WO2008018340A1 - Optical component - Google Patents

Abstract

An optical component (1) is provided with a base material (2) and a reflection preventing film (3) formed on an n number of layers arranged on the surface of the base material (2) so as to prevent adhesion of contamination and scratches. The reflection preventing film (3) has an (n-1)th layer(Mn-1) made of a conductive material, and a distance between the surface of the (n-1)th layer(Mn-1)and the surface of the optical component (1) is 4-20nm.

Description

 Specification

 Optical components

 Technical field

 [0001] The present invention relates to an optical component having antifouling properties.

 Background art

 [0002] Conventionally, from the viewpoint of maintaining optical performance, a water repellent coating that imparts water repellency to the surface of the optical component to facilitate removal of dirt, and an optical component. Antifouling coats are provided to prevent electrostatic charge and prevent dust from adhering to the surface. In addition, such an antifouling coat is designed to function as an antireflection film, and has a conductive material layer made of a conductive material in the first layer, the third layer, etc. from the surface side (for example, And Patent Documents 1 and 2).

 Patent Document 1: Japanese Patent Application Laid-Open No. 59-90801

 Patent Document 2: Japanese Patent Publication No. 53-28214

 Disclosure of the invention

 Problems to be solved by the invention

 [0003] However, with the above water-repellent coat, the attached dirt can be easily removed, but the adhesion itself cannot be prevented.

 [0004] On the other hand, among the above antifouling coats, those having a conductive material layer as the first layer from the surface side can prevent the adhesion of dirt, but when wiping the surface of optical components, etc. The surface of the layer, that is, the surface of the optical component is likely to be damaged. In particular, when the optical component body is made of a polymer resin, the conductive material layer is deposited at a low substrate temperature of 120 ° C or lower, so the strength of the antifouling coating is reduced and wiping occurs. It becomes easy.

 [0005] Of the above antifouling coats, those having a conductive material layer as the third layer from the surface side have two non-conductive layers formed on the surface side of the conductive material layer. In some cases, the conductivity on the surface of the optical component becomes low, and sufficient antistatic performance to prevent the adhesion of dirt cannot be obtained.

[0006] An object of the present invention is to prevent the adhesion of dirt and the occurrence of wiping. It is to provide an optical component that can be used.

 Means for solving the problem

 The invention described in claim 1 is an optical component comprising a base material and an antireflection film provided on the surface of the base material, wherein the antireflection film is a material having conductivity. And a distance between the surface of the conductive material layer and the surface of the optical component is 4 to 20 nm.

 [0008] According to the invention of claim 1, since the antireflection film has a conductive material layer, and the distance between the surface of the conductive material layer and the surface of the optical component is 4 to 20 nm, Unlike the case where the surface of the conductive material layer is located on the surface of the optical component, it is possible to prevent the surface from being wiped even when the surface of the optical component is wiped. In addition, the conductivity on the surface of the optical component is reliably maintained to prevent electrification, so that the adhesion of dirt can be prevented.

Yes

 [0009] The optical component may be any product (component) that is normally used as an optical element such as a lens, a prism, or a filter.

[0010] The invention according to claim 2 is the optical component according to claim 1, wherein the surface resistance value of the optical component is less than 10 ⁵ Ω / mouth. .

[0011] According to the invention described in claim 2, since the surface resistance value of the optical component is less than 10 ⁵ Ω / port, the surface of the optical component can be more reliably prevented from being charged and dirt can be adhered. Use force S to prevent

 It should be noted that “mouth” in the unit of the surface resistance value means square.

[0013] The invention of claim 3 is an optical component comprising a base material and an antireflection film provided on the surface of the base material, wherein the antireflection film is a material having conductivity. The conductive material layer is formed on the inner side of the surface of the optical component, and the surface resistance value of the optical component is less than 10 ⁵ Ω / mouth.

[0014] According to the invention of claim 3, since the antireflection film has the conductive material layer on the inner side of the surface of the optical component, the surface of the conductive material layer is located on the surface of the optical component. In contrast, when the surface of an optical component is wiped, it is possible to prevent wiping from occurring on the surface. In addition, since the surface resistance of optical components is less than 10 ⁵ Ω / mouth, As a result, the electrical conductivity on the surface of the optical component is reliably maintained to prevent electrification.

 [0015] The invention described in claim 4 is the optical component according to any one of claims 1 to 3, wherein the thickness of the conductive material layer is 325 nm. Characterized by

According to the invention described in claim 4, since the thickness of the conductive material layer is 325 nm, it is possible to more reliably prevent charging on the surface of the optical component and prevent adhesion of dirt. Can

[0017] The invention according to claim 5 is the optical component according to claim 4, characterized in that the thickness of the conductive material layer is 318 nm.

