WO2003025537A1 - Optical system misalignment estimating device, optical system misalignment adjusting device, optical system misalignment estimating method, and optical system misalignment correcting method - Google Patents
Optical system misalignment estimating device, optical system misalignment adjusting device, optical system misalignment estimating method, and optical system misalignment correcting method Download PDFInfo
- Publication number
- WO2003025537A1 WO2003025537A1 PCT/JP2002/000284 JP0200284W WO03025537A1 WO 2003025537 A1 WO2003025537 A1 WO 2003025537A1 JP 0200284 W JP0200284 W JP 0200284W WO 03025537 A1 WO03025537 A1 WO 03025537A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical system
- system misalignment
- estimating
- polynomial
- misalignment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/30—Testing of optical devices, constituted by fibre optics or optical waveguides
- G01M11/31—Testing of optical devices, constituted by fibre optics or optical waveguides with a light emitter and a light receiver being disposed at the same side of a fibre or waveguide end-face, e.g. reflectometers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/005—Testing of reflective surfaces, e.g. mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B23/00—Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices
- G02B23/16—Housings; Caps; Mountings; Supports, e.g. with counterweight
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/003—Alignment of optical elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Optics & Photonics (AREA)
- Astronomy & Astrophysics (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Optical Couplings Of Light Guides (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP02715783A EP1429132A1 (en) | 2001-09-18 | 2002-01-17 | Optical system misalignment estimating device, optical system misalignment adjusting device, optical system misalignment estimating method, and optical system misalignment correcting method |
| US10/415,936 US7098433B2 (en) | 2001-09-18 | 2002-01-17 | Apparatus and method for estimating and adjusting deviations in an optical system based on wavefront aberrations ascribable to misalignment |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001283674A JP4140684B2 (ja) | 2000-11-28 | 2001-09-18 | 光学系ズレ推定装置、光学系ズレ調整装置、光学系ズレ推定方法、及び光学系ズレ調整方法 |
| JP2001-283674 | 2001-09-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2003025537A1 true WO2003025537A1 (en) | 2003-03-27 |
Family
ID=19107128
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2002/000284 Ceased WO2003025537A1 (en) | 2001-09-18 | 2002-01-17 | Optical system misalignment estimating device, optical system misalignment adjusting device, optical system misalignment estimating method, and optical system misalignment correcting method |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US7098433B2 (ja) |
| EP (1) | EP1429132A1 (ja) |
| WO (1) | WO2003025537A1 (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1505364A3 (en) * | 2003-08-05 | 2006-07-26 | Agilent Technologies, Inc. | Apparatus and method for parallel interferometric measurement using an expanded local oscillator signal |
| CN114185144A (zh) * | 2021-12-08 | 2022-03-15 | 中国科学院国家天文台 | 一种基于小口径平面镜装调大口径光学系统的装调方法 |
| CN114706222A (zh) * | 2022-03-31 | 2022-07-05 | 青岛虚拟现实研究院有限公司 | Vr设备镜头的光学装配方法 |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003289474A (ja) * | 2002-03-27 | 2003-10-10 | Canon Inc | 画像処理装置、撮像装置、画像処理方法、プログラム、及びコンピュータ読み取り可能な記憶媒体 |
| DE10224363A1 (de) * | 2002-05-24 | 2003-12-04 | Zeiss Carl Smt Ag | Verfahren zur Bestimmung von Wellenfrontaberrationen |
| DE10327019A1 (de) * | 2003-06-12 | 2004-12-30 | Carl Zeiss Sms Gmbh | Verfahren zur Bestimmung der Abbildungsgüte eines optischen Abbildungssystems |
| WO2005024488A1 (en) * | 2003-09-11 | 2005-03-17 | Koninklijke Philips Electronics, N.V. | Adjustment of optical components in optical devices |
| JP4880513B2 (ja) * | 2007-03-29 | 2012-02-22 | 富士フイルム株式会社 | 非球面レンズの面ずれ測定方法および装置 |
| RU2381474C2 (ru) * | 2008-04-17 | 2010-02-10 | Физический институт им. П.Н. Лебедева Российской академии наук | Способ калибровки оптической системы |
| DE102009043744A1 (de) * | 2009-09-30 | 2011-03-31 | Carl Zeiss Microlmaging Gmbh | Verfahren und Mikroskop zur dreidimensional auflösungsgesteigerten Mikroskopie |
| WO2020097744A1 (es) * | 2018-11-12 | 2020-05-22 | Pontificia Universidad Católica De Chile | Sistema de auto colimación para un telescopio; telescopio reflector newtoniano; y método para colimar un telescopio |
| US11870491B2 (en) * | 2021-01-20 | 2024-01-09 | Fluke Corporation | Method and apparatus for measurement of mode delay in optical fibers |
| CN116125658B (zh) * | 2022-12-26 | 2024-10-18 | 中国科学院光电技术研究所 | 一种光学望远镜低时空频率波前像差刚体校正装置及方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02312304A (ja) * | 1989-05-26 | 1990-12-27 | Mitsubishi Electric Corp | 鏡面形状制御装置およびこれを有する人工衛星搭載用反射鏡 |
| JPH05323213A (ja) * | 1991-12-10 | 1993-12-07 | Hughes Aircraft Co | 簡単な適応性光学システム |
| JPH0886689A (ja) * | 1994-09-16 | 1996-04-02 | Mitsubishi Electric Corp | 波面センサ |
