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WO2009139375A1 - Procédé de fabrication d’un guide d’onde optique et guide d’onde optique - Google Patents

Procédé de fabrication d’un guide d’onde optique et guide d’onde optique Download PDF

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Publication number
WO2009139375A1
WO2009139375A1 PCT/JP2009/058827 JP2009058827W WO2009139375A1 WO 2009139375 A1 WO2009139375 A1 WO 2009139375A1 JP 2009058827 W JP2009058827 W JP 2009058827W WO 2009139375 A1 WO2009139375 A1 WO 2009139375A1
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WO
WIPO (PCT)
Prior art keywords
clad layer
resin
optical waveguide
forming
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2009/058827
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English (en)
Japanese (ja)
Inventor
智章 柴田
正利 山口
敦之 高橋
雅美 落合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to CN200980117381.9A priority Critical patent/CN102027400B/zh
Priority to JP2010511979A priority patent/JP5360055B2/ja
Publication of WO2009139375A1 publication Critical patent/WO2009139375A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/44—Compression means for making articles of indefinite length
    • B29C43/46—Rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/32—Component parts, details or accessories; Auxiliary operations
    • B29C43/52—Heating or cooling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00663—Production of light guides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods

Definitions

  • the present invention relates to an optical waveguide manufacturing method and an optical waveguide, and more particularly to an optical waveguide manufacturing method and an optical waveguide that can manufacture an optical waveguide with high productivity and no bubbles remain between a core layer and an upper cladding layer. is there.
  • optical interconnection technology that uses optical signals not only for communication fields such as trunk lines and access systems but also for information processing in routers and servers is underway.
  • an opto-electric hybrid board in which an optical transmission line is combined with an optical transmission path has been developed.
  • an optical transmission line it is desirable to use an optical waveguide that has a higher degree of freedom of wiring and can be densified than an optical fiber, and in particular, an optical waveguide that uses a polymer material with excellent workability and economy. Is promising.
  • an optical waveguide coexists with an electric wiring board, high transparency and high heat resistance are required.
  • an optical waveguide material fluorinated polyimide (for example, Non-Patent Document 1) or epoxy resin (for example, Patent Document 1). ) has been proposed.
  • fluorinated polyimide has a high heat resistance of 300 ° C. or higher and a high transparency of 0.3 dB / cm at a wavelength of 850 nm
  • film formation requires heating conditions of 300 ° C. or more for several tens of minutes to several hours. For this reason, it is difficult to form a film on an electric wiring board.
  • fluorinated polyimide has no photosensitivity, the optical waveguide production method by photosensitivity / development cannot be applied, and the productivity and the area increase are inferior.
  • an optical waveguide is produced using a method of applying a liquid material on a substrate and forming a film
  • the film thickness management is complicated, and the resin applied on the substrate is liquid before curing, There was a problem caused by the material form being liquid, for example, it was difficult to maintain the uniformity of the film thickness because the resin flowed on the substrate.
  • the epoxy resin for forming an optical waveguide in which a photopolymerization initiator is added to a liquid epoxy resin can form a core pattern by a photosensitive / developing method, and some of the materials have high transparency and high heat resistance. There was a similar problem caused by being liquid.
  • a dry film containing a radiation-polymerizable component is laminated on the substrate, and a predetermined amount of light is irradiated to cure the radiation at a predetermined location to form a clad, and develop an unexposed portion as necessary.
  • a method of forming an optical waveguide having excellent transmission characteristics by forming a core portion and the like and further forming a cladding for embedding the core portion is useful. When this method is used, it is easy to ensure the flatness of the clad after embedding the core. It is also suitable for manufacturing a large-area optical waveguide.
  • a vacuum type having a vacuum chamber formed by a pair of block bodies relatively movable up and down as disclosed in FIGS.
  • a so-called vacuum laminating method in which laminating is performed under a reduced pressure is known.
  • the wiring density of the core portion which has been conventionally required, is about 50 ⁇ m / 200 ⁇ m between the line width / line.
  • the present invention has been made to solve the above-described problems, and provides an optical waveguide manufacturing method and an optical waveguide that can manufacture an optical waveguide with high productivity and that no bubbles remain between a core layer and an upper cladding layer.
  • the purpose is to do.
  • the inventors of the present invention have made the clad layer forming resin have a melt viscosity of 100 to 200 Pa ⁇ s when the upper clad layer forming resin film is laminated.
  • the lamination conditions are controlled, the upper clad layer is formed from a resin having a melt viscosity of 100 to 200 Pa ⁇ s at the time of lamination, or the upper clad layer forming resin is laminated on the support film on the core pattern.
  • the present invention has been completed by finding that the above-mentioned object can be achieved by laminating a resin film for forming an upper clad layer to be in contact with the core pattern and then performing a heat treatment.
  • the present invention (1) A step of curing a resin for forming a cladding layer formed on a substrate to form a lower cladding layer, a step of forming a core layer by laminating a resin film for forming a core layer on the lower cladding layer, A step of exposing and developing the core layer to form a core pattern, and a step of laminating a resin film for forming an upper clad layer on the core pattern and curing the resin for forming the clad layer to form an upper clad layer
  • a method of manufacturing an optical waveguide comprising: controlling lamination conditions so that the melt viscosity of the clad layer forming resin is 100 to 200 Pa ⁇ s when the upper clad layer forming resin film is laminated.
  • An optical waveguide manufacturing method (2)
  • the step of forming a core layer includes a step of thermocompression-bonding a resin film for forming a core layer on a lower clad layer using a roll laminator having a heat roll.
  • Manufacturing method of optical waveguide (3)
  • the method for producing an optical waveguide according to the above (1) characterized in that it is thermocompression-bonded under a reduced pressure atmosphere using a flat plate laminator, (4)
  • the upper clad layer is formed of a resin having a melt viscosity of 100 to 200 Pa ⁇ s at the time of lamination.
  • An optical waveguide (7)
  • the upper clad layer contains a phenoxy resin-based pace polymer and a bifunctional epoxy resin, and is 90 to 120 ° C.
  • (9) a step of curing a resin for forming a cladding layer formed on a substrate to form a lower cladding layer, a step of forming a core layer by laminating a resin film for forming a core layer on the lower cladding layer, A step of exposing and developing the core layer to form a core pattern; and an upper clad layer-forming resin film obtained by laminating an upper clad layer-forming resin on a support film on the core pattern.
  • a method of manufacturing an optical waveguide including a step of laminating so as to contact a pattern, a step of performing a heat treatment, and a step of curing the resin for forming a clad layer to form an upper clad layer; (10) The method for producing an optical waveguide according to (9) above, wherein the heat treatment condition is a temperature of 40 to 200 ° C. Is to provide.
  • the manufacturing methods (1) to (3) may be referred to as a first manufacturing method
  • the manufacturing methods (9) to (10) may be referred to as a second manufacturing method.
  • the optical waveguide can be manufactured with high productivity, and no bubbles remain between the core layer and the upper cladding layer.
  • An optical waveguide manufactured according to the present invention is an optical waveguide having a lower clad layer 2, a core pattern 8, and an upper clad layer 9 on a substrate 1, as shown in FIG. 1 core layer forming resin film (FIG. 3, 300) having a low refractive index and two clad layer forming resins having a low refractive index, preferably a clad layer forming resin film (FIG. 2, 200). can do.
  • a film-like material it is possible to solve the problems relating to productivity and large area response unique to liquid materials.
  • the type of the substrate 1 is not particularly limited.
  • an FR-4 substrate, polyimide, a semiconductor substrate, a silicon substrate, a glass substrate, or the like can be used.
  • a film as the substrate 1 flexibility and toughness can be imparted to the optical waveguide.
