WO2002027067A1 - Materiau resistant a la chaleur comprenant un alliage a base de niobium - Google Patents
Materiau resistant a la chaleur comprenant un alliage a base de niobium Download PDFInfo
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- WO2002027067A1 WO2002027067A1 PCT/JP2001/007828 JP0107828W WO0227067A1 WO 2002027067 A1 WO2002027067 A1 WO 2002027067A1 JP 0107828 W JP0107828 W JP 0107828W WO 0227067 A1 WO0227067 A1 WO 0227067A1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
Definitions
- the present invention relates to a heat-resistant material used as a member of a high-temperature combustion device such as a gas turbine or a jet engine, and particularly to a niobium-based alloy in which a film for suppressing high-temperature oxidation is formed on the surface of a niobium-based alloy substrate. 'Regarding heat-resistant materials. Background art
- Ni-based alloys that have higher operating temperature limits than Ni-based alloys that have been frequently used as turbine members have become necessary.
- materials include niobium (Nb) -based heat-resistant materials, such as solid-solution strengthened or precipitation-strengthened Nb alloys and Nb-A1 intermetallic compounds (in the present invention, these are referred to as " Materials are called niobium-based alloys).
- niobium-based alloys Although these niobium-based alloys have high high-temperature strength, they are all easily oxidized in a high-temperature range, for example, at a temperature of 800 ° C or higher, and are used as such in a high-temperature oxidizing atmosphere such as a gas turbine. It is difficult. For this reason, various studies have been made on applying a coating for the purpose of oxidation resistance to the surface of a niobium-based alloy substrate.
- a method of forming a Cr or A1 diffusion layer and a method of ceramic coating have been studied as a heat and oxidation resistant coating of a metal member used in a high-temperature oxidizing atmosphere.
- a method called Thermal Barrier Coating (TBC) is used. It has become mainstream. This is made by laminating a metal bonding layer on the surface of a base material and a heat shielding layer of ceramics on the surface.
- MC is the metal bonding layer r A 1 Y alloy (M is N i, C o, etc.> is ceramics in thermal barrier layer to generate content of Z r 0 2 is often used.
- Japanese Patent Application Laid-Open No. H10-1403333 discloses that an Ir surface coating layer is formed or that an Ir surface coating layer and a Ta An Nb alloy heat-resistant member in which a diffusion preventing layer that forms at least one of R, W, and W is formed is disclosed. Also, Japanese Patent Application Laid-Open No. H10-140347 describes that Ir is vacuum-deposited on the surface of a substrate and A1 ion irradiation is performed at the same time to form a coating layer composed of an Ir_A1 alloy. A method for producing an oxidation-resistant coating layer is disclosed. Disclosure of the invention
- the film intended for oxidation resistance is an alloy film having high adhesion to the base material, and has the same blocking performance of non-metal components such as oxygen and nitrogen as the above-mentioned metal bonding layer. It is desirable.
- the Nb-based alloy which is the object of the present invention is intended to be used at a higher service temperature than the Ni-based alloy, for example, at a temperature exceeding 140 ° C.
- the diffusion of elements between the film and the substrate is inevitable, so that the film deteriorates in a relatively short time and loses its original function in many cases. Therefore, in order to ensure the durability of the oxidation-resistant film, the diffusion should be suppressed as much as possible, and even if there is some diffusion, the film will not deteriorate. It is necessary to have a light covering structure.
- the present invention provides a heat-resistant niobium-based alloy material in which an alloy film that is excellent in blocking performance of non-metal components such as oxygen and nitrogen and that is hardly deteriorated by diffusion is formed on the surface of the niobium-based alloy substrate.
- the purpose is to do.
- a first-layer alloy film composed of Re and at least two other metal elements is formed on the surface of a niobium-based alloy substrate, and the surface is coated with either one of A 1 and Si. It is a heat-resistant niobium-based alloy on which a second-layer alloy film made of at least one other metal element is formed.
- composition of the alloy film of the first layer is substantially the same as the general formula Re e ab M a R b (where M is selected from the group consisting of G r, Ni and A 1 R is one or more elements selected from the group consisting of Nb, M0, W, Hf, Zr and C, and a and b are the atomic ratios of M and R, respectively.)