| JPH09281315A (ja) * | 1996-04-18 | 1997-10-31 | Mitsubishi Electric Corp | 反射鏡の鏡面形状制御装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3230536B2 (ja) | 1992-04-17 | 2001-11-19 | オリンパス光学工業株式会社 | 光学性能測定方法及び装置 |
| JPH08166209A (ja) | 1994-12-14 | 1996-06-25 | Fuji Xerox Co Ltd | 多面鏡評価装置 |
| JP3290349B2 (ja) | 1996-04-15 | 2002-06-10 | 三菱電機株式会社 | 波面変形測定装置及び波面変形測定方法 |
| US6158694A (en) * | 1998-10-13 | 2000-12-12 | Raytheon Company | Spacecraft inertial attitude and rate sensor control system |
-
2002
- 2002-01-17 US US10/415,936 patent/US7098433B2/en not_active Expired - Fee Related
- 2002-01-17 EP EP02715783A patent/EP1429132A1/en not_active Withdrawn
- 2002-01-17 WO PCT/JP2002/000284 patent/WO2003025537A1/ja not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02312304A (ja) * | 1989-05-26 | 1990-12-27 | Mitsubishi Electric Corp | 鏡面形状制御装置およびこれを有する人工衛星搭載用反射鏡 |
| JPH05323213A (ja) * | 1991-12-10 | 1993-12-07 | Hughes Aircraft Co | 簡単な適応性光学システム |
| JPH0886689A (ja) * | 1994-09-16 | 1996-04-02 | Mitsubishi Electric Corp | 波面センサ |
| JPH09281315A (ja) * | 1996-04-18 | 1997-10-31 | Mitsubishi Electric Corp | 反射鏡の鏡面形状制御装置 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1505364A3 (en) * | 2003-08-05 | 2006-07-26 | Agilent Technologies, Inc. | Apparatus and method for parallel interferometric measurement using an expanded local oscillator signal |
| CN114185144A (zh) * | 2021-12-08 | 2022-03-15 | 中国科学院国家天文台 | 一种基于小口径平面镜装调大口径光学系统的装调方法 |
| CN114185144B (zh) * | 2021-12-08 | 2023-08-15 | 中国科学院国家天文台 | 一种基于小口径平面镜装调大口径光学系统的装调方法 |
| CN114706222A (zh) * | 2022-03-31 | 2022-07-05 | 青岛虚拟现实研究院有限公司 | Vr设备镜头的光学装配方法 |
| CN114706222B (zh) * | 2022-03-31 | 2023-09-01 | 青岛虚拟现实研究院有限公司 | Vr设备镜头的光学装配方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20040027566A1 (en) | 2004-02-12 |
| EP1429132A1 (en) | 2004-06-16 |
| US7098433B2 (en) | 2006-08-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2003025537A1 (en) | Optical system misalignment estimating device, optical system misalignment adjusting device, optical system misalignment estimating method, and optical system misalignment correcting method | |
| WO2003060568A3 (en) | Optimization of ablation correction of an optical system and associated methods | |
| SG155035A1 (en) | Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system | |
| WO2001047449A8 (en) | Myopia progression retardation by optical defect correction | |
| AU2001246268A1 (en) | Method and device for calculating value at risk | |
| WO2002079959A3 (en) | Method and apparatus for determining throttle settings | |
| WO2001002895A8 (en) | System, apparatus, and method for correcting vision using an electro-active lens | |
| AU2227399A (en) | Method and apparatus to correct refractive errors using adjustable corneal arcuate segments | |
| AU2002311740A1 (en) | Method and device for measuring blood sugar level | |
| WO2006069040A3 (en) | Method and apparatus for adjusting relative disposition of projection optics based on operating conditions | |
| AU2003216997A1 (en) | Dynamic artefact comparison | |
| AU3920700A (en) | System, device and method for estimating evapo-transpiration in plants | |
| WO2008008591A3 (en) | Method and apparatus for determining print image quality | |
| SG90774A1 (en) | Strain correcting method for plane member and apparatus thereof | |
| AU2002232646A1 (en) | System and method for internet based performance measurement | |
| AU1434001A (en) | Method and apparatus for accurate temperature and pressure measurement | |
| CA2477810A1 (en) | Improvements in or relating to infra red camera calibration | |
| EP0794465A3 (en) | Photolithographic method of producing a semiconductor device, using an alignment correction method | |
| WO2003049793A3 (de) | Verfahren zur steuerung des differenzdrucks in einem cpap-gerät sowie cpap-gerät | |
| AU2001264364A1 (en) | The system and method for determining prescription of exercise program through ameasurment of physical fitness on network | |
| WO2001052715A3 (en) | Method and system for measuring heart rate variability | |
| WO2002035177A3 (en) | Dynamic angle measuring interferometer | |
| WO2003085456A3 (de) | Verfahren und vorrichtung zum abbilden einer maske auf einem substrat | |
| AU3193900A (en) | Exposure system and aberration measurement method for its projection optical system, and production method for device | |
| DK0921901T3 (da) | Fremgangsmåde og apparat til forbelastning af en glidesko til en tidligt skærende betonsav |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AK | Designated states |
Kind code of ref document: A1 |
|
| AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB IE IT LU MC NL PT SE TR |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 10415936 Country of ref document: US |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2002715783 Country of ref document: EP |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
| WWP | Wipo information: published in national office |
Ref document number: 2002715783 Country of ref document: EP |