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WO1995006762B1 - Vapour phase cleaning - Google Patents

Vapour phase cleaning

Info

Publication number
WO1995006762B1
WO1995006762B1 PCT/EP1994/002847 EP9402847W WO9506762B1 WO 1995006762 B1 WO1995006762 B1 WO 1995006762B1 EP 9402847 W EP9402847 W EP 9402847W WO 9506762 B1 WO9506762 B1 WO 9506762B1
Authority
WO
WIPO (PCT)
Prior art keywords
organic solvent
solvent
cleaning chamber
cleaning
maintained
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP1994/002847
Other languages
German (de)
French (fr)
Other versions
WO1995006762A2 (en
WO1995006762A3 (en
Filing date
Publication date
Priority claimed from DE4329178A external-priority patent/DE4329178B4/en
Application filed filed Critical
Priority to US08/605,013 priority Critical patent/US5690751A/en
Publication of WO1995006762A2 publication Critical patent/WO1995006762A2/en
Publication of WO1995006762A3 publication Critical patent/WO1995006762A3/en
Publication of WO1995006762B1 publication Critical patent/WO1995006762B1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Abstract

A process is disclosed to clean one or several objects in the vapour phase of an organic solvent. Solvent vapours are supplied to a cleaning chamber (1) in which an absolute pressure of 200 mbars or less is maintained and cleaning is carried out at a temperature equal to the ignition point of the organic solvent or higher. A preferred apparatus for carrying out the cleaning process has a cleaning chamber (1), two reservoirs (2 and 3), an evaporator (4), a heater (5) and a condenser (6) interconnected by a piping system with a vacuum pump (7), two pumps (8 and 9) and valves (12, 13, 14, 15, 16, 17, 18, 19, 20, 21 and 22). Fresh air (11) may be supplied to the cleaning chamber (1). Waste gas (10) may be evacuated from the apparatus by the vacuum pump (7).

