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WO2008132397A3 - Procede de fabrication d'un masque a ouvertures submillimetriques pour la realisation d'une grille submillimetrique, grille submillimetrique - Google Patents

Procede de fabrication d'un masque a ouvertures submillimetriques pour la realisation d'une grille submillimetrique, grille submillimetrique Download PDF

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Publication number
WO2008132397A3
WO2008132397A3 PCT/FR2008/050505 FR2008050505W WO2008132397A3 WO 2008132397 A3 WO2008132397 A3 WO 2008132397A3 FR 2008050505 W FR2008050505 W FR 2008050505W WO 2008132397 A3 WO2008132397 A3 WO 2008132397A3
Authority
WO
WIPO (PCT)
Prior art keywords
submillimetre
mask
grid
fabricating
apertures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/FR2008/050505
Other languages
English (en)
Other versions
WO2008132397A2 (fr
Inventor
Emmanuel Valentin
Bernard Nghiem
Arnaud Huignard
Georges Zagdoun
Eddy Royer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Original Assignee
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Glass France SAS, Compagnie de Saint Gobain SA filed Critical Saint Gobain Glass France SAS
Priority to JP2009554074A priority Critical patent/JP5611602B2/ja
Priority to CN200880009031.6A priority patent/CN101636361B/zh
Priority to US12/531,699 priority patent/US20100059365A1/en
Priority to KR1020097022043A priority patent/KR101496980B1/ko
Priority to EP08775743A priority patent/EP2129632A2/fr
Publication of WO2008132397A2 publication Critical patent/WO2008132397A2/fr
Publication of WO2008132397A3 publication Critical patent/WO2008132397A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/80—Constructional details
    • H10K10/82—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/251—Al, Cu, Mg or noble metals
    • C03C2217/252—Al
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/116—Deposition methods from solutions or suspensions by spin-coating, centrifugation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/34—Masking
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153—Constructional details
    • G02F1/155—Electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153—Constructional details
    • G02F1/155—Electrodes
    • G02F2001/1555—Counter electrode
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/331—Nanoparticles used in non-emissive layers, e.g. in packaging layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Biophysics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Surface Treatment Of Glass (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Thin Film Transistor (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

Procédé de fabrication d'un masque à ouvertures submillimétriques sur une portion de surface d'un substrat, caractérisé en ce que : on dépose, une couche dite de masque à partir d'une solution de particules colloïdales stabilisées et dispersées dans un solvant, on procède au séchage de la couche de masque jusqu'à l'obtention d'un réseau bidimensionnel irrégulier d'interstices, à bord sensiblement droit, donnant un masque avec un maillage d'interstices aléatoire dans au moins une direction. Grille submillimétrique obtenue par ce procédé.
PCT/FR2008/050505 2007-03-21 2008-03-21 Procede de fabrication d'un masque a ouvertures submillimetriques pour la realisation d'une grille submillimetrique, grille submillimetrique Ceased WO2008132397A2 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2009554074A JP5611602B2 (ja) 2007-03-21 2008-03-21 サブミリメートルの格子を製造するためにサブミリメートルの開口部を有するマスクを製造するためのプロセス、およびサブミリメートルの格子
CN200880009031.6A CN101636361B (zh) 2007-03-21 2008-03-21 制备具有形成亚毫米级格栅的亚毫米级开口的掩模的方法、以及亚毫米级格栅
US12/531,699 US20100059365A1 (en) 2007-03-21 2008-03-21 Process for manufacturing a mask having submillimetric openings for producing a submillimetric grid, and submillimetric grid
KR1020097022043A KR101496980B1 (ko) 2007-03-21 2008-03-21 서브밀리미터 개구부를 갖는 서브밀리미터 그리드 제조용 마스크 제조 방법 및 서브밀리리터 그리드
EP08775743A EP2129632A2 (fr) 2007-03-21 2008-03-21 Procede de fabrication d'un masque a ouvertures submillimetriques pour la realisation d'une grille submillimetrique, grille submillimetrique

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0753972 2007-03-21
FR0753972A FR2913972B1 (fr) 2007-03-21 2007-03-21 Procede de fabrication d'un masque pour la realisation d'une grille

Publications (2)

Publication Number Publication Date
WO2008132397A2 WO2008132397A2 (fr) 2008-11-06
WO2008132397A3 true WO2008132397A3 (fr) 2009-01-29

Family

ID=38537888

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR2008/050505 Ceased WO2008132397A2 (fr) 2007-03-21 2008-03-21 Procede de fabrication d'un masque a ouvertures submillimetriques pour la realisation d'une grille submillimetrique, grille submillimetrique

Country Status (8)