  • the material of the film is not particularly limited, but from the viewpoint of having flexibility and toughness, polyesters such as polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyethylene, polypropylene, polyamide, aramid, polycarbonate, polyphenylene ether, Preferred examples include polyether sulfide, polyarylate, liquid crystal polymer, polysulfone, polyether sulfone, polyether ether ketone, polyether imide, polyamide imide, and polyimide.
  • the thickness of the film may be appropriately changed depending on the intended flexibility, but is preferably 5 to 250 ⁇ m. If it is 5 ⁇ m or more, there is an advantage that toughness is easily obtained, and if it is 250 ⁇ m or less, sufficient flexibility can be obtained.
  • a support film 10 used in the process of manufacturing a clad layer forming resin film 200 described later can be used as the substrate 1 shown in FIG. 1.
  • the clad layer forming resin film 200 when the optical waveguide is manufactured and the support is provided outside the clad layer, the clad layer forming resin is formed on the support film 10 subjected to the adhesion treatment. 20 is preferably formed. Thereby, the adhesive force of the lower clad layer 2 and the base material 1 can be improved, and the peeling defect of the lower clad layer 2 and the base material 1 can be suppressed.
  • the adhesion treatment is a treatment for improving the adhesion force between the support film 10 and the clad layer forming resin 20 formed thereon by easy adhesion resin coating, corona treatment, mat processing by sandblasting, or the like.
  • the support film may be subjected to a release treatment as necessary.
  • you may have a base material on the outer side of an upper clad layer, As a kind of this base material, the thing similar to the base material 1 mentioned above is mentioned, for example, as shown in FIG.1 (f) Examples thereof include a support film 10 used in the production process of a clad layer forming resin film 200 described later.
  • a multilayer optical waveguide may be produced by laminating a plurality of polymer layers having a core pattern and a clad layer on one or both surfaces of the substrate 1 described above. Furthermore, an electrical wiring may be provided on the above-described base material 1, and in this case, a material provided with an electrical wiring in advance can be used as the base material 1. Alternatively, electrical wiring can be formed on the substrate 1 after manufacturing the optical waveguide. Thereby, both the signal transmission line of the metal wiring on the substrate 1 and the signal transmission line of the optical waveguide can be provided, both can be used properly, and signal transmission at a high speed and a long distance can be easily performed. Can do.
  • the clad layer forming resin used in the present invention is not particularly limited as long as it is a resin composition that has a lower refractive index than the core layer and is cured by light or heat, and a thermosetting resin composition or a photosensitive resin composition is used. It can be preferably used.
  • the clad layer forming resin is composed of a resin composition containing (A) a base polymer (also referred to as a binder polymer), (B) a photopolymerizable compound, and (C) a photopolymerization initiator.
  • A a base polymer
  • B a photopolymerizable compound
  • C a photopolymerization initiator.
  • the resin composition used for the cladding layer forming resin may be the same or different in the components contained in the resin composition in the upper cladding layer 9 and the lower cladding layer 2.
  • the refractive indexes may be the same or different.
  • the (A) base polymer used here is for forming a clad layer and ensuring the strength of the clad layer, and is not particularly limited as long as the object can be achieved, phenoxy resin, epoxy resin (Meth) acrylic resin, polycarbonate resin, polyarylate resin, polyether amide, polyether imide, polyether sulfone, etc., or derivatives thereof. These base polymers may be used alone or in combination of two or more.
  • the main chain has an aromatic skeleton from the viewpoint of high heat resistance, and a phenoxy resin is particularly preferable. From the viewpoint of three-dimensional crosslinking and improving heat resistance, an epoxy resin, particularly an epoxy resin that is solid at room temperature is preferable.
  • compatibility with the photopolymerizable compound (B) described in detail later is important for ensuring the transparency of the resin for forming the cladding layer.
  • the phenoxy resin and the (meth) acrylic resin are used. Is preferred.
  • (meth) acrylic resin means acrylic resin and methacrylic resin.
  • phenoxy resins those containing bisphenol A, bisphenol A-type epoxy compounds or derivatives thereof, and bisphenol F, bisphenol F-type epoxy compounds or derivatives thereof as constituent units of copolymer components are heat resistant, adhesive and soluble. It is preferable because of its excellent properties.
  • Preferred examples of the bisphenol A or bisphenol A type epoxy compound include tetrabromobisphenol A and tetrabromobisphenol A type epoxy compounds.
  • tetrabromobisphenol F, a tetrabromobisphenol F type epoxy compound, etc. are mentioned suitably.
  • Specific examples of the bisphenol A / bisphenol F copolymer type phenoxy resin include “Phenotote YP-70” (trade name) manufactured by Toto Kasei Co., Ltd.
  • epoxy resin that is solid at room temperature examples include, for example, “Epototo YD-7020, Epototo YD-7019, Epototo YD-7007” (all trade names) manufactured by Toto Chemical Co., Ltd., and “Epicoat 1010” manufactured by Japan Epoxy Resins Co., Ltd. Bisphenol A type epoxy resin such as “Epicoat 1009, Epicoat 1008” (both trade names).
  • the photopolymerizable compound is not particularly limited as long as it is polymerized by irradiation with light such as ultraviolet rays, and the compound having an ethylenically unsaturated group in the molecule or two or more in the molecule.
  • examples thereof include compounds having an epoxy group.
  • examples of the compound having an ethylenically unsaturated group in the molecule include (meth) acrylate, vinylidene halide, vinyl ether, vinyl pyridine, vinyl phenol, etc., among these, from the viewpoint of transparency and heat resistance, (Meth) acrylate is preferred.
  • the (meth) acrylate any of monofunctional, bifunctional, trifunctional or higher polyfunctional ones can be used.
  • (meth) acrylate means acrylate and methacrylate.
  • the compound having two or more epoxy groups in the molecule include bifunctional or polyfunctional aromatic glycidyl ethers such as bisphenol A type epoxy resins, bifunctional or polyfunctional aliphatic glycidyl ethers such as polyethylene glycol type epoxy resins, and water.
  • Bifunctional alicyclic glycidyl ether such as bisphenol A type epoxy resin, bifunctional aromatic glycidyl ester such as diglycidyl phthalate, bifunctional alicyclic glycidyl ester such as tetrahydrophthalic acid diglycidyl ester, N, N- Bifunctional or polyfunctional aromatic glycidylamine such as diglycidylaniline, bifunctional alicyclic epoxy resin such as alicyclic diepoxycarboxylate, bifunctional heterocyclic epoxy resin, polyfunctional heterocyclic epoxy resin, bifunctional Or polyfunctional silicon-containing epoxy resin Etc., and the like.
  • These (B) photopolymerizable compounds can be used alone or in combination of two or more.
  • the photopolymerization initiator of component (C) is not particularly limited.
  • aryldiazonium salt, diaryliodonium salt, triarylsulfonium salt, triallyl examples include selenonium salts, dialkylphenazylsulfonium salts, dialkyl-4-hydroxyphenylsulfonium salts, and sulfonate esters.
  • aromatic ketones such as benzophenone, quinones such as 2-ethylanthraquinone, and benzoin ethers such as benzoin methyl ether
  • benzoin compounds such as benzoin, benzyl derivatives such as benzyldimethyl ketal, 2,4,5-triarylimidazole dimers such as 2- (o-chlorophenyl) -4,5-diphenylimidazole dimer, 2- Benzimidazoles such as mercaptobenzimidazole, phosphine oxides such as bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide, acridine derivatives such as 9-phenylacridine, N-phenylglycine, N-phenylglycine derivatives , Coumarin system Things and the like.
  • thioxanthone type compound and a tertiary amine compound like the combination of diethyl thioxanthone and dimethylaminobenzoic acid.
  • aromatic ketones and phosphine oxides are preferred from the viewpoint of improving the transparency of the core layer and the cladding layer.
  • These (C) photopolymerization initiators can be used alone or in combination of two or more.