Claims

GEÄNDERTE ANSPRÜCHE[beim Internationalen Büro am 17. März 1995 (17.03.95) eingegangen; ursprüngliche Ansprüche 1-10 durch geänderte Ansprüche 1-10 ersetzt (2 Seiten)] AMENDED CLAIMS [received at the International Bureau on 17 March 1995 (17.03.95); original claims 1-10 replaced by amended claims 1-10 (2 pages)] 1. Verfahren zur Reinigung eines oder mehrerer Gegenstände in der Dampfphase eines organischen Lösungsmittels mit einem Flammpunkt von 40°C bis 100°C, welches die folgenden Schritte enthält:A process for purifying one or more articles in the vapor phase of an organic solvent having a flash point of from 40 ° C to 100 ° C, comprising the steps of: Einspeisen des Lδsungsmitteldampfes in eine 0 Reinigungskammer, worin ein absoluter Druck von 200 mbar oder weniger aufrecht erhalten wird undFeeding the solvent vapor into a cleaning chamber wherein an absolute pressure of 200 mbar or less is maintained and Reinigung bei einer Temperatur beim oder oberhalb des Flammpunktes des organischen t- Lösungsmittels.Purification at a temperature at or above the flash point of the organic t -solvent. 2. Verfahren nach Patentanspruch 1, worin ein absoluter Druck von 125 mbar oder weniger in der Reinigungskammer aufrecht erhalten wird. 0A method according to claim 1, wherein an absolute pressure of 125 mbar or less is maintained in the cleaning chamber. 0 3. Verfahren nach Patentanspruch 1 oder 2, worin das organische Lösungsmittel mehr als 50% eines aliphatischen Kohlenwasserstoffes mit 5 bis 15 Kohlenstoffen, eines aromatischen Kohlenwasserstoffes, c einer sauerstoffhaltigen organischen Verbindung, eines zyklischen Siloxans oder einer Mischung von zwei oder mehr solcher Verbindungen enthält, bezogen auf das Gesamtgewicht des organischen Lösungsmittels.A process according to claim 1 or 2, wherein the organic solvent contains more than 50% of an aliphatic hydrocarbon having 5 to 15 carbons, an aromatic hydrocarbon, c an oxygen-containing organic compound, a cyclic siloxane or a mixture of two or more such compounds, based on the total weight of the organic solvent. 0 4. Verfahren nach einem der Patentansprüche 1 bis 3, worin das organische Lösungsmittel halogenfrei ist.4. The method according to any one of claims 1 to 3, wherein the organic solvent is halogen-free. 5. Verfahren nach einem der Patentansprüche 1 5 bis 4, worin das organische Lösungsmittel ein Alkoxypropanol oder eine Mischung von zwei oder mehr Alkoxypropanolen ist. 5. The method according to any one of claims 1 5 to 4, wherein the organic solvent is an alkoxypropanol or a mixture of two or more alkoxypropanols. 6. Verfahren nach einem der Patentansprüchen 1 bis 5, worin der oder die Gegenstände mit einen flüssigen Lösungsmittel vorgereinigt werden.6. The method according to any one of claims 1 to 5, wherein the or the objects are pre-cleaned with a liquid solvent. 7. Verfahren nach einem der Patentansprüchen 1 bis 6, worin nach der Reinigung in der Dampfphase der oder die Gegenstände in einem Prozess getrocknet werden, worin der Absolutdruck in der Reinigungskammer auf die Hälfte oder weniger des Druckes reduziert wird, der während der Reinigung in der Dampfphase aufrecht erhalten wird.A method according to any one of claims 1 to 6, wherein, after cleaning in the vapor phase, the article (s) are dried in a process wherein the absolute pressure in the cleaning chamber is reduced to one-half or less of the pressure exerted during cleaning in the process Steam phase is maintained. 8. Apparatur zur Durchführung des Verfahrens nach einem der Patentansprüche 1 bis 7, enthaltend eine evakuierbare Reinigungskammer (1), einen evakuierbaren Verdampfer (4), eine Vakuumpumpe (7) und einen oder mehrere evakuierbare Vorratsbehälter (2, 3) für flüssiges Lösungsmittel.8. Apparatus for carrying out the method according to one of the claims 1 to 7, comprising an evacuable cleaning chamber (1), an evacuable evaporator (4), a vacuum pump (7) and one or more evacuable reservoir (2, 3) for liquid solvent. 9. Apparatur nach Patentanspruch 8, enthaltend, zusätzlich einen Kondensator (6).9. Apparatus according to claim 8, comprising, in addition a capacitor (6). 10. Apparatur nach Anspruch 8 oder 9, enthaltend ein organisches Lösungsmittel mit einem Flammpunkt von 40°C bis 100°C.10. Apparatus according to claim 8 or 9, comprising an organic solvent having a flash point of 40 ° C to 100 ° C. GEÄNDEP-TES BLATT (ARTIKEL 19) GEÄNDEP-TES SHEET (ARTICLE 19)
PCT/EP1994/002847 1993-08-30 1994-08-29 Vapour phase cleaning Ceased WO1995006762A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US08/605,013 US5690751A (en) 1993-08-30 1994-08-29 Vapor phase cleaning

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEP4329178.3 1993-08-30
DE4329178A DE4329178B4 (en) 1993-08-30 1993-08-30 Vapor cleaning

Publications (3)

Publication Number Publication Date
WO1995006762A2 WO1995006762A2 (en) 1995-03-09
WO1995006762A3 WO1995006762A3 (en) 1995-04-06
WO1995006762B1 true WO1995006762B1 (en) 1995-04-27

Family

ID=6496368

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP1994/002847 Ceased WO1995006762A2 (en) 1993-08-30 1994-08-29 Vapour phase cleaning

Country Status (3)

Country Link
US (1) US5690751A (en)
DE (1) DE4329178B4 (en)
WO (1) WO1995006762A2 (en)