[0018] According to the invention described in claim 5, since the thickness of the conductive material layer is 318 nm, it is possible to more reliably prevent charging on the surface of the optical component and prevent adhesion of dirt. Can

[0019] The invention according to claim 6 is the optical component according to any one of claims 1 to 5, wherein the conductive material is used for light having a wavelength of 600 nm. It is a high refractive index material having a refractive index of 1.55 or more.

[0020] According to the invention described in claim 6, it is possible to obtain the same effect as the invention described in any one of claims 1 to 5.

[0021] It is more preferable that the refractive index is 1.8 or more with respect to light having a wavelength of 600 nm.

[0022] The invention according to claim 7 is the optical component according to claim 6, wherein the high refractive index material contains an indium oxide-based or zinc oxide-based mixed material. It is characterized by.

 [0023] According to the invention described in claim 7, the force S is obtained to obtain the same effect as that of the invention described in claim 6.

[0024] Note that the indium oxide-based mixed material is a mixed material containing at least indium oxide, for example, a material mainly composed of a mixed material of indium oxide and tin. The zinc oxide-based mixed material is a mixed material containing at least zinc oxide, for example, a material mainly composed of a mixed material of zinc oxide and gallium. [0025] In addition, "containing" may be included as one component or may be included as all components. That is, other components may or may not be included.

[0026] The invention according to claim 8 is the optical component according to any one of claims 1 to 7, wherein the antireflection film is more optical than the conductive material layer. A low-refractive index layer made of a low-refractive index material having a refractive index of less than 1.55 with respect to light having a wavelength of 600 nm is provided on the surface side of the component.

[0027] According to the invention of claim 8, since the antireflection film has the low refractive index layer on the surface side of the optical component with respect to the conductive material layer, the reflection of the optical component is performed by the low refractive index layer. The prevention function can be improved.

[0028] The invention according to claim 9 is the optical component according to claim 8, characterized in that the thickness of the low refractive index layer is 4 to 20 nm.

[0029] According to the invention described in claim 9, the force S is obtained to obtain the same effect as that of the invention described in claim 8.

 [0030] The invention according to claim 10 is the optical component according to claim 8 or 9, wherein the low refractive index layer is located on the surface of the optical component. Do

Yes

 [0031] According to the invention of claim 10, the same effect as that of the invention of claim 8 or 9 can be obtained.

[0032] The invention according to claim 11 is the optical component according to claim 8 or 9, wherein the optical component has a water repellent coating on the surface side of the optical component with respect to the low refractive index layer. It is characterized by this.

 [0033] According to the invention of claim 11, since the water-repellent coat is provided on the surface side of the optical component relative to the low refractive index layer, it is easy to remove dirt adhered to the surface of the optical component. That's the power S.

 [0034] The invention according to claim 12 is the optical component according to any one of claims 8 to 11, wherein the low refractive index material is silicon oxide or silicon oxide and Any one of the mixed materials of aluminum oxide is contained.

[0035] According to the invention of claim 12, any one of claims 8 to 11 is provided. The same effect as the invention described in the item can be obtained.

[0036] The invention according to claim 13 is the optical component according to any one of claims 1 to 12, wherein the base material is formed of a polymer resin. It is characterized by.

 [0037] According to the invention described in claim 13, the same effect as that of any one of claims 1 to 12 can be obtained.

 The invention's effect

 [0038] According to the invention described in claim 1, the force S can be prevented to prevent wiping from occurring on the surface of the optical component. Further, it is possible to prevent the adhesion of dirt.

 [0039] According to the invention described in claim 2, the ability to obtain the same effect as that of the invention described in claim 1 can be obtained. can do

[0040] According to the invention of claim 3, it is possible to prevent the occurrence of wiping on the surface of the optical component. Further, it is possible to prevent the adhesion of dirt.

[0041] According to the invention described in claim 4, it is possible to obtain the same effect as the invention described in any one of claims 1 to 3. It is possible to prevent the adhesion of dirt more reliably.

[0042] According to the invention described in claim 5, it is possible to obtain the same effect as that of the invention described in claim 4. can do

[0043] According to the invention described in claim 6, it is possible to obtain the same effect as the invention described in any one of claims 1 to 5.

[0044] According to the invention described in claim 7, the force S is obtained to obtain the same effect as that of the invention described in claim 6.

 [0045] According to the invention as set forth in claim 8, it is possible to obtain the same effects as those of the invention as set forth in any one of claims 1 to 7. The antireflection function of the optical component can be improved.

[0046] According to the invention of claim 9, the same effect as that of the invention of claim 8 is achieved. Ability to get fruit with S

 [0047] According to the invention described in claim 10, the same effect as that of the invention described in claim 8 or 9 can be obtained.

[0048] According to the invention as set forth in claim 11, it is possible to obtain the same effect as that of the invention as set forth in claim 8 or 9, and of course, adhere to the surface of the optical component. It is possible to facilitate the removal of soiling.

[0049] According to the invention described in claim 12, it is possible to obtain the same effect as that of the invention described in any one of claims 8-11.

