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WO2009035089A1 - 電子材料用洗浄剤 - Google Patents

電子材料用洗浄剤 Download PDF

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Publication number
WO2009035089A1
WO2009035089A1 PCT/JP2008/066558 JP2008066558W WO2009035089A1 WO 2009035089 A1 WO2009035089 A1 WO 2009035089A1 JP 2008066558 W JP2008066558 W JP 2008066558W WO 2009035089 A1 WO2009035089 A1 WO 2009035089A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrates
cleaning agent
cleaning
electronic materials
surfactant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/066558
Other languages
English (en)
French (fr)
Inventor
Kazumitsu Suzuki
Ayayo Sugiyama
Yoshitaka Katsukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Chemical Industries Ltd
Original Assignee
Sanyo Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Chemical Industries Ltd filed Critical Sanyo Chemical Industries Ltd
Priority to CN200880106471A priority Critical patent/CN101848987A/zh
Publication of WO2009035089A1 publication Critical patent/WO2009035089A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

　磁気ディスク基板、フラットパネルディスプレイ基板及びフォトマスク基板等の電子材料基板の表面の平坦性を損ねることなく適度なエッチング性を付与し、また界面活性剤を用いて基板表面から脱離したパーティクルの分散性を高めることで、優れたパーティクルの除去性を実現し、これにより、製造時における歩留まり率の向上や短時間での洗浄が可能となる極めて効率的な高度洗浄を可能にする磁気ディスク基板、フラットパネルディスプレイ基板及びフォトマスク基板等の電子材料用洗浄剤を提供する。この電子材料用洗浄剤は、界面活性剤（Ａ）を含有してなる電子材料用洗浄剤であって、洗浄液として使用される場合の有効成分濃度における２５°CでのｐＨ及び酸化還元電位（Ｖ）［単位はｍＶ、ｖｓＳＨＥ］が下記数式（１）を満たすことを特徴とする。 　　　　　Ｖ　≦　－３８．７×ｐＨ＋５５０　　　　　（１）
PCT/JP2008/066558 2007-09-14 2008-09-12 電子材料用洗浄剤 Ceased WO2009035089A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN200880106471A CN101848987A (zh) 2007-09-14 2008-09-12 电子材料用清洁剂

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007239474 2007-09-14
JP2007239356 2007-09-14
JP2007-239356 2007-09-14
JP2007-239474 2007-09-14

Publications (1)

Publication Number Publication Date
WO2009035089A1 true WO2009035089A1 (ja) 2009-03-19

Family

ID=40452095

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/066558 Ceased WO2009035089A1 (ja) 2007-09-14 2008-09-12 電子材料用洗浄剤

Country Status (5)

Country Link
CN (1) CN101848987A (ja)
MY (1) MY156414A (ja)
SG (1) SG184735A1 (ja)
TW (1) TWI398514B (ja)
WO (1) WO2009035089A1 (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010257510A (ja) * 2009-04-22 2010-11-11 Kao Corp ハードディスク用基板用の洗浄剤組成物
WO2012009968A1 (zh) * 2010-07-23 2012-01-26 安集微电子（上海）有限公司 一种光刻胶的清洗液
JP2012017420A (ja) * 2010-07-08 2012-01-26 Neos Co Ltd 水溶性洗浄剤組成物
CN102346383A (zh) * 2010-08-06 2012-02-08 安集微电子（上海）有限公司 一种光刻胶的清洗液
JP2012177055A (ja) * 2011-02-28 2012-09-13 Sanyo Chem Ind Ltd 電子材料用洗浄剤
JP2013533360A (ja) * 2010-07-19 2013-08-22 ビーエーエスエフ ソシエタス・ヨーロピア 水性アルカリ性洗浄組成物およびそれらを使用する方法
CN108499963A (zh) * 2017-05-18 2018-09-07 苏州权素船舶电子有限公司 一种电子材料研磨清洗方法

