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WO2007059546A3 - Method for producing a tubular target - Google Patents

Method for producing a tubular target Download PDF

Info

Publication number
WO2007059546A3
WO2007059546A3 PCT/AT2006/000476 AT2006000476W WO2007059546A3 WO 2007059546 A3 WO2007059546 A3 WO 2007059546A3 AT 2006000476 W AT2006000476 W AT 2006000476W WO 2007059546 A3 WO2007059546 A3 WO 2007059546A3
Authority
WO
WIPO (PCT)
Prior art keywords
producing
tubular target
target
tubular
joined
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/AT2006/000476
Other languages
German (de)
French (fr)
Other versions
WO2007059546A2 (en
Inventor
Wilhelm Sagemueller
Peter Polcik
Christian Weratschnig
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Metallwerk Plansee GmbH
Original Assignee
Metallwerk Plansee GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metallwerk Plansee GmbH filed Critical Metallwerk Plansee GmbH
Publication of WO2007059546A2 publication Critical patent/WO2007059546A2/en
Publication of WO2007059546A3 publication Critical patent/WO2007059546A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/342—Hollow targets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3491—Manufacturing of targets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

The invention relates to a method for producing a tubular target having a tube made of the target material and a supporting tube, which are joined by internal high-pressure forming.
PCT/AT2006/000476 2005-11-23 2006-11-21 Method for producing a tubular target Ceased WO2007059546A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AT0079705U AT8909U1 (en) 2005-11-23 2005-11-23 METHOD FOR PRODUCING A TUBE TARGET
ATGM797/2005 2005-11-23

Publications (2)

Publication Number Publication Date
WO2007059546A2 WO2007059546A2 (en) 2007-05-31
WO2007059546A3 true WO2007059546A3 (en) 2007-11-01

Family

ID=37451363

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/AT2006/000476 Ceased WO2007059546A2 (en) 2005-11-23 2006-11-21 Method for producing a tubular target

Country Status (3)

Country Link
AT (1) AT8909U1 (en)
TW (1) TW200721232A (en)
WO (1) WO2007059546A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111926296B (en) * 2020-07-15 2022-10-04 先导薄膜材料（广东）有限公司 Rotary target binding method
CN115488333B (en) * 2022-09-27 2023-12-29 宁波江丰电子材料股份有限公司 Molybdenum-titanium alloy tube target and preparation method and application thereof
CN115740452B (en) * 2022-11-09 2024-11-22 有研亿金新材料(山东)有限公司 A method for preparing high-purity, high-density, fine-grained, low-oxygen tungsten target
CN118577756B (en) * 2023-12-29 2025-06-10 长沙鑫康新材料有限公司 Tubular rotary alloy target vacuum smelting casting die

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0089379A1 (en) * 1982-03-17 1983-09-28 Kawasaki Jukogyo Kabushiki Kaisha Method of producing multiple-wall, composite tubular structures
JPH01301855A (en) * 1988-05-30 1989-12-06 Toshiba Corp Sputtering target
JPH069905B2 (en) * 1986-01-21 1994-02-09 日本発条株式会社 Composite material consisting of graphite and metal
JP2000234167A (en) * 1999-02-10 2000-08-29 Tokyo Tungsten Co Ltd Molybdenum sputtering target material and its production
WO2006008197A1 (en) * 2004-07-16 2006-01-26 Bekaert Advanced Coatings Cylindrical target obtained by hot isostatic pressing

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0089379A1 (en) * 1982-03-17 1983-09-28 Kawasaki Jukogyo Kabushiki Kaisha Method of producing multiple-wall, composite tubular structures
JPH069905B2 (en) * 1986-01-21 1994-02-09 日本発条株式会社 Composite material consisting of graphite and metal
JPH01301855A (en) * 1988-05-30 1989-12-06 Toshiba Corp Sputtering target
JP2000234167A (en) * 1999-02-10 2000-08-29 Tokyo Tungsten Co Ltd Molybdenum sputtering target material and its production
WO2006008197A1 (en) * 2004-07-16 2006-01-26 Bekaert Advanced Coatings Cylindrical target obtained by hot isostatic pressing

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Week 199409, Derwent World Patents Index; AN 1987-245802, XP002448136 *

Also Published As

Publication number Publication date
AT8909U1 (en) 2007-02-15
WO2007059546A2 (en) 2007-05-31
TW200721232A (en) 2007-06-01

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