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WO2008153000A1 - Photosensitive color resin composition for color filter, color filter, liquid crystal display, and organic el display - Google Patents

Photosensitive color resin composition for color filter, color filter, liquid crystal display, and organic el display Download PDF

Info

Publication number
WO2008153000A1
WO2008153000A1 PCT/JP2008/060541 JP2008060541W WO2008153000A1 WO 2008153000 A1 WO2008153000 A1 WO 2008153000A1 JP 2008060541 W JP2008060541 W JP 2008060541W WO 2008153000 A1 WO2008153000 A1 WO 2008153000A1
Authority
WO
WIPO (PCT)
Prior art keywords
group
resin composition
color
color filter
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/060541
Other languages
French (fr)
Japanese (ja)
Inventor
Toshiyuki Tanaka
Junji Mizukami
Tatsunori Tsuchiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to CN2008800010167A priority Critical patent/CN101548203B/en
Publication of WO2008153000A1 publication Critical patent/WO2008153000A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

Disclosed is a photosensitive color resin composition for color filters, which is excellent in image-forming property even when a colorant has a high concentration, while having an excellent balance between sensitivity and solubility. This photosensitive color resin composition for color filters is also excellent in sharpness of a pixel edge and adhesion. Specifically disclosed is a photosensitive color resin composition for color filters, which contains an alkali-soluble resin (A) obtained by reacting a reaction product of an epoxy resin (a) represented by the general formula (1-a) below and an unsaturated group-containing carboxylic acid (b) with a polybasic acid and/or an anhydride thereof (c), a photopolymerization initiator (B), and a colorant (C). The alkali-soluble resin (A) has a weight average molecular weight of not less than 3,300 but not more than 50,000. (1-a) (In the formula, n represents an average value which is a number of 0-10; R41 represents a hydrogen atom, a halogen atom, an alkyl group having 1-8 carbon atoms, a cycloalkyl group having 3-10 carbon atoms, a phenyl group, a naphthyl group or a biphenyl group; and G represents a glycidyl group.)
PCT/JP2008/060541 2007-06-11 2008-06-09 Photosensitive color resin composition for color filter, color filter, liquid crystal display, and organic el display Ceased WO2008153000A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2008800010167A CN101548203B (en) 2007-06-11 2008-06-09 Photosensitive colored resin composition for color filter, color filter, liquid crystal display device, and organic electroluminescence display

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007154159 2007-06-11
JP2007-154159 2007-06-11

Publications (1)

Publication Number Publication Date
WO2008153000A1 true WO2008153000A1 (en) 2008-12-18

Family

ID=40129605

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/060541 Ceased WO2008153000A1 (en) 2007-06-11 2008-06-09 Photosensitive color resin composition for color filter, color filter, liquid crystal display, and organic el display

Country Status (5)

Country Link
JP (1) JP5343410B2 (en)
KR (1) KR101477981B1 (en)
CN (1) CN101548203B (en)
TW (1) TWI449968B (en)
WO (1) WO2008153000A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110244513A (en) * 2012-01-31 2019-09-17 三菱化学株式会社 Colored photosensitive composition, black photo spacer and color filter

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5096814B2 (en) * 2007-07-04 2012-12-12 東京応化工業株式会社 Colored photosensitive composition
JP2011099919A (en) * 2009-11-04 2011-05-19 Mitsubishi Chemicals Corp Colored resin composition, color filter, liquid crystal display device, and organic el display
JP2012083549A (en) * 2010-10-12 2012-04-26 Mitsubishi Chemicals Corp Photosensitive coloring resin composition for color filter, color filter, liquid crystal display device, and organic el display
JP5829849B2 (en) * 2011-07-06 2015-12-09 大阪有機化学工業株式会社 Method for producing adamantane derivative
TW201308010A (en) * 2011-07-19 2013-02-16 Nippon Kayaku Kk Colored resin composition
CN103890660B (en) * 2011-10-25 2019-05-31 三菱化学株式会社 Colored photosensitive composition, colored spacer, color filter, and liquid crystal display device
EP2805347B1 (en) * 2012-01-19 2018-03-07 Brewer Science, Inc. Nonpolymeric antireflection compositions containing adamantyl groups
CN102880002B (en) * 2012-10-09 2015-09-23 京东方科技集团股份有限公司 A kind of black-colored photosensitive resin composition, display panel and liquid crystal display
TWI463257B (en) * 2012-11-23 2014-12-01 Chi Mei Corp Photosensitive resin composition for color filters and uses thereof
KR101609634B1 (en) 2012-12-26 2016-04-06 제일모직 주식회사 Photosensitive resin composition and light blocking layer using the same
KR101526678B1 (en) * 2013-08-09 2015-06-05 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter and liquid crystal display having the same
KR102210576B1 (en) * 2013-09-25 2021-02-01 미쯔비시 케미컬 주식회사 Photosensitive coloring composition, black matrix, coloring spacer, image display device, and pigment dispersion
WO2015080146A1 (en) * 2013-11-28 2015-06-04 日本化薬株式会社 Active energy ray-curable resin composition, and spacer for display elements and/or color filter protective film using same
US9285521B2 (en) * 2014-05-28 2016-03-15 Chi Mei Corporation Photosensitive resin composition for color filter and uses thereof
KR102195638B1 (en) * 2014-11-07 2020-12-28 동우 화인켐 주식회사 Self emission type photosensitive resin composition, and display device comprising color conversion layer prepared thereby
JP5959125B2 (en) * 2015-01-22 2016-08-02 日本化薬株式会社 Reactive carboxylate compound, active energy ray-curable resin composition using the same, and use thereof
JP6996175B2 (en) * 2016-09-27 2022-01-17 東レ株式会社 Photosensitive composition for color filter and color filter substrate using it
CN109923475B (en) * 2016-10-14 2022-12-02 三菱化学株式会社 Photosensitive coloring composition, cured product, coloring spacer and image display device
TWI670354B (en) * 2017-02-03 2019-09-01 南韓商東友精細化工有限公司 Self emission type photosensitive resin composition, color filter and image display device using the same
JP2019106332A (en) * 2017-12-14 2019-06-27 コニカミノルタ株式会社 Organic electroluminescent device and method for manufacturing the same, and display device
KR102242171B1 (en) * 2020-12-17 2021-04-20 동우 화인켐 주식회사 Self emission type photosensitive resin composition, and display device comprising color conversion layer prepared thereby