[0050] According to the invention as set forth in claim 13, the same effects as those of the invention as set forth in any one of claims 1 to 12 can be obtained.

 Brief Description of Drawings

 FIG. 1 is a diagram showing an example of an optical component 1 according to the present invention, in which FIG. (A) is a schematic configuration diagram, and FIG. (B) is a partially enlarged view of a circle X in FIG. .

 FIG. 2 is a graph showing the reflectance characteristics of optical components of Example (3) and Comparative Example (1).

 FIG. 3 is a graph showing the reflectance characteristics of optical components of Example (12) and Comparative Example (7).

 FIG. 4 is a graph showing the reflectance characteristics of optical components of Example (15) and Comparative Example (8).

 FIG. 5 is a graph showing the reflectance characteristics of the optical parts of Example (16) and Comparative Example (9).

 FIG. 6 is a diagram for explaining a method for measuring a surface resistance value.

 Explanation of symbols

[0052] 1 Optical components

 2 Base material

 3 Antireflection film

 M layer (n-1) layer (conductive material layer)

 M nth layer (low refractive index layer)

 BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, the best mode for carrying out the present invention will be described with reference to the drawings.

. However, the scope of the invention is not limited to the illustrated examples.

FIG. 1 is a diagram showing an example of an optical component 1 according to the present invention, and FIG. 1 (a) is a schematic configuration diagram. Fig. 1 (b) is a partially enlarged view of circle X in Fig. 1 (a).

As shown in this figure, the optical component 1 is used, for example, as an objective lens of an optical pick-up device in an in-vehicle DVD device, and includes a base material 2.

[0056] The substrate 2 has a curved optical surface in the present embodiment. However, the optical surface of the optical component 1 may be a flat surface or may have a fine structure such as a diffraction structure.

 [0057] The substrate 2 is made of a polymer resin. Here, the polymer resin is not particularly limited as long as it is a transparent resin material generally used as an optical material. However, in consideration of processability as an optical component, acrylic resin, polyolefin resin, and polycarbonate resin are used. Preferably there is. Further, as the polyolefin resin, ZEONEX (manufactured by Nippon Zeon Co., Ltd.) that is a cyclic polyolefin resin, and apell (manufactured by Mitsui Chemicals, Inc.) are suitable. As such resin products, there is ZEONEX330R (product name) as ZEONEX, and APL5014DP (product name) as lapels. However, the polymer resin is not limited to these.

 An antireflection film 3 is provided on the surface of the substrate 2. The antireflection film 3 may be provided on the light source side of the optical pickup device with respect to the substrate 2 or may be provided on the information recording medium side such as a DVD! /. It can be provided on both sides!

 This antireflection film 3 is a film having an antireflection function, and is composed of n layers (n is a natural number of, for example, 4 to 7) M,.

[0060] Hereinafter, when these layers M, ... are defined as the first layer M to the n-th layer M from the inside to the outside, the thickness of the outermost n-th layer M is 4 to 20 nm, more than the n-th layer M. The inner (n-1) layer M- has a thickness of 3 to 25 nm, preferably 3 to 18 nm. The surface of the (n-1) layer M- is located at a depth of 4 to 20 nm from the surface of the optical component 1. However, the nth layer M may be located on the outermost surface of the optical component 1 or may be located on the inner side of the water repellent coat (not shown). When a water repellent coating is provided on the outside of the antireflection film 3, it is possible to facilitate removal of dirt attached to the surface of the optical component 1. Such a water-repellent coat is a perfluoroalkyl silane such as SubstanceWRlPatinal (trade name, Merck It is possible to form S as a material.

[0061] Further, the (n-2) layer M and the nth layer M of the antireflection film 3 are made of a low refractive index material, and the (n-1) layer M has a high conductivity. A conductive material layer is formed from a refractive index material. As a result, the surface resistance value of the optical component 1 is less than 10 ⁵ Ω / mouth.

 [0062] Here, as the low refractive index material, a material containing any one of silicon oxide or a mixed material of silicon oxide and aluminum oxide can be used. In addition, as such a mixed material, for example, SubstanceL5 (trade name, manufactured by Merck Japan Ltd.) is suitable. The material mixed with silicon oxide is not limited to aluminum oxide.

 [0063] In addition, as the high refractive index material having conductivity, a material containing an indium oxide-based zinc oxide-based mixed material, specifically, a mixed material of indium oxide and tin (ITO), zinc oxide, A material containing a mixed material of gallium and gallium can be used. It is preferable that the mixing ratio of tin in the mixed material of indium oxide and tin is 3 to 10 wt%. The material mixed with indium oxide and zinc oxide is not limited to tin and gallium.

 [0064] The materials and thicknesses of the first layer M to the (n-3) layer M in the antireflection film 3 are as follows.

 13

 As long as the antireflection film 3 has an antireflection function as a whole, it can be arbitrarily designed.

