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WO2002036850A3 - Verfahren und vorrichtung zum beschichten von hohlkörpern - Google Patents

Verfahren und vorrichtung zum beschichten von hohlkörpern Download PDF

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Publication number
WO2002036850A3
WO2002036850A3 PCT/EP2001/012689 EP0112689W WO0236850A3 WO 2002036850 A3 WO2002036850 A3 WO 2002036850A3 EP 0112689 W EP0112689 W EP 0112689W WO 0236850 A3 WO0236850 A3 WO 0236850A3
Authority
WO
WIPO (PCT)
Prior art keywords
hollow body
plasma
hollow bodies
vacuum chamber
coating hollow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2001/012689
Other languages
English (en)
French (fr)
Other versions
WO2002036850A2 (de
Inventor
Rainer Dahlmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rheinisch Westlische Technische Hochschuke RWTH
Original Assignee
Rheinisch Westlische Technische Hochschuke RWTH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rheinisch Westlische Technische Hochschuke RWTH filed Critical Rheinisch Westlische Technische Hochschuke RWTH
Priority to AU2002216000A priority Critical patent/AU2002216000A1/en
Publication of WO2002036850A2 publication Critical patent/WO2002036850A2/de
Publication of WO2002036850A3 publication Critical patent/WO2002036850A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/123—Treatment by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
    • C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

Bei einem Verfahren zum Beschichten von Hohlkörpern (1) mittels der Schichtabscheidung aus einem Plasma, bei dem ein Hohlkörper (1) in einer Vakuumkammer (2) von aussen beschichtet wird, ist vorgesehen, dass elektromagnetische Strahlung durch das Innere des Hohlkörpers eingekoppelt wird und in dem den Hohlkörper (1) umgebenen Aussenraum (4) Gase, Dämpfe oder deren Gemische in die Vakuumkammer (2) eingeleitet werden, die zu einem Plasma angeregt werden können, wobei die Prozessparameter derart eingestellt sind, dass im Innenraum (6) des Hohlkörpers (1) das Zünden eines Plasmas verhindert wird.
PCT/EP2001/012689 2000-11-03 2001-11-02 Verfahren und vorrichtung zum beschichten von hohlkörpern Ceased WO2002036850A2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2002216000A AU2002216000A1 (en) 2000-11-03 2001-11-02 Method and device for coating hollow bodies

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2000154653 DE10054653A1 (de) 2000-11-03 2000-11-03 Verfahren und Vorrichtung zum Beschichten von Hohlkörper
DE10054653.6 2000-11-03

Publications (2)

Publication Number Publication Date
WO2002036850A2 WO2002036850A2 (de) 2002-05-10
WO2002036850A3 true WO2002036850A3 (de) 2002-07-18

Family

ID=7662108

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2001/012689 Ceased WO2002036850A2 (de) 2000-11-03 2001-11-02 Verfahren und vorrichtung zum beschichten von hohlkörpern

Country Status (3)

Country Link
AU (1) AU2002216000A1 (de)
DE (1) DE10054653A1 (de)
WO (1) WO2002036850A2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100469943C (zh) * 2002-05-24 2009-03-18 肖特股份公司 用于工件处理的装置和方法
DE10253513B4 (de) * 2002-11-16 2005-12-15 Schott Ag Mehrplatz-Beschichtungsvorrichtung und Verfahren zur Plasmabeschichtung
DE10224546A1 (de) * 2002-05-24 2003-12-04 Sig Technology Ltd Verfahren und Vorrichtung zur Plasmabehandlung von Werkstücken
DE102004045046B4 (de) * 2004-09-15 2007-01-04 Schott Ag Verfahren und Vorrichtung zum Aufbringen einer elektrisch leitfähigen transparenten Beschichtung auf ein Substrat
DE102005040266A1 (de) 2005-08-24 2007-03-01 Schott Ag Verfahren und Vorrichtung zur innenseitigen Plasmabehandlung von Hohlkörpern
DE102011104730A1 (de) 2011-06-16 2012-12-20 Khs Corpoplast Gmbh Verfahren zur Plasmabehandlung von Werkstücken sowie Werkstück mit Gasbarriereschicht
DE102012201955A1 (de) * 2012-02-09 2013-08-14 Krones Ag Powerlanze und plasmaunterstützte Beschichtung mit Hochfrequenzeinkopplung
DE102018114776A1 (de) * 2018-06-20 2019-12-24 Khs Corpoplast Gmbh Vorrichtung zum Beschichten von Behältern mit einer Barriereschicht und Verfahren zur Heizung eines Behälters

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63241177A (ja) * 1987-03-27 1988-10-06 Canon Inc マイクロ波プラズマｃｖｄ装置
US5223308A (en) * 1991-10-18 1993-06-29 Energy Conversion Devices, Inc. Low temperature plasma enhanced CVD process within tubular members
US5308649A (en) * 1992-06-26 1994-05-03 Polar Materials, Inc. Methods for externally treating a container with application of internal bias gas
US5368888A (en) * 1991-11-04 1994-11-29 General Electric Company Apparatus and method for gas phase coating of hollow articles
EP0773167A1 (de) * 1994-08-11 1997-05-14 Kirin Beer Kabushiki Kaisha Verfahren und vorrichtung zur herstellung eines mit kohlenstoffilm beschichteten kunststoffbehälters
WO1997044503A1 (en) * 1996-05-22 1997-11-27 Tetra Laval Holdings & Finance S.A. Method and apparatus for treating inside surfaces of containers
FR2783667A1 (fr) * 1998-03-27 2000-03-24 Sidel Sa Appareil pour la fabrication d'un recipient en matiere a effet barriere
WO2001031680A1 (fr) * 1999-10-25 2001-05-03 Sidel Actis Services Circuit de vide pour un dispositif de traitement d'un recipient a l'aide d'un plasma a basse pression

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63241177A (ja) * 1987-03-27 1988-10-06 Canon Inc マイクロ波プラズマｃｖｄ装置
US5223308A (en) * 1991-10-18 1993-06-29 Energy Conversion Devices, Inc. Low temperature plasma enhanced CVD process within tubular members
US5368888A (en) * 1991-11-04 1994-11-29 General Electric Company Apparatus and method for gas phase coating of hollow articles
US5308649A (en) * 1992-06-26 1994-05-03 Polar Materials, Inc. Methods for externally treating a container with application of internal bias gas
EP0773167A1 (de) * 1994-08-11 1997-05-14 Kirin Beer Kabushiki Kaisha Verfahren und vorrichtung zur herstellung eines mit kohlenstoffilm beschichteten kunststoffbehälters
WO1997044503A1 (en) * 1996-05-22 1997-11-27 Tetra Laval Holdings & Finance S.A. Method and apparatus for treating inside surfaces of containers
FR2783667A1 (fr) * 1998-03-27 2000-03-24 Sidel Sa Appareil pour la fabrication d'un recipient en matiere a effet barriere
WO2001031680A1 (fr) * 1999-10-25 2001-05-03 Sidel Actis Services Circuit de vide pour un dispositif de traitement d'un recipient a l'aide d'un plasma a basse pression

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 013, no. 042 (C - 564) 30 January 1989 (1989-01-30) *

Also Published As

Publication number Publication date
AU2002216000A1 (en) 2002-05-15
WO2002036850A2 (de) 2002-05-10
DE10054653A1 (de) 2002-05-08

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