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WO2008146809A1 - 磁界検出装置 - Google Patents

磁界検出装置 Download PDF

Info

Publication number
WO2008146809A1
WO2008146809A1 PCT/JP2008/059710 JP2008059710W WO2008146809A1 WO 2008146809 A1 WO2008146809 A1 WO 2008146809A1 JP 2008059710 W JP2008059710 W JP 2008059710W WO 2008146809 A1 WO2008146809 A1 WO 2008146809A1
Authority
WO
WIPO (PCT)
Prior art keywords
magnetic field
end portion
magnetic body
detection device
narrowed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/059710
Other languages
English (en)
French (fr)
Inventor
Taisuke Furukawa
Takeharu Kuroiwa
Shingo Tomohisa
Takashi Takenaga
Masakazu Taki
Hiroshi Takada
Yuji Abe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2009516324A priority Critical patent/JP4964301B2/ja
Priority to DE112008001414T priority patent/DE112008001414T5/de
Priority to US12/601,098 priority patent/US8378674B2/en
Publication of WO2008146809A1 publication Critical patent/WO2008146809A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09—Magnetoresistive devices
    • G01R33/093—Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/07—Hall effect devices
    • G01R33/072—Constructional adaptation of the sensor to specific applications
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09—Magnetoresistive devices
    • G01R33/091—Constructional adaptation of the sensor to specific applications

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Measuring Magnetic Variables (AREA)
  • Hall/Mr Elements (AREA)
  • Magnetic Heads (AREA)
  • Transmission And Conversion Of Sensor Element Output (AREA)

Abstract

　本発明は、磁気抵抗効果素子に印加される磁界を調節するために設けられた磁性体(磁束ガイド)を有した磁界検出装置に関している。基板上磁性体３の平面視形状は、一方端部３２側が先細り形状となり、一方端部とは反対側の他方端部３１側が、一方端部より幅広となった略漏斗形状であって、出力側端部の前方に磁気抵抗効果素子２が配設されている。基板上磁性体３は、先細り部３４の輪郭が、漏斗のように直線的ではなく、緩やかな曲率で外側に突出した第１の曲線部と、該第１の曲線部と同等の曲率で緩やかに内側に突出した第２の曲線部とが連続して構成される曲線形状を有している。
PCT/JP2008/059710 2007-05-28 2008-05-27 磁界検出装置 Ceased WO2008146809A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2009516324A JP4964301B2 (ja) 2007-05-28 2008-05-27 磁界検出装置
DE112008001414T DE112008001414T5 (de) 2007-05-28 2008-05-27 Magnetfelddetektionsvorrichtung
US12/601,098 US8378674B2 (en) 2007-05-28 2008-05-27 Magnetic field detection device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-139850 2007-05-28
JP2007139850 2007-05-28

Publications (1)

Publication Number Publication Date
WO2008146809A1 true WO2008146809A1 (ja) 2008-12-04

Family

ID=40075049

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/059710 Ceased WO2008146809A1 (ja) 2007-05-28 2008-05-27 磁界検出装置

Country Status (4)

Country Link
US (1) US8378674B2 (ja)
JP (1) JP4964301B2 (ja)
DE (1) DE112008001414T5 (ja)
WO (1) WO2008146809A1 (ja)

