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WO2007037021A1 - Dispositif d'affichage à cristaux liquides et procédé de production de celui-ci - Google Patents

Dispositif d'affichage à cristaux liquides et procédé de production de celui-ci Download PDF

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Publication number
WO2007037021A1
WO2007037021A1 PCT/JP2005/021030 JP2005021030W WO2007037021A1 WO 2007037021 A1 WO2007037021 A1 WO 2007037021A1 JP 2005021030 W JP2005021030 W JP 2005021030W WO 2007037021 A1 WO2007037021 A1 WO 2007037021A1
Authority
WO
WIPO (PCT)
Prior art keywords
liquid crystal
crystal display
display device
array substrate
counter substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2005/021030
Other languages
English (en)
Japanese (ja)
Inventor
Toshimasa Eguchi
Shigenori Yamaoka
Shigeyoshi Ootsuki
Toshiyuki Ikariya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
JSR Corp
Kuraray Co Ltd
NEC Corp
Sumitomo Chemical Co Ltd
Sumitomo Bakelite Co Ltd
Toppan Inc
Resonac Corp
Original Assignee
Dai Nippon Printing Co Ltd
Hitachi Chemical Co Ltd
JSR Corp
Kuraray Co Ltd
NEC Corp
Sumitomo Chemical Co Ltd
Sumitomo Bakelite Co Ltd
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd, Hitachi Chemical Co Ltd, JSR Corp, Kuraray Co Ltd, NEC Corp, Sumitomo Chemical Co Ltd, Sumitomo Bakelite Co Ltd, Toppan Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP2007537523A priority Critical patent/JPWO2007037021A1/ja
Publication of WO2007037021A1 publication Critical patent/WO2007037021A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters

Definitions

  • Liquid crystal display device and manufacturing method thereof
  • the present invention relates to a liquid crystal display device used for display of a personal computer, a mobile phone, and the like, and a method of manufacturing the same.
  • a liquid crystal display device for example, there is a TN (TwistedNematic) element having a wide application field, and this TN element is composed of one liquid crystal panel and polarizing plates disposed on both sides thereof.
  • TN TransmissionNematic
  • Patent Literature 1 Non-Patent Literature 2
  • Non-Patent Document 1 “FPD Guidebook” edited by Japan Electronics and Information Technology Industries Association (2003) (pp. 20-21)
  • Patent Document 1 Japanese Patent Laid-Open No. 4 208925 (first page)
  • Non-Patent Document 2 Techno Times “Monthly Display” March 2003 (Pages 55-61) Disclosure of Invention
  • the LCD of the glass substrate on both sides is apt to break before the polarizing plate in the manufacturing process is pasted, so it is difficult to reduce the thickness of the glass substrate to 0.3 mm or less.
  • plastic LCDs on both sides have not been able to manufacture high-definition liquid crystal display devices using active matrix.
  • polysilicon thin film transistors p-SiTFT
  • p-SiTFT polysilicon thin film transistors
  • the present invention has been made in view of the strong point, and an object of the present invention is to provide a liquid crystal display device capable of manufacturing a thin, light, and high-definition device that can be easily cracked with high yield, and a method for manufacturing the same. It is said.
  • the present invention is configured as follows.
  • An array substrate having a thin film switching element formed on glass
  • liquid crystal display device wherein a ratio of a linear expansion coefficient between the array substrate and the counter substrate is 1 to 10 or less.
  • liquid crystal display device wherein the thin film switching element is a polysilicon thin film transistor.
  • the invention according to claim 5 provides:
  • the liquid crystal display device according to claim 1, wherein the sealing material is an ultraviolet curable resin.
  • An array substrate having a thin film switching element formed on glass
  • the present invention has the following effects.
  • the array substrate in which a thin film switching element is formed on glass, a counter substrate having a specified plastic film, and the array substrate and the counter substrate are bonded together. It is a high-definition liquid crystal display device that is thinner and lighter than both glass substrate liquid crystal display devices on both sides.
  • the ratio of the linear expansion coefficient between the array substrate and the counter substrate is 1 to 10 or less, and the liquid crystal display device becomes hot due to the definition of the ratio of the linear expansion coefficient. At this time, the liquid crystal display device is less likely to be warped due to a difference in thermal expansion between the array substrate and the counter substrate or to be destroyed due to peeling.
  • the thin film switching element is a polysilicon thin film transistor, and the mobility is high and the switching element can be formed in a small area, or it can be formed up to a driving circuit.
  • the counter substrate is a color filter substrate, and colorization can be easily performed.
  • the sealing material is an ultraviolet curable resin
  • the curing time is short, and it can be cured in a room temperature environment by irradiating with ultraviolet rays. is there.
  • the array substrate in which the thin film switching element is formed on the glass and the counter substrate having the specified plastic film are bonded to each other by using the specified sealing material.
  • High-definition liquid crystal display devices that are thinner and lighter than glass substrate liquid crystal display devices can be manufactured with good yield.
  • FIG. 1 is a schematic cross-sectional view showing a configuration of a liquid crystal display device.
  • Liquid crystal display device of the present invention 1 01 includes an array substrate 110, a counter substrate 120, a liquid crystal 130 interposed between the array substrate 110 and the counter substrate 120, and a sealing material 140 that bonds the array substrate 110 and the counter substrate 120 together.
  • the array substrate 110 has a configuration in which a thin film switching element 112 is formed on a glass 111.
  • the thin film switching element 112 include a thin film diode, an amorphous silicon thin film transistor, and a polysilicon thin film transistor. Of these, it is preferable to use a polysilicon thin film transistor because the mobility is high and the switching element can be formed in a small area and a driving circuit can be formed.
  • the counter substrate 120 has a plastic film 121 having a linear expansion coefficient of 40 ppmZ ° C or less from 30 ° C to 100 ° C and a thickness of 5 m or more and less than 300 ⁇ m.
  • the plastic film 121 include polyethylene naphthalate, aromatic polyamide, polyimide, polybenzothiazole, polybenzoxazole, and the like.
  • the counter substrate 120 may or may not have a transparent electrode depending on the driving mode of the liquid crystal 130.
  • the liquid crystal 130 has a counter electrode when the driving mode is twisted nematic (TN), vertical alignment, polymer dispersion, etc., and has a counter electrode when in-plane switching (IPS). Not done.
  • the counter electrode may be a color filter substrate or a transparent substrate, but it is preferable to use a color filter substrate because it can be easily colored.
  • the counter substrate 20 can be colored without using a color filter substrate.
  • the array substrate 110 can be converted to a color filter (color filter “on” array method) or the color of the knocklight can be switched (field sequential method). ).
  • Sealing material 140 undergoes a curing reaction at 30 ° C. or lower to bond array substrate 110 and counter substrate 120 together, and seal material 140 is interposed between array substrate 110 and counter substrate 120. Spacer beads 131 and liquid crystal 130 are sealed.
