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WO2006125162A3 - Surface and subsurface detection sensor - Google Patents

Surface and subsurface detection sensor Download PDF

Info

Publication number
WO2006125162A3
WO2006125162A3 PCT/US2006/019468 US2006019468W WO2006125162A3 WO 2006125162 A3 WO2006125162 A3 WO 2006125162A3 US 2006019468 W US2006019468 W US 2006019468W WO 2006125162 A3 WO2006125162 A3 WO 2006125162A3
Authority
WO
WIPO (PCT)
Prior art keywords
detection sensor
signal
subsurface detection
subsurface
modulation signal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2006/019468
Other languages
French (fr)
Other versions
WO2006125162A2 (en
Inventor
Araz Yacoubian
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ler Technologies Inc
Original Assignee
Ler Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ler Technologies Inc filed Critical Ler Technologies Inc
Publication of WO2006125162A2 publication Critical patent/WO2006125162A2/en
Publication of WO2006125162A3 publication Critical patent/WO2006125162A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/171—Systems in which incident light is modified in accordance with the properties of the material investigated with calorimetric detection, e.g. with thermal lens detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/1717—Systems in which incident light is modified in accordance with the properties of the material investigated with a modulation of one or more physical properties of the sample during the optical investigation, e.g. electro-reflectance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G01N21/9505—Wafer internal defects, e.g. microcracks
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)

Abstract

A sensor (100) comprises an optical modulator (102) that generates a modulation signal, an interferometer (104) that mixes an acoustic signal evoked by a pulsed laser (110) with the modulation signal to down-convert the acoustic signal to lower frequencies, and a photodetector (124) that detects the down-converted signal.
PCT/US2006/019468 2005-05-18 2006-05-18 Surface and subsurface detection sensor Ceased WO2006125162A2 (en)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
US68229905P 2005-05-18 2005-05-18
US68212705P 2005-05-18 2005-05-18
US68231505P 2005-05-18 2005-05-18
US60/682,299 2005-05-18
US60/682,315 2005-05-18
US60/682,127 2005-05-18
US74808305P 2005-12-06 2005-12-06
US60/748,083 2005-12-06
US74659906P 2006-05-05 2006-05-05
US60/746,599 2006-05-05

Publications (2)

Publication Number Publication Date
WO2006125162A2 WO2006125162A2 (en) 2006-11-23
WO2006125162A3 true WO2006125162A3 (en) 2007-05-10

Family

ID=37432179

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/019468 Ceased WO2006125162A2 (en) 2005-05-18 2006-05-18 Surface and subsurface detection sensor

Country Status (1)

Country Link
WO (1) WO2006125162A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9488620B2 (en) 2011-03-15 2016-11-08 Purdue Research Foundation Weak bond detection
US11359976B2 (en) * 2020-10-23 2022-06-14 Accelovant Technologies Corporation Multipoint surface temperature measurement system and method thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4854710A (en) * 1985-03-01 1989-08-08 Therma-Wave, Inc. Method and apparatus for evaluating surface and subsurface features in a semiconductor
US5191465A (en) * 1990-03-28 1993-03-02 Matsushita Electric Industrial Co., Ltd. Optical apparatus for alignment of reticle and wafer in exposure apparatus
US5491552A (en) * 1993-03-29 1996-02-13 Bruker Medizintechnik Optical interferometer employing mutually coherent light source and an array detector for imaging in strongly scattered media
US20040212807A1 (en) * 2003-04-23 2004-10-28 Hanson Gregory R. Faster processing of multiple spatially-heterodyned direct to digital holograms

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4854710A (en) * 1985-03-01 1989-08-08 Therma-Wave, Inc. Method and apparatus for evaluating surface and subsurface features in a semiconductor
US5191465A (en) * 1990-03-28 1993-03-02 Matsushita Electric Industrial Co., Ltd. Optical apparatus for alignment of reticle and wafer in exposure apparatus
US5491552A (en) * 1993-03-29 1996-02-13 Bruker Medizintechnik Optical interferometer employing mutually coherent light source and an array detector for imaging in strongly scattered media
US20040212807A1 (en) * 2003-04-23 2004-10-28 Hanson Gregory R. Faster processing of multiple spatially-heterodyned direct to digital holograms

Also Published As

Publication number Publication date
WO2006125162A2 (en) 2006-11-23

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