- composition of the alloy film of the second layer is substantially the general formula Q or e A (wherein Q is at least one element of Cr and Ni) , C is the atomic ratio of A 1), which is the heat-resistant material of the niobium-based alloy according to the above (1).
- the atomic ratio a is 0.01 or more, the atomic ratio b is 0.01 to 0.50, the a + b force is 0.95 or less, and the atomic ratio c is 0.0. It is preferably from 5 to 0.95.
- the niobium-based alloy contains at least one of Mo and W and Cr with Nb as a pace, and optionally contains Si, Hf, Z An alloy containing at least one of r and C, wherein the element M in the alloy film of the first layer contains at least Cr (preferably, the element M is mainly composed of Cr). This includes a small amount of one or more of A 1 and Ni), and the element Q in the alloy film of the second layer is Cr or Cr and N Preferably i.
- the niobium-based alloy may be an intermetallic compound containing Nb and A 1.
- composition of the alloy film of the first layer is substantially the general formula R e!-I-e T d R e
- T is one or more elements of Cr and Si
- R is one or more elements selected from the group consisting of Nb, Mo, W, Hf, Zr and C.
- d, e are those represented by a 1, an atomic ratio of R
- the composition of the alloy film of the second layer is substantially formula X -!! f S i f (wherein , X is one or more elements selected from the group consisting of Mo, W and Nb, and f is the atomic ratio of S i). It is a heat-resistant material.
- the atomic ratio d is 0.10 or more, the atomic ratio e is 0.01 to 0.50, d + e is 0.95 or less, and the atomic ratio f is 0.0. It is preferably between 5 and 0.95.
- the niobium-based alloy contains at least one of Mo and W and Si based on Nb, and further includes Cr, Hi, Z r, an alloy containing at least one of C, wherein the element T in the alloy film of the first layer is preferably Si, and in this case, More preferably, the element X in the alloy film is at least one of M 0 and W.
- FIG. 1 is a schematic diagram for explaining the structure of the oxidation-resistant coating of the heat-resistant material of the present invention
- FIG. 2 shows changes in the skin after exposing the heat-resistant material of the present invention to a high-temperature atmosphere.
- Fig. 3 is a schematic diagram showing the cross section of the film before the high-temperature oxidation test of the comparative test piece in the oxidation resistance evaluation.
- Fig. 3 (a) shows an example of the case of A1 alloy coating.
- b) is the Si alloy coating
- An example in the case of a cover is shown.
- Fig. 4 is a schematic diagram showing the cross section of the film after the high-temperature oxidation test of this comparative test piece.
- Fig. 4 (a) shows the case of A1 alloy coating
- Fig. 4 (b) shows the Si alloy coating.
- An example in the case of is shown.
- the oxidation-resistant coating of the heat-resistant material of the present invention comprises two layers of an alloy coating as shown in FIG. Since the surface of the second upper alloy film 3 is oxidized by oxygen in the atmosphere to form a dense oxide layer, it has a function of blocking non-metallic elements such as oxygen and nitrogen in the atmosphere. Have. At the same time, the alloy film 3 has a self-healing function. That is, since the alloy film 3 contains a metal element that is a source of oxide, if the oxide layer formed on the surface peels off, the metal element is immediately oxidized and the oxide layer is formed on the surface. Is regenerated, and the effect of blocking oxygen, nitrogen and the like in the atmosphere can be maintained. On the other hand, the main purpose of the lower first alloy film 2 is to prevent diffusion of elements between the base material 1 and the second alloy film 3.
- the metal element from which the oxide in the second alloy film 3 is based is A1 or Si. If both are present at the same time, an oxide having a low melting point is generated, so only one of them is added to the alloy film 3.
- the metal element that forms the oxide is A 1 (hereinafter referred to as “A1 alloy coating”) and when it is Si (hereinafter referred to as “Si alloy coating”), the first layer
- A1 alloy coating when it is Si
- the first layer The preferred composition of the alloy film is different between the first and second layers.
- the composition of the second alloy film 3 is substantially the same as that of the general formula 0 C Ca lc (where Q is at least one element of Ni and Cr).
