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WO2009035089A1 - Cleaning agent for electronic material - Google Patents

Cleaning agent for electronic material Download PDF

Info

Publication number
WO2009035089A1
WO2009035089A1 PCT/JP2008/066558 JP2008066558W WO2009035089A1 WO 2009035089 A1 WO2009035089 A1 WO 2009035089A1 JP 2008066558 W JP2008066558 W JP 2008066558W WO 2009035089 A1 WO2009035089 A1 WO 2009035089A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrates
cleaning agent
cleaning
electronic materials
surfactant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/066558
Other languages
French (fr)
Japanese (ja)
Inventor
Kazumitsu Suzuki
Ayayo Sugiyama
Yoshitaka Katsukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Chemical Industries Ltd
Original Assignee
Sanyo Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Chemical Industries Ltd filed Critical Sanyo Chemical Industries Ltd
Priority to CN200880106471A priority Critical patent/CN101848987A/en
Publication of WO2009035089A1 publication Critical patent/WO2009035089A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

This invention provides a cleaning agent for electronic materials such as magnetic disk substrates, flat panel display substrates, and photomask substrates, which can realize excellent particle removing properties by imparting a suitable level of etching properties without sacrificing the flatness of the surface of electronic material substrates such as magnetic disk substrates, flat panel display substrates, and photomask substrates and enhancing the dispersibility of particles desorbed from the surface of the substrates with a surfactant, whereby a very efficient high level cleaning, which can realize an improvement in yield in the production of the electronic materials and cleaning in a short time. The cleaning agent for electronic materials contains a surfactant (A) and is characterized by satisfying formula (1): V ≤ -38.7 x pH + 550 (1) wherein pH represents the pH value of the cleaning agent at 25˚C at an effective component concentration for use as a cleaning liquid; and V represents the redox potential of the cleaning agent at 25˚C at an effective component concentration for use as the cleaning liquid, mV (vs. SHE).
PCT/JP2008/066558 2007-09-14 2008-09-12 Cleaning agent for electronic material Ceased WO2009035089A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN200880106471A CN101848987A (en) 2007-09-14 2008-09-12 Cleaning agent for electronic material

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007239474 2007-09-14
JP2007239356 2007-09-14
JP2007-239356 2007-09-14
JP2007-239474 2007-09-14

Publications (1)

Publication Number Publication Date
WO2009035089A1 true WO2009035089A1 (en) 2009-03-19

Family

ID=40452095

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/066558 Ceased WO2009035089A1 (en) 2007-09-14 2008-09-12 Cleaning agent for electronic material

Country Status (5)

Country Link
CN (1) CN101848987A (en)
MY (1) MY156414A (en)
SG (1) SG184735A1 (en)
TW (1) TWI398514B (en)
WO (1) WO2009035089A1 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010257510A (en) * 2009-04-22 2010-11-11 Kao Corp Detergent composition for hard disk substrate
WO2012009968A1 (en) * 2010-07-23 2012-01-26 安集微电子（上海）有限公司 Photoresist cleaning solution
JP2012017420A (en) * 2010-07-08 2012-01-26 Neos Co Ltd Water-soluble detergent composition
CN102346383A (en) * 2010-08-06 2012-02-08 安集微电子（上海）有限公司 Photoresist cleaning solution
JP2012177055A (en) * 2011-02-28 2012-09-13 Sanyo Chem Ind Ltd Detergent for electronic material
JP2013533360A (en) * 2010-07-19 2013-08-22 ビーエーエスエフ ソシエタス・ヨーロピア Aqueous alkaline cleaning compositions and methods of using them
CN108499963A (en) * 2017-05-18 2018-09-07 苏州权素船舶电子有限公司 A kind of electronic material ground and cleaned method