  • the sealing material 140 include a two-component mixed curable resin in which a curing reaction proceeds by mixing a main agent and a curing agent, and an ultraviolet curable resin in which a curing reaction proceeds by irradiation with ultraviolet rays. Can be used. Since the curing time is short, it is preferable to use an ultraviolet curable resin, and it is possible to cure in a room temperature environment by irradiating ultraviolet rays.
  • the ratio of the linear expansion coefficient between the array substrate 110 and the counter substrate 120 is the warpage of the liquid crystal display device 101 due to the difference in thermal expansion between the array substrate 110 and the counter substrate 120 when the liquid crystal display device 101 is heated. It is preferable that the ratio is 1 to 10 or less because breakage due to or peeling occurs.
  • the liquid crystal 130 is interposed between the array substrate 110 in which the thin film switching element is formed on the glass and the counter substrate 120 made of the specified plastic film 121, and is bonded by the specified sealant 140.
  • the high-definition liquid crystal display device 101 that is thinner and lighter than the glass substrate liquid crystal display device on both sides can be manufactured with a high yield.
  • FIG. 2 is a schematic cross-sectional view showing the configuration of the liquid crystal display device 101 of the first embodiment.
  • a-SiTFT thin film transistor that also has an amorphous silicon switch is used as a switching element 2, and the diagonal number is 50 mm.
  • a 320 ⁇ 240 array substrate 110 was prepared.
  • the non-alkali glass 1 had a linear expansion coefficient of 4 ppm / ° C, and the array substrate 110 on which the switching element 2 was formed was the same.
  • a 125 ⁇ m thick polyethylene naphthalate film (Teonex Q-65, manufactured by Teijin DuPont Films Ltd.) 3 is also oxidized by reactive sputtering using silicon as a reaction gas with silicon as a target.
  • a gas noble layer 4 was formed, and then a transparent conductive film 5 having an ITO force was formed by sputtering using an indium tin oxide (hereinafter abbreviated as ITO) target.
  • ITO indium tin oxide
  • ITO indium tin oxide
  • ITO indium tin oxide
  • sealant 140 was used as the sealant 140 with an ultraviolet curable resin having an acid aluminum with a maximum particle size of 2 ⁇ m or less and an acid key with a maximum particle size of 0.5 m or less as a filler. .
  • This sealant 140 could be cured in a temperature environment of 25 ° C by irradiating with 2000 mjZcm 2 of ultraviolet light from a high pressure mercury lamp.
  • the sealing material 140 was drawn on the periphery of the array substrate 110 using a drawing device (dispenser). On the other hand, spacer beads 7 having a particle diameter of 5.0 m were sprayed on the counter substrate 120. Subsequently, the array substrate 110 and the counter substrate 120 are bonded by a bonding apparatus having a positioning device, and the sealing material 140 is cured by irradiating a high-pressure mercury lamp while pressing using a quartz press plate. Was made.
  • a liquid crystal vacuum injection device is used to inject a polymer-dispersed liquid crystal composition comprising an talyl monomer and a fluorine-based liquid crystal into the cell, and the inlet is sealed with a sealing agent, and then the whole surface is irradiated with ultraviolet rays.
  • Acrylic monomers were polymerized to obtain high molecular dispersion type liquid crystal 8.
  • a liquid crystal display device 101 was produced.
  • the liquid crystal display device 101 was stored in a constant temperature bath at 80 ° C. for 500 hours. After that, when the test pattern was displayed, it was displayed well.
  • FIG. 3 is a schematic cross-sectional view showing the configuration of the liquid crystal display device 101 of the second embodiment.
  • 0.5mm-thick alkali-free glass (1737 manufactured by Corning Co., Ltd.) 11
  • a thin film diode with tantalum Z tantalum oxide Z tantalum power is used as a switching element 12, and the diagonal size is 50 mm and the number of pixels is 320 X 240
  • An array substrate 110 was prepared.
  • the non-alkali glass 11 has a linear expansion coefficient of 4 ppmZ ° C, and the same applies to the array substrate 110 on which the switching elements 12 are formed.
  • a color filter 14 corresponding to the array substrate 110 was produced on a 125 ⁇ m thick polyethylene naphthalate film (Teonex Q-65 manufactured by Teijin DuPont Films, Inc.) 13 using a pigment-dispersed photoresist.
  • a gas noble layer 15 that also serves as an oxide layer was formed by reactive sputtering using silicon as a target and oxygen as a reaction gas.
  • a transparent conductive film 16 having ITO force was formed by a sputtering method using an ITO target.
  • ITO was patterned by photolithography using a positive photoresist and etching with hydrochloric acid to produce a color filter substrate.
  • the polyethylene naphthalate film 13 had a linear expansion coefficient of 18 ppm / ° C., and the counter substrate 120 on which the power filter 14, gas nozzle layer 15 and transparent conductive film 16 were formed was the same.
  • Bisphenol A type epoxy resin (Epicoat manufactured by Yuka Shell Epoxy Co., Ltd.), both-end epoxy ethylene glycol oligomer (PTG manufactured by Hodogaya Chemical Co., Ltd.), acid aluminum with maximum particle size of 2 ⁇ m or less, maximum particle size 0
  • a two-pack type sealant 140 that hardens when mixed with a hardener comprising aluminum and a silicon oxide having a maximum particle size of 0.5 ⁇ m or less. This sealant 140 can be cured in a 72 hour environment at 25 ° C after mixing.
  • the base material of the sealing material 140 and the curing agent were mixed around the periphery of the array substrate 110, and then the sealing material 140 was printed using a screen printing apparatus.