 [0065] The optical component 1 described above can be manufactured by a conventionally known manufacturing method. Specifically, for example, the antireflection film 3 of the optical component 1 and the water-repellent coating can be formed by a vacuum deposition method, a snowflake method, a CVD method, or the like.

 [0066] According to such an optical component 1, the antireflection film 3 has the (n-1) layer M, that is, the surface of the conductive material layer on the inside, and the conductive material layer and the surface of the optical component 1 Unlike the case where the surface of the conductive material layer is located on the surface of the optical component 1, the surface force of the optical component 1 is prevented from being wiped off even when the surface of the optical component 1 is wiped. can do.

[0067] Further, as a result of the electrical conductivity on the surface of the optical component 1 being reliably maintained to prevent electrification, dirt Can be prevented. Further, since the surface resistance value of the optical component 1 is less than 10 ⁵ Ω / mouth, it is possible to more reliably prevent the surface of the optical component 1 from being charged and prevent adhesion of dirt. In addition, since the thickness of the conductive material layer is 3 to 25 nm, preferably 3 to 18 nm, the surface of the optical component 1 can be more reliably prevented from being charged and dirt can be prevented.

[0068] Further, since the antireflection film 3 has the nth layer M, that is, a low refractive index layer on the surface side of the optical component 1 relative to the conductive material layer, the antireflective function of the optical component 1 is provided by the low refractive index layer. Improve the power with S.

 In the above embodiment, the optical component 1 has been described as a single ball optical element, but may be a multiple ball optical element.

 Example 1

 [0070] Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples. <Configuration of optical components>

 As examples (1) to (16) and comparative examples (1) to (9) of the optical component 1 in the above embodiment, antireflection films and water repellents having the layer structures shown in Tables 1 to 7 below are used. A coating provided on the optical surface of the substrate 2 was formed.

More specifically, Examples (1) to (; 11) and Comparative Examples (1) to (6) correspond to two-wavelength light beams used for DVD and CD recording / reproduction. In addition, Examples (12) to (; 14) and Comparative Example (7) correspond to a single wavelength light beam used for recording / reproducing BD (Blu-ray Disc). In addition, Examples (15) to (; 16) and Comparative Examples (8) to (9) correspond to three-wavelength light beams used for recording / reproducing BD, DVD and CD.

[0072] In Examples (1) to (; 16) and Comparative Examples (1) to (9), films other than those shown in the table are not provided on the surface side of the optical component. And

In the table, “d” in the middle of each column indicates the thickness of the layer, and “n” indicates the refractive index.

 The “L5” material indicates the above-mentioned “Substance L5”! /.

[0074] [Table 1] Example (1) Example (2) Example (3) Example (4) Substrate Abel Resin Apel Resin Abel Resin Abel Resin

 APL5014DP APL5014DP APL5014DP APL5014DP

1st layer Cerium oxide Cerium oxide Cerium oxide Cerium oxide dl = 71nm dl = 71nm dl = 71nm dl == 71nm nl = 1.82 nl = 1.82 nl = 1.82 nl = 1.82

Second layer Silicon oxide Silicon oxide L5 material Silicon oxide d2 = 118nm d2 = 118ni d2 = 118ni d2 = 118ni n2 = 1.44 n2 = 1.44 n2 = 1.48 n2 = 1.44

3rd layer I T 0 I T 0 I To I T 0

 d3 = 8.1nm d3 = 8.1ni d3 = 8.1nm d3 = 8.1nra η3 = 1.89 η3 = 1.89 n3 = 1.89 η3 = 1.89

4th layer Silicon oxide Silicon oxide L5 material Silicon oxide d4 = 4nm d4 = 8nm d4 = 10nm d4 = 19nm n4 = 1.44 n4 = 1.44 n4 = 1.48 n4 = 1.44 Spectral reflectance characteristics

 λ i (nm) (Rminl (%)) 750 (0.2 or less) 740 (0.2 or less) 755 (0.2 or less) 760 (0.2 or less)

[0075] [Table 2]

[0076] [Table 3] Example ( ⁵ ) Example (6) Example (7) Comparative Example (5) Base Material Abel Resin Abel Resin Abel Resin Abel Resin

 APL5014DP APL5014DP APL5014DP APL5014DP

1st layer Cerium oxide Cerium oxide Cerium oxide Cerium oxide dl = 71nm dl = 71nm dl = 83nm dl = 71nm nl = 1.82 nl = 1.82 nl = 1.82 nl = 1.82

Second layer Silicon oxide Silicon oxide L5 material L5 material d2 = 122nm d2 = 106nm d2 = 80nm d2 = 125n n2 = 1.44 n2 = 1.44 n2 = 1.48 n2 = 1.48

