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WO2006008421A3 - Traitement d'effluents gazeux par plasma a pression atmospherique - Google Patents

Traitement d'effluents gazeux par plasma a pression atmospherique Download PDF

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Publication number
WO2006008421A3
WO2006008421A3 PCT/FR2005/050555 FR2005050555W WO2006008421A3 WO 2006008421 A3 WO2006008421 A3 WO 2006008421A3 FR 2005050555 W FR2005050555 W FR 2005050555W WO 2006008421 A3 WO2006008421 A3 WO 2006008421A3
Authority
WO
WIPO (PCT)
Prior art keywords
gas
atmospheric
gas mixture
plasma treatment
pressure plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/FR2005/050555
Other languages
English (en)
Other versions
WO2006008421A2 (fr
Inventor
Yassine Kabouzi
Michel Moisan
Jean-Christophe Rostaing
Daniel Guerin
Herve Dulphy
Pascal Moine
Valere Laurent
Bruno Depert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA a Directoire et Conseil de Surveillance pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR0451527A external-priority patent/FR2873045B1/fr
Priority claimed from FR0552063A external-priority patent/FR2888130A1/fr
Application filed by Air Liquide SA, LAir Liquide SA a Directoire et Conseil de Surveillance pour lEtude et lExploitation des Procedes Georges Claude filed Critical Air Liquide SA
Priority to US11/571,652 priority Critical patent/US20080234530A1/en
Priority to EP05789918A priority patent/EP1768776A2/fr
Priority to JP2007520867A priority patent/JP2008506516A/ja
Publication of WO2006008421A2 publication Critical patent/WO2006008421A2/fr
Anticipated expiration legal-status Critical
Publication of WO2006008421A3 publication Critical patent/WO2006008421A3/fr
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/126—Microwaves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/206—Organic halogen compounds
    • B01D2257/2066—Fluorine
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0869—Feeding or evacuating the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0875—Gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0881—Two or more materials
    • B01J2219/089—Liquid-solid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treating Waste Gases (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

Procédé de transformation d'un gaz ou mélange de gaz et notamment d'effl uent gazeux fluorés, dans lequel au moins une liaison entre deux atomes d'au moins une molécule dudit gaz ou mélange de gazeux est rompue sous l'action d'un champ électrique et/ou magnétique auquel est soumis ledit gaz ou mélange de gaz. Le flux de gaz ou mélange de gaz est injecté à travers le champ électrique et/ou magnétique de manière non rectiligne afin d'augmenter la longueur parcourue par les molécules de gaz au travers dudit champ et ainsi augmenter l'efficacité de transformation des molécules de gaz ou mélange de gaz.
PCT/FR2005/050555 2004-07-13 2005-07-08 Traitement d'effluents gazeux par plasma a pression atmospherique Ceased WO2006008421A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US11/571,652 US20080234530A1 (en) 2004-07-13 2005-07-08 Atmospheric Pressure Plasma Treatment of Gaseous Effluents
EP05789918A EP1768776A2 (fr) 2004-07-13 2005-07-08 Traitement d'effluents gazeux par plasma a pression atmospherique
JP2007520867A JP2008506516A (ja) 2004-07-13 2005-07-08 ガス排出物の大気圧プラズマ処理

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
FR0451527A FR2873045B1 (fr) 2004-07-13 2004-07-13 Traitement d'effluents gazeux par plasma a pression atmospherique
FR0451527 2004-07-13
FR0552063 2005-07-06
FR0552063A FR2888130A1 (fr) 2005-07-06 2005-07-06 Traitement d'effluents gazeux par plasma a pression atmospherique

Publications (2)

Publication Number Publication Date
WO2006008421A2 WO2006008421A2 (fr) 2006-01-26
WO2006008421A3 true WO2006008421A3 (fr) 2007-04-05

Family

ID=35473990

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR2005/050555 Ceased WO2006008421A2 (fr) 2004-07-13 2005-07-08 Traitement d'effluents gazeux par plasma a pression atmospherique

Country Status (4)

