[go: up one dir, main page]

WO2008093513A1 - Composé polymère réticulable et composition de résine photosensible le contenant - Google Patents

Composé polymère réticulable et composition de résine photosensible le contenant Download PDF

Info

Publication number
WO2008093513A1
WO2008093513A1 PCT/JP2008/050092 JP2008050092W WO2008093513A1 WO 2008093513 A1 WO2008093513 A1 WO 2008093513A1 JP 2008050092 W JP2008050092 W JP 2008050092W WO 2008093513 A1 WO2008093513 A1 WO 2008093513A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
photosensitive resin
composition containing
polymer compound
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/050092
Other languages
English (en)
Japanese (ja)
Inventor
Shin Utsunomiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Soken Kagaku KK
Soken Chemical and Engineering Co Ltd
Original Assignee
Soken Kagaku KK
Soken Chemical and Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soken Kagaku KK, Soken Chemical and Engineering Co Ltd filed Critical Soken Kagaku KK
Priority to KR1020097012023A priority Critical patent/KR20090112633A/ko
Publication of WO2008093513A1 publication Critical patent/WO2008093513A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C08F257/02—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/22—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C08L71/02—Polyalkylene oxides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/05—Polymer mixtures characterised by other features containing polymer components which can react with one another

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

L'invention concerne un composé réticulable qui peut être durci par la chaleur et/ou la lumière sans dépendre d'un initiateur de photopolymérisation ou un monomère polyfonctionnel. La présente invention concerne également une composition de résine photosensible hautement sensible contenant ledit composé réticulable. L'invention concerne particulièrement un composé polymère qui est obtenu en ajoutant un composé (II) représenté par la formule (1) ci-dessous à un copolymère (I) contenant une unité constitutionnelle (A) dérivée d'un acide carboxylique insaturé et une unité constitutionnelle (B) dérivée d'au moins un composé choisi parmi le styrène, le méthylstyrène, l'α-méthylstyrène et l'indène. (1)
PCT/JP2008/050092 2007-02-02 2008-01-09 Composé polymère réticulable et composition de résine photosensible le contenant Ceased WO2008093513A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020097012023A KR20090112633A (ko) 2007-02-02 2008-01-09 가교성 고분자 화합물 및 이것을 함유하는 감광성 수지조성물

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007024631A JP2008189773A (ja) 2007-02-02 2007-02-02 架橋性高分子化合物およびこれを含有する感光性樹脂組成物
JP2007-024631 2007-09-10

Publications (1)

Publication Number Publication Date
WO2008093513A1 true WO2008093513A1 (fr) 2008-08-07

Family

ID=39673827

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/050092 Ceased WO2008093513A1 (fr) 2007-02-02 2008-01-09 Composé polymère réticulable et composition de résine photosensible le contenant

Country Status (4)

Country Link
JP (1) JP2008189773A (fr)
KR (1) KR20090112633A (fr)
TW (1) TW200902564A (fr)
WO (1) WO2008093513A1 (fr)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10883998B2 (en) 2009-03-02 2021-01-05 Massachusetts Institute Of Technology Methods and products for in vivo enzyme profiling
US11054428B2 (en) 2018-03-05 2021-07-06 Massachusetts Institute Of Technology Inhalable nanosensors with volatile reporters and uses thereof
US11428689B2 (en) 2016-05-05 2022-08-30 Massachusetts Institute Of Technology Methods and uses for remotely triggered protease activity measurements
US11448643B2 (en) 2016-04-08 2022-09-20 Massachusetts Institute Of Technology Methods to specifically profile protease activity at lymph nodes
US11519905B2 (en) 2017-04-07 2022-12-06 Massachusetts Institute Of Technology Methods to spatially profile protease activity in tissue and sections
US11549947B2 (en) 2011-03-15 2023-01-10 Massachusetts Institute Of Technology Multiplexed detection with isotope-coded reporters
US11835522B2 (en) 2019-01-17 2023-12-05 Massachusetts Institute Of Technology Sensors for detecting and imaging of cancer metastasis
US12173349B2 (en) 2018-09-25 2024-12-24 Massachusetts Institute Of Technology Lung protease nanosensors and uses thereof
WO2025121031A1 (fr) * 2023-12-08 2025-06-12 株式会社レゾナック Copolymère
WO2025121033A1 (fr) * 2023-12-08 2025-06-12 株式会社レゾナック Procédé de fabrication de copolymère

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5403545B2 (ja) * 2009-09-14 2014-01-29 太陽ホールディングス株式会社 ソルダーレジスト組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板
JP5749119B2 (ja) * 2011-08-19 2015-07-15 富士フイルム株式会社 インク組成物、画像形成方法、及び印画物
JP5887244B2 (ja) * 2012-09-28 2016-03-16 富士フイルム株式会社 パターン形成用自己組織化組成物、それを用いたブロックコポリマーの自己組織化によるパターン形成方法、及び自己組織化パターン、並びに電子デバイスの製造方法
JP7744268B2 (ja) * 2022-03-08 2025-09-25 日本化薬株式会社 硬化性樹脂組成物、その硬化物および半導体装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62215607A (ja) * 1986-03-17 1987-09-22 Agency Of Ind Science & Technol 感光性樹脂の製造方法
JPS63122708A (ja) * 1986-11-13 1988-05-26 Showa Highpolymer Co Ltd ラジカル硬化可能な共重合体樹脂の製造方法
JPH02190860A (ja) * 1989-01-20 1990-07-26 Fuji Photo Film Co Ltd 液状感光性樹脂組成物
JPH1069081A (ja) * 1997-06-06 1998-03-10 Daicel Chem Ind Ltd アルカリ可溶型レジスト用組成物
JPH10147685A (ja) * 1996-11-18 1998-06-02 Toagosei Co Ltd 絶縁材料用樹脂組成物

