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WO2008108108A1 - 磁気ランダムアクセスメモリ - Google Patents

磁気ランダムアクセスメモリ Download PDF

Info

Publication number
WO2008108108A1
WO2008108108A1 PCT/JP2008/050344 JP2008050344W WO2008108108A1 WO 2008108108 A1 WO2008108108 A1 WO 2008108108A1 JP 2008050344 W JP2008050344 W JP 2008050344W WO 2008108108 A1 WO2008108108 A1 WO 2008108108A1
Authority
WO
WIPO (PCT)
Prior art keywords
magnetization
fixed
magnetization region
reversed
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/050344
Other languages
English (en)
French (fr)
Inventor
Tetsuhiro Suzuki
Norikazu Ohshima
Hideaki Numata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP2009502473A priority Critical patent/JP5201538B2/ja
Priority to US12/529,387 priority patent/US8238135B2/en
Publication of WO2008108108A1 publication Critical patent/WO2008108108A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • H10B61/20—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors
    • H10B61/22—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors of the field-effect transistor [FET] type
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/165—Auxiliary circuits
    • G11C11/1659—Cell access
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/165—Auxiliary circuits
    • G11C11/1675—Writing or programming circuits or methods
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C19/00—Digital stores in which the information is moved stepwise, e.g. shift registers
    • G11C19/02—Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements
    • G11C19/08—Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure
    • G11C19/0808—Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure using magnetic domain propagation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/10—Magnetoresistive devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Hall/Mr Elements (AREA)
  • Mram Or Spin Memory Techniques (AREA)
  • Magnetic Heads (AREA)

Abstract

　ＭＲＡＭの磁気記録層１０は、第１磁化固定領域１１、第２磁化固定領域１２及び磁化反転領域１３を有する。磁化反転領域１３は反転可能な磁化を有し、ピン層とオーバーラップする。第１磁化固定領域１１は、磁化反転領域１３の第１境界Ｂ１に接続され、磁化の向きが第１方向に固定される。第２磁化固定領域１２は、磁化反転領域１３の第２境界Ｂ２に接続され、磁化の向きが第２方向に固定される。第１方向及び第２方向は共に、磁化反転領域１３へ向かう方向、又は、磁化反転領域１３から離れる方向である。磁化固定領域１１、１２の少なくとも一部分Ｒ１，Ｒ２における制動係数αは、磁化反転領域１３における制動係数αよりも大きい。
PCT/JP2008/050344 2007-03-07 2008-01-15 磁気ランダムアクセスメモリ Ceased WO2008108108A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009502473A JP5201538B2 (ja) 2007-03-07 2008-01-15 磁気ランダムアクセスメモリ
US12/529,387 US8238135B2 (en) 2007-03-07 2008-01-15 MRAM utilizing free layer having fixed magnetization regions with larger damping coefficient than the switching region

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007056693 2007-03-07
JP2007-056693 2007-03-07

Publications (1)

Publication Number Publication Date
WO2008108108A1 true WO2008108108A1 (ja) 2008-09-12

Family

ID=39738004

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/050344 Ceased WO2008108108A1 (ja) 2007-03-07 2008-01-15 磁気ランダムアクセスメモリ

Country Status (3)

Country Link
US (1) US8238135B2 (ja)
JP (1) JP5201538B2 (ja)
WO (1) WO2008108108A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010074132A1 (ja) * 2008-12-25 2010-07-01 日本電気株式会社 磁気メモリ素子及び磁気ランダムアクセスメモリ
US8687414B2 (en) 2008-12-25 2014-04-01 Nec Corporation Magnetic memory element and magnetic random access memory
JP2017514311A (ja) * 2014-04-25 2017-06-01 華為技術有限公司Ｈｕａｗｅｉ Ｔｅｃｈｎｏｌｏｇｉｅｓ Ｃｏ．，Ｌｔｄ． 書き込み装置及び磁気メモリ

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8576519B1 (en) * 2012-10-11 2013-11-05 HGST Netherlands B.V. Current-perpendicular-to-the-plane (CPP) magnetoresistive (MR) sensor with magnetic damping material at the sensor edges
US10755759B2 (en) 2018-06-28 2020-08-25 International Business Machines Corporation Symmetrically programmable resistive synapse for RPU using current-programmed single domain wall ferroelectric

Citations (3)

