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WO2009078293A1 - 液体材料気化装置 - Google Patents

液体材料気化装置 Download PDF

Info

Publication number
WO2009078293A1
WO2009078293A1 PCT/JP2008/072153 JP2008072153W WO2009078293A1 WO 2009078293 A1 WO2009078293 A1 WO 2009078293A1 JP 2008072153 W JP2008072153 W JP 2008072153W WO 2009078293 A1 WO2009078293 A1 WO 2009078293A1
Authority
WO
WIPO (PCT)
Prior art keywords
gas
carrier gas
liquid material
path
mixing chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/072153
Other languages
English (en)
French (fr)
Inventor
Hideaki Miyamoto
Ichiro Nishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horiba Stec Co Ltd
Original Assignee
Horiba Stec Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horiba Stec Co Ltd filed Critical Horiba Stec Co Ltd
Priority to CN2008801217225A priority Critical patent/CN101903561B/zh
Priority to KR1020107014983A priority patent/KR101501311B1/ko
Priority to US12/809,051 priority patent/US8544828B2/en
Priority to JP2009546220A priority patent/JP5357053B2/ja
Publication of WO2009078293A1 publication Critical patent/WO2009078293A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
    • B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
    • B01B1/005—Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/0082—Regulation; Control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/16—Evaporating by spraying

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Nozzles (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Accessories For Mixers (AREA)

Abstract

　ノズル形状を変更すること無く、キャリアガスＣＧの大流量化を可能にすることを目的とし、液体材料ＬＭ及びキャリアガスＣＧが混合される気液混合室１と、気液混合室１に前記液体材料ＬＭを導入する液体材料導入路２と、気液混合室１にキャリアガスＣＧを導入するキャリアガス導入路３と、気液混合室１に連通し、液体材料ＬＭ及びキャリアガスＣＧからなる混合体を減圧気化させる気化ノズル部４と、気化ノズル部４に連通し、気化ノズル部４により気化された混合ガスＭＧを導出する混合ガス導出路５と、キャリアガス導入路３及び混合ガス導出路５を連通し、キャリアガス導入路３から混合ガス導出路５へキャリアガスＣＧを流すバイパス路６と、を具備する。
PCT/JP2008/072153 2007-12-19 2008-12-05 液体材料気化装置 Ceased WO2009078293A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN2008801217225A CN101903561B (zh) 2007-12-19 2008-12-05 液体材料气化装置
KR1020107014983A KR101501311B1 (ko) 2007-12-19 2008-12-05 액체 재료 기화 장치
US12/809,051 US8544828B2 (en) 2007-12-19 2008-12-05 Liquid material vaporization apparatus
JP2009546220A JP5357053B2 (ja) 2007-12-19 2008-12-05 液体材料気化装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007326748 2007-12-19
JP2007-326748 2007-12-19

Publications (1)

Publication Number Publication Date
WO2009078293A1 true WO2009078293A1 (ja) 2009-06-25

Family

ID=40795409

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/072153 Ceased WO2009078293A1 (ja) 2007-12-19 2008-12-05 液体材料気化装置

Country Status (6)

Country Link
US (1) US8544828B2 (ja)
JP (1) JP5357053B2 (ja)
KR (1) KR101501311B1 (ja)
CN (1) CN101903561B (ja)
TW (1) TWI501290B (ja)
WO (1) WO2009078293A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101078411B1 (ko) 2011-07-06 2011-10-31 주식회사 신명 액체의 기화장치
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
KR102483924B1 (ko) 2016-02-18 2023-01-02 삼성전자주식회사 기화기 및 이를 구비하는 박막 증착 장치
US10983538B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller
JP2023067758A (ja) * 2021-11-01 2023-05-16 株式会社堀場エステック 気化装置、気化装置の制御方法、気化装置用プログラム、及び、流体制御装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06220641A (ja) * 1992-12-15 1994-08-09 Applied Materials Inc 化学的蒸着膜工程のための反応液体の気化
JPH11106921A (ja) * 1997-09-30 1999-04-20 Nissan Motor Co Ltd バブリング型液体原料気化装置及びその原料蒸気輸送開始操作方法
JP2001156055A (ja) * 1999-09-14 2001-06-08 Stec Inc 液体材料気化方法および装置
JP2003273025A (ja) * 2002-03-13 2003-09-26 Stec Inc 液体材料気化装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0784662B2 (ja) * 1989-12-12 1995-09-13 アプライドマテリアルズジャパン株式会社 化学的気相成長方法とその装置
JP2000334005A (ja) * 1999-05-31 2000-12-05 Field Science:Kk 床ずれ防止マット用植物エキス気化装置およびそれを使用した床ずれ防止マット装置
KR100649852B1 (ko) * 1999-09-09 2006-11-24 동경 엘렉트론 주식회사 기화기 및 이것을 이용한 반도체 제조 시스템
JP4276409B2 (ja) 2002-06-21 2009-06-10 株式会社堀場エステック 液体材料気化装置
JP4696561B2 (ja) * 2005-01-14 2011-06-08 東京エレクトロン株式会社 気化装置及び処理装置
JP4601535B2 (ja) * 2005-09-09 2010-12-22 株式会社リンテック 低温度で液体原料を気化させることのできる気化器

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06220641A (ja) * 1992-12-15 1994-08-09 Applied Materials Inc 化学的蒸着膜工程のための反応液体の気化
JPH11106921A (ja) * 1997-09-30 1999-04-20 Nissan Motor Co Ltd バブリング型液体原料気化装置及びその原料蒸気輸送開始操作方法
JP2001156055A (ja) * 1999-09-14 2001-06-08 Stec Inc 液体材料気化方法および装置
JP2003273025A (ja) * 2002-03-13 2003-09-26 Stec Inc 液体材料気化装置

Also Published As

Publication number Publication date
US20110115104A1 (en) 2011-05-19
CN101903561B (zh) 2012-08-22
TWI501290B (zh) 2015-09-21
KR20100093588A (ko) 2010-08-25
TW200931502A (en) 2009-07-16
US8544828B2 (en) 2013-10-01
KR101501311B1 (ko) 2015-03-10
CN101903561A (zh) 2010-12-01
JP5357053B2 (ja) 2013-12-04
JPWO2009078293A1 (ja) 2011-04-28

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