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WO2009072810A3 - Composition de gravure destinée à un substrat de verre - Google Patents

Composition de gravure destinée à un substrat de verre Download PDF

Info

Publication number
WO2009072810A3
WO2009072810A3 PCT/KR2008/007143 KR2008007143W WO2009072810A3 WO 2009072810 A3 WO2009072810 A3 WO 2009072810A3 KR 2008007143 W KR2008007143 W KR 2008007143W WO 2009072810 A3 WO2009072810 A3 WO 2009072810A3
Authority
WO
WIPO (PCT)
Prior art keywords
etchant composition
composition
glass substrate
total weight
inorganic salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2008/007143
Other languages
English (en)
Other versions
WO2009072810A2 (fr
Inventor
Woong Kim
Jae-Seong Park
Jae-Won Jeong
Sang-Hyup Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chemtronics Co Ltd
Original Assignee
Chemtronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=40284061&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2009072810(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Chemtronics Co Ltd filed Critical Chemtronics Co Ltd
Publication of WO2009072810A2 publication Critical patent/WO2009072810A2/fr
Publication of WO2009072810A3 publication Critical patent/WO2009072810A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00Etching, surface-brightening or pickling compositions
    • C09K13/04Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C03C15/02Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00Etching, surface-brightening or pickling compositions
    • C09K13/04Etching, surface-brightening or pickling compositions containing an inorganic acid
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00Etching, surface-brightening or pickling compositions
    • C09K13/04Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/06Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Surface Treatment Of Glass (AREA)
  • Liquid Crystal (AREA)
  • Weting (AREA)

Abstract

L'invention concerne une composition d'agent de gravure destinée à des substrats de verre, et plus particulièrement, une composition d'agent de gravure contenant 10 à 45% en poids d'un sel minéral renfermant du fluor par rapport au poids total de la composition; 1-10% en poids de NH4HF2 ; 1-10% en poids d'un acide possédant une constante (pKa) de dissociation d'acide inférieure à celle du sel minéral contenant du fluor; et de l'eau pour que le poids total de la composition atteigne 100% en poids. Cette composition d'agent de gravure destinée à des substrats de verre permet une réduction de la complexité et des coûts de fabrication grâce à l'utilisation d'éléments simples, offre une vitesse de gravure élevée, grave la surface d'un substrat de verre de manière régulière, présente une excellente aptitude à la gravure et améliore la qualité d'image.
PCT/KR2008/007143 2007-12-04 2008-12-03 Composition de gravure destinée à un substrat de verre Ceased WO2009072810A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020070124792A KR100868228B1 (ko) 2007-12-04 2007-12-04 유리 기판용 식각액 조성물
KR10-2007-0124792 2007-12-04

Publications (2)

Publication Number Publication Date
WO2009072810A2 WO2009072810A2 (fr) 2009-06-11
WO2009072810A3 true WO2009072810A3 (fr) 2009-09-03

Family

ID=40284061

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2008/007143 Ceased WO2009072810A2 (fr) 2007-12-04 2008-12-03 Composition de gravure destinée à un substrat de verre

Country Status (2)

Country Link
KR (1) KR100868228B1 (fr)
WO (1) WO2009072810A2 (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2646384B1 (fr) 2010-11-30 2019-03-27 Corning Incorporated Procédés de formation de rangées haute densité de trous dans du verre
KR101223877B1 (ko) * 2011-03-14 2013-01-17 노바테크인더스트리 주식회사 초박판 패널 제조 시스템
US9315412B2 (en) * 2011-07-07 2016-04-19 Corning Incorporated Surface flaw modification for strengthening of glass articles
TW201408612A (zh) * 2012-08-17 2014-03-01 Onano Ind Corp 無眩光低反射玻璃面的製造方法
US9488857B2 (en) 2014-01-10 2016-11-08 Corning Incorporated Method of strengthening an edge of a glass substrate
KR102269921B1 (ko) * 2014-03-31 2021-06-28 삼성디스플레이 주식회사 유리 강화용 조성물 및 이를 이용한 터치 스크린 글래스의 제조 방법
US10410883B2 (en) 2016-06-01 2019-09-10 Corning Incorporated Articles and methods of forming vias in substrates
US10794679B2 (en) 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
US10134657B2 (en) * 2016-06-29 2018-11-20 Corning Incorporated Inorganic wafer having through-holes attached to semiconductor wafer
KR102079042B1 (ko) * 2016-07-04 2020-02-20 오씨아이 주식회사 실리콘 기판 식각 용액
US10580725B2 (en) 2017-05-25 2020-03-03 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US11078112B2 (en) 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US12180108B2 (en) 2017-12-19 2024-12-31 Corning Incorporated Methods for etching vias in glass-based articles employing positive charge organic molecules
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
KR102087703B1 (ko) * 2019-04-08 2020-03-11 (주)혜덕 칠판 유리 제조용 식각액 조성물 및 그 제조 방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990075903A (ko) * 1998-03-26 1999-10-15 이기원 전자 표시 장치 및 기판용 세정 및 식각 조성물
KR20060033333A (ko) * 2004-10-14 2006-04-19 주식회사 동진쎄미켐 박막트랜지스터 액정표시장치의 에칭 조성물
KR100614985B1 (ko) * 1998-11-24 2006-08-28 다이킨 고교 가부시키가이샤 식각액, 식각 처리물 및 식각 처리물의 제조 방법
KR100677052B1 (ko) * 2005-06-17 2007-02-02 테크노세미켐 주식회사 액정 유리 기판용 식각액 조성물
KR20070108212A (ko) * 2005-01-31 2007-11-08 어플라이드 머티어리얼스, 인코포레이티드 기판 표면 및 챔버 표면을 위한 식각액 처리 공정

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5132859B2 (ja) * 2001-08-24 2013-01-30 ステラケミファ株式会社 多成分を有するガラス基板用の微細加工表面処理液

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990075903A (ko) * 1998-03-26 1999-10-15 이기원 전자 표시 장치 및 기판용 세정 및 식각 조성물
KR100614985B1 (ko) * 1998-11-24 2006-08-28 다이킨 고교 가부시키가이샤 식각액, 식각 처리물 및 식각 처리물의 제조 방법
KR20060033333A (ko) * 2004-10-14 2006-04-19 주식회사 동진쎄미켐 박막트랜지스터 액정표시장치의 에칭 조성물
KR20070108212A (ko) * 2005-01-31 2007-11-08 어플라이드 머티어리얼스, 인코포레이티드 기판 표면 및 챔버 표면을 위한 식각액 처리 공정
KR100677052B1 (ko) * 2005-06-17 2007-02-02 테크노세미켐 주식회사 액정 유리 기판용 식각액 조성물

Also Published As

Publication number Publication date
WO2009072810A2 (fr) 2009-06-11
KR100868228B1 (ko) 2008-11-11

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