Citations (11)

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WO1996034303A1 (en) * 1995-04-27 1996-10-31 Nippon Steel Chemical Co., Ltd. Material for forming color-filter protecting film and color-filter protecting film
JPH09211860A (en) * 1996-02-06 1997-08-15 Nippon Kayaku Co Ltd Resin composition, resist ink resin composition and its cured body
JP2002145999A (en) * 2000-11-15 2002-05-22 Nagase Kasei Kogyo Kk Photopolymerizable unsaturated resin and photosensitive resin composition containing the resin
JP2003270785A (en) * 2002-03-15 2003-09-25 Nippon Steel Chem Co Ltd Colored photosensitive resin composition and color filter
JP2004361736A (en) * 2003-06-05 2004-12-24 Nippon Steel Chem Co Ltd Photosensitive resin composition for black resist and light-shielding film formed using the same
JP2005029520A (en) * 2003-07-08 2005-02-03 Daicel Chem Ind Ltd Polymerizable adamantane derivative, polymer compound, resin composition for photoresist, and method for producing semiconductor
JP2005055814A (en) * 2003-08-07 2005-03-03 Mitsubishi Chemicals Corp Photosensitive colored resin composition for color filter, color filter, and liquid crystal display device
JP2005126674A (en) * 2003-09-30 2005-05-19 Mitsubishi Chemicals Corp Colored resin composition, color filter, and liquid crystal display device
JP2006053569A (en) * 2003-06-10 2006-02-23 Mitsubishi Chemicals Corp Photopolymerizable composition and color filter using the same
JP2006328343A (en) * 2004-12-09 2006-12-07 Mitsubishi Chemicals Corp Curable composition, cured product, color filter, and liquid crystal display device
JP2008052069A (en) * 2006-08-25 2008-03-06 Tokyo Ohka Kogyo Co Ltd Colored photosensitive resin composition

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JP2878486B2 (en) * 1991-05-31 1999-04-05 日本化薬株式会社 Resin composition, solder resist resin composition and cured product thereof
JP4426197B2 (en) * 2003-03-25 2010-03-03 凸版印刷株式会社 Coloring composition, photosensitive coloring composition and color filter
JP2005134439A (en) * 2003-10-28 2005-05-26 Asahi Glass Co Ltd Photosensitive resin composition and cured product thereof

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996034303A1 (en) * 1995-04-27 1996-10-31 Nippon Steel Chemical Co., Ltd. Material for forming color-filter protecting film and color-filter protecting film
JPH09211860A (en) * 1996-02-06 1997-08-15 Nippon Kayaku Co Ltd Resin composition, resist ink resin composition and its cured body
JP2002145999A (en) * 2000-11-15 2002-05-22 Nagase Kasei Kogyo Kk Photopolymerizable unsaturated resin and photosensitive resin composition containing the resin
JP2003270785A (en) * 2002-03-15 2003-09-25 Nippon Steel Chem Co Ltd Colored photosensitive resin composition and color filter
JP2004361736A (en) * 2003-06-05 2004-12-24 Nippon Steel Chem Co Ltd Photosensitive resin composition for black resist and light-shielding film formed using the same
JP2006053569A (en) * 2003-06-10 2006-02-23 Mitsubishi Chemicals Corp Photopolymerizable composition and color filter using the same
JP2005029520A (en) * 2003-07-08 2005-02-03 Daicel Chem Ind Ltd Polymerizable adamantane derivative, polymer compound, resin composition for photoresist, and method for producing semiconductor
JP2005055814A (en) * 2003-08-07 2005-03-03 Mitsubishi Chemicals Corp Photosensitive colored resin composition for color filter, color filter, and liquid crystal display device
JP2005126674A (en) * 2003-09-30 2005-05-19 Mitsubishi Chemicals Corp Colored resin composition, color filter, and liquid crystal display device
JP2006328343A (en) * 2004-12-09 2006-12-07 Mitsubishi Chemicals Corp Curable composition, cured product, color filter, and liquid crystal display device
JP2008052069A (en) * 2006-08-25 2008-03-06 Tokyo Ohka Kogyo Co Ltd Colored photosensitive resin composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110244513A (en) * 2012-01-31 2019-09-17 三菱化学株式会社 Colored photosensitive composition, black photo spacer and color filter
CN110244513B (en) * 2012-01-31 2022-10-14 三菱化学株式会社 Colored photosensitive composition, black photospacer, and color filter

Also Published As

Publication number Publication date
JP2009020501A (en) 2009-01-29
TW200916851A (en) 2009-04-16
JP5343410B2 (en) 2013-11-13
TWI449968B (en) 2014-08-21
KR20100018483A (en) 2010-02-17
KR101477981B1 (en) 2014-12-31
CN101548203B (en) 2012-03-07
CN101548203A (en) 2009-09-30

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