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WO2008096615A1 - 透明ガスバリア性フィルム及びその製造方法 - Google Patents

透明ガスバリア性フィルム及びその製造方法 Download PDF

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Publication number
WO2008096615A1
WO2008096615A1 PCT/JP2008/051060 JP2008051060W WO2008096615A1 WO 2008096615 A1 WO2008096615 A1 WO 2008096615A1 JP 2008051060 W JP2008051060 W JP 2008051060W WO 2008096615 A1 WO2008096615 A1 WO 2008096615A1
Authority
WO
WIPO (PCT)
Prior art keywords
gas barrier
barrier film
transparent gas
producing
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/051060
Other languages
English (en)
French (fr)
Inventor
Kazuhiro Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to EP08703887A priority Critical patent/EP2116368A4/en
Priority to US12/449,186 priority patent/US20100009147A1/en
Priority to JP2008557059A priority patent/JPWO2008096615A1/ja
Publication of WO2008096615A1 publication Critical patent/WO2008096615A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/24992—Density or compression of components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

　本発明は、過酷な環境下で保存されても密着性に優れ、更に激しい衝撃を受けても劣化することなく、かつ良好なガスバリア耐性を備えた透明ガスバリア性フィルムとその製造方法を提供する。この透明ガスバリア性フィルムは、樹脂基材上に、隣接する構成層の密度差が０．０１以上、０．１以下で、かつ厚みが１ｎｍ以上、１０ｎｍ以下である密度の異なる層を、２層以上有することを特徴とする。
PCT/JP2008/051060 2007-02-05 2008-01-25 透明ガスバリア性フィルム及びその製造方法 Ceased WO2008096615A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP08703887A EP2116368A4 (en) 2007-02-05 2008-01-25 TRANSLUCENT GASPERRFILM AND MANUFACTURING METHOD THEREFOR
US12/449,186 US20100009147A1 (en) 2007-02-05 2008-01-25 Transparent gas barrier film
JP2008557059A JPWO2008096615A1 (ja) 2007-02-05 2008-01-25 透明ガスバリア性フィルム及びその製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-025268 2007-02-05
JP2007025268 2007-02-05

Publications (1)

Publication Number Publication Date
WO2008096615A1 true WO2008096615A1 (ja) 2008-08-14

Family

ID=39681526

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/051060 Ceased WO2008096615A1 (ja) 2007-02-05 2008-01-25 透明ガスバリア性フィルム及びその製造方法

Country Status (4)

