackening treatment such as black chrome plating, black alumite, or black coating.
  • black alumite treatment will be further described.
  • a support frame for a pellicle a 5000 series aluminum alloy is generally often used. Therefore, an aluminum alloy will be described as an example.
  • black alumite treatment after forming the pellicle support frame with aluminum alloy, alumite treatment is performed, fine holes generated by this treatment are sealed with a blackening agent, and sealing treatment is performed to close the fine holes. Black anodized.
  • the surface of the support frame made by a general method in this way is observed with an electron microscope, generation of fine cracks (microcracks) is confirmed.
  • micro-cracks have a problem that even if the pattern is further miniaturized and the wiring width is further narrowed, a very small foreign matter falling into the cracks is also a problem. Therefore, it is preferable to take the following method as a method for preventing the occurrence of such microcracks.
  • the surface of the pellicle frame is anodized.
  • This alumite treatment is performed in a sulfuric acid concentration of 10 to 20%, a current density of 1 to 2 A / dm 2 , an electrolyte temperature of 15 to 30 ° C., and an energization time of 10 to 30 minutes.
  • a large number of microscopic holes are regularly formed on the surface of the alloy.
  • a blackening process is performed using the holes. Since the blackening process is performed in order to prevent reflection of light from the frame, it is not limited to black, but also includes dark colors such as brown and dark blue that are close to black.
  • Examples of the blackening treatment include dyeing and electrolytic coloring.
  • Dyeing is a method of obtaining a color tone by adsorbing the dye in this hole by immersing it in a solution in which a black dye is dissolved
  • electrolytic coloring is a method in which a metallic element is electrically deposited in this hole to change the color tone. How to get.
  • the dyeing is performed at a dye concentration of 3 to 10 g / L and a dyeing solution temperature of 50 to 65 ° C.
  • a sealing process for closing the hole is performed.
  • boiling water to which 6 to 12 g / L of a hard wall 3 (trade name) sealing aid, which is called a low-temperature sealing agent, is used is used.
  • the temperature of the sealing is slightly lower than 100 ° C., for example, 70 to 95 ° C., more preferably 80 ° C. If the sealing treatment is performed at ⁇ 90 ° C., a pellicle frame having a very uniform surface property and substantially free of microcracks can be produced.
  • the judgment of the presence or absence of a microcrack draws a 10 cm (actual dimension 0.1 mm) straight line in the photograph which expanded the support frame surface 1000 times with the electron microscope, and calculates the number of cracks which cross
  • the width of the crack those that can be observed in the electron micrograph, that is, those having a crack width of 0.1 ⁇ m or more are counted. It is judged that cracks exist with higher density as this value increases.
  • a minute hole that penetrates the inside and outside of the pellicle frame body is made so that the pressure difference between the inside and outside of the space formed by the pellicle and photomask is eliminated, preventing swelling and dents in the film. I can do it.
  • it is preferable to attach a foreign matter removal filter outside the fine hole because the atmospheric pressure can be adjusted and foreign matter can be prevented from entering the space formed by the pellicle and the photomask.
  • the pellicle frame of the present invention can have both appropriate rigidity and flexibility by satisfying the above requirements. Therefore, there is no distortion of the frame due to the expansion of the pellicle film, and the pellicle is handled alone. Of course, it is possible to follow the bending of the mask itself in the handling after being attached to the mask as well as the bending in the case of doing so. As a result, the pellicle is not wrinkled and can follow the bending of the mask, so that an excellent effect is obtained that no air path is generated.
  • the pellicle frame of the present invention can be further improved in reliability as a pellicle frame by adopting the following structure.
  • the adhesive between the pellicle film 2 and the pellicle frame 1 is an adhesive application device such as an X- Since it can apply
  • the sticking width is set to be narrower than the width of the frame body 1, it is possible to suppress adhesive spots and unpainted areas of the adhesive, and as a result, foreign matter accumulates in the spaces of the uncoated areas and unpainted areas. Can be prevented.
  • Wc Wd because the entire side can be applied without changing the coating amount between the long side and the short side.
