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USD702655S1 - Wafer holder for ion implantation - Google Patents

Wafer holder for ion implantation Download PDF

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Publication number
USD702655S1
USD702655S1 US29/448,067 US201329448067F USD702655S US D702655 S1 USD702655 S1 US D702655S1 US 201329448067 F US201329448067 F US 201329448067F US D702655 S USD702655 S US D702655S
Authority
US
United States
Prior art keywords
ion implantation
wafer holder
view
wafer
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/448,067
Inventor
Ren Kimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Assigned to SUMITOMO ELECTRIC INDUSTRIES, LTD. reassignment SUMITOMO ELECTRIC INDUSTRIES, LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KIMURA, Ren
Application granted granted Critical
Publication of USD702655S1 publication Critical patent/USD702655S1/en
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Description

FIG. 1 is a front view of a wafer holder for ion implantation showing my new design;
FIG. 2 is a rear view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a right side view thereof;
FIG. 6 is a left side view thereof;
FIG. 7 is a perspective view thereof; and,
FIG. 8 is an enlarged cross sectional view taken along line 8-8 of FIG. 3 thereof.
The broken lines shown in the drawings represent portions of the wafer holder for ion implantation that form no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a wafer holder for ion implantation, as shown and described.
US29/448,067 2012-10-15 2013-03-08 Wafer holder for ion implantation Active USD702655S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012024964 2012-10-15
JP2012-024964 2012-10-15

Publications (1)

Publication Number Publication Date
USD702655S1 true USD702655S1 (en) 2014-04-15

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ID=50441838

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/448,067 Active USD702655S1 (en) 2012-10-15 2013-03-08 Wafer holder for ion implantation

Country Status (1)

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US (1) USD702655S1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD731448S1 (en) * 2013-10-29 2015-06-09 Ebara Corporation Polishing pad for substrate polishing apparatus
USD983151S1 (en) * 2020-09-09 2023-04-11 Kokusai Electric Corporation Exhaust liner for reaction tube

Citations (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3247576A (en) * 1962-10-30 1966-04-26 Ibm Method of fabrication of crystalline shapes
US6037599A (en) * 1997-01-09 2000-03-14 Matsushita Electric Industrial Co., Ltd. Ion implantation apparatus and fabrication method for semiconductor device
US6225594B1 (en) * 1999-04-15 2001-05-01 Integrated Materials, Inc. Method and apparatus for securing components of wafer processing fixtures
US6329664B1 (en) * 1998-04-15 2001-12-11 Nec Corporation Ion implantation apparatus for wafers
US6545267B1 (en) * 1998-12-21 2003-04-08 Applied Materials, Inc. Wafer holder of ion implantation apparatus
US20050191409A1 (en) * 2004-01-06 2005-09-01 Adrian Murrell Ion beam monitoring arrangement
US7100954B2 (en) * 2003-07-11 2006-09-05 Nexx Systems, Inc. Ultra-thin wafer handling system
US7109068B2 (en) * 2004-08-31 2006-09-19 Micron Technology, Inc. Through-substrate interconnect fabrication methods
US7479644B2 (en) * 2006-10-30 2009-01-20 Applied Materials, Inc. Ion beam diagnostics
USD592512S1 (en) * 2008-06-12 2009-05-19 The Kind Group Bottle
US7633045B2 (en) * 2006-08-21 2009-12-15 Sony Corporation Optical device, method for producing master for use in producing optical device, and photoelectric conversion apparatus
US7644968B2 (en) * 2004-01-23 2010-01-12 Kawasaki Jukogyo Kabushiki Kaisha Substrate holding device
US7701230B2 (en) * 2007-04-30 2010-04-20 Axcelis Technologies, Inc. Method and system for ion beam profiling
US7799618B2 (en) * 2005-03-30 2010-09-21 Seiko Epson Corporation Method of manufacturing semiconductor device, semiconductor device, display device, and electronic instrument
US20100327190A1 (en) * 2009-06-30 2010-12-30 Twin Creeks Technologies, Inc. Ion implantation apparatus and a method
US8044374B2 (en) * 2009-06-30 2011-10-25 Twin Creeks Technologies, Inc. Ion implantation apparatus
USD661193S1 (en) * 2011-02-11 2012-06-05 The Procter And Gamble Company Container having surface ornamentation
USD680871S1 (en) * 2011-06-02 2013-04-30 The Procter & Gamble Company Bottle
USD684551S1 (en) * 2011-07-07 2013-06-18 Phuong Van Nguyen Wafer polishing pad holder

Patent Citations (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3247576A (en) * 1962-10-30 1966-04-26 Ibm Method of fabrication of crystalline shapes
US6037599A (en) * 1997-01-09 2000-03-14 Matsushita Electric Industrial Co., Ltd. Ion implantation apparatus and fabrication method for semiconductor device
US6329664B1 (en) * 1998-04-15 2001-12-11 Nec Corporation Ion implantation apparatus for wafers
US6545267B1 (en) * 1998-12-21 2003-04-08 Applied Materials, Inc. Wafer holder of ion implantation apparatus
US6225594B1 (en) * 1999-04-15 2001-05-01 Integrated Materials, Inc. Method and apparatus for securing components of wafer processing fixtures
US6617540B2 (en) * 1999-04-15 2003-09-09 Integrated Materials, Inc. Wafer support fixture composed of silicon
US7100954B2 (en) * 2003-07-11 2006-09-05 Nexx Systems, Inc. Ultra-thin wafer handling system
US20050191409A1 (en) * 2004-01-06 2005-09-01 Adrian Murrell Ion beam monitoring arrangement
US7644968B2 (en) * 2004-01-23 2010-01-12 Kawasaki Jukogyo Kabushiki Kaisha Substrate holding device
US7109068B2 (en) * 2004-08-31 2006-09-19 Micron Technology, Inc. Through-substrate interconnect fabrication methods
US7799618B2 (en) * 2005-03-30 2010-09-21 Seiko Epson Corporation Method of manufacturing semiconductor device, semiconductor device, display device, and electronic instrument
US7633045B2 (en) * 2006-08-21 2009-12-15 Sony Corporation Optical device, method for producing master for use in producing optical device, and photoelectric conversion apparatus
US7479644B2 (en) * 2006-10-30 2009-01-20 Applied Materials, Inc. Ion beam diagnostics
US7701230B2 (en) * 2007-04-30 2010-04-20 Axcelis Technologies, Inc. Method and system for ion beam profiling
USD592512S1 (en) * 2008-06-12 2009-05-19 The Kind Group Bottle
US20100327190A1 (en) * 2009-06-30 2010-12-30 Twin Creeks Technologies, Inc. Ion implantation apparatus and a method
US8044374B2 (en) * 2009-06-30 2011-10-25 Twin Creeks Technologies, Inc. Ion implantation apparatus
USD661193S1 (en) * 2011-02-11 2012-06-05 The Procter And Gamble Company Container having surface ornamentation
USD680871S1 (en) * 2011-06-02 2013-04-30 The Procter & Gamble Company Bottle
USD684551S1 (en) * 2011-07-07 2013-06-18 Phuong Van Nguyen Wafer polishing pad holder

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD731448S1 (en) * 2013-10-29 2015-06-09 Ebara Corporation Polishing pad for substrate polishing apparatus
USD983151S1 (en) * 2020-09-09 2023-04-11 Kokusai Electric Corporation Exhaust liner for reaction tube

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