Country Link
US (1) US20100009147A1 (ja)
EP (1) EP2116368A4 (ja)
JP (1) JPWO2008096615A1 (ja)
WO (1) WO2008096615A1 (ja)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010100971A1 (ja) * 2009-03-04 2010-09-10 コニカミノルタホールディングス株式会社 薄膜を有する基材
JP2011179104A (ja) * 2010-03-04 2011-09-15 Fujifilm Corp ガスバリアフィルム、成膜方法、および成膜装置
JP2011184703A (ja) * 2010-03-04 2011-09-22 Fujifilm Corp ガスバリアフィルム、成膜方法、および成膜装置
WO2012029541A1 (ja) * 2010-08-30 2012-03-08 コニカミノルタホールディングス株式会社 薄膜積層体
JP2012083491A (ja) * 2010-10-08 2012-04-26 Sumitomo Chemical Co Ltd 液晶表示素子
WO2013035682A1 (ja) * 2011-09-09 2013-03-14 富士フイルム株式会社 機能性フィルムおよび機能性フィルムの製造方法
WO2013035683A1 (ja) * 2011-09-09 2013-03-14 富士フイルム株式会社 機能性フィルムおよび機能性フィルムの製造方法
WO2013035689A1 (ja) * 2011-09-07 2013-03-14 東レ株式会社 ガスバリア性フィルム
WO2013099654A1 (ja) * 2011-12-27 2013-07-04 日東電工株式会社 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機ｅｌ素子、太陽電池および薄膜電池
JP2013132897A (ja) * 2011-12-27 2013-07-08 Nitto Denko Corp 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機ｅｌ素子、太陽電池および薄膜電池
JP2013180473A (ja) * 2012-03-01 2013-09-12 Nitto Denko Corp 透明ガスバリアフィルム、有機ｅｌ素子、太陽電池および薄膜電池
JP2014065281A (ja) * 2012-09-27 2014-04-17 Keio Gijuku 積層体とその製造方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8062707B2 (en) * 2005-02-17 2011-11-22 Konica Minolta Holdings, Inc. Gas barrier film, gas barrier film manufacturing method, resin substrate for organic electroluminescent device using the aforesaid gas barrier film, and organic electroluminescent device using the aforementioned gas barrier film
US8486487B2 (en) 2005-02-17 2013-07-16 Konica Minolta Holdings, Inc. Gas barrier film, gas barrier film manufacturing method, resin substrate for organic electroluminescent device using the aforesaid gas barrier film, and organic electroluminescent device using the aforementioned gas barrier film
WO2007142059A1 (ja) * 2006-06-02 2007-12-13 Konica Minolta Holdings, Inc. ガスバリア膜付きプラスチック製光学素子およびその製造方法とこれを適用した光ピックアップ装置
US20100003483A1 (en) * 2007-02-05 2010-01-07 Kazuhiro Fukuda Transparent gas barrier film
JPWO2008096617A1 (ja) * 2007-02-06 2010-05-20 コニカミノルタホールディングス株式会社 透明ガスバリア性フィルム及び透明ガスバリア性フィルムの製造方法
US9136402B2 (en) * 2012-02-28 2015-09-15 International Business Machines Corporation High efficiency flexible solar cells for consumer electronics

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1086267A (ja) * 1996-09-11 1998-04-07 Toppan Printing Co Ltd 被覆フィルム
JP2004082522A (ja) * 2002-08-27 2004-03-18 Toray Ind Inc 高ガスバリア性フィルムおよびその製造方法
JP2005169996A (ja) * 2003-12-15 2005-06-30 Dainippon Printing Co Ltd ガスバリア性シートおよびその製造方法
JP2005169994A (ja) * 2003-12-15 2005-06-30 Dainippon Printing Co Ltd ガスバリア性シート
WO2006087941A1 (ja) * 2005-02-17 2006-08-24 Konica Minolta Holdings, Inc. ガスバリアフィルム、ガスバリアフィルムの製造方法および該ガスバリアフィルムを用いた有機エレクトロルミネッセンス素子用樹脂基材、有機エレクトロルミネッセンス素子

Family Cites Families (9)

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Publication number Priority date Publication date Assignee Title
US6268695B1 (en) * 1998-12-16 2001-07-31 Battelle Memorial Institute Environmental barrier material for organic light emitting device and method of making
US7749563B2 (en) * 2002-10-07 2010-07-06 Applied Materials, Inc. Two-layer film for next generation damascene barrier application with good oxidation resistance
US7288311B2 (en) * 2003-02-10 2007-10-30 Dai Nippon Printing Co., Ltd. Barrier film
JP4464155B2 (ja) * 2003-02-10 2010-05-19 大日本印刷株式会社 バリアフィルム
US8652625B2 (en) * 2004-09-21 2014-02-18 Konica Minolta Holdings, Inc. Transparent gas barrier film
EP1829945A4 (en) * 2004-12-21 2011-03-23 Hitachi Chemical Co Ltd FILM, SILICON FILM AND METHOD OF MANUFACTURING THEREOF, COMPOSITION FOR FORMING THE SILICON FILM AND ELECTRONIC COMPONENT
JP2006187966A (ja) * 2005-01-07 2006-07-20 Toppan Printing Co Ltd 透明ガスバリア積層体
US20100003483A1 (en) * 2007-02-05 2010-01-07 Kazuhiro Fukuda Transparent gas barrier film
JPWO2008096617A1 (ja) * 2007-02-06 2010-05-20 コニカミノルタホールディングス株式会社 透明ガスバリア性フィルム及び透明ガスバリア性フィルムの製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1086267A (ja) * 1996-09-11 1998-04-07 Toppan Printing Co Ltd 被覆フィルム
JP2004082522A (ja) * 2002-08-27 2004-03-18 Toray Ind Inc 高ガスバリア性フィルムおよびその製造方法
JP2005169996A (ja) * 2003-12-15 2005-06-30 Dainippon Printing Co Ltd ガスバリア性シートおよびその製造方法
JP2005169994A (ja) * 2003-12-15 2005-06-30 Dainippon Printing Co Ltd ガスバリア性シート
WO2006087941A1 (ja) * 2005-02-17 2006-08-24 Konica Minolta Holdings, Inc. ガスバリアフィルム、ガスバリアフィルムの製造方法および該ガスバリアフィルムを用いた有機エレクトロルミネッセンス素子用樹脂基材、有機エレクトロルミネッセンス素子

