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WO2007109214A3 - Vaporisateur pour la distribution de gaz à faible pression de vapeur - Google Patents

Vaporisateur pour la distribution de gaz à faible pression de vapeur Download PDF

Info

Publication number
WO2007109214A3
WO2007109214A3 PCT/US2007/006775 US2007006775W WO2007109214A3 WO 2007109214 A3 WO2007109214 A3 WO 2007109214A3 US 2007006775 W US2007006775 W US 2007006775W WO 2007109214 A3 WO2007109214 A3 WO 2007109214A3
Authority
WO
WIPO (PCT)
Prior art keywords
delivery
vapor pressure
low vapor
vaporizer
pressure gasses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2007/006775
Other languages
English (en)
Other versions
WO2007109214A2 (fr
Inventor
Jeffrey J Spiegelman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rasirc Inc
Original Assignee
Rasirc Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rasirc Inc filed Critical Rasirc Inc
Priority to JP2009501481A priority Critical patent/JP5681363B2/ja
Publication of WO2007109214A2 publication Critical patent/WO2007109214A2/fr
Publication of WO2007109214A3 publication Critical patent/WO2007109214A3/fr
Priority to US12/198,755 priority patent/US7618027B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
    • B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
    • B01B1/005—Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/65—Vaporizers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

L'invention concerne un dispositif de vaporisation servant à réguler, distribuer et purifier des gaz à faible pression de vapeur conjointement à un gaz vecteur, ledit dispositif étant utilisé en micro-électronique et dans d'autres applications critiques.
PCT/US2007/006775 2006-03-20 2007-03-19 Vaporisateur pour la distribution de gaz à faible pression de vapeur Ceased WO2007109214A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009501481A JP5681363B2 (ja) 2006-03-20 2007-03-19 低蒸気圧ガスを送るためのベポライザー
US12/198,755 US7618027B2 (en) 2006-03-20 2008-08-26 Vaporizer for delivery of low vapor pressure gases

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US78438206P 2006-03-20 2006-03-20
US60/784,382 2006-03-20

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/198,755 Continuation US7618027B2 (en) 2006-03-20 2008-08-26 Vaporizer for delivery of low vapor pressure gases

Publications (2)

Publication Number Publication Date
WO2007109214A2 WO2007109214A2 (fr) 2007-09-27
WO2007109214A3 true WO2007109214A3 (fr) 2007-12-13

Family

ID=38523023

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2007/006775 Ceased WO2007109214A2 (fr) 2006-03-20 2007-03-19 Vaporisateur pour la distribution de gaz à faible pression de vapeur

Country Status (3)

Country Link
US (1) US7618027B2 (fr)
JP (1) JP5681363B2 (fr)
WO (1) WO2007109214A2 (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8297223B2 (en) * 2007-10-02 2012-10-30 Msp Corporation Method and apparatus for particle filtration and enhancing tool performance in film deposition
WO2009064427A2 (fr) * 2007-11-13 2009-05-22 Mckinley James J Générateur de source de vapeur à espace de tête dynamique à concentration variable
WO2011133715A1 (fr) * 2010-04-21 2011-10-27 Rasirc Appareil et procédé pour distribution de vapeur
DE102010018830A1 (de) 2010-04-29 2011-11-03 Bayer Technology Services Gmbh Flüssigkeitsverdampfer
DE102011112043A1 (de) 2011-09-01 2013-03-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung einer photovoltaischen Solarzelle
JP5914037B2 (ja) * 2012-02-23 2016-05-11 東京エレクトロン株式会社 冷却システム、冷却システムを備える基板処理装置及び冷却方法
KR102027475B1 (ko) * 2012-03-28 2019-10-01 라시크 아이엔씨. 다성분 용액으로부터의 공정 가스의 전달 방법
US9327249B2 (en) * 2012-04-17 2016-05-03 Air Products And Chemicals, Inc. Systems and methods for humidifying gas streams
US9545585B2 (en) * 2012-07-16 2017-01-17 Rasirc, Inc. Method, system, and device for delivery of high purity hydrogen peroxide
CN109395224A (zh) 2013-06-19 2019-03-01 上海潓美医疗科技有限公司 保健气体产生器
JP6423004B2 (ja) 2014-05-13 2018-11-14 ラシリック, インコーポレイテッドRASIRC, Inc. プロセスガスを重要工程処理に送達するための方法および系
US10150048B2 (en) * 2014-10-23 2018-12-11 Rasirc, Inc. Method, system, and device for delivery of process gas
US10766771B2 (en) 2015-04-06 2020-09-08 Rasirc, Inc. Methods and systems for purifying hydrogen peroxide solutions
US11458412B2 (en) * 2018-01-17 2022-10-04 Rasirc, Inc. Controlled vapor delivery into low pressure processes
US11655176B2 (en) * 2018-11-21 2023-05-23 Corning Incorporated Method for decreasing bubble lifetime on a glass melt surface
US11938414B1 (en) * 2022-10-04 2024-03-26 Honeywell Federal Manufacturing & Technologies, Llc Microfluidic film evaporation with femtosecond laser-patterned surface

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040056368A1 (en) * 2002-09-19 2004-03-25 Kazuhiro Hirahara Liquid organometallic compound vaporizing/feeding system
US20050066893A1 (en) * 2003-09-29 2005-03-31 Soininen Pekka T. Safe liquid source containers

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06218251A (ja) * 1993-01-27 1994-08-09 Asahi Glass Co Ltd 加湿膜
JPH0861718A (ja) * 1994-08-29 1996-03-08 Orion Mach Co Ltd 加湿装置
JPH11200051A (ja) * 1998-01-20 1999-07-27 Ckd Corp 液体気化装置
JP2000279744A (ja) * 1999-03-30 2000-10-10 Sanyo Electric Co Ltd 調湿装置
JP3992480B2 (ja) * 2001-11-12 2007-10-17 東京エレクトロン株式会社 基板処理装置および基板処理方法ならびに基板処理システム
JP3822135B2 (ja) * 2002-05-13 2006-09-13 日本パイオニクス株式会社 気化供給装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040056368A1 (en) * 2002-09-19 2004-03-25 Kazuhiro Hirahara Liquid organometallic compound vaporizing/feeding system
US20050066893A1 (en) * 2003-09-29 2005-03-31 Soininen Pekka T. Safe liquid source containers

Also Published As

Publication number Publication date
JP2009530854A (ja) 2009-08-27
JP5681363B2 (ja) 2015-03-04
US20090014901A1 (en) 2009-01-15
WO2007109214A2 (fr) 2007-09-27
US7618027B2 (en) 2009-11-17

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