[go: up one dir, main page]

WO2007059546A3 - Procede pour realiser une cible tubulaire - Google Patents

Procede pour realiser une cible tubulaire Download PDF

Info

Publication number
WO2007059546A3
WO2007059546A3 PCT/AT2006/000476 AT2006000476W WO2007059546A3 WO 2007059546 A3 WO2007059546 A3 WO 2007059546A3 AT 2006000476 W AT2006000476 W AT 2006000476W WO 2007059546 A3 WO2007059546 A3 WO 2007059546A3
Authority
WO
WIPO (PCT)
Prior art keywords
producing
tubular target
target
tubular
joined
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/AT2006/000476
Other languages
German (de)
English (en)
Other versions
WO2007059546A2 (fr
Inventor
Wilhelm Sagemueller
Peter Polcik
Christian Weratschnig
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Metallwerk Plansee GmbH
Original Assignee
Metallwerk Plansee GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metallwerk Plansee GmbH filed Critical Metallwerk Plansee GmbH
Publication of WO2007059546A2 publication Critical patent/WO2007059546A2/fr
Publication of WO2007059546A3 publication Critical patent/WO2007059546A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/342—Hollow targets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3491—Manufacturing of targets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

L'invention concerne un procédé pour réaliser une cible tubulaire comportant un tube en matière cible et un tube support, ces tubes étant reliés par formage sous haute pression interne.
PCT/AT2006/000476 2005-11-23 2006-11-21 Procede pour realiser une cible tubulaire Ceased WO2007059546A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AT0079705U AT8909U1 (de) 2005-11-23 2005-11-23 Verfahren zur herstellung eines rohrtargets
ATGM797/2005 2005-11-23

Publications (2)

Publication Number Publication Date
WO2007059546A2 WO2007059546A2 (fr) 2007-05-31
WO2007059546A3 true WO2007059546A3 (fr) 2007-11-01

Family

ID=37451363

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/AT2006/000476 Ceased WO2007059546A2 (fr) 2005-11-23 2006-11-21 Procede pour realiser une cible tubulaire

Country Status (3)

Country Link
AT (1) AT8909U1 (fr)
TW (1) TW200721232A (fr)
WO (1) WO2007059546A2 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111926296B (zh) * 2020-07-15 2022-10-04 先导薄膜材料（广东）有限公司 一种旋转靶材绑定方法
CN115488333B (zh) * 2022-09-27 2023-12-29 宁波江丰电子材料股份有限公司 一种钼钛合金管靶及其制备方法与应用
CN115740452B (zh) * 2022-11-09 2024-11-22 有研亿金新材料(山东)有限公司 一种高纯高致密细晶低氧钨靶材的制备方法
CN118577756B (zh) * 2023-12-29 2025-06-10 长沙鑫康新材料有限公司 一种管状旋转合金靶真空熔炼浇铸模具

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0089379A1 (fr) * 1982-03-17 1983-09-28 Kawasaki Jukogyo Kabushiki Kaisha Méthode de fabrication de structures composites tubulaires avec plusieurs couches
JPH01301855A (ja) * 1988-05-30 1989-12-06 Toshiba Corp スパッタリング用ターゲット
JPH069905B2 (ja) * 1986-01-21 1994-02-09 日本発条株式会社 黒鉛と金属からなる複合材
JP2000234167A (ja) * 1999-02-10 2000-08-29 Tokyo Tungsten Co Ltd Ｍｏスパッターリングターゲット材及びその製造方法
WO2006008197A1 (fr) * 2004-07-16 2006-01-26 Bekaert Advanced Coatings Cible de forme cylindrique obtenue par la compression isostatique chaude

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0089379A1 (fr) * 1982-03-17 1983-09-28 Kawasaki Jukogyo Kabushiki Kaisha Méthode de fabrication de structures composites tubulaires avec plusieurs couches
JPH069905B2 (ja) * 1986-01-21 1994-02-09 日本発条株式会社 黒鉛と金属からなる複合材
JPH01301855A (ja) * 1988-05-30 1989-12-06 Toshiba Corp スパッタリング用ターゲット
JP2000234167A (ja) * 1999-02-10 2000-08-29 Tokyo Tungsten Co Ltd Ｍｏスパッターリングターゲット材及びその製造方法
WO2006008197A1 (fr) * 2004-07-16 2006-01-26 Bekaert Advanced Coatings Cible de forme cylindrique obtenue par la compression isostatique chaude

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Week 199409, Derwent World Patents Index; AN 1987-245802, XP002448136 *

Also Published As

Publication number Publication date
AT8909U1 (de) 2007-02-15
WO2007059546A2 (fr) 2007-05-31
TW200721232A (en) 2007-06-01

Similar Documents

Publication Publication Date Title
WO2008043812A3 (fr) ProcÉdÉ de revÊtement d'objets par un film
EP2592084B8 (fr) Procédé de production de dérivés de pyripyropène et intermédiaires pour leur production
EP1740156B8 (fr) Procede de production d'une forme galenique solide protegee contre un usage detourne
WO2007093627A3 (fr) Composition biocide
EG25348A (en) Process for the manufacture of diesel range hydrocarbons.
WO2006106155A3 (fr) Procede de fabrication d'un epoxyde au depart d'une chlorhydrine
WO2006020913A3 (fr) Procede de fabrication d'un element tubulaire
WO2008082613A3 (fr) Conjugués polymère-fraction à activité facteur ix comprenant une liaison dégradable
WO2007109654A3 (fr) Polymorphes de docétaxel et procédés
ZA200807052B (en) Target arrangement
WO2007044829A3 (fr) Preparation de l'aprepitant
WO2007132354A3 (fr) Procédé de préparation de voriconazole, nouvelle forme polymorphe d'un produit intermédiaire de ce composé et utilisations dudit composé
EG25134A (en) Chamber setting with improved expansion joints andbricks for making same.
WO2008137050A3 (fr) Procédé de préparation de la drospirénone et de produits intermédiaires de celle-ci
EP1883528A4 (fr) Procédé et appareil de fabrication de tube de papier de section transversale polygonale et tube de papier fabriqué selon le procédé
WO2008094871A3 (fr) Sélection de lignées cellulaires sécrétant un haut niveau de protéine
TW200833649A (en) Method for the preparation of hydroxyadamantanamine
WO2008006575A3 (fr) Procédé destiné à produire des aklylanilides à partir de dérivés d'halogénobenzènes
WO2007099552A3 (fr) Nouvelle forme cristalline d'atorvastatine hémi-magnésium
WO2008030564A3 (fr) Anticorps aglycosylés et procédés de fabrication et d'utilisation de ces anticorps
WO2007014197A3 (fr) Vecteurs d'expression de levures pour la production du facteur itf
WO2007059546A3 (fr) Procede pour realiser une cible tubulaire
WO2008035360A3 (fr) Nouvelles formes cristallines
WO2009103399A3 (fr) Supports monolithiques et leurs procédés de production
WO2010131921A3 (fr) Procédé de production d'un dérivé d'alkylamine

Legal Events

Date Code Title Description
NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 06804396

Country of ref document: EP

Kind code of ref document: A2