  • the blending amount of the (A) base polymer is preferably 5 to 80% by mass with respect to the total amount of the components (A) and (B).
  • the blending amount of the (B) photopolymerizable compound is preferably 95 to 20% by mass with respect to the total amount of the components (A) and (B).
  • the component (A) when the component (A) is 80% by mass or less and the component (B) is 20% by mass or more, the (A) base polymer can be easily entangled and cured, and an optical waveguide is formed. The pattern forming property is improved and the photocuring reaction proceeds sufficiently.
  • the blending amounts of the component (A) and the component (B) are more preferably 10 to 75% by mass of the component (A) and 90 to 25% by mass of the component (B), and 20 to 70 of the component (A). More preferably, the content is 80% by mass and the component (B) is 80-30% by mass.
  • the blending amount of the (C) photopolymerization initiator is preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the total amount of the components (A) and (B).
  • the blending amount is 0.1 parts by mass or more, the photosensitivity is sufficient, while when it is 10 parts by mass or less, the light absorption in the surface layer of the resin composition does not increase at the time of exposure. Photocuring is sufficient.
  • the propagation loss does not increase due to the light absorption effect of the polymerization initiator itself. From the above viewpoint, the blending amount of the (C) photopolymerization initiator is more preferably 0.2 to 5 parts by mass.
  • an antioxidant in the cladding layer forming resin, an antioxidant, an anti-yellowing agent, an ultraviolet absorber, a visible light absorber, a colorant, a plasticizer, a stabilizer, a filler, etc. You may add what is called an additive in the ratio which does not have a bad influence on the effect of this invention.
  • the resin film for forming a cladding layer (FIGS. 2 and 200) is obtained by dissolving the resin composition containing the components (A) to (C) in a solvent and applying the solution to the support film 10 to remove the solvent. Can be manufactured more easily.
  • the support film 10 used in the manufacturing process of the clad layer forming resin film 200 is not particularly limited with respect to the material thereof, and various films can be used. From the viewpoints of flexibility and toughness as the support film, those exemplified as the film material of the substrate 1 described above can be similarly mentioned.
  • the thickness of the support film 10 may be appropriately changed depending on the intended flexibility, but is preferably 5 to 250 ⁇ m.
  • the thickness of the support film 10 is preferably 5 to 40 ⁇ m. If it is 5 ⁇ m or more, sufficient toughness can be obtained, and if it is 40 ⁇ m or less, bubbles can be eliminated without setting the heating temperature high.
  • the protective film 11 may be bonded to the clad layer forming resin film 200 as necessary from the viewpoints of protection of the clad layer forming resin film 200 and winding property when manufacturing in a roll shape.
  • the protective film 11 the thing similar to what was mentioned as the example as the support body film 10 can be used, and the mold release process and the antistatic process may be performed as needed.
  • the solvent used here is not particularly limited as long as it can dissolve the resin composition.
  • a solvent such as glycol monomethyl ether acetate, cyclohexanone, N-methyl-2-pyrrolidone, or a mixed solvent thereof can be used.
  • the solid concentration in the resin solution is preferably about 30 to 80% by mass.
  • the thickness after drying is preferably in the range of 5 to 500 ⁇ m.
  • the thickness is 5 ⁇ m or more, a clad thickness necessary for light confinement can be secured, and when the thickness is 500 ⁇ m or less, it is easy to control the film thickness uniformly.
  • the thickness of the cladding layers 2 and 9 is more preferably in the range of 10 to 100 ⁇ m.
  • the thickness of the clad layers 2 and 9 may be the same or different in the lower clad layer 2 formed first and the upper clad layer 9 for embedding the core pattern, but the core pattern is buried. Therefore, the thickness of the upper clad layer 9 is preferably thicker than the thickness of the core layer 3.
  • the core layer forming resin 30 constituting the core layer forming resin film 300 is a resin that is designed such that the core layer 3 has a higher refractive index than the clad layers 2 and 9 and can form the core pattern 8 by actinic rays.
  • a composition can be used, and a photosensitive resin composition is preferred.
  • the same resin composition as that used in the resin for forming a cladding layer that is, the components (A), (B) and (C) are contained, and the optional components are contained as necessary. It is preferable to use a resin composition.
  • the core layer-forming resin film 300 can be easily manufactured by dissolving the resin composition containing the components (A) to (C) in a solvent, applying the resin composition to the support film 4, and removing the solvent. it can.
  • the solvent is not particularly limited as long as it can dissolve the resin composition, and those exemplified as the solvent used for producing the resin film for forming a clad layer can be similarly used.
  • the solid content concentration in the resin solution is preferably about 30 to 80% by mass.
  • the thickness of the core layer forming resin film 300 is not particularly limited, and the thickness of the dried core layer 3 is usually adjusted to be 10 to 100 ⁇ m. If the thickness of the film is 10 ⁇ m or more, there is an advantage that the alignment tolerance can be increased in the coupling with the light emitting / receiving element or the optical fiber after the optical waveguide is formed. There is an advantage that coupling efficiency is improved in coupling with a light emitting element or an optical fiber. From the above viewpoint, the thickness of the film is preferably in the range of 30 to 70 ⁇ m.
  • the support film 4 used in the manufacturing process of the core layer forming resin film 300 is a support film that supports the core layer forming resin 30 and the material thereof is not particularly limited. From the viewpoint that it is easy to peel off and has heat resistance and solvent resistance, polyesters such as polyethylene terephthalate, polypropylene, polyethylene and the like are preferable.
  • the thickness of the support film 4 is preferably 5 to 50 ⁇ m. When it is 5 ⁇ m or more, there is an advantage that the strength as the support film 4 is easily obtained, and when it is 50 ⁇ m or less, there is an advantage that a gap with the mask at the time of pattern formation becomes small and a finer pattern can be formed. .
  • the thickness of the support film 4 is more preferably in the range of 10 to 40 ⁇ m, particularly preferably 15 to 30 ⁇ m.
  • the protective film 11 may be bonded to the core layer forming resin film 300 as necessary.
  • the protective film 11 the thing similar to what was mentioned as the example as the support body film 4 can be used, and the mold release process and the antistatic process may be performed as needed.
  • FIG. 1 Optical waveguide manufacturing method
  • a clad layer forming resin film FIG. 2 and 200
  • a core layer forming resin film FIG. 3
  • the clad layer forming resin 20 FIG. 2, 200
  • Curing is performed to form the lower clad layer 2 (FIG. 1A).
  • the support film 10 becomes the base material 1 of the lower cladding layer 2 shown in FIG.
  • the curing conditions by light or heating vary depending on the type of resin for forming the cladding layer, but the solvent used in the manufacturing process of the resin film for forming the cladding layer is volatilized to ensure complete adhesion with the core layer 3. It is preferable not to cure. This is to prevent adverse effects such as erosion of the solvent by the solvent when the upper clad layer is later laminated.
  • a clad layer forming resin containing a phenoxy resin as a base polymer and a bifunctional epoxy resin as a photopolymerizable compound it may be cured at a temperature of 90 to 150 ° C. for about 10 to 120 minutes.
  • the lower cladding layer 2 is preferably flat without a step on the surface on the core layer lamination side, from the viewpoint of adhesion to the core layer described later. Moreover, the surface flatness of the clad layer 2 can be ensured by using the resin film for forming the clad layer.
  • the clad layer forming resin 20 is irradiated with light or The clad layer 2 is formed by curing by heating. At this time, the clad layer forming resin 20 is preferably formed on the support film 10 subjected to the adhesion treatment.
  • the protective film 11 is preferably not subjected to an adhesion treatment in order to facilitate peeling from the clad layer forming resin film 200, and may be subjected to a mold release treatment as necessary.
  • the core layer 3 is formed on the lower clad layer 2 by a second step described in detail below.