  • the spacer beads 18 having a particle diameter of 5. O / zm were sprayed on the counter substrate 120. Subsequently, the array substrate 110 and the counter substrate 120 are bonded together by a bonding apparatus having a positioning device, pressed using a metal press plate, and then left to stand at 25 ° C. for 72 hours, and the sealing material 140 Curing was performed to produce a cell.
  • a high-molecular dispersion type liquid crystal composition composed of an acrylic monomer and a fluorine-based liquid crystal is injected into this cell using a liquid crystal vacuum injection device, and the injection port is sealed with a sealing agent, and then the entire surface is irradiated with ultraviolet rays. Irradiation was performed to polymerize the acrylic monomer to obtain polymer dispersed liquid crystal 19. Thus, a liquid crystal display device 101 was produced.
  • the liquid crystal display device 101 was stored in a constant temperature bath at 80 ° C. for 500 hours. After that, when the test pattern was displayed, it was displayed well.
  • FIG. 4 is a schematic cross-sectional view showing the configuration of the liquid crystal display device 101 of the third embodiment.
  • An array substrate with a diagonal of 50 mm and a pixel number of 320 ⁇ 240 was prepared using a thin film transistor made of polysilicon as a switching element 22 on a 0.5 mm-thick alkali-free glass (Corning 1737) 21.
  • the non-alkali glass 21 had a linear expansion coefficient of 4 ppmZ ° C., and the array substrate 110 on which the switching elements 22 were formed was the same.
  • a power filter 24 corresponding to the array substrate 110 was prepared using a pigment-dispersed photoresist.
  • a gas noble layer 25 that also serves as an oxide layer was formed by a reactive sputtering method using silicon as a target and oxygen as a reaction gas.
  • a transparent conductive film 26 having ITO force was formed by a sputtering method using an ITO target.
  • ITO was patterned by photolithography using a positive photoresist and etching with hydrochloric acid to produce a color filter substrate, which was used as a counter substrate.
  • This transparent organic / inorganic composite plastic film 23 had a linear expansion coefficient of 14 ppmZ ° C., and the counter substrate 120 on which the color filter 24, the gas noble layer 25 and the transparent conductive film 26 were formed was the same.
  • liquid crystal display device 101 A liquid crystal alignment film made of polyimide was formed on each of the array substrate 110 and the counter substrate 120, and a 90 ° twist alignment process was performed. Next, the sealing material 140 was drawn on the peripheral portion on the array substrate 110 using a drawing device (dispenser). On the other hand, spacer beads 28 having a particle diameter of 5.0 m were sprayed on the counter substrate 120. Subsequently, the array substrate 110 and the counter substrate 120 are bonded by a bonding device having a positioning device, and the sealing material 140 is cured by irradiating a high-pressure mercury lamp while pressing using a quartz press plate. Was made.
  • a nematic liquid crystal composition composed of fluorine-based liquid crystal 29 was injected into this cell using a liquid crystal vacuum injection device, and the injection port was sealed with a sealing agent. Finally, polarizing plates 30 were bonded to the respective surfaces of the array substrate side and the counter substrate side with the absorption axis aligned in the same direction as the alignment treatment. Thus, a liquid crystal display device 101 was produced.
  • the liquid crystal display device 101 was stored in a constant temperature bath at 80 ° C. for 500 hours. After that, when the test pattern was displayed, it was displayed well.
  • Example 2 The same procedure as in Example 1 was conducted, except that a polyethylene naphthalate film having a thickness of 125 m was replaced with a polyether sulfone film having a thickness of 200 ⁇ m (FS-1300, manufactured by Sumitomo Bakelite Co., Ltd.).
  • the linear expansion coefficient of this film was 55 ppmZ ° C, and the same was true for the counter substrate on which the gas barrier layer and the transparent conductive film were formed.
  • thermosetting resin A sealing material (XN-21S manufactured by Mitsui Engineering Co., Ltd.) made of thermosetting resin was used.
  • a sealant was printed on the periphery of the array substrate using a screen printer, and then pre-beta was performed at 80 ° C for 30 minutes in the oven to evaporate the solvent component.
  • spacer beads having a particle size of 5.0 m were sprayed on the counter substrate.
  • the array substrate and the counter substrate are bonded by a bonding device having a positioning device, pressed using a metal press plate, and then allowed to stand at 150 ° C. for 2 hours to cure the sealing material.
  • a cell was produced. When the cell was returned to room temperature, a deformation in which the central part was slightly thick was observed.
  • a liquid crystal vacuum injection device is used to inject a polymer-dispersed liquid crystal composition comprising an acrylic monomer and a fluorine-based liquid crystal into the cell, and the inlet is sealed with a sealing agent, and then the whole surface is irradiated with ultraviolet rays. Acrylic monomers were polymerized to form polymer dispersed liquid crystals. Thus, a liquid crystal display device was produced.
  • the present invention can be applied to a liquid crystal display device used for display of a personal computer, a mobile phone, and the like and a manufacturing method thereof, and a high-definition device that is thin, light, and easy to crack can be manufactured with high yield.
  • FIG. 1 is a schematic cross-sectional view showing a configuration of a liquid crystal display device.
  • FIG. 2 is a schematic cross-sectional view showing the configuration of the liquid crystal display device of Example 1.
  • FIG. 3 is a schematic cross-sectional view showing a configuration of a liquid crystal display device of Example 2.
  • FIG. 4 is a schematic sectional view showing a configuration of a liquid crystal display device of Example 3. Explanation of symbols

