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WO1988001070A3 - A method for making a precision patterned mirror - Google Patents

A method for making a precision patterned mirror Download PDF

Info

Publication number
WO1988001070A3
WO1988001070A3 PCT/US1987/001742 US8701742W WO8801070A3 WO 1988001070 A3 WO1988001070 A3 WO 1988001070A3 US 8701742 W US8701742 W US 8701742W WO 8801070 A3 WO8801070 A3 WO 8801070A3
Authority
WO
WIPO (PCT)
Prior art keywords
mirror
photoresist
photomask
resist
created
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US1987/001742
Other languages
French (fr)
Other versions
WO1988001070A2 (en
Inventor
Albert L Schmidt
Edward E Kovach
Gary W Sherwin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Westinghouse Electric Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of WO1988001070A2 publication Critical patent/WO1988001070A2/en
Publication of WO1988001070A3 publication Critical patent/WO1988001070A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

A precision patterned mirror can be created having a pattern resolution as high as 5 microns using an etchable photoresist mask. The mirror is created by producing a high resolution photomask using standard photomask production techniques. A photoresist is coated onto a mirror blank which includes reflecting layers on a glass substrate. The photomask is used to contact print or expose the photoresist. The resist is then developed and the exposed portions removed using standard photoresist development techniques. The mirror is then ion etched to remove the exposed portions of the reflective layer. The resist is then completely removed using a dry plasma etching process resulting in a completed mirror.
PCT/US1987/001742 1986-08-06 1987-07-17 A method for making a precision patterned mirror Ceased WO1988001070A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US89375986A 1986-08-06 1986-08-06
US893,759 1986-08-06

Publications (2)

Publication Number Publication Date
WO1988001070A2 WO1988001070A2 (en) 1988-02-11
WO1988001070A3 true WO1988001070A3 (en) 1988-03-24

Family

ID=25402038

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1987/001742 Ceased WO1988001070A2 (en) 1986-08-06 1987-07-17 A method for making a precision patterned mirror

Country Status (1)

Country Link
WO (1) WO1988001070A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102016452B1 (en) * 2017-12-27 2019-08-30 한양대학교 에리카산학협력단 Ellipsometer

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE301929C (en) *
US2036021A (en) * 1933-12-23 1936-03-31 Cheney Frank Dexter Manufacture of ornamental coated glass articles
FR806739A (en) * 1935-09-14 1936-12-23 New process for decorating mirrors, and mirrors obtained by this process
FR910757A (en) * 1944-12-13 1946-06-18 Societe D'etudes, De Fabrications Et D'applications Scientifiques S. E. F. A. S. Advanced reticles of optical instruments and their manufacturing processes
US2447836A (en) * 1942-04-02 1948-08-24 Keuffel & Esser Co Precision images and methods of producing them
FR2443084A1 (en) * 1978-12-01 1980-06-27 Meirotti Jean Pierre Use of etched photosensitive resin coatings to decorate mirrors - to reproduce image patterns containing fine detail

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE301929C (en) *
US2036021A (en) * 1933-12-23 1936-03-31 Cheney Frank Dexter Manufacture of ornamental coated glass articles
FR806739A (en) * 1935-09-14 1936-12-23 New process for decorating mirrors, and mirrors obtained by this process
US2447836A (en) * 1942-04-02 1948-08-24 Keuffel & Esser Co Precision images and methods of producing them
FR910757A (en) * 1944-12-13 1946-06-18 Societe D'etudes, De Fabrications Et D'applications Scientifiques S. E. F. A. S. Advanced reticles of optical instruments and their manufacturing processes
FR2443084A1 (en) * 1978-12-01 1980-06-27 Meirotti Jean Pierre Use of etched photosensitive resin coatings to decorate mirrors - to reproduce image patterns containing fine detail

Also Published As

Publication number Publication date
WO1988001070A2 (en) 1988-02-11

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