WO2002046490A3 - Coated substrate having a low emissivity - Google Patents
Coated substrate having a low emissivity Download PDFInfo
- Publication number
- WO2002046490A3 WO2002046490A3 PCT/EP2001/014304 EP0114304W WO0246490A3 WO 2002046490 A3 WO2002046490 A3 WO 2002046490A3 EP 0114304 W EP0114304 W EP 0114304W WO 0246490 A3 WO0246490 A3 WO 0246490A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coated substrate
- low emissivity
- substrate
- substrates
- conductive layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2453—Coating containing SnO2
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/211—SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/216—ZnO
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/24—Doped oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP01986851A EP1341947A2 (en) | 2000-12-06 | 2001-12-06 | Coated substrate, method for reducing the emissivity of substrates, and the use thereof |
| AU2002238412A AU2002238412A1 (en) | 2000-12-06 | 2001-12-06 | Coated substrate having a low emissivity |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10060681 | 2000-12-06 | ||
| DE10060681.4 | 2000-12-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2002046490A2 WO2002046490A2 (en) | 2002-06-13 |
| WO2002046490A3 true WO2002046490A3 (en) | 2003-02-13 |
Family
ID=7666034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2001/014304 Ceased WO2002046490A2 (en) | 2000-12-06 | 2001-12-06 | Coated substrate having a low emissivity |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP1341947A2 (en) |
| AU (1) | AU2002238412A1 (en) |
| WO (1) | WO2002046490A2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004003760B4 (en) * | 2004-01-23 | 2014-05-22 | Forschungszentrum Jülich GmbH | A process for producing a conductive and transparent zinc oxide layer and use thereof in a thin film solar cell |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4769291A (en) * | 1987-02-02 | 1988-09-06 | The Boc Group, Inc. | Transparent coatings by reactive sputtering |
| US4835061A (en) * | 1984-11-09 | 1989-05-30 | Konishiroku Photo Industry Co., Ltd. | Conductive laminate |
| EP0814351A2 (en) * | 1996-06-21 | 1997-12-29 | Semco Glasbeschichtung GmbH | Thermally insulating antireflection coating and manufacturing method |
| WO1998018374A1 (en) * | 1996-10-28 | 1998-05-07 | Gunder Karlsson | Insulating bottle |
| US5976683A (en) * | 1996-10-24 | 1999-11-02 | Leybold Systems Gmbh | Coating system transparent to light and reflecting thermal radiation |
-
2001
- 2001-12-06 AU AU2002238412A patent/AU2002238412A1/en not_active Abandoned
- 2001-12-06 WO PCT/EP2001/014304 patent/WO2002046490A2/en not_active Ceased
- 2001-12-06 EP EP01986851A patent/EP1341947A2/en not_active Withdrawn
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4835061A (en) * | 1984-11-09 | 1989-05-30 | Konishiroku Photo Industry Co., Ltd. | Conductive laminate |
| US4769291A (en) * | 1987-02-02 | 1988-09-06 | The Boc Group, Inc. | Transparent coatings by reactive sputtering |
| EP0814351A2 (en) * | 1996-06-21 | 1997-12-29 | Semco Glasbeschichtung GmbH | Thermally insulating antireflection coating and manufacturing method |
| US5976683A (en) * | 1996-10-24 | 1999-11-02 | Leybold Systems Gmbh | Coating system transparent to light and reflecting thermal radiation |
| WO1998018374A1 (en) * | 1996-10-28 | 1998-05-07 | Gunder Karlsson | Insulating bottle |
Non-Patent Citations (1)
| Title |
|---|
| SZCZYRBOWSKI J ET AL: "New low emissivity coating based on TwinMagR) sputtered TiO2 and Si3N4 layers", THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 351, no. 1-2, 30 August 1999 (1999-08-30), pages 254 - 259, XP004183104, ISSN: 0040-6090 * |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1341947A2 (en) | 2003-09-10 |
| AU2002238412A1 (en) | 2002-06-18 |
| WO2002046490A2 (en) | 2002-06-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| AU2003222246A1 (en) | Insulating glass (ig) window unit including heat treatable coating with silicon-rich silicon nitride layer | |
| EP1153739A4 (en) | Aerogel substrate and method for preparing the same | |
| CA2466715A1 (en) | Heat treatable coated article with anti-migration barrier between dielectric and solar control layer portion, and methods of making same | |
| WO2007005368A8 (en) | A vision panel having a multi-layer primer | |
| EP1514451B1 (en) | Heatable glazing panel | |
| EP0866037A3 (en) | Multilayered water-repellent film and method of forming same on glass substrate | |
| WO2001082336A3 (en) | Laminate comprising barrier layers on a substrate | |
| WO2004049042A3 (en) | Dielectric waveguide and method of making the same | |
| PL1758829T3 (en) | Method for making a coated article with ion beam treated underlayer | |
| WO2002009478A1 (en) | Luminescent device | |
| WO2005007398A3 (en) | Functionalized security glazing | |
| EP0813246A3 (en) | Semiconductor device comprising two semiconductor substrates | |
| CA2443843A1 (en) | Heat treatable coated articles with anti-migration barrier layer between dielectric and solar control layers, and methods of making same | |
| PL367323A1 (en) | Heat treatable coated articles with metal nitride layer and methods of making same | |
| AU2002361688A8 (en) | Anti-reflection layer system on a glass substrate with high visible transmission and a low e | |
| WO2002036511A3 (en) | Method of depositing dlc inclusive coating system on substrate including step of heating substrate during ion beam deposition of dlc inclusive coating system | |
| AU2002323449A1 (en) | Masking for insulating glass units, monolithic panes, and other substrates | |
| EP0992610A3 (en) | Barrier coating on plastic substrates and process for its deposition | |
| WO2001020088A3 (en) | Metal building insulation assembly | |
| AU5844698A (en) | Semiconductor substrate having compound semiconductor layer, process for its production, and electronic device fabricated on semiconductor substrate | |
| AU3984199A (en) | Gap drying with insulation layer between substrate and heated platen | |
| WO2000008523A3 (en) | Self-adhesive electrochromic electrode and systems containing same | |
| WO2003019649A3 (en) | Strip conductor arrangement and method for producing a strip conductor arrangement | |
| EP0839856A3 (en) | Polyester film for decorative plate or decorative sheet | |
| CA2166166A1 (en) | Insulation assembly and method for applying adhesive thereto |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG US UZ VN YU ZA ZM ZW |
|
| AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
| WWE | Wipo information: entry into national phase |
Ref document number: 2001986851 Country of ref document: EP |
|
| WWP | Wipo information: published in national office |
Ref document number: 2001986851 Country of ref document: EP |
|
| REG | Reference to national code |
Ref country code: DE Ref legal event code: 8642 |
|
| WWW | Wipo information: withdrawn in national office |
Ref document number: 2001986851 Country of ref document: EP |
|
| NENP | Non-entry into the national phase |
Ref country code: JP |
|
| WWW | Wipo information: withdrawn in national office |
Country of ref document: JP |