3rd layer I T 0 I T 0 I T 0 I T 0

 d3 = 3nm d3 = 24nm d3 = 2nm η3 = 1.89 η3 = 1.89 n3 = 1.89 n3 = 1.89

4th layer Silicon oxide oxysilicon L5 material L5 material d4 = L0nm d4 = 10nm d4 = 10nm d4 = 10nm n4 = 1.44 n4 = 1.44 n4 = 1.48 n4 = 1.48 Spectral reflectance characteristics II

 yi i (nra) (Riinl (%)) 750 (0.2 or less) 755 (0.2 or less) 750 (0.61 or less) 750 (0.2 or less)

[0077] [Table 4]

[0078] [Table 5] Example (11) Example (12) Example (13) Base material ZEONEX resin Abel resin Apel resin

 ZE0NEX33OR APL5014DP APL5014DP

1st layer Tantalum oxide Silicon oxide L 5 material

 dl = 71nm dl = 26.4nm dl = 27.4nm nl = 2.0 nl = 1.44 nl = 1.48

2 layers 0 Silicon oxide Zirconium oxide Zirconium oxide d2 = 91.5nm d2 = 29.5ni d2 = 33.9nm n2 = 1.44 n2 = 1.86

3rd layer Zinc oxide-based material Silicon oxide L 5 material

 d3 = 20nm d3 = 67na d3 = 59.9nm n3 = 1.95 n3 = 1.44 n3 = 1.48

4th layer Silicon oxide I ο I Τ 0

 d4 = 10nm d4 = 5nra d4 = 8nm n4 = l.44 η4 = 1.89 η4 = 1.89

5th layer Silicon oxide Silicon oxide d5 = 10ni d5 = 10.6nm n5 II = 1.44 n5 = 1.44 Spectral reflectance characteristics

λ i (nm) (Rininl ( %)) 750 (0.2 or less) 410 (0.2) 4_Rei ^{5 (0.2} or less)

Example (I ⁴ ) Comparative Example (?) Example (15) Base Material ZEONEX Resin Abel Resin ZEONEX Resin

 ZE0NEX33OR APL5014DP ZE0NEX330R

1st layer Silicon oxide Silicon oxide Silicon oxide dl = 27.4nm dl = 18.4nra dl = 130nm nl = 1.44 nl = 1.44 nl = 1.44

2nd layer Zirconium oxide Oxidyl zirconium Oxidized zirconium d2 = 48.3nm d2 = 30.8nm d2 = 39.6nm n2 = 1.86 n2 = 1.86 n2 = 1.86

3rd layer Silicon oxide Silicon oxide Silicon oxide d3 = 41nm d3 = 82.5nm d3 = 44.5nra n3 = 1.44 n3 = 1.44 n3 = 1.44

4th layer ΐ Τ ィ Hydylconium d4 = 13ni d4 = 28.3nra η4 = 1.89 n4 = 1.86

5th layer Silicon oxide Silicon oxide d5 = 10.6nm d5 = 83.7nm n5 = 1.44 n5 = 1.44

6th layer I T 0

 d6 = 8nm η6 = 1.89

7th layer Silicon oxide d7 = 10.5nm n7 = 1.44 Spectral reflectance characteristics

/ ii (nm) (Rminl (%)) ⁴ 〇 ⁴ (0.2 or less) 410 (0.2 or less) 405 (0.2 or less)

/ i 2 (nm) (Rmin2 (%)) 720 (0.5 or less)]

Comparative Example (8) Example (16) Comparative Example (9) Base Material ZEONEX Resin Abel Resin Abel Resin

 ZE0NEX330R APL5014DP APL5014DP

 1st layer Silicon oxide Silicon oxide Silicon oxide

 dl = 115.8nm dl = 120nm dl = 94.9nm

 111 = 1.44 nl = 1.44 nl = 1.44

 2nd layer Zirconium oxide Oxidyl zirconium Zirconium oxide

 d2 = 28.9nm d2 = 9.1nm d2 = 12.6nm n2 = 1.86 n2 = 1.86 n2 = 1.86

 3rd layer Silicon oxide L 5 material L 5 material

 d3 = 47.3nm d3 = 28.8nm d3 = 33.8nm n3 = 1.44 n3 = 1.45 n3 = 1.45

 4th layer Acid Zirconium Zirconium Oxide Zirconium Oxide

 d4 = 26nm d4 = 55.9nni d4 = 60.9nm n4 = 1.86 n4 = 1.86 n4 = 1.86

 5th layer Silicon oxide Silicon oxide Silicon oxide

 d5 = 10.6ni d5 = 12.3nm d5 = 22.4nm n5 = 1.44 n5 = 1.44 n5 = 1.44

 6th layer Zirconium oxide Zirconium oxide

 d6 = 60.5nm d6 = 38.4nm n6 = 1.86 n6 = 1.86

 7th layer L 5 material L 5 material

 d7 = 59.45nm d7 = 97.1nm n7 = 1.45 n7 = 1.45

 8th layer I T 0

 d8 = 8nm

 n8 = 1.89

 9th layer

 d9 = llnm

 n9 = 1.44

 Spectral reflectance characteristics

 λ i (nm) (Rminl (%)) 405 (0.1 or less) 420 (0.6 or less) 420 (0.65 or less)

 / i 2 (nm) (Rmin2 (%)) 730 (0.5 or less) 720 (0.4 or less) 730 (0.2 or less)

[0081] <Evaluation of antireflection performance>

 Spectral reflectance characteristics of the optical components of Examples (1) to (16) and Comparative Examples (1) to (9) formed as described above were measured using a lens reflectance measuring instrument “USPM-RU” (trade name, Olympus). When the antireflection performance was evaluated according to the following criteria, the results shown in Table 8 below were obtained.