Cited By (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010276422A (ja) * 2009-05-27 2010-12-09 Sae Magnetics (Hk) Ltd 電流センサ
WO2011068146A1 (ja) * 2009-12-02 2011-06-09 アルプス電気株式会社 磁気センサ
WO2011089978A1 (ja) * 2010-01-20 2011-07-28 アルプス電気株式会社 磁気センサ
WO2012014546A1 (ja) * 2010-07-30 2012-02-02 三菱電機株式会社 磁性体検出装置
JP2012127788A (ja) * 2010-12-15 2012-07-05 Alps Electric Co Ltd 磁気センサ
JP2012132832A (ja) * 2010-12-22 2012-07-12 Mitsubishi Electric Corp 半導体装置
JP2012242195A (ja) * 2011-05-18 2012-12-10 Mitsubishi Electric Corp 磁気検出装置
JP2013152208A (ja) * 2011-12-26 2013-08-08 Hitachi Metals Ltd 磁気センサデバイス、及び電流センサ回路
WO2013118498A1 (ja) * 2012-02-07 2013-08-15 旭化成エレクトロニクス株式会社 磁気センサ及びその磁気検出方法
JP2013178226A (ja) * 2012-02-07 2013-09-09 Asahi Kasei Electronics Co Ltd 磁気センサ及びその磁気検出方法
WO2014123142A1 (ja) * 2013-02-07 2014-08-14 三菱電機株式会社 磁気センサ装置
JP2015500992A (ja) * 2011-12-05 2015-01-08 アドバンスド マイクロセンサーズ コーポレーション 磁界検知装置及び方法
US9244135B2 (en) 2011-05-16 2016-01-26 Mitsubishi Electric Corporation Magnetic sensor device
US9279866B2 (en) 2012-04-09 2016-03-08 Mitsubishi Electric Corporation Magnetic sensor
WO2016047782A1 (ja) * 2014-09-26 2016-03-31 旭化成エレクトロニクス株式会社 磁気センサ
JP2016048256A (ja) * 2009-09-25 2016-04-07 エバースピン テクノロジーズ インコーポレイテッドＥｖｅｒＳｐｉｎ Ｔｅｃｈｎｏｌｏｇｉｅｓ， Ｉｎｃ． ３軸磁場センサー
JP2016170166A (ja) * 2015-03-12 2016-09-23 Tdk株式会社 磁気センサ
JP2016170028A (ja) * 2015-03-12 2016-09-23 Tdk株式会社 磁気センサ
US9525129B2 (en) 2010-03-31 2016-12-20 Everspin Technologies, Inc. Methods of manufacturing a magnetic field sensor
DE102017120052A1 (de) 2016-10-25 2018-04-26 Tdk Corporation Magnetfelderfassungsvorrichtung
DE102017119905A1 (de) 2016-12-06 2018-06-07 Tdk Corporation Magnetfeld-Erfassungsvorrichtung
JPWO2017077871A1 (ja) * 2015-11-06 2018-08-16 Tdk株式会社 磁気センサ
DE102018106205A1 (de) 2017-03-27 2018-09-27 Tdk Corporation Magnetfelderfassungsvorrichtung
DE102018106002A1 (de) 2017-04-10 2018-10-11 Tdk Corporation Element mit magnetoresistivem Effekt
JP2019074481A (ja) * 2017-10-19 2019-05-16 Tdk株式会社 磁気センサ
JP2019095319A (ja) * 2017-11-24 2019-06-20 Tdk株式会社 磁気センサ
US10330747B2 (en) 2016-12-15 2019-06-25 Tdk Corporation Magnetic field detection device
JP2019158508A (ja) * 2018-03-12 2019-09-19 Tdk株式会社 磁気センサ
JP2020067331A (ja) * 2018-10-23 2020-04-30 Tdk株式会社 磁気センサ
US11782104B2 (en) 2017-03-27 2023-10-10 Tdk Corporation Magnetic field detection device

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008249556A (ja) * 2007-03-30 2008-10-16 Tdk Corp 磁気センサ
EP2333573B1 (en) * 2009-11-30 2012-10-24 STMicroelectronics Srl Integrated magnetic sensor for detecting horizontal magnetic fields and manufacturing process thereof
IT1397983B1 (it) * 2010-02-05 2013-02-04 St Microelectronics Srl Sensore magnetico integrato di rilevamento di campi magnetici verticali e relativo procedimento di fabbricazione
US9207292B2 (en) 2011-02-02 2015-12-08 Infineon Technologies Ag Magnetoresistive device and method for manufacturing the same
US20130113473A1 (en) * 2011-11-04 2013-05-09 Sae Magnetics (H.K.) Magnetic sensor with shunting layers and manufacturing method thereof
DE102013225580A1 (de) * 2013-12-11 2015-06-11 Zf Friedrichshafen Ag Messkopf, Messsystem sowie Verfahren zum Bestimmen einer Qualität eines Magnetblocks für einen Energiewandler
JP2015125019A (ja) * 2013-12-25 2015-07-06 株式会社東芝 電流センサ、電流測定モジュール及びスマートメータ
CN109154640B (zh) 2016-05-24 2021-03-23 Tdk株式会社 磁传感器
JP6828676B2 (ja) 2017-12-27 2021-02-10 Tdk株式会社 磁気センサ
JP7615659B2 (ja) * 2020-12-22 2025-01-17 株式会社レゾナック 磁気センサ
JP7552354B2 (ja) * 2020-12-25 2024-09-18 株式会社レゾナック 磁気センサ
JP7643134B2 (ja) * 2021-03-26 2025-03-11 株式会社レゾナック 磁気センサ
US20230089065A1 (en) * 2021-09-21 2023-03-23 Tdk Corporation Sensor