  • the core layer forming resin film 300 is laminated on the lower cladding layer 2 to form the core layer 3 having a higher refractive index than the lower cladding layer 2.
  • the core layer forming resin film 300 is bonded onto the lower cladding layer 2 and the core layer 3 is laminated.
  • a roll laminator or a flat plate laminator can be used for the lamination. For example, when using the roll laminator 5 (FIG.
  • the laminating temperature of the bubbles is preferably in the range of room temperature (25 ° C.) to 100 ° C.
  • the temperature is higher than room temperature, the adhesion between the lower clad layer and the core layer is improved, and when the temperature is 40 ° C. or higher, the adhesion can be further improved.
  • the required film thickness can be obtained without the core layer flowing during roll lamination.
  • the range of 40 to 100 ° C. is more preferable.
  • the pressure is preferably 0.2 to 0.9 MPa.
  • the laminating speed is preferably 0.1 to 3 m / min, but these conditions are not particularly limited.
  • the flat plate laminator refers to a laminator in which a laminated material is sandwiched between a pair of flat plates and pressed by pressing the flat plates.
  • a vacuum pressurizing laminator described in Patent Document 2 can be suitably used.
  • the upper limit of the degree of vacuum which is a measure of pressure reduction, is preferably 10,000 Pa or less, and more preferably 1000 Pa or less.
  • the degree of vacuum is preferably low from the viewpoint of adhesion and followability.
  • the lower limit of the degree of vacuum is preferably about 10 Pa from the viewpoint of productivity (the time required for evacuation).
  • the heating temperature is preferably 40 to 130 ° C.
  • the pressure is preferably 0.1 to 1.0 MPa (1 to 10 kgf / cm 2 ), but these conditions are not particularly limited.
  • a roll laminator is preferably used from the viewpoint of reducing bubbles during lamination, and a flat plate laminator is used from the viewpoint of adhesion and flatness. Moreover, you may use these laminators together as needed.
  • the core layer forming resin film 300 is preferably composed of the core layer forming resin 30 and the support film 4 from the viewpoint of handleability.
  • the core layer forming resin 30 is disposed on the lower clad layer 2 side. And laminate.
  • the core layer forming resin film 300 may be composed of the core layer forming resin 30 alone.
  • the protective film 11 is provided on the opposite side of the base material of the core layer forming resin film 300, the core layer forming resin film 300 is laminated after the protective film 11 is peeled off.
  • the protective film 11 and the support film 4 have not been subjected to an adhesive treatment in order to facilitate peeling from the core layer-forming resin film 300, and may be subjected to a release treatment as necessary. Good.
  • the core layer 3 is exposed and developed to form an optical waveguide core pattern 8 (FIGS. 1D and 1E).
  • actinic rays are irradiated in an image form through the photomask pattern 7.
  • the active light source include known light sources that effectively emit ultraviolet rays, such as carbon arc lamps, mercury vapor arc lamps, ultrahigh pressure mercury lamps, high pressure mercury lamps, and xenon lamps.
  • those that effectively emit visible light such as a photographic flood bulb and a solar lamp, can be used.
  • the support film 4 of the resin film 300 for core layer formation remains, the support film 4 is peeled off, and the unexposed portion is removed and developed by wet development or the like to form the core pattern 8.
  • wet development development is performed by a known method such as spraying, rocking dipping, brushing, scraping, or the like, using an organic solvent developer suitable for the composition of the film.
  • organic solvent developers examples include N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, cyclohexanone, methyl ethyl ketone, methyl isobutyl ketone, ⁇ -butyrolactone, methyl cellosolve, ethyl cellosolve, propylene glycol monomethyl
  • organic solvent developers include N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, cyclohexanone, methyl ethyl ketone, methyl isobutyl ketone, ⁇ -butyrolactone, methyl cellosolve, ethyl cellosolve, propylene glycol monomethyl
  • examples include ether and propylene glycol monomethyl ether acetate. Moreover, you may use together 2 or more types of image development methods as needed.
  • Examples of the development method include a dip method, a paddle method, a spray method such as a high-pressure spray method, brushing, and scraping.
  • the high-pressure spray method is most suitable for improving the resolution.
  • heating at about 60 to 250 ° C. (preferably at about 110 to 150 ° C. for about 10 to 120 minutes) or exposure at about 0.1 to 1000 mJ / cm 2 is performed as necessary.
  • the core pattern 8 may be further cured and used so that the solvent is volatilized and erosion by the solvent does not occur.
  • a clad layer forming resin film 200 is laminated for embedding the core pattern 8.
  • the laminating is performed with the clad layer forming resin 20 facing the core pattern 8.
  • the thickness of the clad layer 9 is preferably larger than the thickness of the core layer 3 as described above.
  • Lamination is preferably performed by heat-pressing the clad layer forming resin film 200 in a reduced pressure atmosphere (FIG. 1 (f)).
  • the fourth step is preferably performed in a reduced-pressure atmosphere at the time of thermocompression bonding from the viewpoint of improving adhesion and followability.
  • the upper limit of the degree of vacuum which is a measure of pressure reduction, is preferably 10,000 Pa or less, and more preferably 1000 Pa or less.
  • the degree of vacuum is preferably low from the viewpoint of adhesion and followability.
  • the lower limit of the degree of vacuum is preferably about 10 Pa from the viewpoint of productivity (the time required for evacuation).
  • the heating temperature is preferably 40 to 130 ° C.
  • the pressure is preferably 0.1 to 1.0 MPa (1 to 10 kgf / cm 2 ), but these conditions are not particularly limited.
  • the clad layer-forming resin film 200 when the clad layer-forming resin film 200 is heat-pressed, at least one, and preferably both, are pressure-bonded using a stainless steel (SUS) plate, resulting in a uniform film thickness, compared with the case where a rubber plate is used. A flat upper cladding layer is formed.
  • SUS stainless steel
  • the protective film 11 is provided on the opposite side of the support film 10 of the clad layer forming resin film 200, the protective film 11 is peeled off and then the clad layer forming resin film 200 is laminated. Then, the clad layer 9 is formed by curing by light or heating. At this time, it is preferable that the clad layer forming resin 20 is formed on the support film 10 subjected to the adhesion treatment.
  • the protective film 11 is preferably not subjected to an adhesive treatment in order to facilitate peeling from the clad layer forming resin film 200, and may be subjected to a release treatment as necessary.
  • the lamination conditions such as temperature, pressure, and time are set such that the melt viscosity of the clad layer forming resin is 100 to 200 Pa ⁇ s when the upper clad layer forming resin film is laminated.
  • the melt viscosity is preferably 120 to 180 Pa ⁇ s.
  • the melt viscosity is preferably a melt viscosity at 40 to 130 ° C.
  • the melt viscosity is more preferably a melt viscosity at 50 to 100 ° C., and further preferably a melt viscosity at 100 ° C.
  • the optical waveguide of the present invention is an optical waveguide in which a lower clad layer, a core pattern, and an upper clad layer are sequentially laminated on a base material.
  • the upper clad layer has a melt viscosity of 100 to 200 Pa ⁇ s at the time of lamination. It is an optical waveguide formed from a certain resin.
  • the optical waveguide is an optical waveguide in which a lower clad layer, a core pattern, and an upper clad layer are sequentially laminated on a base material.
  • the upper clad layer has a melt viscosity of 100 to 100 ° C., preferably 40 to 130 ° C.
  • It may be an optical waveguide formed of a resin having a viscosity of 200 Pa ⁇ s, and the upper cladding layer includes a phenoxy resin-based pace polymer and a bifunctional epoxy resin, and has a melt viscosity of 100 to 90 ° C. at 90 to 120 ° C.
  • An optical waveguide formed from a resin having a pressure of 200 Pa ⁇ s is preferable.
