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WO2009001547A1 - 金属シリコンの精製方法とシリコン塊の製造方法 - Google Patents

金属シリコンの精製方法とシリコン塊の製造方法 Download PDF

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Publication number
WO2009001547A1
WO2009001547A1 PCT/JP2008/001627 JP2008001627W WO2009001547A1 WO 2009001547 A1 WO2009001547 A1 WO 2009001547A1 JP 2008001627 W JP2008001627 W JP 2008001627W WO 2009001547 A1 WO2009001547 A1 WO 2009001547A1
Authority
WO
WIPO (PCT)
Prior art keywords
silicon
purifying
silicon metal
weight
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/001627
Other languages
English (en)
French (fr)
Inventor
Yuma Kamiyama
Kazuyoshi Honda
Yasuharu Shinokawa
Hiromasa Yagi
Tomofumi Yanagi
Kunihiko Bessho
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Panasonic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp filed Critical Panasonic Corp
Priority to CN2008800140090A priority Critical patent/CN101668701B/zh
Priority to US12/440,531 priority patent/US8668895B2/en
Priority to JP2008549303A priority patent/JP4265697B2/ja
Publication of WO2009001547A1 publication Critical patent/WO2009001547A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/037—Purification
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Silicon Compounds (AREA)

Abstract

　金属シリコンの精製方法では、１０００ｐｐｍ以上、１００００ｐｐｍ以下の重量比のアルミニウムを含み、シリコンの濃度が９８重量％以上９９．９重量％以下である金属シリコンを準備する。この金属シリコンを圧力が１００Ｐａ以上、１０００Ｐａ以下の不活性雰囲気で、１５００°C以上、１６００°C以下に加熱し、一定時間保持する。
PCT/JP2008/001627 2007-06-26 2008-06-24 金属シリコンの精製方法とシリコン塊の製造方法 Ceased WO2009001547A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN2008800140090A CN101668701B (zh) 2007-06-26 2008-06-24 金属硅的精制方法和硅块的制造方法
US12/440,531 US8668895B2 (en) 2007-06-26 2008-06-24 Purifying method for metallic silicon and manufacturing method of silicon ingot
JP2008549303A JP4265697B2 (ja) 2007-06-26 2008-06-24 金属シリコンの精製方法とシリコン塊の製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-167135 2007-06-26
JP2007167135 2007-06-26

Publications (1)

Publication Number Publication Date
WO2009001547A1 true WO2009001547A1 (ja) 2008-12-31

Family

ID=40185372

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/001627 Ceased WO2009001547A1 (ja) 2007-06-26 2008-06-24 金属シリコンの精製方法とシリコン塊の製造方法

Country Status (5)

Country Link
US (1) US8668895B2 (ja)
JP (1) JP4265697B2 (ja)
KR (1) KR20100033956A (ja)
CN (1) CN101668701B (ja)
WO (1) WO2009001547A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104583124A (zh) 2012-06-25 2015-04-29 希利柯尔材料股份有限公司 用于纯化硅的方法
WO2014004392A1 (en) 2012-06-25 2014-01-03 Silicor Materials Inc. Method to purify aluminum and use of purified aluminum to purify silicon

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60195016A (ja) * 1984-03-16 1985-10-03 Agency Of Ind Science & Technol 金属けい素の精製法
JPS62292613A (ja) * 1986-06-10 1987-12-19 Kawasaki Steel Corp 高純度けい素の精製方法
JPH01176211A (ja) * 1988-01-05 1989-07-12 Nippon Sheet Glass Co Ltd 金属シリコンの脱炭方法
JPH10182134A (ja) * 1996-10-31 1998-07-07 Kawasaki Steel Corp シリコンの精製方法
JP2006027940A (ja) * 2004-07-14 2006-02-02 Sharp Corp 金属の精製方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0533070A (ja) 1991-05-11 1993-02-09 Toho Aen Kk 金属珪素粉末中の不純物の除去方法
JP2905353B2 (ja) 1993-02-04 1999-06-14 川崎製鉄株式会社 金属シリコンの精製方法
JP3497355B2 (ja) * 1997-10-06 2004-02-16 信越フィルム株式会社 シリコンの精製方法
FR2827592B1 (fr) * 2001-07-23 2003-08-22 Invensil Silicium metallurgique de haute purete et procede d'elaboration
CN1299983C (zh) * 2003-07-22 2007-02-14 龚炳生 光电级硅的制造方法
JP4722403B2 (ja) 2004-02-20 2011-07-13 新日鉄マテリアルズ株式会社 シリコン精製装置及びシリコン精製方法
JP4672559B2 (ja) 2005-01-26 2011-04-20 新日鉄マテリアルズ株式会社 シリコン精製装置及びシリコン精製方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60195016A (ja) * 1984-03-16 1985-10-03 Agency Of Ind Science & Technol 金属けい素の精製法
JPS62292613A (ja) * 1986-06-10 1987-12-19 Kawasaki Steel Corp 高純度けい素の精製方法
JPH01176211A (ja) * 1988-01-05 1989-07-12 Nippon Sheet Glass Co Ltd 金属シリコンの脱炭方法
JPH10182134A (ja) * 1996-10-31 1998-07-07 Kawasaki Steel Corp シリコンの精製方法
JP2006027940A (ja) * 2004-07-14 2006-02-02 Sharp Corp 金属の精製方法

Also Published As

Publication number Publication date
KR20100033956A (ko) 2010-03-31
CN101668701B (zh) 2011-12-07
JP4265697B2 (ja) 2009-05-20
US8668895B2 (en) 2014-03-11
CN101668701A (zh) 2010-03-10
JPWO2009001547A1 (ja) 2010-08-26
US20090280049A1 (en) 2009-11-12

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