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WO2009075308A1 - Composé cyclique, base de photorésine, composition de photorésine, procédé de microfabrication et dispositif à semi-conducteurs - Google Patents

Composé cyclique, base de photorésine, composition de photorésine, procédé de microfabrication et dispositif à semi-conducteurs Download PDF

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Publication number
WO2009075308A1
WO2009075308A1 PCT/JP2008/072469 JP2008072469W WO2009075308A1 WO 2009075308 A1 WO2009075308 A1 WO 2009075308A1 JP 2008072469 W JP2008072469 W JP 2008072469W WO 2009075308 A1 WO2009075308 A1 WO 2009075308A1
Authority
WO
WIPO (PCT)
Prior art keywords
photoresist
cyclic compound
semiconductor device
microfabrication process
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/072469
Other languages
English (en)
Japanese (ja)
Inventor
Takashi Kashiwamura
Akinori Yomogita
Masashi Sekikawa
Mitsuru Shibata
Norio Tomotsu
Takanori Owada
Junpei Maruyama
Hirotoshi Ishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Idemitsu Kosan Co Ltd
Original Assignee
Idemitsu Kosan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idemitsu Kosan Co Ltd filed Critical Idemitsu Kosan Co Ltd
Priority to JP2009545437A priority Critical patent/JPWO2009075308A1/ja
Publication of WO2009075308A1 publication Critical patent/WO2009075308A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/92—Systems containing at least three condensed rings with a condensed ring system consisting of at least two mutually uncondensed aromatic ring systems, linked by an annular structure formed by carbon chains on non-adjacent positions of the aromatic system, e.g. cyclophanes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)

Abstract

L'invention concerne un composé cyclique représenté par la formule (1), dans laquelle 50% des R1 représentent des groupes hydroxy et le reste représente des groupes inhibiteurs de dissolution clivables en milieu acide.
PCT/JP2008/072469 2007-12-11 2008-12-11 Composé cyclique, base de photorésine, composition de photorésine, procédé de microfabrication et dispositif à semi-conducteurs Ceased WO2009075308A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009545437A JPWO2009075308A1 (ja) 2007-12-11 2008-12-11 環状化合物、フォトレジスト基材、フォトレジスト組成物、微細加工方法及び半導体装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007320223 2007-12-11
JP2007-320223 2007-12-11

Publications (1)

Publication Number Publication Date
WO2009075308A1 true WO2009075308A1 (fr) 2009-06-18

Family

ID=40755549

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/072469 Ceased WO2009075308A1 (fr) 2007-12-11 2008-12-11 Composé cyclique, base de photorésine, composition de photorésine, procédé de microfabrication et dispositif à semi-conducteurs

Country Status (3)

Country Link
JP (1) JPWO2009075308A1 (fr)
TW (1) TW200946500A (fr)
WO (1) WO2009075308A1 (fr)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009244766A (ja) * 2008-03-31 2009-10-22 Dainippon Printing Co Ltd ポジ型レジスト組成物、及び当該ポジ型レジスト組成物を用いたパターン形成方法
WO2010067621A1 (fr) * 2008-12-11 2010-06-17 出光興産株式会社 Composés cycliques et compositions de résine photosensible les utilisant
JP2010254664A (ja) * 2009-03-31 2010-11-11 Dainippon Printing Co Ltd カリックスレゾルシンアレン誘導体、当該カリックスレゾルシンアレン誘導体の製造方法、ネガ型レジスト組成物、及びパターン形成方法
WO2011024957A1 (fr) * 2009-08-31 2011-03-03 三菱瓦斯化学株式会社 Composé cyclique, procédé de production du composé cyclique, composition sensible aux radiations et méthode de formation d'un motif de réserve
WO2011043029A1 (fr) * 2009-10-06 2011-04-14 三菱瓦斯化学株式会社 Composé cyclique, son procédé de fabrication, composition sensible au rayonnement, et procédé de formation d'un motif de réserve
WO2011065004A1 (fr) * 2009-11-27 2011-06-03 三菱瓦斯化学株式会社 Composé cyclique, procédé de préparation associé, composition sensible aux rayonnements, et procédé de formation de motif de réserve
US8765356B2 (en) 2011-09-23 2014-07-01 Dow Global Technologies Llc Calixarene compound and photoresist composition comprising same
US8936900B2 (en) 2011-09-23 2015-01-20 Rohm And Haas Electronic Materials Llc Calixarene and photoresist composition comprising same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003313546A (ja) * 2002-04-24 2003-11-06 Tokuyama Corp 発光性組成物
WO2005097725A1 (fr) * 2004-04-05 2005-10-20 Idemitsu Kosan Co., Ltd. Composes de calixresorcinarene, materiaux de base de photoresist, et compositions de ceux-ci
JP2007197389A (ja) * 2006-01-27 2007-08-09 Idemitsu Kosan Co Ltd 環状化合物、並びにそれからなるフォトレジスト基材及び組成物