  • the melt viscosity is preferably 120 to 180 Pa ⁇ s.
  • the type of base polymer or polymerizable compound (structure, molecular weight, glass transition temperature, viscosity, etc.) used as the resin composition Alternatively, it can be obtained by appropriately adjusting the blending ratio thereof.
  • the base polymer include phenoxy resin, epoxy resin solid at room temperature, (meth) acrylic polymer, acrylic rubber, polyurethane, polyimide, polyamide, polyamideimide, polysiloxane and the like.
  • the molecular weight of the base polymer is preferably 5,000 or more in terms of number average molecular weight, more preferably 10,000 or more, and particularly preferably 30,000 or more in order to form a resin film.
  • the upper limit of the number average molecular weight is not particularly limited, but is preferably 1,000,000 or less, more preferably 900,000 or less, particularly 800,000 from the viewpoint of compatibility with the polymerizable compound component. The following is preferable.
  • the number average molecular weight in the present invention is a value measured by gel permeation chromatography (GPC) and converted to standard polystyrene.
  • numerator can be used.
  • Specific examples include (meth) acrylates, vinylidene halides, vinyl ethers, vinyl pyridines, vinyl phenols, etc.
  • (meth) acrylates are preferable from the viewpoint of transparency and heat resistance.
  • the (meth) acrylate any of monofunctional, bifunctional, and trifunctional can be used.
  • (meth) acrylate means acrylate and methacrylate. It is also preferable to include a compound having two or more epoxy groups in the molecule.
  • bifunctional aromatic glycidyl ethers such as bisphenol A type epoxy resin, tetrabromobisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol AD type epoxy resin, naphthalene type epoxy resin; phenol novolac type epoxy resin, Polyfunctional aromatic glycidyl ethers such as cresol novolac type epoxy resin, dicyclopentadiene-phenol type epoxy resin, tetraphenylolethane type epoxy resin; polyethylene glycol type epoxy resin, polypropylene glycol type epoxy resin, neopentyl glycol type epoxy resin, Bifunctional aliphatic glycidyl ether such as hexanediol type epoxy resin; Bifunctional alicyclic glycidyl ether such as hydrogenated bisphenol A type epoxy resin; Polyfunctional aliphatic glycidyl ethers such as roll propane type epoxy resin, sorbitol type epoxy resin, glycerin type epoxy resin; bifunctional aromatic glycid
  • These polymerizable compounds usually have a molecular weight of about 100 to 2000, more preferably about 150 to 1000, and those that are liquid at room temperature are suitably used. Moreover, these compounds can be used individually or in combination of 2 or more types, Furthermore, it can also be used in combination with another polymeric compound. In addition, the molecular weight of the polymerizable compound in the present invention can be measured by GPC method or mass spectrometry.
  • the blending ratio of the base polymer and the polymerizable compound is preferably 10 to 80% by mass of the base polymer with respect to the total amount of these components. It becomes easy to set it as a film form as it is 10 mass% or more.
  • the range of 20 to 70% by mass is more preferable.
  • the melt viscosity of the resin for forming the upper clad layer is prepared by preparing a measurement sample having a film thickness of 200 to 500 ⁇ m and sandwiching the sample in parallel with a pair of circular plates having a diameter of 2 cm.
  • the measurement was carried out with an elastic measuring device (TA Instruments, ARES-2KSTD) at a heating rate of 5 ° C./min. More specifically, the measurement was performed under the conditions of a shear frequency of 1 Hz and a strain of 5% (rotation angle of 9 degrees).
  • a clad layer-forming resin is applied and dried on a support film such as a polyamide film, and then a release PET film or the like is protected.
  • the protective film and the support film are peeled off, the clad layer forming resin layer is taken out, and a plurality of clad forming resin layers are overlaid, and a vacuum pressure laminator Using MVLP-500 (manufactured by Meiki Seisakusho Co., Ltd.), it was evacuated to 500 Pa or less and then pressurized under the conditions of pressure 0.4 MPa, temperature 50 ° C., and time 30 seconds.
  • the number of clad forming resin layers to be overlaid was adjusted so that the film thickness after pressing was in the range of 200 to 500 ⁇ m.
  • the heat treatment condition is preferably a temperature of 40 ° C. to 200 ° C., more preferably 50 to 100 ° C.
  • the heat treatment time is preferably 15 to 120 minutes. Within this time range, no bubbles remain and workability is not sacrificed. From these viewpoints, the heat treatment time is more preferably 20 to 60 minutes.
  • Example 1 [Production of resin film for clad layer formation]
  • A As base polymer (binder polymer), 48 parts by mass of phenoxy resin (trade name: Phenototo YP-70, manufactured by Tohto Kasei Co., Ltd., number average molecular weight 43000)
  • B As a photopolymerizable compound, alicyclic Diepoxycarboxylate (trade name: KRM-2110, molecular weight: 252, manufactured by Asahi Denka Kogyo Co., Ltd.) 49.6 parts by mass
  • C As a photopolymerization initiator, triphenylsulfonium hexafluoroantimonate salt (trade name: 2 parts by mass of SP-170, manufactured by Asahi Denka Kogyo Co., Ltd., 0.4 parts by mass of SP-100 (trade name, manufactured by Asahi Denka Kogyo Co., Ltd.
  • the mixture is filtered under pressure at a temperature of 25 ° C. and a pressure of 0.4 MPa, and further the degree of vacuum using a vacuum pump and a bell jar. Degassed under reduced pressure for 15 minutes under the condition of 50 mmHg.
  • the resin varnish A for forming a clad layer obtained above is coated on a corona-treated surface of a polyamide film (trade name: Miktron, manufactured by Toray Industries, Inc., thickness: 12 ⁇ m) (Multicoater TM-MC, Inc.
  • a release PET film (trade name: Purex A31, Teijin DuPont Films Co., Ltd., thickness: 25 ⁇ m) ) was attached so that the release surface was on the resin side to obtain a resin film for forming a cladding layer.
  • the thickness of the resin layer can be arbitrarily adjusted by adjusting the gap of the coating machine.
  • the cured film thickness is 25 ⁇ m for the lower cladding layer and 80 ⁇ m for the upper cladding layer. Adjusted.
  • A As a base polymer (binder polymer), 26 parts by mass of phenoxy resin (trade name: Phenotote YP-70, manufactured by Tohto Kasei Co., Ltd.), (B) 9,9-bis [4- (2-acryloyloxyethoxy) phenyl] fluorene (trade name: A-BPEF, Shin-Nakamura Chemical Co., Ltd.) 36 parts by mass, and bisphenol A type epoxy acrylate (trade name: EA-1020, Shin-Nakamura Chemical Co., Ltd.) 36 parts by mass, (C) 1 part by mass of bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide (trade name: Irgacure 819, manufactured by Ciba Specialty Chemicals) as a photopolymerization initiator, and 1- [4- (2-hydroxyethoxy) phenyl] -2-hydroxy-2-methyl-1-propane-1 ON (
  • the core layer-forming resin varnish B obtained above is applied to the non-treated surface of a PET film (trade name: Cosmo Shine A1517, manufactured by Toyobo Co., Ltd., thickness: 16 ⁇ m) in the same manner as in the above production example.
  • a release PET film (trade name: PUREX A31, Teijin DuPont Films Co., Ltd., thickness: 25 ⁇ m) is applied as a protective film so that the release surface is on the resin side, and a core layer forming resin A film was obtained.
  • the gap of the coating machine was adjusted so that the film thickness after curing was 50 ⁇ m.
  • the lower clad layer 2 was formed by irradiating ultraviolet rays (wavelength 365 nm) with 1 J / cm 2 from the opposite side of the body film and then heat-treating at 80 ° C. for 10 minutes (see FIG. 1A).