- a 1 is aluminum and c is the atomic ratio of A 1).
- a 1 Q is an element necessary to form a dense oxide layer when oxidized in a high-temperature oxidizing atmosphere.
- Q is a high-temperature stable phase (alloy or intermetallic compound) between it and A 1. ) Is an essential element for ensuring the heat resistance and durability of the second layer coating.
- the composition of the first alloy film 2 in the A1 alloy coating is substantially the general formula R e ab M a R b (where R e is rhenium and M is C r, N i and And one or more elements selected from the group consisting of A1 and R is one or more elements selected from the group consisting of Nb, M0, W, Hf, Zr and C.
- R e is rhenium and M is C r, N i and
- one or more elements selected from the group consisting of A1 and R is one or more elements selected from the group consisting of Nb, M0, W, Hf, Zr and C.
- A, b are the atomic ratios of M and R, respectively.
- Re is an element that plays a major role in preventing diffusion.
- the element M is mainly contained in the first layer coating and the second layer coating (may be partially contained in the base material), and the first layer coating and the second layer coating (and the first layer coating and the base layer). This is effective in reducing the diffusion between materials.
- the element R is mainly contained in the first layer film and the substrate (partially may be contained in the second layer film), and between the first layer film and the substrate (and the first layer film and the first layer film). It is effective in reducing the diffusion between the two layers.
- the alloy film 3 of the second layer in substantially the general formula X! _ F S i f (wherein, X is selected from the group consisting of M 0, W and N b At least one element, f is the atomic ratio of Si) is preferably used.
- Si is an element that forms a dense oxide layer
- X is an element that forms a stable phase at high temperature with Si, ensuring the heat resistance and durability of the second layer coating. Is essential in doing so.
- the first alloy film 2 of the Si alloy coating substantially has the general formula R e or de T d R e (where T is one or more elements of Cr and Si, R is one or more elements selected from the group consisting of Ni, Mo, W, Hf, Zr, and C (Where d and e are the atomic ratios of T and R, respectively)).
- the reason why the first layer alloy film is composed of a ternary or higher composition is not only the element in the second layer film but also the This is because the elements are also contained in the first layer and the film in advance, and the chemical potential in each phase is made equal for each component, thereby preventing diffusion. As a result, decomposition and alteration of the oxidation-resistant coating can be suppressed, and the durability of the coating can be greatly improved.
- the elements M and R in the A1 alloy coating and the elements T and R in the Si alloy coating are each preferably an element which forms a high-temperature stable phase with Re. It is effective in suppressing decomposition and alteration of a single layer film.
- an intermetallic compound phase such as a Re—Cr—Ni system sigma phase, a Re— (Nb, Mo, W) system sigma phase or a chi phase is preferable. Since these phases have a high melting point, they can prevent the first-layer film from decomposing or diffusing and disappearing. Further, since the diffusion coefficients of other elements are small, they can prevent diffusion. Demonstrate function.
- alloy coating is common to both A1 alloy coating and Si alloy coating unless otherwise specified.
- the alloy films of the first and second layers only need to have substantially the above composition, and may contain unavoidable impurity elements.
- FIG. 2 is a schematic cross-sectional view showing a change in a film after exposing the heat-resistant member of the present invention to a high-temperature atmosphere.
- a dense oxide layer 4a is formed on the surface of the second alloy film 3.
- the oxide layer 4 a mainly A 1 2 0 3 or 8 i O 2, such a Tsuteori, layer thickness smaller without having, the greater ability to block elements.
- the first layer 2 It is a phase that is extremely stable at high temperatures, and has a large effect of suppressing swarf and diffusion.
- the atomic ratio a of the element M in the first alloy film is 0.01 or more.
- the diffusion of element Q from the second-layer coating to the first-layer coating increases.
- the atomic ratio b of the elemental scale is preferably in the range of 0.01 to 0.50. If b is less than 0.01, the purpose of suppressing the diffusion of the element R from the base material to the first layer film cannot be achieved, and if b exceeds 0.50, the first layer film relatively cannot be obtained. This is because the contents of Re and M in the composition are undesirably small. Furthermore, it is preferable that a + b is 0.95 or less.