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003313546A (ja) * 2002-04-24 2003-11-06 Tokuyama Corp 発光性組成物
WO2005097725A1 (fr) * 2004-04-05 2005-10-20 Idemitsu Kosan Co., Ltd. Composes de calixresorcinarene, materiaux de base de photoresist, et compositions de ceux-ci
JP2007197389A (ja) * 2006-01-27 2007-08-09 Idemitsu Kosan Co Ltd 環状化合物、並びにそれからなるフォトレジスト基材及び組成物

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009244766A (ja) * 2008-03-31 2009-10-22 Dainippon Printing Co Ltd ポジ型レジスト組成物、及び当該ポジ型レジスト組成物を用いたパターン形成方法
WO2010067621A1 (fr) * 2008-12-11 2010-06-17 出光興産株式会社 Composés cycliques et compositions de résine photosensible les utilisant
JP2010254664A (ja) * 2009-03-31 2010-11-11 Dainippon Printing Co Ltd カリックスレゾルシンアレン誘導体、当該カリックスレゾルシンアレン誘導体の製造方法、ネガ型レジスト組成物、及びパターン形成方法
EP2474518A4 (fr) * 2009-08-31 2014-03-26 Mitsubishi Gas Chemical Co Composé cyclique, procédé de production du composé cyclique, composition sensible aux radiations et méthode de formation d'un motif de réserve
WO2011024957A1 (fr) * 2009-08-31 2011-03-03 三菱瓦斯化学株式会社 Composé cyclique, procédé de production du composé cyclique, composition sensible aux radiations et méthode de formation d'un motif de réserve
JP5733211B2 (ja) * 2009-08-31 2015-06-10 三菱瓦斯化学株式会社 環状化合物、その製造方法、感放射線性組成物およびレジストパターン形成方法
US8829247B2 (en) 2009-10-06 2014-09-09 Mitsubishi Gas Chemical Company, Inc. Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern
WO2011043029A1 (fr) * 2009-10-06 2011-04-14 三菱瓦斯化学株式会社 Composé cyclique, son procédé de fabrication, composition sensible au rayonnement, et procédé de formation d'un motif de réserve
KR101779512B1 (ko) 2009-10-06 2017-09-18 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 시클릭 화합물, 이의 제조방법, 감방사선 조성물, 및 레지스트 패턴의 형성 방법
CN102666461A (zh) * 2009-11-27 2012-09-12 三菱瓦斯化学株式会社 环状化合物、其生产方法、放射线敏感性组合物和抗蚀图案形成方法
WO2011065004A1 (fr) * 2009-11-27 2011-06-03 三菱瓦斯化学株式会社 Composé cyclique, procédé de préparation associé, composition sensible aux rayonnements, et procédé de formation de motif de réserve
US8969629B2 (en) 2009-11-27 2015-03-03 Mitsubishi Gas Chemical Company, Inc. Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation method
JP5857745B2 (ja) * 2009-11-27 2016-02-10 三菱瓦斯化学株式会社 環状化合物、その製造方法、感放射線性組成物及びレジストパターン形成方法
US8765356B2 (en) 2011-09-23 2014-07-01 Dow Global Technologies Llc Calixarene compound and photoresist composition comprising same
US8936900B2 (en) 2011-09-23 2015-01-20 Rohm And Haas Electronic Materials Llc Calixarene and photoresist composition comprising same

Also Published As

Publication number Publication date
JPWO2009075308A1 (ja) 2011-04-28
TW200946500A (en) 2009-11-16

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