  • Wa Wb
  • Wa Wb
  • Wc Wd
  • the pellicle frame according to the first aspect of the present invention is such that the length of the long side of the photomask is not less than the length of the long side of the pellicle frame and the length of the long side of the pellicle frame is not more than 150 mm, and the length of the short side of the photomask is the short side of the pellicle frame.
  • the photomask with a pellicle frame short side length of +200 mm or less can be particularly suitably followed.
  • the thickness of the photomask only needs to be thick enough to withstand the weight of the pellicle frame after the pellicle frame is attached (so that the photomask is not damaged).
  • soda lime glass, non-alkali glass, low alkali glass, quartz glass, and the like can be considered as the material of the photomask, but the pellicle frame of the first invention can suitably follow without depending on the material of the photomask. it can.
  • the configuration of the pellicle frame according to the first invention has been described above.
  • the width of the pellicle frame 1 in the second invention will be described.
  • the width Wa of the long side 1a of the pellicle frame body 1 shown in FIG. 2 has a lower limit of 13.0 mm or more, preferably a lower limit of 14.0 mm or more, and most preferably 16.0 mm or more.
  • the upper limit is 30.0 mm or less, preferably the upper limit is 25.0 mm or less, and more preferably the upper limit is 19.0 mm or less.
  • the width of the side of the pellicle frame refers to the maximum width of each side such as the widths Wa and Wb as shown in FIGS.
  • the width Wb of the short side 1b of the pellicle frame 1 shown in FIG. 3 needs to be at least wider than the width Wa of the long side 1a. Specifically, the width Wb of the short side 1b with respect to the width Wa of the long side 1a.
  • the ratio (Wb / Wa) has a lower limit of 1.05 or more, preferably 1.1 or more, and an upper limit of 1.50 or less, preferably 1.25 or less, and most preferably 1.2 or less. Therefore, the width Wb of the short side of the pellicle frame body takes a value of 13.65 mm or more and 45.0 mm or less.
  • a gripping method for gripping the two short sides is preferable.
  • the width Wb of the short side of the pellicle frame is Wb / Wa of 1.05 or more with respect to the width Wa of the long side, it is always rigid when handled by the gripping method of gripping the two short sides. Gripping from a high side is possible, and wrinkling during handling can be suppressed.
  • the thickness of the frame 1 Preferably it is 4.0 mm or more, More preferably, it is 5.0 mm or more, More preferably, it is 6.0 mm or more.
  • the upper limit is preferably 10.0 mm or less, more preferably 8.0 mm or less, still more preferably 7.0 mm or less, and most preferably 6.5 mm or less.
  • the cross-sectional shape of each side of the pellicle frame body is not particularly limited, such as a rectangular shape, an H shape, or a T shape, but the rectangular shape is most preferable.
  • the cross section may be a hollow structure.
  • the pellicle frame body 1 of the present invention has a remarkable effect as it becomes larger.
  • the length La of the long side 1a of the pellicle frame body 1 is 1400 mm or more, particularly 1700 mm or more and 2100 mm or less.
  • the effective area of the pellicle at that time has a remarkable effect when it is 16000 cm 2 or more, 24000 cm 2 or more, particularly 25000 cm 2 or more.
  • the pellicle frame 1 of the present invention has a significant effect when it is large, the upper limit of the effective area is sufficient if the upper limit of the effective area is 35000 cm 2 because of the size required for masks used in the manufacture of TFTLCDs. It is.
  • the pellicle frame of the present invention can have both appropriate rigidity and flexibility by satisfying the above requirements, so that there is no distortion of the frame due to the expansion of the pellicle film, and the pellicle is handled alone.
  • the distortion of the pellicle frame that occurs when the pellicle film is stretched on the pellicle frame can follow the flexure of the mask without reducing the effective area of the pellicle. It is what you play.
  • the short side is wider than the long side, the short side of the pellicle frame is easily gripped when handling the pellicle. As a result, it becomes easier to handle the pellicle from the same side as the gripping portion when handling the mask, thereby improving work efficiency.