[0082] It should be noted that the shortest wavelength indicating the minimum reflectance in the spectral reflectance characteristic of LOOOnm, the wavelength is 350-; the wavelength is λ (nm), and the reflectance corresponding to this wavelength λ is Rminl (%). Short, When the wavelength is λ (nm) and the reflectance corresponding to this wavelength λ is Rmin2 (%), each light

twenty two

The minimum reflectances Rminl and Rmin2 for the school parts are as shown in the bottom column of Table 1 to Table 7 above. The spectral reflectance characteristics of each optical component are, for example, “Graph 1” in FIG. 2 in Example (3), “Graph 2” in FIG. 2 in Comparative Example (1), and FIG. 3 in Example (12). "Graph 3" in Figure 3, "Graph 4" in Figure 3 for Comparative Example (7), "Graph 5" in Figure 4 for Example (15), "Graph 6" in Figure 4 for Comparative Example (8), Example (16) is shown in “Graph 7” in FIG. 5, and Comparative Example (9) is shown in “Graph 8” in FIG.

 (Evaluation level of antireflection performance)

 • In the case of Examples (1) to (; 11) and Comparative Examples (1) to (6)

 ○: The wavelength λ 1 of the minimum reflectance is 750 ± 20 nm, and the reflectance Rminl of the wavelength λ 1 is less than 0.7%. When used as an objective lens for an optical pickup device, there is no practical problem in recording and reproducing information.

 Δ: Wavelength λΐ is 750 ± 20 nm, reflectivity Rminl is 0.7% or more and less than 1%. No practical problems in recording and playback.

 X: Both the above ○ and △ criteria are not satisfied. There are practical problems in recording and playback. • Examples (12) to (; 14) and Comparative Example (7)

 ○: The wavelength λ 1 of the minimum reflectance is 405 ± 20 nm, and the reflectance Rminl of the wavelength λ 1 is less than 0.7%. There is no practical problem in recording and playback.

 Δ: Wavelength λ Repulsive force 05 ± 20nm, reflectivity Rminl force SO. 7% or more and less than 1.0%. There are no practical problems in recording and playback.

 X: Both the above ○ and △ criteria are not satisfied. There are practical problems in recording and playback. • In the case of Examples (15) to (; 16) and Comparative Examples (8) to (9)

 ○: The wavelength λ 1 of the minimum reflectance is 405 ± 20 nm, and the reflectance Rminl of the wavelength λ 1 is less than 0.7%. Furthermore, the wavelength 2 of the minimum reflectance is 700 ± 50 nm, and the reflectance Rmin2 of the wavelength 2 is less than 0.7%. There is no practical problem in recording and playback.

Δ: Wavelength λ repulsive force 05 ± 20nm, reflectivity Rminl force SO. 7% or more and less than 1%. Furthermore, the wavelength 2 of the minimum reflectance is 700 ± 50 nm, and the reflectance Rmin2 of the wavelength 2 is 0.7% or more and less than 1%. No practical problems in recording and playback. X: Neither of the above ○ and △ criteria is satisfied. There is a practical problem in recording or playback _c

[0083] [Table 8]

 [0084] <Evaluation of antistatic performance>

 In addition, after preparing the following measurement samples (1) and (2) as optical parts of Examples (1) to (; 16) and Comparative Examples (1) to (9), the surface resistance value was When measured or calculated with an insulation meter (SM-10E type, manufactured by Toa Denpa Kogyo Co., Ltd.) and evaluated the antistatic performance according to the following criteria, the results shown in Table 9 and Table 8 above were obtained.

 (Measurement sample)

 Measurement sample (1): Disc-shaped plastic test piece with a diameter of 30 mm and a thickness of 3 mm Measurement sample (2): Optical component of the target shape

 The antireflection film and the water repellent coating of these measurement samples (1) and (2) were formed under the same conditions by an antireflection film forming apparatus using a vacuum deposition method, a sputtering method, a CVD method, or the like.

[0085] The measurement sample (1) was prepared only for Example (1), and the measurement sample (2) was prepared for each of Examples (1) to (; 16) and Comparative Examples (1) to (9). I made it! (Measurement and calculation method)

 Step 1: Calculation of surface resistance value conversion coefficient Rso / R

 First, for the measurement sample (1), the surface resistance value R so (unit: MΩ / port) of the optical surface having the antireflection film was measured with the ultra-insulation meter.