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JP2002208680A (ja) * 2001-01-11 2002-07-26 Canon Inc 磁気薄膜メモリ素子、磁気薄膜メモリおよび情報記録再生方法
JP2005191032A (ja) * 2003-12-24 2005-07-14 Toshiba Corp 磁気記憶装置及び磁気情報の書込み方法
WO2007020823A1 (ja) * 2005-08-15 2007-02-22 Nec Corporation 磁気メモリセル、磁気ランダムアクセスメモリ、及び磁気ランダムアクセスメモリへのデータ読み書き方法

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US6767655B2 (en) * 2000-08-21 2004-07-27 Matsushita Electric Industrial Co., Ltd. Magneto-resistive element
US6834005B1 (en) 2003-06-10 2004-12-21 International Business Machines Corporation Shiftable magnetic shift register and method of using the same
JP2005093488A (ja) 2003-09-12 2005-04-07 Sony Corp 磁気抵抗効果素子とその製造方法、および磁気メモリ装置とその製造方法
JP4143020B2 (ja) 2003-11-13 2008-09-03 株式会社東芝 磁気抵抗効果素子および磁気メモリ
JP2005150482A (ja) * 2003-11-18 2005-06-09 Sony Corp 磁気抵抗効果素子及び磁気メモリ装置
JP2005223086A (ja) * 2004-02-04 2005-08-18 Sony Corp 磁気記憶素子及びその駆動方法、磁気メモリ
JP2006073930A (ja) 2004-09-06 2006-03-16 Canon Inc 磁壁移動を利用した磁気抵抗効果素子の磁化状態の変化方法及び該方法を用いた磁気メモリ素子、固体磁気メモリ
JP4920881B2 (ja) 2004-09-27 2012-04-18 株式会社日立製作所 低消費電力磁気メモリ及び磁化情報書き込み装置
JP2006303159A (ja) * 2005-04-20 2006-11-02 Fuji Electric Holdings Co Ltd スピン注入磁区移動素子およびこれを用いた装置
JP4444241B2 (ja) * 2005-10-19 2010-03-31 株式会社東芝 磁気抵抗効果素子、磁気ランダムアクセスメモリ、電子カード及び電子装置
KR100763910B1 (ko) * 2006-02-23 2007-10-05 삼성전자주식회사 마그네틱 도메인 드래깅을 이용하는 자성 메모리 소자
KR100923302B1 (ko) * 2006-02-27 2009-10-27 삼성전자주식회사 자기 메모리 소자
JP5077732B2 (ja) 2006-03-23 2012-11-21 日本電気株式会社 磁気メモリセル、磁気ランダムアクセスメモリ、半導体装置及び半導体装置の製造方法
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US8023315B2 (en) * 2007-02-13 2011-09-20 Nec Corporation Magnetoresistive effect element and magnetic random access memory

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002208680A (ja) * 2001-01-11 2002-07-26 Canon Inc 磁気薄膜メモリ素子、磁気薄膜メモリおよび情報記録再生方法
JP2005191032A (ja) * 2003-12-24 2005-07-14 Toshiba Corp 磁気記憶装置及び磁気情報の書込み方法
WO2007020823A1 (ja) * 2005-08-15 2007-02-22 Nec Corporation 磁気メモリセル、磁気ランダムアクセスメモリ、及び磁気ランダムアクセスメモリへのデータ読み書き方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
MIZUKAMI S. ET AL.: "The Study on Ferromagnetic Resonance Linewidth for NM/80NiFe/NM (NM = Cu, Ta, Pd and Pt) Films", JAPANESE JOURNAL OF APPLIED PHYSICS, vol. 40, February 2001 (2001-02-01), pages 580 - 585 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010074132A1 (ja) * 2008-12-25 2010-07-01 日本電気株式会社 磁気メモリ素子及び磁気ランダムアクセスメモリ
US8559214B2 (en) 2008-12-25 2013-10-15 Nec Corporation Magnetic memory device and magnetic random access memory
US8687414B2 (en) 2008-12-25 2014-04-01 Nec Corporation Magnetic memory element and magnetic random access memory
JP2017514311A (ja) * 2014-04-25 2017-06-01 華為技術有限公司Ｈｕａｗｅｉ Ｔｅｃｈｎｏｌｏｇｉｅｓ Ｃｏ．，Ｌｔｄ． 書き込み装置及び磁気メモリ

Also Published As

Publication number Publication date
JPWO2008108108A1 (ja) 2010-06-10
US8238135B2 (en) 2012-08-07
US20100096715A1 (en) 2010-04-22
JP5201538B2 (ja) 2013-06-05

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