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JPH09218052A (ja) * 1996-02-09 1997-08-19 Tokai Rika Co Ltd 磁気センサ
JPH10318783A (ja) * 1997-05-16 1998-12-04 Yazaki Corp 磁気検出装置及び磁気検出信号処理装置
JP2000193728A (ja) * 1998-12-25 2000-07-14 Toyota Central Res & Dev Lab Inc 磁界検出素子
JP2001102659A (ja) * 1999-01-04 2001-04-13 Yamaha Corp 磁気抵抗素子

Cited By (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010276422A (ja) * 2009-05-27 2010-12-09 Sae Magnetics (Hk) Ltd 電流センサ
US8836317B2 (en) 2009-05-27 2014-09-16 Sae Magnetics (H.K.) Ltd. Current sensor
USRE46428E1 (en) 2009-09-25 2017-06-06 Everspin Technologies, Inc. Three axis magnetic field sensor
USRE49404E1 (en) 2009-09-25 2023-01-31 Everspin Technologies, Inc. Three axis magnetic field sensor
JP2016048256A (ja) * 2009-09-25 2016-04-07 エバースピン テクノロジーズ インコーポレイテッドＥｖｅｒＳｐｉｎ Ｔｅｃｈｎｏｌｏｇｉｅｓ， Ｉｎｃ． ３軸磁場センサー
WO2011068146A1 (ja) * 2009-12-02 2011-06-09 アルプス電気株式会社 磁気センサ
JP5297539B2 (ja) * 2010-01-20 2013-09-25 アルプス電気株式会社 磁気センサ
WO2011089978A1 (ja) * 2010-01-20 2011-07-28 アルプス電気株式会社 磁気センサ
US10276789B2 (en) 2010-03-31 2019-04-30 Everspin Technologies, Inc. Methods of manufacturing a magnetic field sensor
US9525129B2 (en) 2010-03-31 2016-12-20 Everspin Technologies, Inc. Methods of manufacturing a magnetic field sensor
US9893274B2 (en) 2010-03-31 2018-02-13 Everspin Technologies, Inc. Methods of manufacturing a magnetic field sensor
US11678584B2 (en) 2010-03-31 2023-06-13 Everspin Technologies, Inc. Methods of manufacturing a magnetic field sensor
US11024799B2 (en) 2010-03-31 2021-06-01 Everspin Technologies, Inc. Methods of manufacturing a magnetic field sensor
US9553261B2 (en) 2010-03-31 2017-01-24 Everspin Technologies, Inc. Methods of manufacturing a magnetic field sensor
WO2012014546A1 (ja) * 2010-07-30 2012-02-02 三菱電機株式会社 磁性体検出装置
US9222993B2 (en) 2010-07-30 2015-12-29 Mitsubishi Electric Corporation Magnetic substance detection device
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JP2013152208A (ja) * 2011-12-26 2013-08-08 Hitachi Metals Ltd 磁気センサデバイス、及び電流センサ回路
US9599681B2 (en) 2012-02-07 2017-03-21 Asahi Kasei Microdevices Corporation Magnetic sensor and magnetic detecting method of the same
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JPWO2014123142A1 (ja) * 2013-02-07 2017-02-02 三菱電機株式会社 磁気センサ装置
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WO2014123142A1 (ja) * 2013-02-07 2014-08-14 三菱電機株式会社 磁気センサ装置
JPWO2016047782A1 (ja) * 2014-09-26 2017-04-27 旭化成エレクトロニクス株式会社 磁気センサ
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Also Published As

Publication number Publication date
JP4964301B2 (ja) 2012-06-27
US20100156405A1 (en) 2010-06-24
US8378674B2 (en) 2013-02-19
JPWO2008146809A1 (ja) 2010-08-19
DE112008001414T5 (de) 2010-04-22

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