WO2002036850A3 - Method and device for coating hollow bodies - Google Patents
Method and device for coating hollow bodies Download PDFInfo
- Publication number
- WO2002036850A3 WO2002036850A3 PCT/EP2001/012689 EP0112689W WO0236850A3 WO 2002036850 A3 WO2002036850 A3 WO 2002036850A3 EP 0112689 W EP0112689 W EP 0112689W WO 0236850 A3 WO0236850 A3 WO 0236850A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- hollow body
- plasma
- hollow bodies
- vacuum chamber
- coating hollow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/123—Treatment by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Abstract
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AU2002216000A AU2002216000A1 (en) | 2000-11-03 | 2001-11-02 | Method and device for coating hollow bodies |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2000154653 DE10054653A1 (en) | 2000-11-03 | 2000-11-03 | Method and device for coating hollow bodies |
| DE10054653.6 | 2000-11-03 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2002036850A2 WO2002036850A2 (en) | 2002-05-10 |
| WO2002036850A3 true WO2002036850A3 (en) | 2002-07-18 |
Family
ID=7662108
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2001/012689 Ceased WO2002036850A2 (en) | 2000-11-03 | 2001-11-02 | Method and device for coating hollow bodies |
Country Status (3)
| Country | Link |
|---|---|
| AU (1) | AU2002216000A1 (en) |
| DE (1) | DE10054653A1 (en) |
| WO (1) | WO2002036850A2 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2003237678A1 (en) * | 2002-05-24 | 2003-12-12 | Schott Ag | Device and method for treating workpieces |
| DE10253513B4 (en) * | 2002-11-16 | 2005-12-15 | Schott Ag | Multi-station coating device and process for plasma coating |
| DE10224546A1 (en) * | 2002-05-24 | 2003-12-04 | Sig Technology Ltd | Method and device for the plasma treatment of workpieces |
| DE102004045046B4 (en) * | 2004-09-15 | 2007-01-04 | Schott Ag | Method and device for applying an electrically conductive transparent coating to a substrate |
| DE102005040266A1 (en) | 2005-08-24 | 2007-03-01 | Schott Ag | Method and device for inside plasma treatment of hollow bodies |
| DE102011104730A1 (en) * | 2011-06-16 | 2012-12-20 | Khs Corpoplast Gmbh | Method for plasma treatment of workpieces and workpiece with gas barrier layer |
| DE102012201955A1 (en) * | 2012-02-09 | 2013-08-14 | Krones Ag | Power lance and plasma-enhanced coating with high-frequency coupling |
| DE102018114776A1 (en) * | 2018-06-20 | 2019-12-24 | Khs Corpoplast Gmbh | Device for coating containers with a barrier layer and method for heating a container |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63241177A (en) * | 1987-03-27 | 1988-10-06 | Canon Inc | Microwave plasma CVD equipment |
| US5223308A (en) * | 1991-10-18 | 1993-06-29 | Energy Conversion Devices, Inc. | Low temperature plasma enhanced CVD process within tubular members |
| US5308649A (en) * | 1992-06-26 | 1994-05-03 | Polar Materials, Inc. | Methods for externally treating a container with application of internal bias gas |
| US5368888A (en) * | 1991-11-04 | 1994-11-29 | General Electric Company | Apparatus and method for gas phase coating of hollow articles |
| EP0773167A1 (en) * | 1994-08-11 | 1997-05-14 | Kirin Beer Kabushiki Kaisha | Carbon film-coated plastic container manufacturing apparatus and method |
| WO1997044503A1 (en) * | 1996-05-22 | 1997-11-27 | Tetra Laval Holdings & Finance S.A. | Method and apparatus for treating inside surfaces of containers |
| FR2783667A1 (en) * | 1998-03-27 | 2000-03-24 | Sidel Sa | APPARATUS FOR MANUFACTURING A BARRIER CONTAINER |
| WO2001031680A1 (en) * | 1999-10-25 | 2001-05-03 | Sidel Actis Services | Vacuum circuit for a device for treating a receptacle with low pressure plasma |
-
2000
- 2000-11-03 DE DE2000154653 patent/DE10054653A1/en not_active Withdrawn
-
2001
- 2001-11-02 AU AU2002216000A patent/AU2002216000A1/en not_active Abandoned
- 2001-11-02 WO PCT/EP2001/012689 patent/WO2002036850A2/en not_active Ceased
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63241177A (en) * | 1987-03-27 | 1988-10-06 | Canon Inc | Microwave plasma CVD equipment |
| US5223308A (en) * | 1991-10-18 | 1993-06-29 | Energy Conversion Devices, Inc. | Low temperature plasma enhanced CVD process within tubular members |
| US5368888A (en) * | 1991-11-04 | 1994-11-29 | General Electric Company | Apparatus and method for gas phase coating of hollow articles |
| US5308649A (en) * | 1992-06-26 | 1994-05-03 | Polar Materials, Inc. | Methods for externally treating a container with application of internal bias gas |
| EP0773167A1 (en) * | 1994-08-11 | 1997-05-14 | Kirin Beer Kabushiki Kaisha | Carbon film-coated plastic container manufacturing apparatus and method |
| WO1997044503A1 (en) * | 1996-05-22 | 1997-11-27 | Tetra Laval Holdings & Finance S.A. | Method and apparatus for treating inside surfaces of containers |
| FR2783667A1 (en) * | 1998-03-27 | 2000-03-24 | Sidel Sa | APPARATUS FOR MANUFACTURING A BARRIER CONTAINER |
| WO2001031680A1 (en) * | 1999-10-25 | 2001-05-03 | Sidel Actis Services | Vacuum circuit for a device for treating a receptacle with low pressure plasma |
Non-Patent Citations (1)
| Title |
|---|
| PATENT ABSTRACTS OF JAPAN vol. 013, no. 042 (C - 564) 30 January 1989 (1989-01-30) * |
Also Published As
| Publication number | Publication date |
|---|---|
| DE10054653A1 (en) | 2002-05-08 |
| AU2002216000A1 (en) | 2002-05-15 |
| WO2002036850A2 (en) | 2002-05-10 |
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