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101673589B1 (ko) * 2009-10-30 2016-11-07 동우 화인켐 주식회사 평판표시장치의 유리기판용 세정제 조성물
JP5401359B2 (ja) * 2010-02-16 2014-01-29 花王株式会社 硬質表面用アルカリ洗浄剤組成物
CN102653706A (zh) * 2011-03-03 2012-09-05 宁波市鄞州声光电子有限公司 非金属元件清洁剂
KR20140053003A (ko) * 2011-05-24 2014-05-07 아사히 가라스 가부시키가이샤 세정제 및 유리 기판의 세정 방법
CN102981376A (zh) * 2011-09-05 2013-03-20 安集微电子（上海）有限公司 一种光刻胶清洗液
CN102604751B (zh) * 2012-01-20 2013-06-19 深圳市飞世尔实业有限公司 一种光学玻璃清洗剂
MY181715A (en) * 2012-09-20 2021-01-04 Hoya Corp Method for manufacturing glass substrate for information recording medium
CN104781204A (zh) * 2012-11-22 2015-07-15 旭硝子株式会社 玻璃基板的清洗方法
CN104673540A (zh) * 2013-11-30 2015-06-03 天津晶美微纳科技有限公司 一种水溶性液晶玻璃基板清洗剂及其制备方法
CN103668144B (zh) * 2013-12-24 2016-01-20 淮南天力生物工程开发有限公司 一种环保型有机金属处理液及其制备方法
CN104710608B (zh) * 2015-02-09 2016-11-23 上海金兆节能科技有限公司 醇醚磷酸酯及其制备方法和用该酯制备环保金属清洗剂
JP6046865B1 (ja) * 2015-05-13 2016-12-21 バンドー化学株式会社 研磨パッド及び研磨パッドの製造方法
CN104894593A (zh) * 2015-07-02 2015-09-09 傅宇晓 冷轧管材清洗液
CN105838507B (zh) * 2016-05-16 2019-02-01 深圳市路维光电股份有限公司 光罩清洗剂及清洗方法
CN106811347A (zh) * 2016-11-29 2017-06-09 洛阳新巨能高热技术有限公司 一种电子材料清洗剂
JP6495230B2 (ja) * 2016-12-22 2019-04-03 花王株式会社 シリコンウェーハ用リンス剤組成物
CN108004049A (zh) * 2017-12-28 2018-05-08 广州云普电子科技有限公司 一种具备防腐防锈功能的电子材料清洗剂
CN113195698A (zh) 2018-12-21 2021-07-30 恩特格里斯公司 用于化学机械研磨后(post-cmp)钴衬底的清洗的组合物和方法
CN121219828A (zh) * 2023-04-21 2025-12-26 Asml荷兰有限公司 衬底处理

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07161672A (ja) * 1993-12-10 1995-06-23 Tadahiro Omi 基体の表面洗浄方法及び表面洗浄剤
JP2001070898A (ja) * 1999-09-06 2001-03-21 Shin Etsu Chem Co Ltd 精密基板の洗浄液及び洗浄方法
JP2002069495A (ja) * 2000-06-16 2002-03-08 Kao Corp 洗浄剤組成物
JP2003119494A (ja) * 2001-10-05 2003-04-23 Nec Corp 洗浄組成物およびこれを用いた洗浄方法と洗浄装置
JP2003142441A (ja) * 2001-11-02 2003-05-16 Nec Electronics Corp 洗浄方法および洗浄液
JP2004217814A (ja) * 2003-01-16 2004-08-05 Nec Corp デバイス基板用の洗浄組成物及び該洗浄組成物を用いた洗浄方法並びに洗浄装置
WO2007125634A1 (ja) * 2006-03-31 2007-11-08 Sanyo Chemical Industries, Ltd. 銅配線用洗浄剤

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4107825B2 (ja) * 2001-10-16 2008-06-25 電気化学工業株式会社 スラグ系注入材スラリー

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07161672A (ja) * 1993-12-10 1995-06-23 Tadahiro Omi 基体の表面洗浄方法及び表面洗浄剤
JP2001070898A (ja) * 1999-09-06 2001-03-21 Shin Etsu Chem Co Ltd 精密基板の洗浄液及び洗浄方法
JP2002069495A (ja) * 2000-06-16 2002-03-08 Kao Corp 洗浄剤組成物
JP2003119494A (ja) * 2001-10-05 2003-04-23 Nec Corp 洗浄組成物およびこれを用いた洗浄方法と洗浄装置
JP2003142441A (ja) * 2001-11-02 2003-05-16 Nec Electronics Corp 洗浄方法および洗浄液
JP2004217814A (ja) * 2003-01-16 2004-08-05 Nec Corp デバイス基板用の洗浄組成物及び該洗浄組成物を用いた洗浄方法並びに洗浄装置
WO2007125634A1 (ja) * 2006-03-31 2007-11-08 Sanyo Chemical Industries, Ltd. 銅配線用洗浄剤

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010257510A (ja) * 2009-04-22 2010-11-11 Kao Corp ハードディスク用基板用の洗浄剤組成物
JP2012017420A (ja) * 2010-07-08 2012-01-26 Neos Co Ltd 水溶性洗浄剤組成物
JP2013533360A (ja) * 2010-07-19 2013-08-22 ビーエーエスエフ ソシエタス・ヨーロピア 水性アルカリ性洗浄組成物およびそれらを使用する方法
KR101855538B1 (ko) 2010-07-19 2018-05-04 바스프 에스이 수성 알칼리 세정 조성물 및 이의 사용 방법
WO2012009968A1 (zh) * 2010-07-23 2012-01-26 安集微电子（上海）有限公司 一种光刻胶的清洗液
CN102346383A (zh) * 2010-08-06 2012-02-08 安集微电子（上海）有限公司 一种光刻胶的清洗液
WO2012016425A1 (zh) * 2010-08-06 2012-02-09 安集微电子（上海）有限公司 一种光刻胶的清洗液
JP2012177055A (ja) * 2011-02-28 2012-09-13 Sanyo Chem Ind Ltd 電子材料用洗浄剤
CN108499963A (zh) * 2017-05-18 2018-09-07 苏州权素船舶电子有限公司 一种电子材料研磨清洗方法

Also Published As

Publication number Publication date
TWI398514B (zh) 2013-06-11
SG184735A1 (en) 2012-10-30
MY156414A (en) 2016-02-26
TW200923072A (en) 2009-06-01
CN101848987A (zh) 2010-09-29

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