Country Link
US (1) US20100059365A1 (fr)
EP (1) EP2129632A2 (fr)
JP (1) JP5611602B2 (fr)
KR (1) KR101496980B1 (fr)
CN (1) CN101636361B (fr)
FR (1) FR2913972B1 (fr)
TW (1) TWI478886B (fr)
WO (1) WO2008132397A2 (fr)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009151203A1 (fr) * 2008-06-13 2009-12-17 주식회사 엘지화학 Élément chauffant et procédé de fabrication de celui-ci
KR20090129927A (ko) * 2008-06-13 2009-12-17 주식회사 엘지화학 발열체 및 이의 제조방법
US10412788B2 (en) * 2008-06-13 2019-09-10 Lg Chem, Ltd. Heating element and manufacturing method thereof
FR2936360B1 (fr) 2008-09-24 2011-04-01 Saint Gobain Procede de fabrication d'un masque a ouvertures submillimetriques pour grille electroconductrice submillimetrique, masque et grille electroconductrice submillimetrique.
FR2936241B1 (fr) * 2008-09-24 2011-07-15 Saint Gobain Electrode avant pour cellule solaire avec revetement antireflet.
FR2936361B1 (fr) * 2008-09-25 2011-04-01 Saint Gobain Procede de fabrication d'une grille submillimetrique electroconductrice, grille submillimetrique electroconductrice
EP2244316A1 (fr) 2009-04-22 2010-10-27 Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO Dispositif électronique et procédé pour sa fabrication
KR20110054841A (ko) 2009-11-18 2011-05-25 삼성모바일디스플레이주식회사 유기 발광 표시 장치 및 그 제조 방법
TWI451800B (zh) * 2009-12-29 2014-09-01 Lg Chemical Ltd 加熱元件以及製造彼之方法
FR2954856B1 (fr) 2009-12-30 2012-06-15 Saint Gobain Cellule photovoltaique organique et module comprenant une telle cellule
FR2955101B1 (fr) * 2010-01-11 2012-03-23 Saint Gobain Materiau photocatalytique et vitrage ou cellule photovoltaique comprenant ce materiau
FR2964254B1 (fr) * 2010-08-30 2013-06-14 Saint Gobain Support de dispositif a diode electroluminescente organique, un tel dispositif a diode electroluminescente organique et son procede de fabrication
FR2965407A1 (fr) 2010-09-27 2012-03-30 Saint Gobain Procédé de connexion(s) électrique(s) d'un dispositif a diode électroluminescente organique encapsule et un tel dispositif oled
FR2979340B1 (fr) * 2011-08-30 2013-08-23 Saint Gobain Electrode supportee transparente
FR2993707B1 (fr) * 2012-07-17 2015-03-13 Saint Gobain Electrode supportee transparente pour oled
US9313896B2 (en) * 2013-02-04 2016-04-12 Nanchang O-Film Tech. Co., Ltd. Double-layered transparent conductive film and manufacturing method thereof
FR3023932B1 (fr) 2014-07-16 2016-07-08 Commissariat Energie Atomique Dispositif electrochrome comprenant un systeme de chauffage integre
EP3250379B1 (fr) * 2015-01-26 2022-04-20 Saint-Gobain Glass France Vitre latérale laminée pouvant être chauffée
US10597097B2 (en) 2015-09-07 2020-03-24 Sabic Global Technologies B.V. Aerodynamic features of plastic glazing of tailgates
CN108025625B (zh) 2015-09-07 2021-06-29 沙特基础工业全球技术公司 背门的塑料玻璃表面
WO2017042699A1 (fr) 2015-09-07 2017-03-16 Sabic Global Technologies B.V. Moulage d'un vitrage en matière plastique de hayons
CN108136633B (zh) 2015-09-07 2021-02-05 沙特基础工业全球技术公司 具有塑料玻璃的后挡板的照明系统
KR102140566B1 (ko) 2015-11-23 2020-08-04 사빅 글로벌 테크놀러지스 비.브이. 플라스틱 글레이징을 갖는 윈도우를 위한 라이팅 시스템
USD804830S1 (en) * 2016-06-30 2017-12-12 Nta Enterprises Textile sheet with a camouflage pattern
US11936109B2 (en) 2020-01-17 2024-03-19 Telefonaktiebolaget Lm Ericsson (Publ) mmWave dielectric waveguide beam former/redirector

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WO2007059750A1 (fr) * 2005-11-28 2007-05-31 Christian-Albrechts-Universität Zu Kiel Procede de production d'une pluralite de nanoconnexions disposees avec regularite sur un substrat

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WO2007059750A1 (fr) * 2005-11-28 2007-05-31 Christian-Albrechts-Universität Zu Kiel Procede de production d'une pluralite de nanoconnexions disposees avec regularite sur un substrat

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Also Published As

Publication number Publication date
KR101496980B1 (ko) 2015-03-03
EP2129632A2 (fr) 2009-12-09
FR2913972A1 (fr) 2008-09-26
TW200902466A (en) 2009-01-16
KR20100015787A (ko) 2010-02-12
US20100059365A1 (en) 2010-03-11
CN101636361A (zh) 2010-01-27
FR2913972B1 (fr) 2011-11-18
JP2010524810A (ja) 2010-07-22
CN101636361B (zh) 2014-07-02
JP5611602B2 (ja) 2014-10-22
TWI478886B (zh) 2015-04-01
WO2008132397A2 (fr) 2008-11-06

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