  • the widths Wc and Wd of the attachment surfaces 1a1 and 1b1 of the pellicle film 2 of the long side 1a and the short side 1b of the frame 1 are substantially equal.
  • the widths Wc and Wd of the bonding surfaces 1a1 and 1b1 of the pellicle film of the long side 1a and the short side 1b described here are substantially equal to the widths Wc of the film bonding surfaces 1a1 and 1b1 of the long side 1a and the short side 1b. This means that the difference in Wd is smaller than the difference between the widths Wa and Wb of the long side 1a and the short side 1b.
  • the adhesive between the pellicle film 2 and the pellicle frame 1 is applied using an adhesive application device such as an XY dispenser robot.
  • the adhesive application amount per unit length is the same between the long side 1a and the short side 1b, when Wc ⁇ Wd, the long pellicle film 2 is attached to the pellicle frame 1 when the pellicle film 2 is attached.
  • the amount of the adhesive increases, and the adhesive sometimes protrudes from the film attachment surface 1 a 1 of the frame 1 and hangs down to the inner peripheral portion of the frame 1.
  • the short side 1b is insufficient in the amount of adhesive and does not spread uniformly over the entire surface 1b1, and a narrow gap is formed between the pellicle film 2 and the pellicle frame 1 on the inside, and foreign matter is generated in this gap. It may be caught. From this point of view, as described above, by making the widths Wc, Wd of the film attachment surfaces 1a1, 1b1 of the long side 1a and the short side 1b substantially equal, using a conventional simple adhesive application device, A more preferred pellicle can be obtained.
  • the pellicle frame is inclined at least on the adhering surface side of the pellicle film 2 of the long side 1a of the frame 1 If the surface is formed, an inclined surface can be formed without a step, and foreign matter can be prevented from accumulating on the pellicle frame. In addition, you may make this inclined surface into a phase shape. In addition, it can prevent that an adhesive agent hangs down to the inner peripheral part of a frame by providing this inclined surface. It is preferable that the inclined surface has a size that does not affect the rigidity and flexibility of the pellicle frame.
  • pellicle membranes include cellulose derivatives (nitrocellulose, cellulose acetate, cellulose acetate propionate, cellulose acetate butyrate, etc., or a mixture of two or more thereof), fluorine-based polymers (tetrafluoroethylene-vinylidene fluoride-hexafluoropropylene).
  • Teflon AF (trade name) manufactured by Du Pont, a polymer having a cyclic structure in the main chain, Cytop (trade name) manufactured by Asahi Glass Co., and Algoflon (trade name) manufactured by Augmont ) And the like are used.
  • a thin film formed from a polymer solution is used as the pellicle film.
  • This thin film has a tension.
  • this tension is necessary to prevent the pellicle film from being bent or wrinkled.
  • the pellicle film vibrates greatly and is difficult to remove.
  • the pellicle film foreign matter inspection machine does not function normally. In addition, there arises a problem such as an error in measuring the optical height of the pellicle film.
  • Cellulose acetate propionate and cellulose acetate butyrate are preferably used for the ultra-high pressure mercury lamp, which is the light source of the currently used batch exposure liquid crystal exposure machine, from the viewpoint of light resistance and cost.
  • the thickness of the pellicle film is preferably about 0.5 ⁇ m to 10 ⁇ m. In the large pellicle according to the present invention, 2 ⁇ m to 8 ⁇ m is preferable because of the strength of the pellicle film and the ease of forming a uniform film.
  • the above polymer is made into a polymer solution by using a suitable solvent (ketone, ester, alcohol, fluorine, etc.).
  • ester systems such as ethyl lactate are preferred.
  • the polymer solution is filtered through a depth filter, a membrane filter or the like as necessary.
  • the polymer solution film forming method includes a spin coating method, a roll coating method, a knife coating method, a casting method, and the like, but the spin coating method is preferable from the viewpoint of uniformity and foreign matter management.
  • a uniform film is formed by drying the solvent by hot plate, clean oven, (far) infrared heating or the like, if necessary.