- the atomic ratio c of the element A 1 in the alloy film of the second layer is 0.05 to 0.95. If it is less than 0.05, the function of forming a dense oxide film will be insufficient.If it exceeds 0.95, the amount of element Q will be relatively small, and a phase stable at high temperatures will be obtained. Is not formed.
- the atomic ratio d of the element T in the first alloy film is preferably 0.1 or more. If it is less than this, diffusion of the element X from the second layer coating to the first layer coating increases.
- the atomic ratio e of the element R is preferably from 0.01 to 0.50. If e is less than 0 or 01, the purpose of suppressing the diffusion of the element R from the base material to the first layer coating cannot be achieved, and if e exceeds 0.50, the relative content in the first layer coating is relatively small. This is because the contents of Re and T are reduced, which is not preferable. Further, d + e is preferably 0.95 or less. Beyond this, the amount of Re Too little, and the diffusion prevention function is insufficient. Further, the atomic ratio f of the element Si in the alloy coating of the second layer is preferably in the range of 0.05 to 0.95. If it is less than 0.05, the function of forming a dense oxide film will be insufficient, and if it exceeds 0.95, the amount of element X will be relatively small, and a phase stable at high temperatures will be obtained. This makes it impossible to form
- the present inventors studied the mechanical properties of a niobium-based alloy, and found that a binary alloy of Nb—M0 or Nb—W or a three-part alloy of Nb—M0—W has improved high-temperature strength and toughness. It was found to be excellent and suitable as a turbine member. Appropriate ranges of the contents of the alloying elements are 1 to 30 at% for M 0 and 1 to 15 at% for W.
- the present inventors have conducted various studies on the oxidation-resistant coating of these binary or ternary alloys, and have found that, in relation to the composition of the niobium-based alloy of the base material, either A1 alloy coating or Si alloy coating is used.
- A1 alloy coating the second layer film should be composed of Cr-A1 alloy and a small amount of Cr should be added to the base material.
- the base material is Nb— (one or more of Mo and W) —Cr alloys
- the first layer alloy film contains Re and Cr
- a more preferred alloy film of the first layer is mainly composed of Re and Cr, and a small amount of one or more of (Ni, A1) and one of (Mo, W, Nb). It contains one or more species.
- the substrate may contain one or more of Si, Hf, Zr, and C as necessary.
- Re in the first layer film is 10 to 60 at% and Cr is 10 to 60 at%.
- a 1 in the second layer coating is preferably 15 to 75 at%.
- the second layer coating is made of Mo, W, and Nb silicide, thereby providing extremely excellent oxidation resistance. It has been found to exhibit the property. That is, in this heat-resistant material, the base material is Nb— (one or more of Mo and W) -Si alloys, and the first layer alloy film is substantially composed of Re and Si ( At least one of Mo, W, and Nb), and the second alloy film is substantially composed of Si and (at least one of Mo, W, and Nb). It is. Among them, it is particularly preferable that the second-layer life metal film is substantially composed of Si and (at least one of Mo and W).
- the substrate may contain one or more of Cr, Hf, Zr, and G as needed.
- Re in the first layer film is 10 to 60 at%
- (Mo + W + Nb) is 10 to 60 at%
- Si is 1 to 50 at%. It is preferably at%.
- (M 0 + W + N b) in the second layer coating is preferably 20 to 60 at%.
- the method of forming the alloy film on the substrate surface is not particularly limited, and may be any of, for example, a PVD method, a GVD method, a thermal spraying method, an electrolytic coating method, and a combination thereof. May be used. Further, some of the components constituting the alloy film may be added by a thermal diffusion method. In this case, a gradient may occur in the concentration of the component elements in the depth direction, but in the present invention, there may be a concentration gradient applied to the alloy film.