 On the other hand, for the measurement sample (2), as shown in FIG. 6, first, electrodes 5a and 5b are formed on the optical surface coated with the antireflection film with a conductive paint such as a silver paste agent, and the electrodes The resistance value R (unit: MΩ) between 5a and 5b was measured with the ultra-insulation meter 6.

 [0087] Then, Rso / R was calculated from the measured surface resistance value Rso and the resistance value R, and this value was used as a surface resistance value conversion coefficient.

Note that the above step 1 was performed only for the example (1). As a result, the measurement sample (1) force and the surface resistance value Rso were measured, and the result of Rso = 4 × 10 ⁴ MQ / mouth was obtained. Further, the resistance value R was measured from the measurement sample (2), and the result of R = 2 × 10 ³ MQ was obtained. A result of a surface resistance value conversion coefficient Rso / R = 20 was obtained.

 Step 2: Surface resistance straight Rs measurement

 For the measurement samples (2) of Examples (1) to (; 16) and Comparative Examples (1) to (9), electrodes 5a and 5b with the same shape and arrangement as those used in Step 1 above were applied to the sample surface. After the formation (see FIG. 6), the resistance value R (unit: Ω Ω) between the electrodes 5a and 5b was measured with the ultra-insulation meter 6, and the surface resistance value Rs was determined by the following formula. That is, with respect to Examples (2) to (; 16) and Comparative Examples (1) to (9), only the measurement sample (2) was prepared and the resistance value R was measured to obtain Example (1). The surface resistance value Rs was obtained by multiplying the surface resistance value conversion factor Rso / R (= 20).

Yes

 [0089] Rs = RX (Rso / R)

 Since the surface resistance value Rs and the resistance value R are easily affected by the humidity of the measurement environment! /, The above measurement was performed under low humidity conditions with a relative humidity of 20% and a temperature of 15 to 25 ° C.

 (Evaluation level of antistatic performance)

◯: Surface resistance Rs is less than 10 ⁵ ΜΩ / mouth. Antistatic effect even in a dynamic state.

Eight: surface resistance straight 1¾ 10 ^5-7 ^ [0 / b. Antistatic effect in static state.

X: Surface resistance Rs is 10 ⁷ ΜΩ / mouth or more. Static charge accumulates on the surface and has no antistatic effect The above evaluation criteria were set based on “the latest technology and application development of antistatic materials” (publisher: Gemichi Publishing Co., Ltd.).

 [0091] [Table 9]

However, in Table 9 above, for example, “10E + n” (n is a natural number) means “10 ⁿ ”.

<Evaluation of antifouling performance>

Further, the transmittance variation due to antifouling in Examples (1) to (; 16) and Comparative Examples (1) to (9) as optical components was measured. Evaluate antifouling performance according to standards As a result, the results shown in Table 8 were obtained.

(Measuring method)

 First, with a conventionally known transmittance measuring device, the luminous flux transmittance at a wavelength of 650 nm was measured in Examples (1) to (; 11) and Comparative Examples (1) to (6). ) And Comparative Examples (7) to (9), the luminous transmittance at a wavelength of 405 nm was measured using the measurement sample (2). Next, after placing the measurement sample (2) of each Example and Comparative Example in a glass container filled with cigarette smoke while maintaining the humidity at 20% or less and left for one week, the same conditions were applied. The transmittance was measured.

 (Evaluation level of antifouling performance)

 ◯: The transmittance decrease after standing is less than 1%.

 Δ: Decrease in transmittance after standing is from 1% to less than 2%.

 X: The transmittance decrease after standing is 2% or more.

 <Evaluation of film strength>

 In addition, the film strengths of the measurement samples (1) and (2) as optical components of Examples (1) to (; 16) and Comparative Examples (1) to (9) were measured and evaluated according to the following criteria: However, the results shown in Table 8 above were obtained.

(Measuring method)

 The surface of the measurement sample (2) was wiped with a cotton swab soaked with isopropyl alcohol, and the number of times of wiping until the antireflection film or water repellent coat on the surface was peeled was measured. The wiping load was between 5 and 10 g. In addition, the measurement was performed on a portion having no uneven shape such as a diffractive structure.

 (Evaluation level of film strength)

 ○: Less than 50 times, the outermost antireflection film and water repellent coating are not peeled off.

 Δ: Less than 10 times, the outermost antireflection film and water repellent coating are not peeled off, and less than 50 times. X: The outermost antireflection film and water-repellent coating peel off in less than 10 times.

 <Comprehensive evaluation>

Based on the above results, comprehensive evaluation of optical components of Examples (1) to (; 16) and Comparative Examples (1) to (9) was conducted according to the following evaluation levels. Obtained. (Evaluation level of comprehensive evaluation)

 ○: All four evaluation items are ○. It is extremely excellent in practical use!