  • synthetic quartz, fused quartz, alkali-free glass, low alkali glass, soda lime glass, or the like can be used. Since the substrate for film formation of the large pellicle according to the present invention is large, the film formation substrate may be cracked due to temperature spots during drying. In order to prevent this, the thermal expansion coefficient of the film formation substrate is preferably as small as possible. It is particularly preferred linear expansion coefficient at 0 ° C. ⁇ 300 ° C. is not more than 50 ⁇ 10- 7 m / °C.
  • the surface of the substrate for film formation may be subjected to a mold release process in advance using a material such as silicone or fluorine.
  • a layer having a lower refractive index than the pellicle film that is, an antireflection layer
  • Teflon AF (trade name) manufactured by Du Pont, a fluorinated polymer (terpolymer of tetrafluoroethylene-vinylidene fluoride-hexafluoropropylene, a polymer having a cyclic structure in the main chain) is used as an antireflection layer material.
  • Asahi Glass's Cytop (trade name), Augmont's Algoflon (trade name), polyfluoroacrylate, etc.), calcium fluoride, magnesium fluoride, barium fluoride and other low refractive index materials are used.
  • the antireflection layer can be formed by a spin coating method similar to that described above in the case of a polymer, and by a thin film formation method such as vacuum deposition or sputtering in the case of an inorganic material. From the viewpoint of foreign matter, a spin coating method using a polymer solution is preferable. Since Teflon AF (trade name) manufactured by Du Pont and Algoflon (trade name) manufactured by Augmond have a low refractive index, they have a high antireflection effect and are preferable.
  • the pellicle film formed on the film formation substrate as described above may be peeled off from the film formation substrate by a temporary frame in which an adhesive material is attached to aluminum alloy, stainless steel, resin, etc. good. Further, after bonding a desired pellicle frame on the film formation substrate, it may be peeled off from the film formation substrate.
  • the large pellicle film thus obtained is attached with an adhesive while tension is applied to the pellicle frame.
  • the tension of the film is in an appropriate range, the large pellicle film is prevented from being poorly exposed due to its own weight or the pressure difference between the inside and outside of the large pellicle film, which prevents the film surface of the large pellicle film from expanding or denting in the vertical direction. I can do it.
  • the foreign matter adhered to the pellicle film is removed by air blow, the problem that the pellicle film vibrates greatly and it is difficult to remove the foreign matter can be solved.
  • the pellicle film since the height of the pellicle film changes depending on the location, the pellicle film It is possible to solve the problem that the foreign matter inspection machine does not function normally, and to solve the problem of causing an error in the optical height measurement of the pellicle film. In addition, it is possible to ensure follow-up performance with respect to atmospheric pressure fluctuations inside and outside the large pellicle.
  • the film adhesive for adhering the pellicle film and the pellicle frame is appropriately selected depending on the material of the pellicle film and the material of the pellicle frame.
  • an epoxy, acrylic, silicone or fluorine adhesive is used.
  • the hardening method (thermal curing, photocuring, anaerobic hardening etc.) suitable for each adhesive agent is employ
  • the mask adhesive for attaching the pellicle frame to the photomask is a hot-melt type (rubber-based or acrylic-based) that has adhesive force on itself, and a tape-based (base material) with adhesive material applied to both sides of the base material.
  • a hot-melt type rubber-based or acrylic-based
  • base material base material
  • Acrylic, PVC, etc. sheets or rubber, polyolefin, urethane, etc. foams can be applied, and rubber, acrylic, silicone, etc. adhesive materials are used as adhesives)
  • a relatively soft hot-melt material or foam is suitable as the mask adhesive material in order to uniformly apply the pellicle to the photomask with a low load.
  • foam dust generation from the foam can be prevented by covering the cross section with an acrylic or vinyl acetate adhesive material or a non-adhesive material.
  • the thickness of the mask adhesive is usually 0.2 mm or more, but is preferably 1 mm or more for uniform sticking to the photomask.
  • a polyester film that has been subjected to a release treatment with silicone or fluorine is used.