- the thickness of the alloy film of the first layer and the second layer is not particularly limited, but is usually about 1 to 100 m. If the film thickness is too small, the anti-oxidation and diffusion prevention functions will be insufficient, and if the film thickness is too large, the thermal stress will be large. Good. (Evaluation of oxidation resistance characteristics)
- a high temperature oxidation test was performed on a test piece having a two-layer oxidation resistant film formed on the surface of a niobium-based alloy substrate based on the present invention and a comparative test piece having one layer based on the present invention to evaluate the oxidation resistance properties. . This test was performed on both the A1 alloy coated test piece and the Si alloy coated test piece.
- the ingot is subjected to a homogenization heat treatment of 1700 to 180 ° C for 24 hours in an Ar gas stream of 1 atm, and then a test specimen substrate of 30 x 20 x 2 (thickness) mm was cut out and subjected to a coating treatment.
- test piece (two-layer coating) of the present invention coated with an A1 alloy was prepared by first depositing a 5-meter-thick metal Re on the surface of the base A alloy from a molten chloride bath containing rhenium chloride. Then embedded in an alumina crucible with Hue port chromium powder, it was more diffuse process C r vapor to 1 0 hr held at 1 3 0 0 ° C in a vacuum of 1 X 1 0- 3 P a.
- test piece was taken out from the crucible, again embedded in an alumina crucible together with F e-A 1 alloy powder followed Pull, and 6 hr held at 1 0 0 0 ° C in a vacuum of 1 X 1 0- 3 P a , And A1 vapor diffusion treatment.
- a comparative test piece (single-layer coating) coated with A1 alloy was prepared by subjecting the A alloy base material prepared by the same method as described above to the electrodeposition treatment of metal Vapor diffusion treatment, A 1 A vapor diffusion treatment performed under the same conditions as above Prepared.
- the Re electrodeposition layer was the first layer consisting mainly of the ternary system of Re—Cr—Nb. It changed to film 2. Further, the second layer coating 3 mainly composed of Cr—A 1 is formed by the A 1 vapor diffusion treatment, and the oxide layer 4 a is formed by the oxidation treatment.
- the oxide layer (Al, 0) 4a having a thickness of about 5 m and a thickness of about 5 m in order from the surface.
- a 2 ⁇ m oxide layer (Cr, b) 4 b was formed, followed by a layer of about 8 ⁇ m, consisting mainly of Cr and Nb.
- the Cr-Nb layer had a two-layer structure consisting of the upper G rich layer 5b and the lower N rich layer 5a.
- Table 2 shows the thickness and composition of each layer in this test piece. Table 2 shows the results of the comparative test pieces coated with the A1 alloy.
- a metal Re having a thickness of 5 ⁇ was electrodeposited from a molten chloride bath containing dimethyl chloride on the surface of the base material of the B alloy. Subsequently, after being immersed in a molten metal Si bath in an Ar atmosphere, it was pulled up and subjected to Si plating.
- the Si deposition amount at this time was about 60 g / m 2 (equivalent to a thickness of about 25 m) from the weight change before and after plating.
- test piece of the present invention As a preliminary treatment, a diffusion / oxidation treatment in which heating was performed in a still air at 110 ° C. for 9 hours was performed on the test pieces of the present invention and the comparative test pieces subjected to the coating treatment according to the above steps.
- the test piece of the present invention As a result, in the test piece of the present invention, as shown in FIG. 2, the first layer film 2 and the second layer film 3 were laminated on the surface of the substrate 1, and the oxide layer (S i, O) was formed on the outermost surface. A heat-resistant material on which 4a was formed was obtained. Table 3 shows the thickness and composition of each layer of the coating on this test piece.
- the deposited layer of Re formed on the substrate surface. Due to the infiltration of Si by the hot-dip Si plating and the subsequent diffusion treatment in vacuum, and the diffusion of Nb from the base metal, the Re electrodeposited layer was mainly composed of Re—Si—Nb It was changed to the first layer coating 2 consisting of a ternary system. Further, excess Si dissolved Nb that passed through the Re electrodeposited layer to form a Si—Nb alloy layer, and the second layer film 3 was formed. Moreover, Te cowpea to the oxidation process, S i - only the surface layer of the N b layer is oxidized, an oxide layer consisting of S i 0 2 (S i, 0) 4 a is formed. Table 3 Test pieces of the present invention coated with Si alloy
- Oxide layer Si, Nb, 0
- the A1 alloy-coated test pieces prepared as described above and the comparative test pieces were subjected to a high-temperature oxidation test of isothermal continuous heating in a still air at 110 ° C. to compare oxidation resistance properties.
