WO2008018340A1 - Composant optique - Google Patents
Composant optique Download PDFInfo
- Publication number
- WO2008018340A1 WO2008018340A1 PCT/JP2007/065064 JP2007065064W WO2008018340A1 WO 2008018340 A1 WO2008018340 A1 WO 2008018340A1 JP 2007065064 W JP2007065064 W JP 2007065064W WO 2008018340 A1 WO2008018340 A1 WO 2008018340A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical component
- layer
- conductive material
- refractive index
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G02B1/116—Multilayers including electrically conducting layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/121—Protecting the head, e.g. against dust or impact with the record carrier
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/135—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
- G11B7/1372—Lenses
- G11B7/1374—Objective lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
Definitions
- the present invention relates to an optical component having antifouling properties.
- a water repellent coating that imparts water repellency to the surface of the optical component to facilitate removal of dirt, and an optical component.
- Antifouling coats are provided to prevent electrostatic charge and prevent dust from adhering to the surface.
- such an antifouling coat is designed to function as an antireflection film, and has a conductive material layer made of a conductive material in the first layer, the third layer, etc. from the surface side (for example, And Patent Documents 1 and 2).
- Patent Document 1 Japanese Patent Application Laid-Open No. 59-90801
- Patent Document 2 Japanese Patent Publication No. 53-28214
- those having a conductive material layer as the first layer from the surface side can prevent the adhesion of dirt, but when wiping the surface of optical components, etc.
- the surface of the layer that is, the surface of the optical component is likely to be damaged.
- the conductive material layer is deposited at a low substrate temperature of 120 ° C or lower, so the strength of the antifouling coating is reduced and wiping occurs. It becomes easy.
- those having a conductive material layer as the third layer from the surface side have two non-conductive layers formed on the surface side of the conductive material layer.
- the conductivity on the surface of the optical component becomes low, and sufficient antistatic performance to prevent the adhesion of dirt cannot be obtained.
- An object of the present invention is to prevent the adhesion of dirt and the occurrence of wiping. It is to provide an optical component that can be used.
- the invention described in claim 1 is an optical component comprising a base material and an antireflection film provided on the surface of the base material, wherein the antireflection film is a material having conductivity. And a distance between the surface of the conductive material layer and the surface of the optical component is 4 to 20 nm.
- the antireflection film has a conductive material layer, and the distance between the surface of the conductive material layer and the surface of the optical component is 4 to 20 nm, Unlike the case where the surface of the conductive material layer is located on the surface of the optical component, it is possible to prevent the surface from being wiped even when the surface of the optical component is wiped. In addition, the conductivity on the surface of the optical component is reliably maintained to prevent electrification, so that the adhesion of dirt can be prevented.
- the optical component may be any product (component) that is normally used as an optical element such as a lens, a prism, or a filter.
- the invention according to claim 2 is the optical component according to claim 1, wherein the surface resistance value of the optical component is less than 10 5 ⁇ / mouth. .
- mouth in the unit of the surface resistance value means square.
- the invention of claim 3 is an optical component comprising a base material and an antireflection film provided on the surface of the base material, wherein the antireflection film is a material having conductivity.
- the conductive material layer is formed on the inner side of the surface of the optical component, and the surface resistance value of the optical component is less than 10 5 ⁇ / mouth.
- the antireflection film since the antireflection film has the conductive material layer on the inner side of the surface of the optical component, the surface of the conductive material layer is located on the surface of the optical component. In contrast, when the surface of an optical component is wiped, it is possible to prevent wiping from occurring on the surface. In addition, since the surface resistance of optical components is less than 10 5 ⁇ / mouth, As a result, the electrical conductivity on the surface of the optical component is reliably maintained to prevent electrification.
- the invention described in claim 4 is the optical component according to any one of claims 1 to 3, wherein the thickness of the conductive material layer is 325 nm. Characterized by
- the thickness of the conductive material layer is 325 nm, it is possible to more reliably prevent charging on the surface of the optical component and prevent adhesion of dirt.
- the invention according to claim 5 is the optical component according to claim 4, characterized in that the thickness of the conductive material layer is 318 nm.
- the thickness of the conductive material layer is 318 nm, it is possible to more reliably prevent charging on the surface of the optical component and prevent adhesion of dirt.
