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WO2008076199A3 - Dispositifs de conditionnement de tampons de cmp et procédés associés - Google Patents

Dispositifs de conditionnement de tampons de cmp et procédés associés Download PDF

Info

Publication number
WO2008076199A3
WO2008076199A3 PCT/US2007/024169 US2007024169W WO2008076199A3 WO 2008076199 A3 WO2008076199 A3 WO 2008076199A3 US 2007024169 W US2007024169 W US 2007024169W WO 2008076199 A3 WO2008076199 A3 WO 2008076199A3
Authority
WO
WIPO (PCT)
Prior art keywords
cmp pad
associated methods
pad conditioners
cutting element
cutting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2007/024169
Other languages
English (en)
Other versions
WO2008076199A2 (fr
Inventor
Chien-Min Sung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of WO2008076199A2 publication Critical patent/WO2008076199A2/fr
Publication of WO2008076199A3 publication Critical patent/WO2008076199A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Abstract

L'invention concerne un procédé pour réduire un degré de compression d'un tampon de polissage mécano-chimique (CMP) lors du conditionnement du tampon de CMP. Selon ce procédé, le tampon de CMP est mis en prise avec au moins un élément de coupe extra-dur, cet élément de coupe comprenant une face de coupe qui forme un angle inférieur ou égal à 90° avec une surface finie du tampon de CMP, puis le tampon de CMP et l'élément de coupe sont déplacés l'un par rapport à l'autre dans une direction de façon à obtenir un enlèvement de matière du tampon de CMP au moyen de la face de coupe et conditionner ainsi le tampon de CMP.
PCT/US2007/024169 2006-11-16 2007-11-16 Dispositifs de conditionnement de tampons de cmp et procédés associés Ceased WO2008076199A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US86620206P 2006-11-16 2006-11-16
US60/866,202 2006-11-16

Publications (2)

Publication Number Publication Date
WO2008076199A2 WO2008076199A2 (fr) 2008-06-26
WO2008076199A3 true WO2008076199A3 (fr) 2008-08-21

Family

ID=39536874

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/024169 Ceased WO2008076199A2 (fr) 2006-11-16 2007-11-16 Dispositifs de conditionnement de tampons de cmp et procédés associés

Country Status (4)

Country Link
US (1) US20080153398A1 (fr)
CN (1) CN101557904A (fr)
TW (1) TWI356449B (fr)
WO (1) WO2008076199A2 (fr)

Families Citing this family (40)

