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WO2008146449A1 - 弾性波素子 - Google Patents

弾性波素子 Download PDF

Info

Publication number
WO2008146449A1
WO2008146449A1 PCT/JP2008/001165 JP2008001165W WO2008146449A1 WO 2008146449 A1 WO2008146449 A1 WO 2008146449A1 JP 2008001165 W JP2008001165 W JP 2008001165W WO 2008146449 A1 WO2008146449 A1 WO 2008146449A1
Authority
WO
WIPO (PCT)
Prior art keywords
elastic wave
wave element
piezoelectric substrate
silicon oxide
oxide film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/001165
Other languages
English (en)
French (fr)
Inventor
Yukio Iwasaki
Hiroki Kamiguchi
Yosuke Hamaoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Original Assignee
Panasonic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp filed Critical Panasonic Corp
Priority to JP2009516166A priority Critical patent/JP4868063B2/ja
Priority to EP08751689A priority patent/EP2109218A4/en
Priority to CN2008800139924A priority patent/CN101669285B/zh
Priority to US12/532,426 priority patent/US7928633B2/en
Publication of WO2008146449A1 publication Critical patent/WO2008146449A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/0222Details of interface-acoustic, boundary, pseudo-acoustic or Stonely wave devices

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

 弾性波素子は、圧電基板と、圧電基板上に設けられた櫛形電極と、櫛形電極を覆う酸化ケイ素膜と、酸化ケイ素膜上に設けられた酸化窒化ケイ素膜とを備える。酸化ケイ素膜の膜厚Hと圧電基板を伝播する弾性波の波長λはH/λ≧0.15の関係を満たす。この弾性波素子は弾性波の伝播特性の変動を抑制し、高い信頼性を有する。
PCT/JP2008/001165 2007-05-25 2008-05-09 弾性波素子 Ceased WO2008146449A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009516166A JP4868063B2 (ja) 2007-05-25 2008-05-09 弾性波素子
EP08751689A EP2109218A4 (en) 2007-05-25 2008-05-09 ELASTIC WAVE ELEMENT
CN2008800139924A CN101669285B (zh) 2007-05-25 2008-05-09 弹性波元件
US12/532,426 US7928633B2 (en) 2007-05-25 2008-05-09 Elastic wave element containing a silicon oxide film and a silicon nitride oxide film

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007138591 2007-05-25
JP2007-138591 2007-05-25
JP2008-082801 2008-03-27
JP2008082801 2008-03-27

Publications (1)

Publication Number Publication Date
WO2008146449A1 true WO2008146449A1 (ja) 2008-12-04

Family

ID=40074727

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/001165 Ceased WO2008146449A1 (ja) 2007-05-25 2008-05-09 弾性波素子

Country Status (5)

Country Link
US (1) US7928633B2 (ja)
EP (1) EP2109218A4 (ja)
JP (2) JP4868063B2 (ja)
CN (1) CN101669285B (ja)
WO (1) WO2008146449A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012057208A (ja) * 2010-09-08 2012-03-22 Murata Mfg Co Ltd 酸窒化シリコン膜の成膜方法及び弾性境界波装置の製造方法
JP2013544041A (ja) * 2011-03-25 2013-12-09 パナソニック株式会社 高次横モード波を抑制した弾性波デバイス
US11522515B2 (en) 2017-03-16 2022-12-06 Skyworks Solutions, Inc. Acoustic wave device including interdigital electrodes covered by silicon oxynitride film

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102365822B (zh) * 2009-04-07 2014-07-09 株式会社村田制作所 弹性边界波谐振器以及梯型滤波器
CN103718458B (zh) * 2011-08-08 2017-01-25 株式会社村田制作所 弹性波装置
JP2018182354A (ja) * 2017-04-03 2018-11-15 株式会社村田製作所 弾性波装置
GB2598165B (en) * 2020-08-18 2022-08-24 River Eletec Corp Acoustic wave device
US12274173B2 (en) 2020-08-18 2025-04-08 River Eletec Corporation Acoustic wave device
US20230361753A1 (en) 2022-03-02 2023-11-09 Skyworks Solutions, Inc. Acoustic wave device with interdigital transducer electrode having buffer layer