- the invention according to claim 6 is the optical component according to any one of claims 1 to 5, wherein the conductive material is used for light having a wavelength of 600 nm. It is a high refractive index material having a refractive index of 1.55 or more.
- the refractive index is 1.8 or more with respect to light having a wavelength of 600 nm.
- the invention according to claim 7 is the optical component according to claim 6, wherein the high refractive index material contains an indium oxide-based or zinc oxide-based mixed material. It is characterized by.
- the indium oxide-based mixed material is a mixed material containing at least indium oxide, for example, a material mainly composed of a mixed material of indium oxide and tin.
- the zinc oxide-based mixed material is a mixed material containing at least zinc oxide, for example, a material mainly composed of a mixed material of zinc oxide and gallium.
- "containing" may be included as one component or may be included as all components. That is, other components may or may not be included.
- the invention according to claim 8 is the optical component according to any one of claims 1 to 7, wherein the antireflection film is more optical than the conductive material layer.
- a low-refractive index layer made of a low-refractive index material having a refractive index of less than 1.55 with respect to light having a wavelength of 600 nm is provided on the surface side of the component.
- the antireflection film since the antireflection film has the low refractive index layer on the surface side of the optical component with respect to the conductive material layer, the reflection of the optical component is performed by the low refractive index layer.
- the prevention function can be improved.
- the invention according to claim 9 is the optical component according to claim 8, characterized in that the thickness of the low refractive index layer is 4 to 20 nm.
- the invention according to claim 10 is the optical component according to claim 8 or 9, wherein the low refractive index layer is located on the surface of the optical component.
- the invention according to claim 11 is the optical component according to claim 8 or 9, wherein the optical component has a water repellent coating on the surface side of the optical component with respect to the low refractive index layer. It is characterized by this.
- the invention according to claim 12 is the optical component according to any one of claims 8 to 11, wherein the low refractive index material is silicon oxide or silicon oxide and Any one of the mixed materials of aluminum oxide is contained.
- the invention according to claim 13 is the optical component according to any one of claims 1 to 12, wherein the base material is formed of a polymer resin. It is characterized by.
- the force S can be prevented to prevent wiping from occurring on the surface of the optical component. Further, it is possible to prevent the adhesion of dirt.
- FIG. 1 is a diagram showing an example of an optical component 1 according to the present invention, in which FIG. (A) is a schematic configuration diagram, and FIG. (B) is a partially enlarged view of a circle X in FIG. .
- FIG. 2 is a graph showing the reflectance characteristics of optical components of Example (3) and Comparative Example (1).
- FIG. 3 is a graph showing the reflectance characteristics of optical components of Example (12) and Comparative Example (7).
- FIG. 4 is a graph showing the reflectance characteristics of optical components of Example (15) and Comparative Example (8).
- FIG. 5 is a graph showing the reflectance characteristics of the optical parts of Example (16) and Comparative Example (9).
- FIG. 6 is a diagram for explaining a method for measuring a surface resistance value.
- FIG. 1 is a diagram showing an example of an optical component 1 according to the present invention
- FIG. 1 (a) is a schematic configuration diagram
- Fig. 1 (b) is a partially enlarged view of circle X in Fig. 1 (a).
- the optical component 1 is used, for example, as an objective lens of an optical pick-up device in an in-vehicle DVD device, and includes a base material 2.
- the substrate 2 has a curved optical surface in the present embodiment.
- the optical surface of the optical component 1 may be a flat surface or may have a fine structure such as a diffraction structure.
- the substrate 2 is made of a polymer resin.
- the polymer resin is not particularly limited as long as it is a transparent resin material generally used as an optical material.
- acrylic resin, polyolefin resin, and polycarbonate resin are used.
- the polyolefin resin ZEONEX (manufactured by Nippon Zeon Co., Ltd.) that is a cyclic polyolefin resin, and apell (manufactured by Mitsui Chemicals, Inc.) are suitable.
- ZEONEX330R product name
- APL5014DP product name
- lapels lapels.
- the polymer resin is not limited to these.
- An antireflection film 3 is provided on the surface of the substrate 2.
- the antireflection film 3 may be provided on the light source side of the optical pickup device with respect to the substrate 2 or may be provided on the information recording medium side such as a DVD! /. It can be provided on both sides!
- This antireflection film 3 is a film having an antireflection function, and is composed of n layers (n is a natural number of, for example, 4 to 7) M,.
- the thickness of the outermost n-th layer M is 4 to 20 nm, more than the n-th layer M.
