WO2010058980A3 - Single crystal growing apparatus - Google Patents
Single crystal growing apparatus Download PDFInfo
- Publication number
- WO2010058980A3 WO2010058980A3 PCT/KR2009/006830 KR2009006830W WO2010058980A3 WO 2010058980 A3 WO2010058980 A3 WO 2010058980A3 KR 2009006830 W KR2009006830 W KR 2009006830W WO 2010058980 A3 WO2010058980 A3 WO 2010058980A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- single crystal
- growing apparatus
- crystal growing
- crucible
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
- C30B15/16—Heating of the melt or the crystallised materials by irradiation or electric discharge
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Embodiments provide a single crystal growing apparatus. The single crystal growing apparatus may include a chamber, a crucible, a heater, and heat supplying means. The crucible may be provided in the chamber to hold silicon melt. The heater may be provided in the chamber to heat the crucible. The heat supplying means may supply heat to a crystal at a necking portion during single crystal growth.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020080115533A KR20100056640A (en) | 2008-11-20 | 2008-11-20 | Single crystal growth apparatus |
| KR10-2008-0115533 | 2008-11-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2010058980A2 WO2010058980A2 (en) | 2010-05-27 |
| WO2010058980A3 true WO2010058980A3 (en) | 2010-08-19 |
Family
ID=42198674
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/KR2009/006830 Ceased WO2010058980A2 (en) | 2008-11-20 | 2009-11-20 | Single crystal growing apparatus |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR20100056640A (en) |
| WO (1) | WO2010058980A2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101263082B1 (en) * | 2010-11-15 | 2013-05-09 | 주식회사 엘지실트론 | Sapphire Ingot Grower |
| KR101383954B1 (en) * | 2012-08-16 | 2014-04-10 | 주식회사 엘지실트론 | Method for Growing Silicon Single Crystal |
| CN107805840A (en) * | 2016-09-09 | 2018-03-16 | 上海新昇半导体科技有限公司 | A kind of crystal pulling mechanism of crystal pulling furnace |
| CN107881553A (en) * | 2016-09-30 | 2018-04-06 | 上海新昇半导体科技有限公司 | A kind of crystal pulling furnace |
| CN107604428A (en) * | 2017-10-18 | 2018-01-19 | 青海日晶光电有限公司 | A kind of monocrystalline silicon continuous production crystallization charging (feeding) equipment and technique |
| US20250236986A1 (en) * | 2024-01-19 | 2025-07-24 | Globalwafers Co., Ltd. | Hotzone components having a protective coating |
| US20250257495A1 (en) * | 2024-02-08 | 2025-08-14 | Globalwafers Co., Ltd. | Bi-directional heating of a silicon charge |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08175896A (en) * | 1994-12-22 | 1996-07-09 | Tdk Corp | Method and device for producing single crystal |
| JPH1081593A (en) * | 1996-09-02 | 1998-03-31 | Super Silicon Kenkyusho:Kk | Production of cz silicon single crystal and apparatus therefor |
| JPH10194893A (en) * | 1996-12-27 | 1998-07-28 | Tdk Corp | Apparatus for production of single crystal |
| JP2008189525A (en) * | 2007-02-06 | 2008-08-21 | Covalent Materials Corp | Single crystal pulling device |
-
2008
- 2008-11-20 KR KR1020080115533A patent/KR20100056640A/en not_active Ceased
-
2009
- 2009-11-20 WO PCT/KR2009/006830 patent/WO2010058980A2/en not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08175896A (en) * | 1994-12-22 | 1996-07-09 | Tdk Corp | Method and device for producing single crystal |
| JPH1081593A (en) * | 1996-09-02 | 1998-03-31 | Super Silicon Kenkyusho:Kk | Production of cz silicon single crystal and apparatus therefor |
| JPH10194893A (en) * | 1996-12-27 | 1998-07-28 | Tdk Corp | Apparatus for production of single crystal |
| JP2008189525A (en) * | 2007-02-06 | 2008-08-21 | Covalent Materials Corp | Single crystal pulling device |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20100056640A (en) | 2010-05-28 |
| WO2010058980A2 (en) | 2010-05-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
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| NENP | Non-entry into the national phase |
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| 122 | Ep: pct application non-entry in european phase |
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