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003198321A (ja) * 2001-10-17 2003-07-11 Murata Mfg Co Ltd 弾性表面波装置およびその製造方法
JP2003209458A (ja) 2001-03-04 2003-07-25 Kazuhiko Yamanouchi 弾性表面波基板及び弾性表面波機能素子
JP2005348139A (ja) * 2004-06-03 2005-12-15 Murata Mfg Co Ltd 弾性波装置及びその製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3293408B2 (ja) * 1995-06-01 2002-06-17 松下電器産業株式会社 Sawデバイスおよびその製造方法
JP2914282B2 (ja) * 1996-03-25 1999-06-28 日本電気株式会社 半導体装置の製造方法
JP3445971B2 (ja) * 2000-12-14 2003-09-16 富士通株式会社 弾性表面波素子
EP1239588A2 (en) * 2001-03-04 2002-09-11 Kazuhiko Yamanouchi Surface acoustic wave substrate and surface acoustic wave functional element
WO2002082644A1 (fr) * 2001-03-30 2002-10-17 Mitsubishi Denki Kabushiki Kaisha Dispositif d'onde acoustique et procede de fabrication correspondant
JP2005150228A (ja) * 2003-11-12 2005-06-09 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JP4453701B2 (ja) * 2004-03-02 2010-04-21 株式会社村田製作所 弾性表面波装置
JP4329740B2 (ja) * 2004-10-22 2009-09-09 セイコーエプソン株式会社 有機エレクトロルミネッセンス装置の製造方法、及び有機エレクトロルミネッセンス装置
JP2007028297A (ja) * 2005-07-19 2007-02-01 Seiko Epson Corp Sawデバイスの製造方法
JP5125729B2 (ja) * 2008-04-28 2013-01-23 パナソニック株式会社 弾性波素子と、これを用いたフィルタ及び電子機器

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003209458A (ja) 2001-03-04 2003-07-25 Kazuhiko Yamanouchi 弾性表面波基板及び弾性表面波機能素子
JP2003198321A (ja) * 2001-10-17 2003-07-11 Murata Mfg Co Ltd 弾性表面波装置およびその製造方法
JP2005348139A (ja) * 2004-06-03 2005-12-15 Murata Mfg Co Ltd 弾性波装置及びその製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2109218A4

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012057208A (ja) * 2010-09-08 2012-03-22 Murata Mfg Co Ltd 酸窒化シリコン膜の成膜方法及び弾性境界波装置の製造方法
JP2013544041A (ja) * 2011-03-25 2013-12-09 パナソニック株式会社 高次横モード波を抑制した弾性波デバイス
JP2015111923A (ja) * 2011-03-25 2015-06-18 スカイワークス・パナソニック フィルターソリューションズ ジャパン株式会社 高次横モード波を抑制した弾性波デバイス
US9065424B2 (en) 2011-03-25 2015-06-23 Skyworks Panasonic Filter Solutions Japan Co., Ltd Acoustic wave device with reduced higher order transverse modes
US9640750B2 (en) 2011-03-25 2017-05-02 Skyworks Filter Solutions Japan Co., Ltd. Acoustic wave device with suppressed higher order transverse modes
US11522515B2 (en) 2017-03-16 2022-12-06 Skyworks Solutions, Inc. Acoustic wave device including interdigital electrodes covered by silicon oxynitride film

Also Published As

Publication number Publication date
US20100060101A1 (en) 2010-03-11
EP2109218A4 (en) 2012-11-28
JP2011254549A (ja) 2011-12-15
JP4868063B2 (ja) 2012-02-01
CN101669285A (zh) 2010-03-10
EP2109218A1 (en) 2009-10-14
JPWO2008146449A1 (ja) 2010-08-19
JP5278513B2 (ja) 2013-09-04
US7928633B2 (en) 2011-04-19
CN101669285B (zh) 2013-01-02

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