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)

Abstract

Le problème à résoudre dans le cadre de la présente invention est de prévoir un dispositif présentant des propriétés d'affichage et une fiabilité adéquates, produit en contrecollant un substrat matriciel comprenant un élément de commutation à film mince prévu sur du verre sur un contre-substrat formé d'un film en plastique. La solution proposée consiste en ce que ce dispositif d'affichage à cristaux liquides (101) soit produit en contrecollant un substrat matriciel (110) comprenant un élément de commutation à film mince prévu sur du verre sur un contre-substrat (120) comprenant un film en plastique ayant une épaisseur d'au moins 5 μm et inférieure à 300 μm et ayant un coefficient de dilatation linéaire n'excédant pas 40 ppm/°C selon ce qui est déterminé de 30 °C à 100 °C à l'aide d'un matériau de scellement (140) qui provoque une réaction de durcissement à 30 °C ou en dessous.
PCT/JP2005/021030 2005-09-27 2005-11-16 Dispositif d'affichage à cristaux liquides et procédé de production de celui-ci Ceased WO2007037021A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007537523A JPWO2007037021A1 (ja) 2005-09-27 2005-11-16 液晶表示装置及びその製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005-279806 2005-09-27
JP2005279806 2005-09-27

Publications (1)

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WO2007037021A1 true WO2007037021A1 (fr) 2007-04-05

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220009202A1 (en) * 2019-04-02 2022-01-13 Toppan Printing Co., Ltd. Transparent conductive gas barrier laminate, a method for ufacturing the same, and a device using the transparent conductive gas barrier laminate

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH086039A (ja) * 1994-06-24 1996-01-12 Sharp Corp 液晶表示素子の製造方法及び液晶表示素子
JPH0973090A (ja) * 1995-09-04 1997-03-18 Toshiba Corp 液晶表示装置
JP2005208185A (ja) * 2004-01-21 2005-08-04 Sony Corp 液晶表示装置および液晶表示装置の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH086039A (ja) * 1994-06-24 1996-01-12 Sharp Corp 液晶表示素子の製造方法及び液晶表示素子
JPH0973090A (ja) * 1995-09-04 1997-03-18 Toshiba Corp 液晶表示装置
JP2005208185A (ja) * 2004-01-21 2005-08-04 Sony Corp 液晶表示装置および液晶表示装置の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20220009202A1 (en) * 2019-04-02 2022-01-13 Toppan Printing Co., Ltd. Transparent conductive gas barrier laminate, a method for ufacturing the same, and a device using the transparent conductive gas barrier laminate

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