- the inner (n-1) layer M- has a thickness of 3 to 25 nm, preferably 3 to 18 nm.
- the surface of the (n-1) layer M- is located at a depth of 4 to 20 nm from the surface of the optical component 1.
- the nth layer M may be located on the outermost surface of the optical component 1 or may be located on the inner side of the water repellent coat (not shown).
- a water repellent coating is provided on the outside of the antireflection film 3, it is possible to facilitate removal of dirt attached to the surface of the optical component 1.
- a water-repellent coat is a perfluoroalkyl silane such as SubstanceWRlPatinal (trade name, Merck It is possible to form S as a material.
- the (n-2) layer M and the nth layer M of the antireflection film 3 are made of a low refractive index material, and the (n-1) layer M has a high conductivity.
- a conductive material layer is formed from a refractive index material.
- the low refractive index material a material containing any one of silicon oxide or a mixed material of silicon oxide and aluminum oxide can be used.
- a mixed material for example, SubstanceL5 (trade name, manufactured by Merck Japan Ltd.) is suitable.
- the material mixed with silicon oxide is not limited to aluminum oxide.
- the high refractive index material having conductivity a material containing an indium oxide-based zinc oxide-based mixed material, specifically, a mixed material of indium oxide and tin (ITO), zinc oxide, A material containing a mixed material of gallium and gallium can be used. It is preferable that the mixing ratio of tin in the mixed material of indium oxide and tin is 3 to 10 wt%.
- the material mixed with indium oxide and zinc oxide is not limited to tin and gallium.
- the materials and thicknesses of the first layer M to the (n-3) layer M in the antireflection film 3 are as follows.
- the antireflection film 3 has an antireflection function as a whole, it can be arbitrarily designed.
- the optical component 1 described above can be manufactured by a conventionally known manufacturing method.
- the antireflection film 3 of the optical component 1 and the water-repellent coating can be formed by a vacuum deposition method, a snowflake method, a CVD method, or the like.
- the antireflection film 3 has the (n-1) layer M, that is, the surface of the conductive material layer on the inside, and the conductive material layer and the surface of the optical component 1 Unlike the case where the surface of the conductive material layer is located on the surface of the optical component 1, the surface force of the optical component 1 is prevented from being wiped off even when the surface of the optical component 1 is wiped. can do.
- the antireflection film 3 has the nth layer M, that is, a low refractive index layer on the surface side of the optical component 1 relative to the conductive material layer, the antireflective function of the optical component 1 is provided by the low refractive index layer. Improve the power with S.
- the optical component 1 has been described as a single ball optical element, but may be a multiple ball optical element.
- antireflection films and water repellents having the layer structures shown in Tables 1 to 7 below are used. A coating provided on the optical surface of the substrate 2 was formed.
- Examples (1) to (; 11) and Comparative Examples (1) to (6) correspond to two-wavelength light beams used for DVD and CD recording / reproduction.
- Examples (12) to (; 14) and Comparative Example (7) correspond to a single wavelength light beam used for recording / reproducing BD (Blu-ray Disc).
- Examples (15) to (; 16) and Comparative Examples (8) to (9) correspond to three-wavelength light beams used for recording / reproducing BD, DVD and CD.
- the “L5” material indicates the above-mentioned “Substance L5”! /.
- Example (1) Example (2)
- Example (3) Example (4) Substrate Abel Resin Apel Resin Abel Resin Abel Resin
- Example (11) Example (12) Example (13) Base material ZEONEX resin Abel resin Apel resin
- Example (15) Base Material ZEONEX Resin Abel Resin ZEONEX Resin
- the shortest wavelength indicating the minimum reflectance in the spectral reflectance characteristic of LOOOnm the wavelength is 350-; the wavelength is ⁇ (nm), and the reflectance corresponding to this wavelength ⁇ is Rminl (%). Short, When the wavelength is ⁇ (nm) and the reflectance corresponding to this wavelength ⁇ is Rmin2 (%), each light
- the minimum reflectances Rminl and Rmin2 for the school parts are as shown in the bottom column of Table 1 to Table 7 above.
- the spectral reflectance characteristics of each optical component are, for example, “Graph 1” in FIG. 2 in Example (3), “Graph 2” in FIG. 2 in Comparative Example (1), and FIG. 3 in Example (12).