- the heating time of the test piece of the present invention was 168 hours. Since the appearance of the test specimen for comparison was significantly changed, the time was set to 12 hours. The results are shown in Tables 5 and 6. Table 5 A1 For the test piece of the present invention coated with alloy
- a oxide layer, c also being alumina according to X-ray diffraction
- the alumina is maintained without change in the extreme thickness at the substrate surface
- a 1 concentration of the second layer Indicates that the concentration is equal to or higher than the concentration capable of expressing the alumina forming ability in the Cr—A1 alloy.
- Fig. 4 (a) schematically shows the state of the film after the 12-hour high-temperature oxidation test of the comparative test piece.
- Table 6 shows the change in oxide layer thickness before and after the high-temperature oxidation test.
- the surface oxide layer (Cr, Nb, 0) 4c and the lower oxide layer (Nb, 0) 4d were two layers.
- a oxide layer was S i 0 2 According to the X-ray diffraction. Furthermore, the oxides layer is maintained without change in the extreme thickness at the surface of the member, S i the concentration of the second layer S i - N b or concentration capable of expressing the S i 0 2 forming ability in the alloy It represents that.
- Fig. 4 (b) schematically shows the state of the film after the 8-hour high-temperature oxidation test of the comparative test piece.
- Table 8 shows the change in oxide layer thickness before and after the high-temperature oxidation test.
- the surface oxide layer (Si, Nb, 0) 4b and the lower oxide layer (Nb, 0) 4c were two layers. The thickness of this material reached 120 m, most of which (about lOOim) was a layer 4c consisting of Nb and 0, indicating that the Nb base alloy of the substrate was oxidized. ing.
- a heat-resistant material in which a coating having a large effect of suppressing high-temperature oxidation is formed on a base material surface of a niobium-based alloy.
- This oxidation-resistant coating is a self-repairing process that regenerates oxides by oxidizing A1 or Si in the second layer coating to maintain the function of blocking non-metallic elements such as oxygen and nitrogen in the atmosphere.
- diffusion of elements is suppressed by the first layer film, so that the film hardly deteriorates even if it is kept at a high temperature of 110 to 1200 ° C or more for a long time. Excellent in oxidation resistance and durability.
- this heat-resistant material is suitable as a structural member for a gas turbine blade engine, a rocket engine, and the like.
- these members can be used without cooling, it is possible to contribute to improvement of thermal efficiency and simplification of a device structure.
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Abstract
L'invention concerne un matériau résistant à la chaleur comprenant un alliage à base de niobium. Ce matériau comprend un substrat formé d'un alliage à base de niobium, une première couche de revêtement comprenant du Fe et au moins deux autres éléments métalliques, formée sur la surface du substrat et par dessus la surface de ce premier revêtement, une seconde couche de revêtement comprenant un des éléments Al et Si et au moins un élément métallique autre que ces derniers. Cette combinaison de revêtements assure un haut degré d'interception de l'oxygène et présente une sensibilité réduite à la détérioration résultant de la diffusion d'un élément. L'invention concerne des compositions adéquates pour la première et pour la seconde couche de revêtement, aussi bien pour le cas d'un second revêtement comprenant de l'Al que pour celui d'un second revêtement comprenant du Si, ainsi que des compositions de revêtement préférées convenant pour différentes compositions d'alliage à base de niobium du substrat.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002530827A JP5295474B2 (ja) | 2000-09-28 | 2001-09-10 | ニオブ基合金耐熱部材 |