  • the case for transporting the pellicle is made by injection molding or vacuum molding a material such as acrylic, ABS, PVC, or PET. These materials may be kneaded with an antistatic agent in order to prevent electrification, or a polymer having an antistatic structure (BAYON (trademark) manufactured by Kureha, ADION (trademark) manufactured by Asahi Kasei) may be used.
  • BAYON trademark
  • ADION trademark
  • the case for the super-large pellicle according to the present invention is provided with a rib structure on the case lid, the tray, or both so that the case is not distorted during transportation and the pellicle is damaged in the case. It is preferable to increase.
  • the longest side length of 1.4 m to 2 mm is formed by forming gripping convex portions or concave portions on all the side portions of the pellicle frame so as not to be restricted by the photomask. It is also possible to achieve gripping of a 1 m large pellicle.
  • the short side is wider than the long side, it is easy to form a grip convex part and concave part on the short side.
  • the pellicle frame of the second invention is such that the length of the long side of the photomask is not less than the length of the long side of the pellicle frame, the length of the long side of the pellicle frame +150 mm or less, and the length of the short side of the photomask is the short side of the pellicle frame.
  • the photomask with a pellicle frame short side length of +200 mm or less can be particularly suitably followed.
  • the thickness of the photomask only needs to be thick enough to withstand the weight of the pellicle frame after the pellicle frame is attached (so that the photomask is not damaged).
  • soda lime glass, non-alkali glass, low alkali glass, quartz glass, and the like can be considered as the material of the photomask, but the pellicle frame of the second invention can suitably follow without depending on the material of the photomask. it can.
  • the present invention will be described more specifically with reference to examples.
  • the super large pellicle frame 1 has the length (La) of the long side 1a, the length (Lb) of the short side 1b, the area inside the frame (effective area), and the thickness of the frame as shown in Table 1 to Table 9. What was shown in (1) was used.
  • Table 1 to Table 9 show the width (Wa) of the long side 1a and the width (Wb) of the short side 1b of the pellicle frame.
  • the material of the pellicle frame was aluminum alloy, and the frame had a rectangular cross section.
  • the pellicle frame used was a microcrack-free product that had been subjected to black alumite treatment. Therefore, performance evaluation of an actual pellicle was performed using the frame as described above.
  • the pellicle film As the pellicle film, a polymer solution of cellulose ester is applied on a low alkali glass, and a main film is formed by spin coating. Next, a 4 ⁇ m-thick pellicle film in which a fluoropolymer solution is applied onto the film by spin coating to form an antireflection layer is uniformly used. The obtained pellicle film is spread and stuck on the pellicle frame. Here, the presence or absence of wrinkles generated when the pellicle film was stretched and bonded to the pellicle frame was evaluated (results of wrinkle generation during film extension). The evaluation results are shown in Tables 1 to 9. In the evaluation results, “ ⁇ ” indicates no wrinkles, “ ⁇ ” indicates that the film is slightly wavy when viewed closely, and “ ⁇ ” indicates that the wrinkles are slightly wrinkled.
  • the pellicle frame body on which the pellicle film was stretched and bonded was attached to quartz glass.
  • a 1.2 mm thick styrene ethylene butylene styrene rubber-based hot-melt adhesive material was used as the mask adhesive material, and this hot-melt adhesive material was applied to the mask adhesive surface of the pellicle frame to obtain quartz glass. Affixed at a predetermined position. Each member was subjected to ultrasonic cleaning before use.
  • the size of the quartz glass was made into the long side length + 50mm of the pellicle which sticks the long side of quartz glass, and the short side length + 100mm of the pellicle which sticks the short side of quartz glass. Table 17 shows the size and thickness of the quartz glass used.
  • the flexibility of the pellicle frame was evaluated by measuring the followability of the pellicle to the mask.
  • the pellicle attached to the mask is left floating in the air while holding the two short sides of the mask with the surface on which the pellicle is attached facing down, and the pellicle follows the deflection caused by the weight of the mask. It was evaluated with the followability of whether or not.
  • the evaluation results are shown in Tables 1 to 9.
  • follow-up evaluation criteria are ⁇ ⁇ '' when there is no change within one year after mask attachment, ⁇ ⁇ '' when there is a slight lift at the bonded part, ⁇ X '' when there is an air pass It was evaluated.