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101673589B1 (en) * 2009-10-30 2016-11-07 동우 화인켐 주식회사 A detergent composition for a glass substrate of flat panel display device
JP5401359B2 (en) * 2010-02-16 2014-01-29 花王株式会社 Alkali detergent composition for hard surface
CN102653706A (en) * 2011-03-03 2012-09-05 宁波市鄞州声光电子有限公司 Nonmetallic element cleaner
KR20140053003A (en) * 2011-05-24 2014-05-07 아사히 가라스 가부시키가이샤 Cleaning agent and method for cleaning glass substrate
CN102981376A (en) * 2011-09-05 2013-03-20 安集微电子（上海）有限公司 Photoresist cleaning solution
CN102604751B (en) * 2012-01-20 2013-06-19 深圳市飞世尔实业有限公司 Cleaning agent for optical glass
MY181715A (en) * 2012-09-20 2021-01-04 Hoya Corp Method for manufacturing glass substrate for information recording medium
CN104781204A (en) * 2012-11-22 2015-07-15 旭硝子株式会社 Cleaning method of glass substrate
CN104673540A (en) * 2013-11-30 2015-06-03 天津晶美微纳科技有限公司 Water-soluble liquid crystal glass substrate detergent and preparation method thereof
CN103668144B (en) * 2013-12-24 2016-01-20 淮南天力生物工程开发有限公司 A kind of environment-friendly type organo-metallic treatment solution and preparation method thereof
CN104710608B (en) * 2015-02-09 2016-11-23 上海金兆节能科技有限公司 Alcohol ether phosphate and preparation method thereof and prepare environment protection metal abluent with this ester
JP6046865B1 (en) * 2015-05-13 2016-12-21 バンドー化学株式会社 Polishing pad and polishing pad manufacturing method
CN104894593A (en) * 2015-07-02 2015-09-09 傅宇晓 Cold rolled tube cleaning fluid
CN105838507B (en) * 2016-05-16 2019-02-01 深圳市路维光电股份有限公司 Optical enclosure cleaning agent and cleaning method
CN106811347A (en) * 2016-11-29 2017-06-09 洛阳新巨能高热技术有限公司 A kind of washing agent for electronic materials
JP6495230B2 (en) * 2016-12-22 2019-04-03 花王株式会社 Rinse agent composition for silicon wafer
CN108004049A (en) * 2017-12-28 2018-05-08 广州云普电子科技有限公司 A kind of washing agent for electronic materials for possessing antiseptic and rustproof function
CN113195698A (en) 2018-12-21 2021-07-30 恩特格里斯公司 Compositions and methods for cleaning POST chemical mechanical polishing (POST-CMP) cobalt substrates
CN121219828A (en) * 2023-04-21 2025-12-26 Asml荷兰有限公司 Substrate processing

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07161672A (en) * 1993-12-10 1995-06-23 Tadahiro Omi Substrate surface cleaning method and surface cleaning agent
JP2001070898A (en) * 1999-09-06 2001-03-21 Shin Etsu Chem Co Ltd Cleaning liquid and cleaning method for precision substrates
JP2002069495A (en) * 2000-06-16 2002-03-08 Kao Corp Detergent composition
JP2003119494A (en) * 2001-10-05 2003-04-23 Nec Corp Washing composition, and washing method and washing device using the same
JP2003142441A (en) * 2001-11-02 2003-05-16 Nec Electronics Corp Washing method and cleaning liquid
JP2004217814A (en) * 2003-01-16 2004-08-05 Nec Corp Washing composition for device substrate and washing method and washing apparatus each using the same composition
WO2007125634A1 (en) * 2006-03-31 2007-11-08 Sanyo Chemical Industries, Ltd. Cleaning agent for copper wiring

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4107825B2 (en) * 2001-10-16 2008-06-25 電気化学工業株式会社 Slug injection slurry

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07161672A (en) * 1993-12-10 1995-06-23 Tadahiro Omi Substrate surface cleaning method and surface cleaning agent
JP2001070898A (en) * 1999-09-06 2001-03-21 Shin Etsu Chem Co Ltd Cleaning liquid and cleaning method for precision substrates
JP2002069495A (en) * 2000-06-16 2002-03-08 Kao Corp Detergent composition
JP2003119494A (en) * 2001-10-05 2003-04-23 Nec Corp Washing composition, and washing method and washing device using the same
JP2003142441A (en) * 2001-11-02 2003-05-16 Nec Electronics Corp Washing method and cleaning liquid
JP2004217814A (en) * 2003-01-16 2004-08-05 Nec Corp Washing composition for device substrate and washing method and washing apparatus each using the same composition
WO2007125634A1 (en) * 2006-03-31 2007-11-08 Sanyo Chemical Industries, Ltd. Cleaning agent for copper wiring

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010257510A (en) * 2009-04-22 2010-11-11 Kao Corp Detergent composition for hard disk substrate
JP2012017420A (en) * 2010-07-08 2012-01-26 Neos Co Ltd Water-soluble detergent composition
JP2013533360A (en) * 2010-07-19 2013-08-22 ビーエーエスエフ ソシエタス・ヨーロピア Aqueous alkaline cleaning compositions and methods of using them
KR101855538B1 (en) 2010-07-19 2018-05-04 바스프 에스이 Aqueous alkaline cleaning compositions and methods of their use
WO2012009968A1 (en) * 2010-07-23 2012-01-26 安集微电子（上海）有限公司 Photoresist cleaning solution
CN102346383A (en) * 2010-08-06 2012-02-08 安集微电子（上海）有限公司 Photoresist cleaning solution
WO2012016425A1 (en) * 2010-08-06 2012-02-09 安集微电子（上海）有限公司 Photo-resist washing fluid
JP2012177055A (en) * 2011-02-28 2012-09-13 Sanyo Chem Ind Ltd Detergent for electronic material
CN108499963A (en) * 2017-05-18 2018-09-07 苏州权素船舶电子有限公司 A kind of electronic material ground and cleaned method

Also Published As

Publication number Publication date
TWI398514B (en) 2013-06-11
SG184735A1 (en) 2012-10-30
MY156414A (en) 2016-02-26
TW200923072A (en) 2009-06-01
CN101848987A (en) 2010-09-29

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