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WO2008143186A1 - 低屈折率被膜形成用塗布液、その製造方法及び反射防止材 - Google Patents

低屈折率被膜形成用塗布液、その製造方法及び反射防止材 Download PDF

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Publication number
WO2008143186A1
WO2008143186A1 PCT/JP2008/059070 JP2008059070W WO2008143186A1 WO 2008143186 A1 WO2008143186 A1 WO 2008143186A1 JP 2008059070 W JP2008059070 W JP 2008059070W WO 2008143186 A1 WO2008143186 A1 WO 2008143186A1
Authority
WO
WIPO (PCT)
Prior art keywords
coating film
refractive index
coating solution
low refractive
disclosed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/059070
Other languages
English (en)
French (fr)
Inventor
Takayuki Negi
Kenichi Motoyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Priority to KR1020097023903A priority Critical patent/KR101463641B1/ko
Priority to JP2009515214A priority patent/JP5310549B2/ja
Priority to CN2008800161133A priority patent/CN101679805B/zh
Publication of WO2008143186A1 publication Critical patent/WO2008143186A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Paints Or Removers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Silicon Polymers (AREA)

Abstract

　水接触角が高い基材上でも低い温度で硬化し、高光透過性）、高硬度の耐擦傷性に優れる低屈折率を有する被膜を形成できる被膜形成用塗布液、その製造方法、及び該被膜を使用する反射防止材を提供する。 　含フッ素有機基が結合したケイ素原子を有するポリシロキサン（Ａ）と、炭素数が２０以下の直鎖アルキルアミン化合物（Ｂ）と、全体の炭素数が２０以下でありかつその構造中に炭素数１０以下の環状基を有するアミン化合物（Ｃ）と、を含有することを特徴とする低屈折率被膜形成用塗布液。
PCT/JP2008/059070 2007-05-18 2008-05-16 低屈折率被膜形成用塗布液、その製造方法及び反射防止材 Ceased WO2008143186A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020097023903A KR101463641B1 (ko) 2007-05-18 2008-05-16 저굴절률 피막 형성용 도포액, 그 제조 방법 및 반사 방지재
JP2009515214A JP5310549B2 (ja) 2007-05-18 2008-05-16 低屈折率被膜形成用塗布液、その製造方法及び反射防止材
CN2008800161133A CN101679805B (zh) 2007-05-18 2008-05-16 低折射率被膜形成用涂布液、其制造方法及防反射材料

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-132683 2007-05-18
JP2007132683 2007-05-18

Publications (1)

Publication Number Publication Date
WO2008143186A1 true WO2008143186A1 (ja) 2008-11-27

Family

ID=40031887

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/059070 Ceased WO2008143186A1 (ja) 2007-05-18 2008-05-16 低屈折率被膜形成用塗布液、その製造方法及び反射防止材

Country Status (5)

Country Link
JP (1) JP5310549B2 (ja)
KR (1) KR101463641B1 (ja)
CN (1) CN101679805B (ja)
TW (1) TWI537349B (ja)
WO (1) WO2008143186A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5262722B2 (ja) * 2006-11-14 2013-08-14 日産化学工業株式会社 低屈折率被膜形成用塗布液、その製造方法及び反射防止材
CN113946000A (zh) * 2020-06-30 2022-01-18 日本电产株式会社 光学构件的制造方法及光学构件

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09208898A (ja) * 1995-12-01 1997-08-12 Nissan Chem Ind Ltd 低屈折率及び撥水性を有する被膜
JPH11217540A (ja) * 1998-02-03 1999-08-10 Daikin Ind Ltd 塗料用組成物
JP2003025510A (ja) * 2001-07-16 2003-01-29 Shin Etsu Chem Co Ltd 反射防止性及び耐擦傷性を有する多層積層体
WO2005059051A1 (ja) * 2003-12-19 2005-06-30 Nissan Chemical Industries, Ltd. 低屈折率及び大きい水接触角を有する被膜
WO2007102514A1 (ja) * 2006-03-07 2007-09-13 Nissan Chemical Industries, Ltd. 被膜形成用塗布液、その製造方法、その被膜、及び反射防止材
WO2008044742A1 (en) * 2006-10-12 2008-04-17 Nissan Chemical Industries, Ltd. Coating solution for formation of low refractive coating film, process for production thereof, and anti-reflection material
WO2008059844A1 (en) * 2006-11-14 2008-05-22 Nissan Chemical Industries, Ltd. Coating liquid for forming low refractive index film, method for producing the same and antireflection member

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW376408B (en) * 1995-12-01 1999-12-11 Nissan Chemical Ind Ltd Coating film having water repellency and low refractive index
US7652115B2 (en) * 2003-09-08 2010-01-26 3M Innovative Properties Company Fluorinated polyether isocyanate derived silane compositions
JP4887783B2 (ja) * 2003-12-18 2012-02-29 日産化学工業株式会社 低屈折率及び撥水性を有する被膜

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09208898A (ja) * 1995-12-01 1997-08-12 Nissan Chem Ind Ltd 低屈折率及び撥水性を有する被膜
JPH11217540A (ja) * 1998-02-03 1999-08-10 Daikin Ind Ltd 塗料用組成物
JP2003025510A (ja) * 2001-07-16 2003-01-29 Shin Etsu Chem Co Ltd 反射防止性及び耐擦傷性を有する多層積層体
WO2005059051A1 (ja) * 2003-12-19 2005-06-30 Nissan Chemical Industries, Ltd. 低屈折率及び大きい水接触角を有する被膜
WO2007102514A1 (ja) * 2006-03-07 2007-09-13 Nissan Chemical Industries, Ltd. 被膜形成用塗布液、その製造方法、その被膜、及び反射防止材
WO2008044742A1 (en) * 2006-10-12 2008-04-17 Nissan Chemical Industries, Ltd. Coating solution for formation of low refractive coating film, process for production thereof, and anti-reflection material
WO2008059844A1 (en) * 2006-11-14 2008-05-22 Nissan Chemical Industries, Ltd. Coating liquid for forming low refractive index film, method for producing the same and antireflection member

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5262722B2 (ja) * 2006-11-14 2013-08-14 日産化学工業株式会社 低屈折率被膜形成用塗布液、その製造方法及び反射防止材
CN113946000A (zh) * 2020-06-30 2022-01-18 日本电产株式会社 光学构件的制造方法及光学构件

Also Published As

Publication number Publication date
KR101463641B1 (ko) 2014-11-19
KR20100016601A (ko) 2010-02-12
JP5310549B2 (ja) 2013-10-09
CN101679805B (zh) 2013-02-27
JPWO2008143186A1 (ja) 2010-08-05
TWI537349B (zh) 2016-06-11
CN101679805A (zh) 2010-03-24
TW200916540A (en) 2009-04-16

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