  • a roll laminator (HLM-1500, manufactured by Hitachi Chemical Technoplant Co., Ltd.) is used on the lower clad layer 2 under the conditions of a pressure of 0.4 MPa, a temperature of 50 ° C., and a laminating speed of 0.2 m / min.
  • the layer forming resin film was laminated to form the core layer 30 (see FIG. 1B).
  • a vacuum pressurizing laminator manufactured by Meiki Seisakusho Co., Ltd., MVLP-500
  • MVLP-500 vacuumed to 500 Pa or less, pressure 0.4 MPa, temperature 100 ° C., pressurizing time
  • the resin film for forming a clad layer was laminated under a condition of 30 seconds (see FIG. 1 (f)).
  • the melt viscosity of the upper clad layer forming resin film at a temperature of 100 ° C. was 170 Pa ⁇ s.
  • ultraviolet light (wavelength 365 nm) is irradiated on both surfaces in total at 25 J / cm 2 , and then heat-treated at 160 ° C.
  • the flexible optical waveguide was treated for 24 hours at 85 ° C./85% in a high temperature and high humidity condition to produce a flexible optical waveguide from which the support film was removed.
  • the appearance of the flexible optical waveguide thus produced was examined under a microscope with a magnification of 50 times, and it was confirmed that there were no bubbles in contact with the core.
  • the propagation loss of the manufactured optical waveguide was determined by using a cut-back method using an 850 nm surface emitting laser (EXFO, FLS-300-01-VCL) as a light source, and Advantest Co., Ltd., Q82214 as a light receiving sensor.
  • EXFO 850 nm surface emitting laser
  • Q82214 Q82214 as a light receiving sensor.
  • Example 1 a flexible optical waveguide was produced in the same manner as in Example 1 except that the lamination temperature at the time of forming the upper clad was 60 ° C., 65 ° C., 80 ° C., and 90 ° C.
  • the melt viscosities of the resin films for forming the upper cladding layer at temperatures of 60 ° C., 65 ° C., 80 ° C., and 90 ° C. were 1720 Pa ⁇ s, 1180 Pa ⁇ s, 445 Pa ⁇ s, and 260 Pa ⁇ s, respectively.
  • five or more bubbles having a size of 5 ⁇ m or more remaining in contact with the core remained.
  • the propagation loss of the manufactured optical waveguide was determined by using a cut-back method using an 850 nm surface emitting laser (EXFO, FLS-300-01-VCL) as a light source, and Advantest Co., Ltd., Q82214 as a light receiving sensor.
  • EXFO 850 nm surface emitting laser
  • Q82214 Q82214 as a light receiving sensor.
  • Example 2 [Production of resin film for clad layer formation]
  • A As a base polymer (binder polymer), 50 parts by mass of a phenoxy resin (trade name: Phenototo YP-70, manufactured by Tohto Kasei Co., Ltd.),
  • B As a photopolymerizable compound, an alicyclic diepoxycarboxylate ( Product name: KRM-2110, molecular weight: 252, manufactured by Asahi Denka Kogyo Co., Ltd.) 50 parts by mass,
  • C As a photopolymerization initiator, triphenylsulfonium hexafluoroantimonate salt (trade name: SP-170, Asahi Denka Kogyo) Co., Ltd.) 2 parts by weight, 40 parts by weight of propylene glycol monomethyl ether acetate as an organic solvent are weighed in a wide-mouthed plastic bottle, using a mechanical stirrer, shaft and propeller, at a
  • the clad layer-forming resin varnish A obtained above was coated on a non-treated surface of a PET film (trade name: Cosmo Shine A4100, manufactured by Toyobo Co., Ltd., thickness: 50 ⁇ m) (Multicoater TM-MC , Manufactured by Hirano Tech Seed Co., Ltd., dried at 80 ° C. for 10 minutes, then at 100 ° C. for 10 minutes, and then as a protective film, a release PET film (trade name: Purex A31, Teijin DuPont Films, Inc., thickness 25 ⁇ m) was attached so that the release surface was on the resin side, and a resin film for forming a clad layer was obtained.
  • a PET film trade name: Cosmo Shine A4100, manufactured by Toyobo Co., Ltd., thickness: 50 ⁇ m
  • Multicoater TM-MC Manufactured by Hirano Tech Seed Co., Ltd., dried at 80 ° C. for 10 minutes, then at 100 ° C
  • the thickness of the resin layer can be arbitrarily adjusted by adjusting the gap of the coating machine.
  • the cured film thickness is 30 ⁇ m for the lower cladding layer and 60 ⁇ m for the upper cladding layer. Adjusted.
  • a resin varnish B for forming a core layer was prepared in the same manner and under the same conditions as in Example 1. Thereafter, pressure filtration and degassing under reduced pressure were carried out under the same method and conditions as in the above production example.
  • the core layer-forming resin varnish B obtained above is applied to the non-treated surface of a PET film (trade name: Cosmo Shine A1517, manufactured by Toyobo Co., Ltd., thickness: 16 ⁇ m) in the same manner as in the above production example.
  • a release PET film (trade name: PUREX A31, Teijin DuPont Films Co., Ltd., thickness: 25 ⁇ m) is applied as a protective film so that the release surface is on the resin side, and a core layer forming resin A film was obtained.
  • the gap of the coating machine was adjusted so that the film thickness after curing was 40 ⁇ m.
  • a method for manufacturing the optical waveguide will be described below.
  • a silane coupling agent manufactured by Toray Dow Corning Co., Ltd. [Z6040]
  • Z6040 Toray Dow Corning Co., Ltd.
  • the coating was carried out under conditions of 10 seconds, further 1500 rpm / 30 seconds, and then heated on a hot plate at 120 ° C. for 3 minutes.
  • “1H-D2” manufactured by Mikasa Co., Ltd. was used.
  • the protective film of the clad layer forming resin film produced above is peeled off, and the laminator (manufactured by Hitachi Chemical Technoplant Co., Ltd.) is made so that the resin layer for forming the clad layer is in contact with the silicon substrate subjected to the silane coupling treatment.
  • HLM-1500 was roll-laminated under the conditions of 80 ° C., 0.5 MPa, and feed rate of 0.5 m.
  • ultraviolet rays (wavelength 365 nm) were irradiated from the resin side (opposite side of the support film) at 1 J / cm 2 with an ultraviolet exposure machine (EXM-1172, manufactured by Oak Manufacturing Co., Ltd.), and a PET film (support film) After peeling off Cosmo Shine A4100), the lower clad layer 2 was formed by heat treatment at 120 ° C. for 60 minutes (see FIG. 4A).
  • a roll laminator (HLM-1500, manufactured by Hitachi Chemical Technoplant Co., Ltd.) is used on the lower clad layer 2 under the conditions of a pressure of 0.4 MPa, a temperature of 50 ° C., and a laminating speed of 0.2 m / min.
  • the layer forming resin film was laminated to form the core layer 30 (see FIG. 4B).
  • cleaning liquid isopropanol
  • a vacuum pressurizing laminator manufactured by Meiki Seisakusho Co., Ltd., MVLP-500
  • MVLP-500 vacuum pressurizing laminator
  • the resin film for forming a clad layer was laminated under the condition of 30 seconds (see FIG. 4 (e)).
  • the melt viscosity of the resin film for forming the upper cladding layer at a temperature of 100 ° C. was 121 Pa ⁇ s.
  • the upper cladding layer 9 was formed by heat treatment at 160 ° C.
  • Example 2 a flexible optical waveguide was produced in the same manner as in Example 2 except that the lamination temperature at the time of forming the upper clad was 60 ° C., 70 ° C., 80 ° C., and 90 ° C.
  • the melt viscosities of the upper clad layer forming resin films at temperatures of 60 ° C., 65 ° C., 80 ° C., and 90 ° C. were 1670 Pa ⁇ s, 842 Pa ⁇ s, 383 Pa ⁇ s, and 233 Pa ⁇ s, respectively.