- the wavelength ⁇ 1 of the minimum reflectance is 750 ⁇ 20 nm, and the reflectance Rminl of the wavelength ⁇ 1 is less than 0.7%.
- Wavelength ⁇ is 750 ⁇ 20 nm
- reflectivity Rminl is 0.7% or more and less than 1%. No practical problems in recording and playback.
- the wavelength ⁇ 1 of the minimum reflectance is 405 ⁇ 20 nm, and the reflectance Rminl of the wavelength ⁇ 1 is less than 0.7%. There is no practical problem in recording and playback.
- the wavelength ⁇ 1 of the minimum reflectance is 405 ⁇ 20 nm, and the reflectance Rminl of the wavelength ⁇ 1 is less than 0.7%. Furthermore, the wavelength 2 of the minimum reflectance is 700 ⁇ 50 nm, and the reflectance Rmin2 of the wavelength 2 is less than 0.7%. There is no practical problem in recording and playback.
- Measurement sample (1) Disc-shaped plastic test piece with a diameter of 30 mm and a thickness of 3 mm
- Measurement sample (2) Optical component of the target shape
- the antireflection film and the water repellent coating of these measurement samples (1) and (2) were formed under the same conditions by an antireflection film forming apparatus using a vacuum deposition method, a sputtering method, a CVD method, or the like.
- the measurement sample (1) was prepared only for Example (1), and the measurement sample (2) was prepared for each of Examples (1) to (; 16) and Comparative Examples (1) to (9). I made it! (Measurement and calculation method)
- Step 1 Calculation of surface resistance value conversion coefficient Rso / R
- the surface resistance value R so (unit: M ⁇ / port) of the optical surface having the antireflection film was measured with the ultra-insulation meter.
- electrodes 5a and 5b are formed on the optical surface coated with the antireflection film with a conductive paint such as a silver paste agent, and the electrodes
- the resistance value R (unit: M ⁇ ) between 5a and 5b was measured with the ultra-insulation meter 6.
- step 1 was performed only for the example (1).
- the luminous flux transmittance at a wavelength of 650 nm was measured in Examples (1) to (; 11) and Comparative Examples (1) to (6).
- Comparative Examples (7) to (9) the luminous transmittance at a wavelength of 405 nm was measured using the measurement sample (2).
- the same conditions were applied. The transmittance was measured.
- ⁇ The transmittance decrease after standing is less than 1%.
- ⁇ Decrease in transmittance after standing is from 1% to less than 2%.
- the transmittance decrease after standing is 2% or more.
- the surface of the measurement sample (2) was wiped with a cotton swab soaked with isopropyl alcohol, and the number of times of wiping until the antireflection film or water repellent coat on the surface was peeled was measured.
- the wiping load was between 5 and 10 g.
- the measurement was performed on a portion having no uneven shape such as a diffractive structure.
- ⁇ Less than 10 times, the outermost antireflection film and water repellent coating are not peeled off, and less than 50 times.
- X The outermost antireflection film and water-repellent coating peel off in less than 10 times.
- the thickness of the conductive material layer ((n-1) layer) is 3 nm or more and 25 nm or less, and the distance between the surface of the conductive material layer and the outermost surface of the optical component is 4 nm or more and 20 nm.
- the overall evaluation was ⁇ level or higher, and it was found that there was no practical problem.
- the film strength may become a ⁇ level as shown in Examples (7), (11) and Comparative Example (6). I understood. This is presumably because the conductive material layer has lower film strength, such as hardness, denseness, and abrasion resistance, compared to the metal oxide or silicon oxide layer.
- the conductive material layer has lower film strength, such as hardness, denseness, and abrasion resistance, compared to the metal oxide or silicon oxide layer.
- the base material temperature cannot be maintained higher than when the conductive material layer is formed on the glass base material and the film strength of the conductive material layer is low. Therefore, if the thickness of the conductive material layer is increased, the film strength of the entire antireflection film is unlikely to be good even if a layer such as silicon oxide is provided on the surface side.
- the thickness of the conductive material layer is less than 3 nm, the surface resistance value increases, and the resistance value fluctuates greatly depending on the deposition conditions, resulting in a decrease in antistatic performance and antifouling performance. (See Comparative Example (5)).