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| Application Number | Priority Date | Filing Date | Title |
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| JP2000296521 | 2000-09-28 | ||
| JP2000-296521 | 2000-09-28 | ||
| JP2000296522 | 2000-09-28 | ||
| JP2000-296522 | 2000-09-28 |
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| WO2002027067A1 true WO2002027067A1 (fr) | 2002-04-04 |
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| PCT/JP2001/007828 Ceased WO2002027067A1 (fr) | 2000-09-28 | 2001-09-10 | Materiau resistant a la chaleur comprenant un alliage a base de niobium |
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| JP (2) | JP5295474B2 (fr) |
| WO (1) | WO2002027067A1 (fr) |
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|---|---|---|---|---|
| JP5854497B2 (ja) * | 2011-07-27 | 2016-02-09 | 国立大学法人北海道大学 | Nb−Si系耐熱合金 |
| CN106488993B (zh) * | 2015-05-25 | 2019-05-03 | 三菱日立电力系统株式会社 | 硅化铌基复合材料以及使用其的高温部件和高温热机 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1150235A (ja) * | 1997-08-01 | 1999-02-23 | Hitachi Ltd | Nb合金への耐酸化表面コーティング |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4904546A (en) * | 1989-04-03 | 1990-02-27 | General Electric Company | Material system for high temperature jet engine operation |
| US6830827B2 (en) * | 2000-03-07 | 2004-12-14 | Ebara Corporation | Alloy coating, method for forming the same, and member for high temperature apparatuses |
-
2001
- 2001-09-10 WO PCT/JP2001/007828 patent/WO2002027067A1/fr not_active Ceased
- 2001-09-10 JP JP2002530827A patent/JP5295474B2/ja not_active Expired - Fee Related
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- 2012-02-07 JP JP2012023563A patent/JP2012132099A/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1150235A (ja) * | 1997-08-01 | 1999-02-23 | Hitachi Ltd | Nb合金への耐酸化表面コーティング |
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2005068685A1 (ja) * | 2004-01-15 | 2007-09-06 | 株式会社荏原製作所 | 拡散バリヤ用合金皮膜及びその製造方法、並びに高温装置部材 |
| US7851070B2 (en) | 2004-01-15 | 2010-12-14 | National University Corporation Hokkaido University | Diffusion barrier alloy film and high-temperature apparatus member |
| JP4753720B2 (ja) * | 2004-01-15 | 2011-08-24 | 株式会社荏原製作所 | 拡散バリヤ用合金皮膜及びその製造方法、並びに高温装置部材 |
| WO2005068685A1 (fr) * | 2004-01-15 | 2005-07-28 | Ebara Corporation | Revetement en alliage pour barriere de diffusion, procede d'elaboration, et element de dispositif haute temperature |
| US9267184B2 (en) | 2010-02-05 | 2016-02-23 | Ati Properties, Inc. | Systems and methods for processing alloy ingots |
| US11059089B2 (en) | 2010-02-05 | 2021-07-13 | Ati Properties Llc | Systems and methods for processing alloy ingots |
| US11059088B2 (en) | 2010-02-05 | 2021-07-13 | Ati Properties Llc | Systems and methods for processing alloy ingots |
| US9533346B2 (en) | 2010-02-05 | 2017-01-03 | Ati Properties Llc | Systems and methods for forming and processing alloy ingots |
| US9327342B2 (en) | 2010-06-14 | 2016-05-03 | Ati Properties, Inc. | Lubrication processes for enhanced forgeability |
| US10207312B2 (en) | 2010-06-14 | 2019-02-19 | Ati Properties Llc | Lubrication processes for enhanced forgeability |
| US9242291B2 (en) | 2011-01-17 | 2016-01-26 | Ati Properties, Inc. | Hot workability of metal alloys via surface coating |
| CN103732771B (zh) * | 2011-01-17 | 2016-01-20 | Ati资产公司 | 通过表面涂层改善金属合金的热加工性 |
| CN103732771A (zh) * | 2011-01-17 | 2014-04-16 | Ati资产公司 | 通过表面涂层改善金属合金的热加工性 |
| US9539636B2 (en) | 2013-03-15 | 2017-01-10 | Ati Properties Llc | Articles, systems, and methods for forging alloys |
| US9027374B2 (en) | 2013-03-15 | 2015-05-12 | Ati Properties, Inc. | Methods to improve hot workability of metal alloys |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5295474B2 (ja) | 2013-09-18 |
| JPWO2002027067A1 (ja) | 2004-02-05 |
| JP2012132099A (ja) | 2012-07-12 |
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