  • the pellicle frame body of the present invention has appropriate rigidity and flexibility.
  • the rigidity of the pellicle frame body is determined by the presence or absence of wrinkles generated when the pellicle film is spread on the pellicle frame body, and the wrinkle generated during the subsequent handling of the pellicle.
  • the flexibility is evaluated by visually judging the presence or absence of the pellicle attached to the mask with the two sides of the mask held in the air with the surface to which the pellicle is attached facing down. It was evaluated by following whether the pellicle follows the deflection caused by the weight of the mask.
  • Table 10 shows the length (La) of the long side 1a, the length (Lb) of the short side 1b, and the area inside the frame (effective area) of the frame 1 for the super-large pellicle used in the examples and comparative examples.
  • Table 16 shows the width (Wa) of the long side 1a, the width (Wb) of the short side 1b, and the thickness of the pellicle frame of the pellicle frame.
  • the material of the pellicle frame was aluminum alloy, and the frame had a rectangular cross section.
  • the pellicle frame used was a microcrack-free product that had been subjected to black alumite treatment. Therefore, performance evaluation was actually performed using the above-mentioned pellicle frame body.
  • As the pellicle film a polymer solution of cellulose ester was applied on low alkali glass, and a main film was formed by spin coating.
  • a 4 ⁇ m-thick pellicle film in which a fluoropolymer solution was applied onto the film by spin coating to form an antireflection layer was uniformly used.
  • the obtained pellicle film was spread and stuck on the pellicle frame.
  • the handling of the pellicle frame was carried out by gripping a part of each side of a set of short sides.
  • the presence or absence of wrinkles generated when the pellicle film was stretched and bonded to the pellicle frame was evaluated (results of wrinkle generation during film extension).
  • the evaluation results are shown in Tables 10 to 16. In the evaluation results, “ ⁇ ” indicates no wrinkles, “ ⁇ ” indicates that the film is slightly wavy when viewed closely, and “ ⁇ ” indicates that the wrinkles are slightly wrinkled.
  • the pellicle frame body on which the pellicle film was stretched and bonded was attached to quartz glass.
  • a 1.2 mm thick styrene ethylene butylene styrene rubber-based hot-melt adhesive material was used as the mask adhesive material, and this hot-melt adhesive material was applied to the mask adhesive surface of the pellicle frame to obtain quartz glass. Affixed at a predetermined position. Each member was subjected to ultrasonic cleaning before use.
  • the size of the quartz glass was made into the long side length + 50mm of the pellicle which sticks the long side of quartz glass, and the short side length + 100mm of the pellicle which sticks the short side of quartz glass. Table 17 shows the size and thickness of the quartz glass used.
  • a series of handling processes refers to a handling process consisting of a transport process after an assembly (pellicle film expansion / adhesion) process ⁇ inspection process ⁇ packaging process ⁇ shipping process ⁇ removing process ⁇ attaching process to a photomask. .
  • the pellicle In the transport process after the assembly process, the pellicle is transported to the inspection process by gripping the vicinity of the four corners on the short side of the pellicle frame with a gripping force that does not drop the pellicle using the in-process transport holder. At this time, the pellicle is carried to the inspection process with the long side parallel to the ground and the short side perpendicular to the ground. In the inspection process, inspection is performed through one vertical rotation about the horizontal axis of the pellicle, one horizontal rotation about the vertical axis, and one 90 degree rotation on the pellicle film plane around the center of the pellicle film. Do.
  • the pellicle is carried with the long side of the pellicle parallel to the ground and the short side perpendicular to the ground.
  • the pellicle is stored in the pellicle storage container with the in-process transport holder attached. Thereafter, the in-process transport holder is removed in the storage container, and only the pellicle is stored in the storage container.
  • the shipping process normal transportation assuming truck transportation is performed. At this time, the storage container is kept horizontal.
  • the pellicle is taken out from the storage container in a state where the pellicle frame is horizontal with the ground.