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Optical Head (AREA)
Abstract
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008528790A JPWO2008018340A1 (ja) | 2006-08-11 | 2007-08-01 | 光学部品 |
| CN2007800294056A CN101501768B (zh) | 2006-08-11 | 2007-08-01 | 光学部件 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006-219826 | 2006-08-11 | ||
| JP2006219826 | 2006-08-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2008018340A1 true WO2008018340A1 (fr) | 2008-02-14 |
Family
ID=39032873
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2007/065064 Ceased WO2008018340A1 (fr) | 2006-08-11 | 2007-08-01 | Composant optique |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2008018340A1 (fr) |
| CN (1) | CN101501768B (fr) |
| WO (1) | WO2008018340A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010085886A (ja) * | 2008-10-02 | 2010-04-15 | Konica Minolta Opto Inc | 光学素子及びその製造方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104090313B (zh) * | 2014-07-25 | 2015-11-18 | 丹阳丹耀光学有限公司 | 一种超硬防水膜及其加工工艺 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6113202A (ja) * | 1984-06-29 | 1986-01-21 | Nec Corp | レ−ザミラ− |
| JPH0634802A (ja) * | 1992-07-20 | 1994-02-10 | Fuji Photo Optical Co Ltd | 導電性反射防止膜 |
| JP2005181519A (ja) * | 2003-12-17 | 2005-07-07 | Fuji Photo Film Co Ltd | 反射防止フィルム、偏光板、及び画像表示装置 |
| JP2005302088A (ja) * | 2004-04-07 | 2005-10-27 | Konica Minolta Opto Inc | 対物レンズ及び光ピックアップ装置 |
| JP2006184493A (ja) * | 2004-12-27 | 2006-07-13 | Fuji Photo Film Co Ltd | 光学機能フィルム及びその製造方法、並びにそれを用いた偏光板及び画像表示装置 |
| JP2006184849A (ja) * | 2004-11-30 | 2006-07-13 | Toppan Printing Co Ltd | 反射防止積層体、光学機能性フィルタ、光学表示装置および光学物品 |
| JP2006221142A (ja) * | 2005-01-14 | 2006-08-24 | Sony Corp | 光学素子、レンズ鏡筒、撮像装置及び電子機器 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5667880A (en) * | 1992-07-20 | 1997-09-16 | Fuji Photo Optical Co., Ltd. | Electroconductive antireflection film |
| JPH09152502A (ja) * | 1995-11-28 | 1997-06-10 | Toppan Printing Co Ltd | 導電性反射防止膜 |
-
2007
- 2007-08-01 JP JP2008528790A patent/JPWO2008018340A1/ja active Pending
- 2007-08-01 WO PCT/JP2007/065064 patent/WO2008018340A1/fr not_active Ceased
- 2007-08-01 CN CN2007800294056A patent/CN101501768B/zh not_active Expired - Fee Related
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6113202A (ja) * | 1984-06-29 | 1986-01-21 | Nec Corp | レ−ザミラ− |
| JPH0634802A (ja) * | 1992-07-20 | 1994-02-10 | Fuji Photo Optical Co Ltd | 導電性反射防止膜 |
| JP2005181519A (ja) * | 2003-12-17 | 2005-07-07 | Fuji Photo Film Co Ltd | 反射防止フィルム、偏光板、及び画像表示装置 |
| JP2005302088A (ja) * | 2004-04-07 | 2005-10-27 | Konica Minolta Opto Inc | 対物レンズ及び光ピックアップ装置 |
| JP2006184849A (ja) * | 2004-11-30 | 2006-07-13 | Toppan Printing Co Ltd | 反射防止積層体、光学機能性フィルタ、光学表示装置および光学物品 |
| JP2006184493A (ja) * | 2004-12-27 | 2006-07-13 | Fuji Photo Film Co Ltd | 光学機能フィルム及びその製造方法、並びにそれを用いた偏光板及び画像表示装置 |
| JP2006221142A (ja) * | 2005-01-14 | 2006-08-24 | Sony Corp | 光学素子、レンズ鏡筒、撮像装置及び電子機器 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010085886A (ja) * | 2008-10-02 | 2010-04-15 | Konica Minolta Opto Inc | 光学素子及びその製造方法 |
| US9188768B2 (en) | 2008-10-02 | 2015-11-17 | Konica Minolta, Inc. | Optical element and production method of the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2008018340A1 (ja) | 2009-12-24 |
| CN101501768B (zh) | 2011-10-26 |
| CN101501768A (zh) | 2009-08-05 |
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