  • the flexible optical waveguide produced under these conditions five or more bubbles having a size of 5 ⁇ m or more remaining in contact with the core remained.
  • the propagation loss of the manufactured optical waveguide was measured in the same manner as in Example 1, it was 0.1 dB / cm, and it was found that the propagation loss was degraded due to bubbles.
  • Example 3 [Production of resin film for clad layer formation]
  • A As a base polymer (binder polymer), 48 parts by mass of phenoxy resin (trade name: Phenototo YP-70, manufactured by Tohto Kasei Co., Ltd.),
  • B As a photopolymerizable compound, an alicyclic diepoxycarboxylate ( Product name: KRM-2110, molecular weight: 252, manufactured by Asahi Denka Kogyo Co., Ltd.) 49.6 parts by mass
  • C As a photopolymerization initiator, triphenylsulfonium hexafluoroantimonate salt (trade name: SP-170, Asahi 2 parts by mass of Denka Kogyo Co., Ltd., 0.4 parts by mass of SP-100 (trade name, manufactured by Asahi Denka Kogyo Co., Ltd.) as a sensitizer, and 40 parts by mass of propylene glycol monomethyl
  • the mixture is filtered under pressure at a temperature of 25 ° C. and a pressure of 0.4 MPa, and further the degree of vacuum using a vacuum pump and a bell jar. Degassed under reduced pressure for 15 minutes under the condition of 50 mmHg.
  • the resin varnish A for forming a clad layer obtained above is coated on a corona-treated surface of a polyamide film (trade name: Miktron, manufactured by Toray Industries, Inc., thickness: 12 ⁇ m) (Multicoater TM-MC, Inc.
  • a release PET film (trade name: Purex A31, Teijin DuPont Films Co., Ltd., thickness: 25 ⁇ m) ) was attached so that the release surface was on the resin side to obtain a resin film for forming a cladding layer.
  • the thickness of the resin layer can be arbitrarily adjusted by adjusting the gap of the coating machine.
  • the cured film thickness is 25 ⁇ m for the lower cladding layer and 80 ⁇ m for the upper cladding layer. Adjusted.
  • A As a base polymer (binder polymer), 26 parts by mass of phenoxy resin (trade name: Phenotote YP-70, manufactured by Tohto Kasei Co., Ltd.), (B) 9,9-bis [4- (2-acryloyloxyethoxy) phenyl] fluorene (trade name: A-BPEF, Shin-Nakamura Chemical Co., Ltd.) 36 parts by mass, and bisphenol A type epoxy acrylate (trade name: EA-1020, Shin-Nakamura Chemical Co., Ltd.) 36 parts by mass, (C) 1 part by mass of bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide (trade name: Irgacure 819, manufactured by Ciba Specialty Chemicals) as a photopolymerization initiator, and 1- [4- (2-hydroxyethoxy) phenyl] -2-hydroxy-2-methyl-1-propane-1 ON (
  • the core layer-forming resin varnish B obtained above is applied to the non-treated surface of a PET film (trade name: Cosmo Shine A1517, manufactured by Toyobo Co., Ltd., thickness: 16 ⁇ m) in the same manner as in the above production example.
  • a release PET film (trade name: PUREX A31, Teijin DuPont Films Co., Ltd., thickness: 25 ⁇ m) is applied as a protective film so that the release surface is on the resin side, and a core layer forming resin A film was obtained.
  • the gap of the coating machine was adjusted so that the film thickness after curing was 70 ⁇ m.
  • the lower clad layer 2 was formed by irradiating ultraviolet rays (wavelength 365 nm) with 1 J / cm 2 from the opposite side of the body film and then heat-treating at 80 ° C. for 10 minutes (see FIG. 1A).
  • a roll laminator (HLM-1500, manufactured by Hitachi Chemical Technoplant Co., Ltd.) is used on the lower clad layer 2 under the conditions of a pressure of 0.4 MPa, a temperature of 50 ° C., and a laminating speed of 0.2 m / min.
  • the layer forming resin film was laminated to form the core layer 30 (see FIG. 1B).
  • a vacuum pressurizing laminator manufactured by Meiki Seisakusho Co., Ltd., MVLP-500
  • MVLP-500 vacuumed to 500 Pa or lower, pressure 0.4 MPa, temperature 60 ° C., pressurizing time
  • the resin film 1 for forming a clad layer was laminated under a condition of 30 seconds (see FIG. 1 (f)).
  • FIG. 1 (f) when an appearance inspection was performed under a microscope with a magnification of 100, four bubbles were in contact with the core in the upper clad (see FIG. 5).
  • heating was performed in a heating furnace at 50 ° C. for 30 minutes, and the appearance was similarly examined under a microscope.
  • ultraviolet light (wavelength 365 nm) is irradiated on both surfaces in total at 25 J / cm 2 , and then heat-treated at 160 ° C. for 1 hour to form a flexible optical waveguide in which the upper clad layer 9 is formed and the support film is disposed outside. It produced (refer FIG.1 (g)).
  • the flexible optical waveguide was treated for 24 hours at 85 ° C./85% in a high temperature and high humidity condition to produce a flexible optical waveguide from which the support film was removed.
  • Propagation loss of the manufactured optical waveguide was measured using a cut-back method (measurement) using a 850 nm surface emitting laser (EXFO, FLS-300-01-VCL) as the light source, and Advantest Q82214 as the light receiving sensor.
  • the bubbles could be eliminated even when the heating temperature after the upper clad lamination was 60 ° C., 70 ° C., 80 ° C., 90 ° C., 100 ° C.
  • Comparative Example 3 An optical waveguide was produced by the same optical waveguide forming resin film and process as in Example 3 except that the heat treatment after the upper clad lamination was not performed. As a result, bubbles remained after the upper clad lamination remained as it was.
  • the propagation loss of the optical waveguide manufactured under these conditions is 0.1 dB / cm, and it has been found that the propagation loss is deteriorated due to bubbles.
  • Example 4 [Production of resin film for clad layer formation]
  • A As a base polymer (binder polymer), 50 parts by mass of a phenoxy resin (trade name: Phenototo YP-70, manufactured by Tohto Kasei Co., Ltd.),
  • B As a photopolymerizable compound, an alicyclic diepoxycarboxylate ( Product name: KRM-2110, molecular weight: 252, manufactured by Asahi Denka Kogyo Co., Ltd.) 50 parts by mass,
  • C As a photopolymerization initiator, triphenylsulfonium hexafluoroantimonate salt (trade name: SP-170, Asahi Denka Kogyo) Co., Ltd.) 2 parts by weight, 40 parts by weight of propylene glycol monomethyl ether acetate as an organic solvent are weighed in a wide-mouthed plastic bottle, using a mechanical stirrer, shaft and propeller, at a
  • the clad layer-forming resin varnish A obtained above is coated on an easy-adhesion treated surface of a PET film (trade name: Cosmo Shine A1517, manufactured by Toyobo Co., Ltd., thickness: 16 ⁇ m) (Multicoater TM- MC, manufactured by Hirano Tech Seed Co., Ltd., dried at 80 ° C. for 10 minutes, then at 100 ° C. for 10 minutes, and then released as a protective PET film (trade name: Purex A31, Teijin DuPont Film Co., Ltd.) (Thickness: 25 ⁇ m) was pasted so that the release surface was on the resin side to obtain a resin film for forming a cladding layer.
  • a PET film trade name: Cosmo Shine A1517, manufactured by Toyobo Co., Ltd., thickness: 16 ⁇ m
  • Multicoater TM- MC manufactured by Hirano Tech Seed Co., Ltd., dried at 80 ° C. for 10 minutes, then at 100 ° C. for 10 minutes
  • the thickness of the resin layer can be arbitrarily adjusted by adjusting the gap of the coating machine.