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DE19609783B4 (en) * 1996-03-13 2005-08-25 Meissner, Werner Method for cleaning objects and apparatus for carrying out the method
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JP3692380B2 (en) * 1998-07-03 2005-09-07 Ａｚエレクトロニックマテリアルズ株式会社 Container cleaning method and apparatus
US6354310B1 (en) 1998-11-12 2002-03-12 General Electric Company Apparatus and process to clean and strip coatings from hardware
ATE242344T1 (en) * 1999-03-24 2003-06-15 Wolf Gmbh METHOD AND SYSTEM FOR SURFACE TREATMENT OF PARTS WITH A SOLVENT
WO2002019390A2 (en) * 2000-08-31 2002-03-07 Chemtrace, Inc. Cleaning of semiconductor process equipment chamber parts using organic solvents
US6938439B2 (en) * 2003-05-22 2005-09-06 Cool Clean Technologies, Inc. System for use of land fills and recyclable materials
US20050129977A1 (en) * 2003-12-12 2005-06-16 General Electric Company Method and apparatus for forming patterned coated films
DE102006039715A1 (en) * 2006-08-24 2008-02-28 Dürr Ecoclean GmbH Cleaning device with a flood chamber
EP2108464A1 (en) 2008-04-09 2009-10-14 Dow Global Technologies Inc. Process for cleaning articles
US8029623B2 (en) * 2008-07-08 2011-10-04 Dow Global Technologies Llc Acid removal in cleaning processes
JP5720674B2 (en) * 2010-03-29 2015-05-20 日立金属株式会社 Initial microcrystalline alloy, nanocrystalline soft magnetic alloy and method for producing the same, and magnetic component comprising nanocrystalline soft magnetic alloy
DE102014109293B4 (en) 2013-07-03 2020-02-20 Thorsten Rapp Device for heating a degreasing and / or cleaning system
DE102015117388A1 (en) 2015-10-13 2017-04-13 EMO Oberflächentechnik GmbH Device and method for deburring components by means of ultrasound
DE102016109861A1 (en) * 2016-05-30 2017-11-30 EMO Oberflächentechnik GmbH Method and device for cleaning industrially manufactured parts
DE102019119423A1 (en) 2019-07-17 2021-01-21 HEMO GmbH Process for recycling asphalt

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US4231804A (en) * 1978-01-17 1980-11-04 Petterson Robert C Vapor stripping method
DE3738006A1 (en) * 1987-11-09 1989-05-18 Wolfgang Speck Process for cleaning contaminated parts and device for carrying out the process
US4838476A (en) * 1987-11-12 1989-06-13 Fluocon Technologies Inc. Vapour phase treatment process and apparatus
US5051135A (en) * 1989-01-30 1991-09-24 Kabushiki Kaisha Tiyoda Seisakusho Cleaning method using a solvent while preventing discharge of solvent vapors to the environment
JP2721704B2 (en) * 1989-06-26 1998-03-04 株式会社千代田製作所 Cleaning equipment using organic solvents
JPH0611435B2 (en) * 1989-09-18 1994-02-16 山崎化学工業株式会社 Vacuum cleaning device
JPH0757913B2 (en) * 1989-10-27 1995-06-21 オリエンタルエンヂニアリング株式会社 Degreasing and cleaning method and device
US5115576A (en) * 1989-10-27 1992-05-26 Semifab Incorporated Vapor device and method for drying articles such as semiconductor wafers with substances such as isopropyl alcohol
US5108660A (en) * 1990-01-29 1992-04-28 The Procter & Gamble Company Hard surface liquid detergent compositions containing hydrocarbyl amidoalkylenesulfobetaine
US5081772A (en) * 1990-05-17 1992-01-21 Rochester Midland Corporation Condensation vapor degreaser
US5045117A (en) * 1990-09-18 1991-09-03 Rockwell International Corporation System for removing flux residues from printed wiring assemblies
DE4031563A1 (en) * 1990-10-05 1992-04-09 Zeiss Carl Fa Cleaning optical components using non-halogenated solvents - by passing through successive baths contg. organic solvent, water contg. surfactant, and organic solvent for drying
DE4125891C2 (en) * 1991-08-05 1995-01-19 Hermann Ziegler Process for cleaning dirty parts
DE4128699A1 (en) * 1991-08-29 1993-03-04 Peter Warthmann Process and equipment for solvent degreasing and cleaning - by solvent evapn. and condensn. on goods due to temp. differential, with continuous multistage treatment at increasing solvent pressure and temp.
US5240507A (en) * 1991-11-05 1993-08-31 Gray Donald J Cleaning method and system
IT1260831B (en) * 1992-07-17 1996-04-22 MACHINING PARTS DEGREASING PROCESS AND PLANT TO PERFORM THE PROCEDURE
JP3393389B2 (en) * 1992-10-30 2003-04-07 株式会社日本ヘイズ Vacuum degreasing cleaning method and vacuum cleaning machine
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