  • the pellicle frame near the four corners on the short side is gripped with a gripping force that does not cause the pellicle to fall.
  • the pellicle frame is held horizontally with the ground and the pellicle frame is gripped around the four corners on the short side of the pellicle frame with a gripping force that does not drop the pellicle.
  • Affix with pellicle mask adhesive The sticking force is firmly attached with a sticking force that does not change the outer shape of the pellicle even after sticking.
  • the evaluation results are shown in Tables 10 to 16. The evaluation criteria are the same as when the pellicle frame is stretched and bonded.
  • the evaluation results are shown in Table 10 to Table 16 (following evaluation results).
  • the follow-up evaluation standard is that after the pellicle mask is attached, the pellicle-attached surface is down and left in the air while holding the two short sides of the mask. The case where there was no air gap was evaluated as “ ⁇ ”, the case where a slight float occurred in the bonded portion was evaluated as “ ⁇ ”, and the case where an air path occurred was evaluated as “X”.
  • the pellicle frame, pellicle, and method of using the pellicle frame of the present invention it is used in the photolithography process of a large-sized color TFT LCD (thin film transistor liquid crystal display) capable of high-quality and high-definition display that has been developed in recent years. Applicable to large photomasks and reticles.
  • TFT LCD thin film transistor liquid crystal display

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Abstract

L'invention concerne un cadre pelliculaire, le cadre pelliculaire n'étant pas déformé lorsqu'un film de pellicule est étiré et collé, et le cadre pelliculaire lui-même suit la flexion provoquée par le poids d'un masque même après qu'une pellicule est collée sur le masque. Un cadre pelliculaire rectangulaire présente un facteur de distorsion α inférieur ou égal à 0,06%, l'aptitude à la déformation β de chaque côté du cadre pelliculaire exprimée par l'expression générale (1) est supérieure ou égale à 3 mm, l'aptitude à la déformation β du côté long du cadre pelliculaire est inférieure ou égal à 32 mm, le côté long du cadre pelliculaire présente une longueur de 1400 à 2100 mm, et la surface à l'intérieur du cadre pelliculaire est supérieure ou égale à 15000 cm2.
PCT/JP2009/065919 2008-09-12 2009-09-11 Cadre pelliculaire, pellicule et procédé d'utilisation de cadre pelliculaire Ceased WO2010029997A1 (fr)

Priority Applications (4)

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JP2010528762A JP4886070B2 (ja) 2008-09-12 2009-09-11 ペリクル枠体、ペリクル及びペリクル枠体の使用方法
KR1020137010747A KR101390007B1 (ko) 2008-09-12 2009-09-11 펠리클 프레임, 펠리클 및 펠리클 프레임의 사용 방법
CN200980133492.9A CN102132210B (zh) 2008-09-12 2009-09-11 表膜构件框体、表膜构件和表膜构件框体的使用方法
KR1020117004478A KR101287700B1 (ko) 2008-09-12 2009-09-11 펠리클 프레임, 펠리클 및 펠리클 프레임의 사용 방법

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JP6729233B2 (ja) * 2016-09-20 2020-07-22 日本軽金属株式会社 ペリクル用支持枠及びペリクル並びにその製造方法
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US10578962B2 (en) 2010-04-13 2020-03-03 Asahi Kasei E-Materials Corporation Self-supporting film, self-supporting structure, method for manufacturing self-supporting film, and pellicle
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JP2012230227A (ja) * 2011-04-26 2012-11-22 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル
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TWI497197B (zh) 2015-08-21
CN102132210A (zh) 2011-07-20
CN102132210B (zh) 2013-01-23
KR101287700B1 (ko) 2013-07-24
JP5284445B2 (ja) 2013-09-11
TW201510638A (zh) 2015-03-16
CN102944973B (zh) 2015-01-21
TW201015213A (en) 2010-04-16
JPWO2010029997A1 (ja) 2012-02-02
CN102944973A (zh) 2013-02-27
JP4886070B2 (ja) 2012-02-29
TWI537674B (zh) 2016-06-11
KR20130049837A (ko) 2013-05-14

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