 △: Only one of the four items is △, and the others are all ◯. There is no practical problem.

 X: Both the above ○ and △ criteria are not satisfied. There are practical problems.

 [0093] Thereby, the thickness of the conductive material layer ((n-1) layer) is 3 nm or more and 25 nm or less, and the distance between the surface of the conductive material layer and the outermost surface of the optical component is 4 nm or more and 20 nm. In the following cases, the overall evaluation was △ level or higher, and it was found that there was no practical problem.

 However, particularly when the thickness of the conductive material layer is larger than 18 nm, the film strength may become a Δ level as shown in Examples (7), (11) and Comparative Example (6). I understood. This is presumably because the conductive material layer has lower film strength, such as hardness, denseness, and abrasion resistance, compared to the metal oxide or silicon oxide layer. In addition, when the conductive material layer is formed on the resin base material, the base material temperature cannot be maintained higher than when the conductive material layer is formed on the glass base material and the film strength of the conductive material layer is low. Therefore, if the thickness of the conductive material layer is increased, the film strength of the entire antireflection film is unlikely to be good even if a layer such as silicon oxide is provided on the surface side.

 [0095] On the other hand, it was found that when the thickness of the conductive material layer was 3 nm or more and 18 nm or less, the above problems were improved, and the overall evaluation was rated as “◯”.

On the other hand, when the thickness of the conductive material layer is larger than 25 nm, the surface resistance value is small, but it is difficult to maintain good antireflection performance, and the surface of the conductive material layer It was found that even if a layer such as silicon oxide was provided on the side, the film strength was not improved (Comparative Example (6

)reference).

 [0097] When the thickness of the conductive material layer is less than 3 nm, the surface resistance value increases, and the resistance value fluctuates greatly depending on the deposition conditions, resulting in a decrease in antistatic performance and antifouling performance. (See Comparative Example (5)).

[0098] Further, when silicon oxide or the like is laminated on the surface side of the conductive material layer, if the thickness of this layer is less than 4 nm, the film of the antireflection film is caused by the low film strength of the conductive material layer. In contrast to the ability to improve the strength S /! (See Comparative Example (2)), it was found that the film strength could be improved when the thickness was 4 nm or more (Examples (1) to (; See 16)). Examples (7), (11) The reason why the film strength slightly decreases to the Δ level is considered to be because the thickness of the conductive material layer is larger than 18 nm as described above. In addition, it was found that when the layer thickness of silicon oxide or the like is 20 nm or more, the film strength can be improved, but the surface resistance value of the antireflection layer increases, and the antistatic performance and antifouling performance are lowered. (See comparative examples (3) and (4)).

Claims

The scope of the claims  [1] An optical component comprising a base material and an antireflection film provided on the surface of the base material, wherein the antireflection film has a conductive material layer made of a conductive material, An optical component characterized in that the distance between the surface of the material layer and the surface of the optical component is 4 to 20 nm.  [2] In the optical component according to claim 1, An optical part characterized in that the surface resistance value of the optical component is less than 10 ⁵ Ω / mouth Ρ  Ο ο  [3] An optical component comprising a base material and an antireflection film provided on the surface of the base material, wherein the antireflection film comprises a conductive material layer made of a conductive material, Have inside the surface, An optical part characterized in that the surface resistance value of the optical component is less than 10 ⁵ Ω / mouth Ρ  Ο ο  [4] In the optical component according to any one of claims 1 to 3,  The optical component according to claim 1, wherein the conductive material layer has a thickness of 3 to 25 nm. [5] In the optical component according to claim 4,  An optical component having a thickness of the conductive material layer of 3 to 18 nm. [6] In the optical component according to any one of claims 1 to 5,  2. The optical component according to claim 1, wherein the conductive material is a high refractive index material having a refractive index of 1.55 or more with respect to light having a wavelength of 600 nm. [7] In the optical component according to claim 6,  The optical component characterized in that the high refractive index material contains an indium oxide-based or zinc oxide-based mixed material. [8] In the optical component according to any one of claims 1 to 7,  The antireflection film is An optical system comprising a low refractive index layer made of a low refractive index material having a refractive index of less than 1.55 with respect to light having a wavelength of 600 nm, on the surface side of the optical component relative to the conductive material layer. [9] In the optical component according to claim 8,  The optical component according to claim 1, wherein the low refractive index layer has a thickness of 4 to 20 nm. [10] In the optical component according to claim 8 or 9,  The optical component, wherein the low refractive index layer is located on a surface of the optical component. [11] In the optical component according to claim 8 or 9,  An optical component comprising a water-repellent coat on the surface side of the optical component relative to the low refractive index layer.  [12] In the optical component according to any one of claims 8 to 11,  The optical component, wherein the low refractive index material contains one of silicon oxide or a mixed material of silicon oxide and aluminum oxide.  [13] In the optical component according to any one of claims 1 to 12,  The optical component, wherein the base material is made of a polymer resin.