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
"An outline of the X-ray reflectance method in X-ray diffraction Handbook", January 1999, KOKUSAI BUNKEN INSATSU SHA, pages: 151
See also references of EP2116368A4 *

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5780154B2 (ja) * 2009-03-04 2015-09-16 コニカミノルタ株式会社 薄膜を有する基材の製造方法
WO2010100971A1 (ja) * 2009-03-04 2010-09-10 コニカミノルタホールディングス株式会社 薄膜を有する基材
JP2011179104A (ja) * 2010-03-04 2011-09-15 Fujifilm Corp ガスバリアフィルム、成膜方法、および成膜装置
JP2011184703A (ja) * 2010-03-04 2011-09-22 Fujifilm Corp ガスバリアフィルム、成膜方法、および成膜装置
WO2012029541A1 (ja) * 2010-08-30 2012-03-08 コニカミノルタホールディングス株式会社 薄膜積層体
JP2012083491A (ja) * 2010-10-08 2012-04-26 Sumitomo Chemical Co Ltd 液晶表示素子
JPWO2013035689A1 (ja) * 2011-09-07 2015-03-23 東レ株式会社 ガスバリア性フィルム
US9090780B2 (en) 2011-09-07 2015-07-28 Toray Industries, Inc. Gas barrier film
WO2013035689A1 (ja) * 2011-09-07 2013-03-14 東レ株式会社 ガスバリア性フィルム
JP2013056513A (ja) * 2011-09-09 2013-03-28 Fujifilm Corp 機能性フィルムおよび機能性フィルムの製造方法
JP2013056514A (ja) * 2011-09-09 2013-03-28 Fujifilm Corp 機能性フィルムおよび機能性フィルムの製造方法
WO2013035683A1 (ja) * 2011-09-09 2013-03-14 富士フイルム株式会社 機能性フィルムおよび機能性フィルムの製造方法
WO2013035682A1 (ja) * 2011-09-09 2013-03-14 富士フイルム株式会社 機能性フィルムおよび機能性フィルムの製造方法
WO2013099654A1 (ja) * 2011-12-27 2013-07-04 日東電工株式会社 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機ｅｌ素子、太陽電池および薄膜電池
JP2013132897A (ja) * 2011-12-27 2013-07-08 Nitto Denko Corp 透明ガスバリアフィルム、透明ガスバリアフィルムの製造方法、有機ｅｌ素子、太陽電池および薄膜電池
US9660208B2 (en) 2011-12-27 2017-05-23 Nitto Denko Corporation Transparent gas barrier film, method for producing transparent gas barrier film, organic EL element, solar battery, and thin film battery
JP2013180473A (ja) * 2012-03-01 2013-09-12 Nitto Denko Corp 透明ガスバリアフィルム、有機ｅｌ素子、太陽電池および薄膜電池
JP2014065281A (ja) * 2012-09-27 2014-04-17 Keio Gijuku 積層体とその製造方法

Also Published As

Publication number Publication date
EP2116368A4 (en) 2012-04-11
US20100009147A1 (en) 2010-01-14
JPWO2008096615A1 (ja) 2010-05-20
EP2116368A1 (en) 2009-11-11

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