Country Link
US (1) US20080234530A1 (fr)
EP (1) EP1768776A2 (fr)
JP (1) JP2008506516A (fr)
WO (1) WO2006008421A2 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2888130A1 (fr) * 2005-07-06 2007-01-12 Air Liquide Electronics Sys Traitement d'effluents gazeux par plasma a pression atmospherique
EP2131633A1 (fr) * 2008-05-28 2009-12-09 L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude Procédé de refroidissement d'un plasma micro-onde et système de destruction sélective de molécules chimiques utilisant ce procédé
FR2932058A1 (fr) * 2008-05-28 2009-12-04 Air Liquide Procede de demarrage d'un plasma micro-onde et systeme de destruction selective de molecules chimiques utilisant ce procede
DE102009011530A1 (de) 2009-03-03 2010-09-09 Sortech Ag Verfahren zur Ausbildung einer Alumosilikat-Zeolith-Schicht auf einem metallischen Substrat, das beschichtete Substrat sowie dessen Verwendung
DE102015122301B4 (de) 2015-12-18 2020-08-13 Fahrenheit Gmbh Verfahren zur Ausbildung einer Alumosilikat-Zeolith-Schicht auf einem aluminiumhaltigen metallischen Substrat sowie Verwendung des danach erhaltenen Substrats
GB201722035D0 (en) 2017-12-28 2018-02-14 Arcs Energy Ltd Fluid traetment apparatus for an exhaust system and method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5349154A (en) * 1991-10-16 1994-09-20 Rockwell International Corporation Diamond growth by microwave generated plasma flame
US5965786A (en) * 1996-07-26 1999-10-12 L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Process and apparatus for the treatment of perfluorinated and hydrofluorocarbon gases for the purpose of destroying them
WO2004041425A1 (fr) * 2002-11-05 2004-05-21 Hydro-Quebec Reacteur a chauffage electrique pour le reformage en phase gazeuse

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DE1290712B (de) * 1966-01-15 1969-03-13 Hoechst Ag Gegen den Abbau durch Licht und Waerme stabilisierte Formmassen
US3619403A (en) * 1970-06-30 1971-11-09 Lfe Corp Gas reaction apparatus
US3620008A (en) * 1970-07-23 1971-11-16 Robert M Newbold Apparatus for removing air pollutants from the exhaust stream of a combustion process
US3707644A (en) * 1971-02-19 1972-12-26 Northern Natural Gas Co Apparatus for heating gases to high temperatures
US3946180A (en) * 1974-04-22 1976-03-23 I-T-E Imperial Corporation Downstream injection nozzle for puffer circuit interrupter
JPH0763033B2 (ja) * 1984-06-27 1995-07-05 吉明 荒田 大出力プラズマジェット発生装置
US4883570A (en) * 1987-06-08 1989-11-28 Research-Cottrell, Inc. Apparatus and method for enhanced chemical processing in high pressure and atmospheric plasmas produced by high frequency electromagnetic waves
US5026484A (en) * 1987-07-28 1991-06-25 Juvan Christian H A Continuous flow method for processing liquids using high-energy discharge
US5349143A (en) * 1993-01-19 1994-09-20 Lucerne Products, Inc. Reversible electrical switch
US5951771A (en) * 1996-09-30 1999-09-14 Celestech, Inc. Plasma jet system
FR2757082B1 (fr) * 1996-12-13 1999-01-15 Air Liquide Procede d'epuration d'un gaz plasmagene et installation pour la mise en oeuvre d'un tel procede
US6322756B1 (en) * 1996-12-31 2001-11-27 Advanced Technology And Materials, Inc. Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
JP2000133494A (ja) * 1998-10-23 2000-05-12 Mitsubishi Heavy Ind Ltd マイクロ波プラズマ発生装置及び方法
EP1093847A1 (fr) * 1999-04-12 2001-04-25 Mitsubishi Heavy Industries, Ltd. Dispositif de decomposition de composes halogenes organiques et procede de gestion de fonctionnement afferent, et procede de decomposition de composes halogenes organiques
JP2001232180A (ja) * 2000-02-25 2001-08-28 Toshiba Corp 高周波プラズマによる化合物分解装置、化合物分解方法及び化合物分解システム
WO2001093315A2 (fr) * 2000-05-25 2001-12-06 Jewett Russell F Procedes et appareillages de traitement par plasma
FR2825295B1 (fr) * 2001-05-31 2004-05-28 Air Liquide Application des plasmas denses crees a pression atmospherique au traitement d'effluents gazeux
US6620394B2 (en) * 2001-06-15 2003-09-16 Han Sup Uhm Emission control for perfluorocompound gases by microwave plasma torch
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JP4196371B2 (ja) * 2002-08-20 2008-12-17 キヤノンアネルバ株式会社 ハロゲンガスの製造方法、ハロゲンガスの製造装置及びハロゲンガスの回収・循環システム
US20080110744A1 (en) * 2004-06-30 2008-05-15 Jean-Marc Girard Method for the Preparation of a Gas or Mixture of Gases Containing Molecular Fluorine

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5349154A (en) * 1991-10-16 1994-09-20 Rockwell International Corporation Diamond growth by microwave generated plasma flame
US5965786A (en) * 1996-07-26 1999-10-12 L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Process and apparatus for the treatment of perfluorinated and hydrofluorocarbon gases for the purpose of destroying them
WO2004041425A1 (fr) * 2002-11-05 2004-05-21 Hydro-Quebec Reacteur a chauffage electrique pour le reformage en phase gazeuse

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1768776A2 *

Also Published As

Publication number Publication date
EP1768776A2 (fr) 2007-04-04
JP2008506516A (ja) 2008-03-06
US20080234530A1 (en) 2008-09-25
WO2006008421A2 (fr) 2006-01-26

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