  • the thickness after curing is 30 ⁇ m for the lower cladding layer and 80 ⁇ m for the upper cladding layer. Adjusted.
  • a resin film for forming a core layer was obtained by the same method and conditions as in Example 3. In this example, the gap of the coating machine was adjusted so that the film thickness after curing was 50 ⁇ m.
  • the lower clad layer 2 was formed by irradiating ultraviolet rays (wavelength 365 nm) with 1 J / cm 2 from the opposite side of the support film, followed by heat treatment at 80 ° C. for 10 minutes (see FIG. 1A).
  • a roll laminator (HLM-1500, manufactured by Hitachi Chemical Technoplant Co., Ltd.) is used on the lower clad layer 2 under the conditions of a pressure of 0.4 MPa, a temperature of 50 ° C., and a laminating speed of 0.2 m / min.
  • the layer forming resin film was laminated to form the core layer 30 (see FIG. 1B).
  • a vacuum pressurizing laminator manufactured by Meiki Seisakusho Co., Ltd., MVLP-500
  • the resin film 1 for forming a clad layer was laminated under a condition of 30 seconds (see FIG. 1 (f)).
  • an appearance inspection was performed under a microscope with a magnification of 100, there were three bubbles in the upper clad in contact with the core. Then, in order to lose
  • ultraviolet rays (wavelength 365 nm) are irradiated on both surfaces in total 6 J / cm 2 , and then heat-treated at 120 ° C. for 1 hour to form an upper clad layer 9 and a flexible optical waveguide having a support film disposed on the outside. It produced (refer FIG.1 (g)).
  • Propagation loss of the manufactured optical waveguide was measured using a cut-back method (measurement) using a 850 nm surface emitting laser (EXFO, FLS-300-01-VCL) as the light source, and Advantest Q82214 as the light receiving sensor.
  • EXFO 850 nm surface emitting laser
  • Comparative Example 4 An optical waveguide was produced by the same optical waveguide forming resin film and process as in Example 4 except that the heat treatment after the upper clad lamination was not performed. As a result, bubbles remained after the upper clad lamination remained as it was.
  • the propagation loss of the optical waveguide manufactured under these conditions is 0.1 dB / cm, and it has been found that the propagation loss is deteriorated due to bubbles.
  • Example 5 (second manufacturing method) In Example 4, except that the support film of the resin film for forming the clad was changed to a PET film having a thickness of 25 ⁇ m (trade name: Purex A31, Teijin DuPont Film Co., Ltd., non-treated surface used) An optical waveguide was prepared in the same manner as in 2. At this time, after the upper clad lamination, when an appearance inspection was performed under a microscope with a magnification of 100 times, there were four bubbles in the upper clad in contact with the core. Even in this case, bubbles could be eliminated by setting the heating temperature after the upper clad lamination to 50 ° C., 60 ° C., 70 ° C., 80 ° C., 90 ° C., and 100 ° C.
  • Comparative Example 5 An optical waveguide was produced by the same optical waveguide forming resin film and process as in Example 5 except that the heat treatment after the upper clad lamination was not performed. As a result, bubbles remained after the upper clad lamination remained as it was.
  • Example 6 (second manufacturing method)
  • the support film of the resin film for forming a clad was changed to an aramid film having a thickness of 9 ⁇ m (trade name: Mikutron, Toray Industries, Inc., using a corona-treated surface), as in Example 3.
  • An optical waveguide was produced.
  • an appearance inspection was performed under a microscope with a magnification of 100.
  • bubbles could be eliminated by setting the heating temperature after the upper clad lamination to 40 ° C. and the heating time to 60 minutes.
  • Comparative Example 6 An optical waveguide was produced by the same optical waveguide forming resin film and process as in Example 6 except that the heat treatment after the upper clad lamination was not performed. As a result, bubbles remained after the upper clad lamination remained as it was.
  • the optical waveguide can be manufactured with high productivity, and no bubbles remain between the core layer and the upper cladding layer.
  • the optical waveguide can be manufactured with high productivity, and no bubbles remain between the core layer and the upper cladding layer, and the upper cladding layer is flat. For this reason, it is extremely useful as a manufacturing method of a highly practical optical waveguide.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ophthalmology & Optometry (AREA)

Abstract

La présente invention concerne un procédé de fabrication d'un guide d'onde optique qui comporte une étape consistant à former une couche de placage inférieure par le durcissement d'une résine de formation de couche de placage formée sur un matériau de base ; une étape consistant à former une couche centrale par stratification, sur la couche de placage inférieure, d'un film de résine permettant de former la couche centrale ; une étape consistant à former un motif central par l'exposition et le développement de la couche centrale ; et une étape consistant à former une couche de placage supérieure par la stratification, sur le motif central, d'un film de résine pour la formation d'une couche de placage supérieure et à durcir la résine de formation de couche de placage. Au moment de la stratification du film de résine pour former la couche de placage supérieure, les conditions de stratification sont contrôlées de façon que la viscosité à l'état fondu de la résine de formation de couche de placage soit de 100 à 200 Pa·s. Le guide d'onde optique est formé d'une résine présentant une viscosité à l'état fondu de 100 à 200 Pa·s. Dans le procédé de fabrication d'un guide d'onde optique, le guide d'onde optique peut être fabriqué avec une productivité élevée et aucune bulle ne reste entre la couche centrale et la couche de placage supérieure.
PCT/JP2009/058827 2008-05-13 2009-05-12 Procédé de fabrication d’un guide d’onde optique et guide d’onde optique Ceased WO2009139375A1 (fr)

Priority Applications (2)

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CN200980117381.9A CN102027400B (zh) 2008-05-13 2009-05-12 光波导的制造方法及光波导
JP2010511979A JP5360055B2 (ja) 2008-05-13 2009-05-12 光導波路の製造方法及び光導波路

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JP (2) JP5360055B2 (fr)
KR (1) KR20110014150A (fr)
CN (1) CN102027400B (fr)
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JP2013015736A (ja) * 2011-07-05 2013-01-24 Hitachi Chem Co Ltd フレキシブル光導波路及びフレキシブル光電気複合基板
JP2023096847A (ja) * 2021-12-27 2023-07-07 住友ベークライト株式会社 光導波路の製造方法

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JP5308398B2 (ja) * 2010-05-11 2013-10-09 日東電工株式会社 光導波路形成用樹脂組成物およびそれを用いた光導波路
JP5351096B2 (ja) * 2010-06-02 2013-11-27 日東電工株式会社 光導波路の製法
WO2017209137A1 (fr) * 2016-06-02 2017-12-07 旭硝子株式会社 Guide d'ondes optique en résine
JP6859136B2 (ja) * 2017-03-03 2021-04-14 日東電工株式会社 光導波路コア形成用感光性エポキシ樹脂組成物、光導波路コア形成用感光性フィルム、光導波路、光電気混載基板および光導波路の製造方法

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WO2005080458A1 (fr) * 2004-02-25 2005-09-01 Kansai Paint Co., Ltd. Composition de résine durcissable pour guide de lumière, film sec durcissable pour guide de lumière, guide de lumière et méthode pour former la partie centrale d'un guide de lumière
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JP2023096847A (ja) * 2021-12-27 2023-07-07 住友ベークライト株式会社 光導波路の製造方法

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JP2013214111A (ja) 2013-10-17
JPWO2009139375A1 (ja) 2011-09-22
TWI452363B (zh) 2014-09-11
TW200951520A (en) 2009-12-16
KR20110014150A (ko) 2011-02-10
JP5610046B2 (ja) 2014-10-22
CN102027400B (zh) 2016-03-30
CN102027400A (zh) 2011-04-20
JP5360055B2 (ja) 2013-12-04

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