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Publication number Priority date Publication date Assignee Title
US9463552B2 (en) 1997-04-04 2016-10-11 Chien-Min Sung Superbrasvie tools containing uniformly leveled superabrasive particles and associated methods
US9221154B2 (en) 1997-04-04 2015-12-29 Chien-Min Sung Diamond tools and methods for making the same
US9409280B2 (en) 1997-04-04 2016-08-09 Chien-Min Sung Brazed diamond tools and methods for making the same
US9199357B2 (en) 1997-04-04 2015-12-01 Chien-Min Sung Brazed diamond tools and methods for making the same
US9238207B2 (en) 1997-04-04 2016-01-19 Chien-Min Sung Brazed diamond tools and methods for making the same
US9868100B2 (en) 1997-04-04 2018-01-16 Chien-Min Sung Brazed diamond tools and methods for making the same
US7516536B2 (en) * 1999-07-08 2009-04-14 Toho Engineering Kabushiki Kaisha Method of producing polishing pad
US8678878B2 (en) 2009-09-29 2014-03-25 Chien-Min Sung System for evaluating and/or improving performance of a CMP pad dresser
US8622787B2 (en) 2006-11-16 2014-01-07 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
US9724802B2 (en) 2005-05-16 2017-08-08 Chien-Min Sung CMP pad dressers having leveled tips and associated methods
US8393934B2 (en) 2006-11-16 2013-03-12 Chien-Min Sung CMP pad dressers with hybridized abrasive surface and related methods
US9138862B2 (en) 2011-05-23 2015-09-22 Chien-Min Sung CMP pad dresser having leveled tips and associated methods
US8398466B2 (en) 2006-11-16 2013-03-19 Chien-Min Sung CMP pad conditioners with mosaic abrasive segments and associated methods
US20150017884A1 (en) * 2006-11-16 2015-01-15 Chien-Min Sung CMP Pad Dressers with Hybridized Abrasive Surface and Related Methods
EP2193007B1 (fr) 2007-08-23 2015-01-07 Saint-Gobain Abrasifs Outil abrasif pour le dressage de patins a polier
WO2009064677A2 (fr) * 2007-11-13 2009-05-22 Chien-Min Sung Dresseurs de tampons de polissage mecano-chimique
US9011563B2 (en) * 2007-12-06 2015-04-21 Chien-Min Sung Methods for orienting superabrasive particles on a surface and associated tools
TWI473685B (zh) * 2008-01-15 2015-02-21 Iv Technologies Co Ltd 研磨墊及其製造方法
CN102341215B (zh) 2009-03-24 2014-06-18 圣戈班磨料磨具有限公司 用作化学机械平坦化垫修整器的研磨工具
WO2010141464A2 (fr) * 2009-06-02 2010-12-09 Saint-Gobain Abrasives, Inc. Outils de conditionnement cmp résistants à la corrosion et leurs procédés de fabrication et d'utilisation
NL1037020C2 (nl) * 2009-06-05 2010-12-07 Auto Cosmetics Hoogeveen Gereedschap en werkwijze voor het reconditioneren van een polijstpad, tevens werkwijze voor het vervaardigen van zo een gereedschap.
WO2011028700A2 (fr) 2009-09-01 2011-03-10 Saint-Gobain Abrasives, Inc. Conditionneur de polissage chimico-mécanique
KR101091030B1 (ko) * 2010-04-08 2011-12-09 이화다이아몬드공업 주식회사 감소된 마찰력을 갖는 패드 컨디셔너 제조방법
KR101916492B1 (ko) * 2011-03-07 2018-11-07 엔테그리스, 아이엔씨. 화학 및 기계적 평탄화 패드 컨디셔너
WO2012162430A2 (fr) 2011-05-23 2012-11-29 Chien-Min Sung Tampon de polissage mécano-chimique (cmp) à pointes nivelées et procédés associés
CN102229105A (zh) * 2011-06-28 2011-11-02 清华大学 化学机械抛光方法
KR101339722B1 (ko) * 2011-07-18 2013-12-10 이화다이아몬드공업 주식회사 Ｃｍｐ 패드 컨디셔너
WO2013166516A1 (fr) * 2012-05-04 2013-11-07 Entegris, Inc. Tampons de conditionneur de polissage chimicomécanique (cmp) avec amélioration de matière superabrasive
US9956664B2 (en) 2012-08-02 2018-05-01 3M Innovative Properties Company Abrasive element precursor with precisely shaped features and methods of making thereof
SG11201500802TA (en) 2012-08-02 2015-04-29 3M Innovative Properties Co Abrasive articles with precisely shaped features and method of making thereof
US20150239140A1 (en) * 2012-10-19 2015-08-27 Dow Global Technologies Llc Apparatus and method for cutting formable and/or collapsible materials
US9457450B2 (en) 2013-03-08 2016-10-04 Tera Xtal Technology Corporation Pad conditioning tool
TWI511841B (zh) * 2013-03-15 2015-12-11 Kinik Co 貼合式化學機械硏磨修整器及其製法
WO2015143278A1 (fr) * 2014-03-21 2015-09-24 Entegris, Inc. Conditionneur de tampon de polissage mécano-chimique à bords de coupe allongés
CN106078517A (zh) * 2016-08-03 2016-11-09 咏巨科技有限公司 一种抛光垫修整装置
WO2020044011A1 (fr) * 2018-08-31 2020-03-05 Morgan Advanced Ceramics, Inc. Tête de conditionnement cmp hybride
US20250050464A1 (en) * 2021-12-31 2025-02-13 3M Innovative Properties Company Conditioning disk with microfeatures
KR102804527B1 (ko) * 2022-07-20 2025-05-12 새솔다이아몬드공업 주식회사 패드 컨디셔너
CN117103123B (zh) * 2023-10-24 2024-01-30 华南理工大学 一种金刚石磨粒修平表面的微纳结构成型控制方法
TWI884897B (zh) * 2025-01-23 2025-05-21 日鐵精工股份有限公司 穩定型拋光墊修整器

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EP1075898A2 (fr) * 1999-08-13 2001-02-14 Mitsubishi Materials Corporation Outil et dispositif de dressage
US6439986B1 (en) * 1999-10-12 2002-08-27 Hunatech Co., Ltd. Conditioner for polishing pad and method for manufacturing the same
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WO2006124792A2 (fr) * 2005-05-16 2006-11-23 Chien-Min Sung Cutters superdurs et procedes associes

Also Published As

Publication number Publication date
CN101557904A (zh) 2009-10-14
WO2008076199A2 (fr) 2008-06-26
US20080153398A1 (en) 2008-06-26
TWI356449B (en) 2012-01-11
TW200837823A (en) 2008-09-16

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