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62215607A (ja) * 1986-03-17 1987-09-22 Agency Of Ind Science & Technol 感光性樹脂の製造方法
JPS63122708A (ja) * 1986-11-13 1988-05-26 Showa Highpolymer Co Ltd ラジカル硬化可能な共重合体樹脂の製造方法
JPH02190860A (ja) * 1989-01-20 1990-07-26 Fuji Photo Film Co Ltd 液状感光性樹脂組成物
JPH10147685A (ja) * 1996-11-18 1998-06-02 Toagosei Co Ltd 絶縁材料用樹脂組成物
JPH1069081A (ja) * 1997-06-06 1998-03-10 Daicel Chem Ind Ltd アルカリ可溶型レジスト用組成物

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
MASAZO NIWA ET AL.: "Synthesis of Graft Polymers by Copolomerization of Macromonomer. I. Preparation of Macromonomers", JOURNAL OF MACROMOLECULAR SCIENCE - CHEMISTRY, vol. A23, no. 4, 1986, pages 433 - 450 *

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11703510B2 (en) 2009-03-02 2023-07-18 Massachusetts Institute Of Technology Methods and products for in vivo enzyme profiling
US11549951B2 (en) 2009-03-02 2023-01-10 Massachusetts Institute Of Technology Methods and products for in vivo enzyme profiling
US10883998B2 (en) 2009-03-02 2021-01-05 Massachusetts Institute Of Technology Methods and products for in vivo enzyme profiling
US11549947B2 (en) 2011-03-15 2023-01-10 Massachusetts Institute Of Technology Multiplexed detection with isotope-coded reporters
US11448643B2 (en) 2016-04-08 2022-09-20 Massachusetts Institute Of Technology Methods to specifically profile protease activity at lymph nodes
US11428689B2 (en) 2016-05-05 2022-08-30 Massachusetts Institute Of Technology Methods and uses for remotely triggered protease activity measurements
US11519905B2 (en) 2017-04-07 2022-12-06 Massachusetts Institute Of Technology Methods to spatially profile protease activity in tissue and sections
US12320801B2 (en) 2017-04-07 2025-06-03 Massachusetts Institute Of Technology Methods to spatially profile protease activity in tissue and sections
US11054428B2 (en) 2018-03-05 2021-07-06 Massachusetts Institute Of Technology Inhalable nanosensors with volatile reporters and uses thereof
US12173349B2 (en) 2018-09-25 2024-12-24 Massachusetts Institute Of Technology Lung protease nanosensors and uses thereof
US11835522B2 (en) 2019-01-17 2023-12-05 Massachusetts Institute Of Technology Sensors for detecting and imaging of cancer metastasis
WO2025121031A1 (fr) * 2023-12-08 2025-06-12 株式会社レゾナック Copolymère
WO2025121033A1 (fr) * 2023-12-08 2025-06-12 株式会社レゾナック Procédé de fabrication de copolymère

Also Published As

Publication number Publication date
TW200902564A (en) 2009-01-16
JP2008189773A (ja) 2008-08-21
KR20090112633A (ko) 2009-10-28

Similar Documents

Publication Publication Date Title
WO2008093513A1 (fr) Composé polymère réticulable et composition de résine photosensible le contenant
WO2008126700A1 (fr) Film optique, plaque de polarisation, affichage à cristaux liquides et polymère absorbant des ultraviolets
TW200710579A (en) Bottom resist layer composition and patterning process using the same
TW200502345A (en) Curable (meth)acrylate compositions
WO2009084909A3 (fr) Film optique, film de protection pour polariseur, plaque de polarisation fabriquée à partir de ce film et dispositif afficheur utilisant cette plaque
WO2009034998A1 (fr) Composition contenant un polymère ayant un groupe sylile azoté pour la formation d'un film de sous-couche de résist
WO2007111716A3 (fr) Composition polymere de liant superabsorbent souple
EP1939687A3 (fr) Composition polymérisable, précurseur de plaque d'impression lithographique et procédé d'impression lithographique
WO2008146723A1 (fr) Composition de résine, film de résine espaceur, et dispositif à semi-conducteurs
NO341526B1 (no) "Vandig harpiksdispersjon for klebestoff og sammensetning derav"
WO2009047949A1 (fr) Polymère photosensible greffé et composition de résine photosensible le comprenant
TW200942967A (en) Positive photosensitive polymer composition
TW200702915A (en) Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same
JP2006241270A5 (fr)
TWI263867B (en) Positively photosensitive resin composition and method of pattern formation
WO2008009843A3 (fr) Procede de preparation de polymeres (meth) acryliques
WO2009022724A1 (fr) Composition de résine photosensible et stratifié de celle-ci
TW200736828A (en) Photosensitive resin composition and photoresist film using the same
CN105765458A (zh) 负型感光性树脂组合物
TW200801800A (en) Photosensitive resin composition
EP1403708A3 (fr) Photoréserve
EP1630602A3 (fr) Composition polymérisable, film hydrophile susceptible d'être formé par durcissement de cette composition et précurseur de plaque d'impression planographique
EP1894972A3 (fr) Composition de résine photosensible pour carte de circuit flexible et carte de circuit flexible l'utilisant
JP2010540693A5 (fr)
WO2008132842A1 (fr) Composition de résine photosensible, film sec et produit traité au moyen dudit film sec

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08702964

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 1020097012023

Country of ref document: KR

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08702964

Country of ref document: EP

Kind code of ref document: A1